氧化石墨烯铬离子印迹材料的制备及其除Cr(Ⅲ)性能研究
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摘要
针对制革废水二级处理出水的Cr(Ⅲ)去除,采用表面离子印迹技术制备了磁性氧化石墨烯表面Cr(Ⅲ)离子印迹材料Fe_3O_4@SiO_2–GO–IIP,探讨了pH和废水中共存金属离子对其Cr(Ⅲ)吸附性能的影响,并就其去除实际制革废水中Cr(Ⅲ)的性能进行了测试和评价。结果表明:制备的Fe_3O_4@SiO_2-GO-IIP,其表面形成的Cr(Ⅲ)印迹空穴,对废水中的Cr(Ⅲ)具有较高的选择吸附性能;pH对其Cr(Ⅲ)吸附性能具有显著影响,适宜的pH为6.1左右;对于Cr(Ⅲ)浓度为2.65mg/L的制革废水二级处理出水,Fe_3O_4@SiO_2-GO-IIP投加剂量为3~4g/L时,出水Cr(Ⅲ)浓度可达到GB30486-2013要求的最为严格的标准;对吸附饱和的Fe_3O_4@SiO_2-GO-IIP,可采用0.1mol/L的HCl溶液进行洗涤和再生。
引文
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