ZnO纳米棒/纳米锥阵列制备及其场发射性质研究
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摘要
采用化学气相沉积法在厚度约450 nm的ZnO晶种层上分别生长了ZnO纳米棒/纳米锥阵列,并对其场发射特性进行了研究。研究结果发现:沿c轴择优取向的ZnO晶种层中含有较少缺陷;长度分别为7μm和3.5μm的ZnO纳米棒/纳米锥均沿[0001]方向生长,ZnO纳米棒/纳米锥包含大量氧空位缺陷;ZnO纳米棒顶端尺寸约150 nm,而ZnO纳米锥具有非常尖锐的尖端;ZnO纳米棒/纳米锥的面密度分别为2.6×10~8/cm~2和1.9×10~8/cm~2;ZnO纳米锥具有相对较低的开启电场~6.1 V/μm和较高的场增强因子~1641。本文对影响场发射性能的因素进行了讨论。
ZnO nanorod/nanocone arrays were grown on the ZnO seed layers respectively by the chemical vapor deposition(CVD) method and their field emission(FE) properties were studied. The ZnO seed layer with a thickness of approximately 450 nm exhibits high c-axis orientation and possesses few defects. ZnO nanorods with the length of about 7 μm and ZnO nanocones with the length of about 3.5 μm all grow along the [0001] direction and contain a large number of oxygen vacancy defects. ZnO nanorods have the similar top diameters of 150 nm, while ZnO nanocones exhibit very sharp tips. The areal densitis of ZnO nanorod/nanocone arrays are about 3.6×10~8/cm~2 and 1.9×10~8/cm~2.ZnO nanocone array has the lower turn-on electrical field of 6.1 V/μm and higher field enhancement factor of 1641. The effect factors on the FE property have been discussed.
引文
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