Phonon Assisted Ultrafast Charge Transfer at van der Waals Interface
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摘要
The van der Waals interfaces of two-dimensional(2D) semiconductor are central to new device concepts and emerging technologies in light-electricity interconversion where the efficient charge separation is key factor. Contrary to general expectation, efficient electron-hole separation can occur in vertically stacked transition-metal dichalcogenide(TMD) heterostructure bilayers through ultrafast charge transfer between the neighboring layers despite their weak van der Waals(vd W) bonding. In this Letter, we show using ab initio non-adiabatic molecular dynamics(NAMD), that instead of direct tunneling, the ultrafast interlayer hole transfer is strongly promoted by an adiabatic mechanism through phonon excitation. At room temperature the interlayer charge transfer in MoS_2/WS_2 is ultrafast with a timescale of 20 fs which is in good agreement with the experiment. This ultrafast hole transfer process can be suppressed by decreasing the temperature to 100 K, which reduces the phonon occupation and the charge transfer is then dominated by direct tunneling, which happens at the time scale longer than 300 fs. The atomic level picture of phonon-assisted ultrafast mechanism revealed in our study is valuable both for the fundamental understanding of ultrafast charge carrier dynamics at vd W hetero-interfaces as well as for the design of novel quasi-2D devices for optoelectronic and photovoltaic applications.
The van der Waals interfaces of two-dimensional(2D) semiconductor are central to new device concepts and emerging technologies in light-electricity interconversion where the efficient charge separation is key factor. Contrary to general expectation, efficient electron-hole separation can occur in vertically stacked transition-metal dichalcogenide(TMD) heterostructure bilayers through ultrafast charge transfer between the neighboring layers despite their weak van der Waals(vd W) bonding. In this Letter, we show using ab initio non-adiabatic molecular dynamics(NAMD), that instead of direct tunneling, the ultrafast interlayer hole transfer is strongly promoted by an adiabatic mechanism through phonon excitation. At room temperature the interlayer charge transfer in MoS_2/WS_2 is ultrafast with a timescale of 20 fs which is in good agreement with the experiment. This ultrafast hole transfer process can be suppressed by decreasing the temperature to 100 K, which reduces the phonon occupation and the charge transfer is then dominated by direct tunneling, which happens at the time scale longer than 300 fs. The atomic level picture of phonon-assisted ultrafast mechanism revealed in our study is valuable both for the fundamental understanding of ultrafast charge carrier dynamics at vd W hetero-interfaces as well as for the design of novel quasi-2D devices for optoelectronic and photovoltaic applications.
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