反应溅射镀膜机的PEM自动控制系统
摘要
根据磁控溅射反应的原理,由迟滞回线可以得出,要想获得较快的沉积速率和一定化学配比的高质量的薄膜,就要使磁控反应的位置在迟滞回线中的过渡区域,即在金属模式和化合模式之间拐弯点,而且迟滞回线具有不可逆性,这就要求有一种快速的反馈控制方法,自动控制反应气体的进入。有许多信号可以作为反馈信号和控制方法,通过对适应性和优劣点的比较,选择了等离子体发射光谱检测法。
反应溅射镀膜机的PEM(plasma emission monitor)自动控制系统就是通过观测反应过程中等离子体发射光谱,由光谱图反映出来的真空室中各种粒子的密度来判断反应的状态,再根据反应的状态来自动控制反应气体的流量。理论上说,运用Stark等方法通过光谱图能够准确的计算出等离子体中各种粒子的密度,但是由于反应的复杂性和干扰参数的难确定性,得到的光谱强度与粒子密度有正比的关系,系统的控制部分就用粒子对应的相对光谱强度来反映各种粒子的相对密度。这中间需要用到光纤、光谱仪、光电转化等设备,这也是整个系统的重要部分。
根据溅射镀膜机的工作原理和等离子体发射光谱诊断的原理,设计了能够根据反应状态快速调节反应气体质量流量的自动控制系统,应用于溅射镀膜机。对系统所用到的硬件设备进行了分析,并选择了光谱仪等主要设备的产品品牌和型号。对探头的安放位置、设备之间的接口等进行了分析说明。此外,对PEM控制器的调节参数的选择,控制算法和方式进行了分析研究,提出了利用同一条谱线不同反应状态的强度比值和不同种谱线强度的不同状态的比值,这两种选择调节参数的方式。设计了适用于反应溅射镀膜机PEM自动控制系统的单神经元自适应控制算法,并运用Matlab软件进行算法的仿真运算,通过与无自适应环节的传统PID算法进行对比,可以得到更加理想的控制效果。
通过使用PEM控制系统,可以使反应磁控溅射镀膜机在沉积速率较高的情况下进行,并得到了质量更加优秀的化合物薄膜,提高了产品的应用价值。同时,该系统也是实际可行的。
Based on the principle of reactive magnetron sputtering, what we can see from the hysteresis effect of reactive sputtering, we aim at getting high-grade film with high sputtering rate and optimum stoicheiometry, so we should set the reactive point in the transition region of the hystersis effect, which is between metallic mode and oxide mode. We know that hystersis effect is inerversible, so a fast control system is needed to make-up a closed loop to control the reactive gas flow. There are many signals can be used, we choose the PEM as the signal because of its adaptability.
The PEM automatic control system of reactive sputtering coating equipment is monitoring the plasma with its emissions, and through the spectrogram the density of the different particles can be known and the state of reaction can be known too, than to control the reacting gas flow. On theory, we can compute the density of all the different particles exactly through the spectrogram with Stark manner etc. But because of the complexity and indeterminacy of parameters in reaction, with direct proportion between intensity of spectrum and density of particals, we choose the relative intensity of spectrum to agent the density of particals. And spectrometer, fiber, photoelectric conversion elements will be used in the system.
Based on the principle of reactive magnetron sputtering and emission spectra diagnosing the plasma, I design an automatic system for reactive sputtering coating equipment which can adjust the react gas quickly. The equipments used in system are analysed, than the main equipments'brand and model number are chosen. The position of probe and interface of equipments are introduced.Furthermore, it formulates the regulation signal control algorithm and manners are studied. Two regulation signal modes are brought out with using the same or different spectral lines in different states. It designs a single neuron adaptive PID controller for PEM system of reactive sputtering coating equipment, and then simulates the control algorithm PID with software Matlab. By comparison simulation of classical PID without a single neuron adaptive controller, we can see it get a more ideal effect.
Because of the PEM control system, the reactive sputtering coating equipment can work at the point with a high sputtering rate and get good compound thin film.Besides, the system is a fessible plan.
反应溅射镀膜机的PEM(plasma emission monitor)自动控制系统就是通过观测反应过程中等离子体发射光谱,由光谱图反映出来的真空室中各种粒子的密度来判断反应的状态,再根据反应的状态来自动控制反应气体的流量。理论上说,运用Stark等方法通过光谱图能够准确的计算出等离子体中各种粒子的密度,但是由于反应的复杂性和干扰参数的难确定性,得到的光谱强度与粒子密度有正比的关系,系统的控制部分就用粒子对应的相对光谱强度来反映各种粒子的相对密度。这中间需要用到光纤、光谱仪、光电转化等设备,这也是整个系统的重要部分。
根据溅射镀膜机的工作原理和等离子体发射光谱诊断的原理,设计了能够根据反应状态快速调节反应气体质量流量的自动控制系统,应用于溅射镀膜机。对系统所用到的硬件设备进行了分析,并选择了光谱仪等主要设备的产品品牌和型号。对探头的安放位置、设备之间的接口等进行了分析说明。此外,对PEM控制器的调节参数的选择,控制算法和方式进行了分析研究,提出了利用同一条谱线不同反应状态的强度比值和不同种谱线强度的不同状态的比值,这两种选择调节参数的方式。设计了适用于反应溅射镀膜机PEM自动控制系统的单神经元自适应控制算法,并运用Matlab软件进行算法的仿真运算,通过与无自适应环节的传统PID算法进行对比,可以得到更加理想的控制效果。
通过使用PEM控制系统,可以使反应磁控溅射镀膜机在沉积速率较高的情况下进行,并得到了质量更加优秀的化合物薄膜,提高了产品的应用价值。同时,该系统也是实际可行的。
Based on the principle of reactive magnetron sputtering, what we can see from the hysteresis effect of reactive sputtering, we aim at getting high-grade film with high sputtering rate and optimum stoicheiometry, so we should set the reactive point in the transition region of the hystersis effect, which is between metallic mode and oxide mode. We know that hystersis effect is inerversible, so a fast control system is needed to make-up a closed loop to control the reactive gas flow. There are many signals can be used, we choose the PEM as the signal because of its adaptability.
The PEM automatic control system of reactive sputtering coating equipment is monitoring the plasma with its emissions, and through the spectrogram the density of the different particles can be known and the state of reaction can be known too, than to control the reacting gas flow. On theory, we can compute the density of all the different particles exactly through the spectrogram with Stark manner etc. But because of the complexity and indeterminacy of parameters in reaction, with direct proportion between intensity of spectrum and density of particals, we choose the relative intensity of spectrum to agent the density of particals. And spectrometer, fiber, photoelectric conversion elements will be used in the system.
Based on the principle of reactive magnetron sputtering and emission spectra diagnosing the plasma, I design an automatic system for reactive sputtering coating equipment which can adjust the react gas quickly. The equipments used in system are analysed, than the main equipments'brand and model number are chosen. The position of probe and interface of equipments are introduced.Furthermore, it formulates the regulation signal control algorithm and manners are studied. Two regulation signal modes are brought out with using the same or different spectral lines in different states. It designs a single neuron adaptive PID controller for PEM system of reactive sputtering coating equipment, and then simulates the control algorithm PID with software Matlab. By comparison simulation of classical PID without a single neuron adaptive controller, we can see it get a more ideal effect.
Because of the PEM control system, the reactive sputtering coating equipment can work at the point with a high sputtering rate and get good compound thin film.Besides, the system is a fessible plan.
引文
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3.伊恩.史蒂文森弗兰克.泽蒙戴尔.莫顿.镀膜工艺与镀膜系统配置[J],真空科学与技术,2003,23(6)：443-448
4.徐祖华.三靶磁溅式真空镀膜机电气控制系统的研究[D],长沙：湖南大学,2004,6-14
5.姜燮昌.大面积反应溅射技术的最新进展及应用[J],真空,2002,3：2-8
6.陈玲玲,李国卿,黄开玉,关秉羽,江思源.镀膜机的微机控制[J],真空,2003,6：24-26
7.郝向东,张晓江.南玻玻璃镀膜自动控制系统[J],电气时代,2005,12：56-57
8.刘洪祥,李凌辉,申林,胜明,张云洞.自动控制离子束溅射沉积光学薄膜系统设计[J],光学仪器,2004,26(2)：83-86
9.袁文军.可编程控制器在建筑玻璃真空镀膜生产线上的应用[J],机械研究与应用,1999,12(1)：33-34
10.许世军,任小玲.光学镀膜仪的监控稳定性研究[J],真空,2006,43(6)：55-56
11.杨波.镀膜机智能膜厚控制系统的研究[D],长春：长春理工大学,2002,3-8
12.周志文,薛华.真空应用设备中的常用调压方法[J],机械研究与应用,2004,5：33-37
13. Till Wallendorf, Swen Marke, Christian May. Optical investigations in a PEM controlled reactive magnetron sputter process for aluminum doped zinc oxide layers using metallic alloy targets [J], Surface and Coatings Technology,2003:222-228
14.管潇津.等离子体过程诊断与应用[J],保定师范专科学校学报,2004,17(2)：21-24
15.杨幼桐,杜凯,张菲,宋国利,万鹏程,刘艳春.等离子体的诊断方法[J],哈尔滨学院学报,2005,26(10)：132-135
16.王加扣.低温氢等离子体诊断[D],成都：四川大学,2005,27-54
17.王金刚.NbN薄膜的制备及等离子体诊断[D],大连：大连理工大学,2004,6-17
18. Yong M. Kim, Jong U. Kim, Jeon G. Han. Investigation on the pulsed DC plasma nitr-iding with optical emission spectroscopy[J], Surface and Coatings Technology,2002, 151-152:227-232
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