TiNx太阳光谱选择性吸收薄膜的研究
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摘要
太阳光谱选择性吸收薄膜是太阳能光热转换应用中极为重要的关键材料,具有环保、光热转换效率高等优点,并且可与建筑一体化结合,有市场前景。当今,世界上许多国家都在积极研究它的制备工艺,以期获得具有简单的工艺、低廉的成本、优良稳定的性能的太阳光谱选择性吸收薄膜。本论文在调研国内外研究发展的基础上,针对目前国内太阳能集热器的现状和发展趋势,开展了磁控溅射制备太阳光谱选择性吸收薄膜的研究。
本论文采用直流反应磁控溅射方法,以Ti为靶材,Ar气为工作气体,O_2气和N_2气为反应气体,在Si基底上制备了单层TiNx薄膜,分别在Cu基底和载波片上制备了单层TiO_(2-x)薄膜以及Ti-TiNx-TiO_(2-x)多层薄膜,并对这些薄膜结晶结构、表面形貌和光学性质进行分析。
1.在各种工艺参数下制备的TiNx薄膜,发现当氩气流量为30sccm,氮气流量为2.0sccm,基底温度为300℃,溅射电流为0.35A时,用反应磁控溅射法在Si基底上制备的TiNx薄膜为多晶结构的立方相,并呈现为(200)择优取向,颗粒致密,膜表面均匀,结晶度最好;在测试波长(350-1000nm)范围内,所有样品的反射光谱都在455nm附近存在一个反射极小值,而在近红外波段都表现了高反射。
2.氧气流量对反应溅射沉积单层TiO_(2-x)膜的透过率、折射率和消光系数影响显著。随O_2气流量增大,薄膜透过率逐渐增大,当O_2气流量为16sccm时,薄膜在500nm波长处的透过率达到了85%。在可见-近红外波段内(400-1000nm),薄膜折射率和消光系数随氧气流量增大而减小。
3.在铜片上沉积Ti-TiNx-TiO_(2-x)多层膜。该多层膜在300-2500nm波段内平均吸收率α=82%,有良好的光谱选择特性,可作为太阳光谱选择性吸收薄膜。
Solar spectra selective absorption thin film(SSSATF),having advantages such as environmental protection,high efficiency of light-heat conversion,is a extremely important and crucial material in the application of solar energy.At present,solar is investigated in many countries,to obtain high and stable performance SSSATF with simple and low cost technology.In this paper,the research and development of SSSATF,combine with solar collectors and solar water-heater are detaily introduced.
In this paper,we choosed the Ti as the target,Ar as working gas,O_2 and N_2 as reactive gases,using DC reactive magnetron sputtering method to prepare TiNx thin films on Si substrates,and Ti-TiNx-TiO_(2-x) multi-layer thin films on Cu substrates.
1.TiNx thin films are prepared on Si substrates.Under the condition of the argon gas flow is 30sccm,nitrogen flow is 2.0sccm,substrate temperature is 300℃,and the sputtering current is 0.35A,the as-deposited TiNx thin films are cubic phase, polycrystalline with(200) preferred orientation.And a low reflectance is presented nearby wavelength 455nm in all the TiNx thin films prepared under various process parameters,while high reflectance is presented in the near-infrared band.
2.Single-layer TiO_(2-x) thin film is deposited on glass substrates.Transmittance, refractive index and extinction coefficient of TiO_(2-x) thin film were significantly affected by the oxygen flow,within wavelength range 400-1000nm,transmittance increase gradually with increasing O_2 flow,however,refractive index and extinction coefficient decrease with increasing O_2 flow.
3.Ti-TiNx-TiO_(2-x) multi-layer thin films were deposited on Cu substrates.The average absorptance within the band of wavelength 300-2500nm isα=82%.These multilayer thin films can be used for solar spectra selective absorption thin films.
本论文采用直流反应磁控溅射方法,以Ti为靶材,Ar气为工作气体,O_2气和N_2气为反应气体,在Si基底上制备了单层TiNx薄膜,分别在Cu基底和载波片上制备了单层TiO_(2-x)薄膜以及Ti-TiNx-TiO_(2-x)多层薄膜,并对这些薄膜结晶结构、表面形貌和光学性质进行分析。
1.在各种工艺参数下制备的TiNx薄膜,发现当氩气流量为30sccm,氮气流量为2.0sccm,基底温度为300℃,溅射电流为0.35A时,用反应磁控溅射法在Si基底上制备的TiNx薄膜为多晶结构的立方相,并呈现为(200)择优取向,颗粒致密,膜表面均匀,结晶度最好;在测试波长(350-1000nm)范围内,所有样品的反射光谱都在455nm附近存在一个反射极小值,而在近红外波段都表现了高反射。
2.氧气流量对反应溅射沉积单层TiO_(2-x)膜的透过率、折射率和消光系数影响显著。随O_2气流量增大,薄膜透过率逐渐增大,当O_2气流量为16sccm时,薄膜在500nm波长处的透过率达到了85%。在可见-近红外波段内(400-1000nm),薄膜折射率和消光系数随氧气流量增大而减小。
3.在铜片上沉积Ti-TiNx-TiO_(2-x)多层膜。该多层膜在300-2500nm波段内平均吸收率α=82%,有良好的光谱选择特性,可作为太阳光谱选择性吸收薄膜。
Solar spectra selective absorption thin film(SSSATF),having advantages such as environmental protection,high efficiency of light-heat conversion,is a extremely important and crucial material in the application of solar energy.At present,solar is investigated in many countries,to obtain high and stable performance SSSATF with simple and low cost technology.In this paper,the research and development of SSSATF,combine with solar collectors and solar water-heater are detaily introduced.
In this paper,we choosed the Ti as the target,Ar as working gas,O_2 and N_2 as reactive gases,using DC reactive magnetron sputtering method to prepare TiNx thin films on Si substrates,and Ti-TiNx-TiO_(2-x) multi-layer thin films on Cu substrates.
1.TiNx thin films are prepared on Si substrates.Under the condition of the argon gas flow is 30sccm,nitrogen flow is 2.0sccm,substrate temperature is 300℃,and the sputtering current is 0.35A,the as-deposited TiNx thin films are cubic phase, polycrystalline with(200) preferred orientation.And a low reflectance is presented nearby wavelength 455nm in all the TiNx thin films prepared under various process parameters,while high reflectance is presented in the near-infrared band.
2.Single-layer TiO_(2-x) thin film is deposited on glass substrates.Transmittance, refractive index and extinction coefficient of TiO_(2-x) thin film were significantly affected by the oxygen flow,within wavelength range 400-1000nm,transmittance increase gradually with increasing O_2 flow,however,refractive index and extinction coefficient decrease with increasing O_2 flow.
3.Ti-TiNx-TiO_(2-x) multi-layer thin films were deposited on Cu substrates.The average absorptance within the band of wavelength 300-2500nm isα=82%.These multilayer thin films can be used for solar spectra selective absorption thin films.
引文
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