闪光釉的研制
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摘要
闪光釉是近几年发展起来的一种装饰艺术釉。用它可以在墙地砖上印制各种花色图案,烧成后具有镜面般的反光效果,能迎合一部分用户的欣赏要求。本论文对闪光釉的配方组成、制备工艺、闪光釉中CeO_2晶体的析晶过程及闪光机理作了比较系统的试验和研究。
     通过大量的配方试验,确定了较佳的四个配方组成及相应的工艺条件。对各项工艺因素的试验表明:烧成温度影响釉熔体中析出的CeO_2晶粒的大小和数量,因而对闪光效果影响很大;闪光釉的烧成宜于快速冷却;闪光釉可以在一定的温度范围内熔制成功,但熔制温度的高低会对烧成温度造成影响,一般地,烧成温度随熔制温度的降低而升高;闪光釉熔块以按料:球:水=1:3:5球磨1h为宜,过度细磨会加剧闪光釉与底釉的反应,于烧成不利,球磨时外加少量的CMC和乙二醇有助于提高球磨效率,并改善烧成釉面的闪光效果;合适的釉层厚度为0.3~0.4mm。
     从对国外闪光釉粉烧釉时CeO_2析晶过程的试验和分析可以发现:釉熔体中CeO_2晶体的晶核生成范围大约在950~1040℃,最大成核速度在1010℃附近,1040~1100℃位于CeO_2晶体的生长范围之内,最大生长速度大致介于1070~1100℃之间。
     对闪光机理的分析表明:CeO_2晶粒的反射和釉面镜反射是造成闪光效果的直接原因,而釉层折射率、釉面平整度、CeO_2晶粒的取向度、颗粒度及其在釉层中的铺盖面积则是影响闪光效果的重要因素,改善工艺可从这些因素着手。
Glisten glaze, developed in recent years, is a kind of ornamental artistic glaze. It can be used to print all kinds of the design and color patterns on tiles with specular reflection when sintered, which may cater to some customers' appetite. In this paper, the formula and producing process of the glisten glaze are discussed systematically, as well as the crystallization of CeO2 in the glisten glaze and the glistening mechanism.
    Four formulas and their corresponding technical processing are determined by large numbers of formula experiments. The test of all kinds of factors shows that the sintering temperature affects the size and quantity of the grain of CeO2 crystallized from the glaze melt so as to influence the glistening effect dramatically; the glisten glaze should be cooled quickly after sintering ; the glisten glaze can be successfully melted in a certain temperature range, but the melting temperature can affect the sintering temperature to some extend. Generally, the sintering temperature will rise with the falling of the melting temperature. The clinker of the glisten glaze is grinded for an hour with such a proportion ?powder:ball:water = 1:3:5. The extreme grinding will accelerate the reaction between the glisten glaze and the based glaze, which is not good for sintering. While grinding, a small quantity of CMC and ethylene glycol are added to improve the grinding efficiency and the glistening effect of glaze surface. The finable thickness of glaze layer is 0.3-0.4mm.
    Testing and analyzing the crystallization process of CeO2 when the glisten glaze powders from foreign countries were sintered, we find that the crystal nucleus of CeO2 in the glaze form in 950-1040℃, and the maxical velocity of nucleation is near 1010℃. 1040-1100 ℃ is located in the temperature range of the growing of CeO2 crystal and the temperature of the maxical growing velocity is nearly between 1070℃ and 1100℃.
    The analysis of the glistening mechanism shows that the reflection of crystal grain of CeO2 and the specular reflection of glaze surface directly affect the glazing effect. The refractive index of glaze layer, the smoothness of glaze surface, the orientation, size and covering area in the glaze of CeO2 are the important factors influencing the glistening effect We may begin with these factors to improve the technology.
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