溶胶—凝胶法制备锌锡氧化物薄膜材料及其应用
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摘要
氧化物透明导电薄膜以接近金属的电导率、可见光范围内高透射比、红外高反射比及其半导体特性,广泛应用于太阳能电池、平面液晶显示器(LCD)、电加热玻璃、半导体/绝缘体/半导体(SIS)异质结。其中ZnO和SnO_2是应用最广泛的两种薄膜。溶胶-凝胶法是一种制备薄膜的新方法,设备简单,易掺杂,可大面积均匀成膜。在荧光粉颗粒表面包覆上一层或多层薄膜能够使荧光粉和外界可以隔离开,提高荧光粉的分散性和稳定性,解决荧光粉由于电性和表面化学活性造成的荧光粉性能的下降,与此同时,在荧光粉表面包覆特殊材料也可以提高荧光粉的发光性能。本文围绕透明导电薄膜的制备及其应用做了以下工作:
     1.溶胶凝胶法制备了SnO_2:Sb和ZnO:Al薄膜,重点探讨了溶胶凝胶法制备SnO_2—ZnO复合薄膜,并且考察了其I-V特性,在较高温度下,多层复合薄膜的I-V关系逐渐偏离欧姆定律,对此现象的可能原因作出了解释。用X射线光电子能谱(XPS)分析了薄膜的表面组成,用扫面电镜(SEM)观察了薄膜的截面结构。用紫外可见分光光度计(UV-Vis)考察了薄膜的透过率。
     2.在含锡的干凝胶氧化过程中,首次发现了干凝胶的部分升华现象,升华产物容易成膜。把升华物质分别沉积在石英、硅基底上可以得到透明导电薄膜,实验条件:含锡的二氧化锡干凝胶0.8g作为升华源;高纯氧气(99.9%)下500℃氧化1h,基底距离升华源5cm。经X射线衍射(XRD)和X射线光电子能谱(XPS)表明,所得到的薄膜是四方相金红石结构的二氧化锡。紫外可见分光光度计(UV-Vis)测试了薄膜的透光率,在可见光区达到80%以上。用扫描电镜(SEM)和原子力显微镜(AFM)观察了薄膜的微观形貌,表明所得到的薄膜致密,晶粒大小均匀,垂直基底表面生长,薄膜厚度比较均匀。用吸收系数间接推测膜厚,厚度大约70nm,四探针测试表明薄膜的方块电阻567Ω,电阻率为2.86×10~(-2)Ω·cm。表现出良好的透明导电性能。
     3.利用含锡干凝胶部分升华产物对自制ZnS:Mn荧光粉进行包覆研究。在固定氧气流量和氧化时间的条件下,考察了干凝胶与ZnS:Mn荧光粉的质量比和氧化温度对包覆后荧光粉电阻率的影响。当干凝胶与荧光粉的质量比为3.0,氧化温度为500℃处理后荧光粉的电阻率明显下降,对包覆后的荧光粉进行了室温光致荧光(PL)光谱、X射线衍射(XRD)以及透射电镜(TEM)分析。结果表明对荧光粉的包覆,显著改变了荧光粉的导电性而荧光粉的光致发光性质和晶体结构并没有受到太大影响。
Transparent and conductive oxide (TCO) films are widely used as transparent electrodes for optoelectronic devices such as touch panels, flat panel displays, liquid crystal display (LCD), semiconductor/ insulator/ semiconductor (SIS) hetero-conjunction, and thin-film solar cells, since they have high transmittance in visible range, high reflectance in infrared range and semiconductor’s characteristics and their electrical conductivities are similar to those of metals. Recently, ZnO and SnO_2 films have received much attention because of their possibility for TCO films with excellent chemical and thermal stability in addition to high electrical conductivity and optical transparency.
     Comparing to other methods, sol-gel is a new method to make TCO for its simplicity, easy doping and large area deposition on the substrates. As-prepared phosphors have intrinsic drawbacks in application, surface coatings have proved an efficient solution against agglomeration of powders, unstable surface electrical and chemical performances.
     In this thesis, we have investigated the method to obtain transparent and conductive zinc tin oxide films and their application to coat phosphors. The main results are as follow:
     1. SnO_2:Sb film, ZnO:Al film and alternate multi-layer films of SnO_2-ZnO were obtained respectively, by using sol-gel method. The electrical characterization of the films was basically conducted by conventional four probe technique and current-voltage (I-V) measurements. An phenomenon of deviating from ohmic law based I-V relation has been observed when the multi-layer films were measured at higher temperature. X-ray photoelectron spectroscopy (XPS), Ultraviolet (UV)-visible spectra and scanning electron microscopy (SEM) have been used to investigated the composition , visible light transmittance and morphology of the samples, respectively.
     2. It has been found that partially sublimating tin xerogel occurs during oxidization. The matter of tin xerogel sublimating has been deposited on quartz and silicon wafers to form transparent and conductive flms. The experimental conditions were controlled as follow: 0.8g tin xerogel was used as the sublimating source, 5cm from the source to the substrate, oxidizing for 1h under flux pure oxygen (99.9%). The results of XRD and XPS show that the film has stoichiometry of SnO_2 with tetragonal rutile crystal structure. The average transmittance of the film was above 80% in visible range. SEM and atomic force microscope (AFM) have been used to analyze the morphology of the film. It shows that the nanocrystal is compact and uniform in size and the films is smooth with equal thickness basically. The thickness and resistitvity of the film obtained as above is 70nm from deduction of absorption coefficient and 2.86×10~(-2)Ω·cm from four-probe measurements.
     3. Partial sublimation of SnO_2:Sb xerogel during oxidation was utilized to treat the as-prepared ZnS:Mn phosphor. The mass ratio of SnO_2:Sb xerogel to ZnS:Mn phosphors changed from 0.5 to 4.0 and the range of the oxidation temperature was 300-600℃under the given oxygen flux (0.2 L·min-1) and oxidation duration (30 min).The treated phosphors were characterized by X-ray diffraction (XRD), photoluminescence (PL), transmittance electron microscopy (TEM), and electrical resistance measurements. The results showed that the conductivity of the treated ZnS:Mn phosphors was obviously improved when the mass ratio of SnO_2:Sb xerogel to ZnS:Mn phosphors and the oxidation temperature were 3.0 and 500℃, respectively. The photoluminescence characteristics and crystal structure of the treated ZnS:Mn phosphors remained the same as the as-prepared phosphors.
引文
[1] 李世涛,乔学亮,陈建国,透明导电薄膜的研究现状与进展[J],激光与光电子学进展,2003, 40(7): 53-59.
    [2] Meng L.J., dos Santos M.P., Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering[J],Thin solid films, 1996,289 (Issues 1-2):65-69.
    [3] Ma J., Ji F., Ma H.L., Li S.Y., Electrical and optical properties of ZnO: Al films prepared by an evaporation method[J], Thin solid films, 1996,2 89 (Issues 1-2):213-215.
    [4] Takaoka G.H., Yamazaki D., Matsauo J., High quality ITO film formation by the simultaneous use of cluster in beam and laser irradiation[J], Materials Chemistry and Physics, 2002,74:104-108.
    [5] Mayer B., Highly conductive and transparent films of tin and fluorine doped indium oxide produced by APCVD[J],Thin solid films,1992, 221(Issues 1-2):166-182.
    [6] Gottmann J., Kreutz E.W., Pulsed laser deposition of alumina and zirconia thin films on polymers and glass as optical and protective coatings [J], Surface and Coatings Technology, 1999,116~119:1189-1194.
    [7] Negishi N., Takeuchi K., Preparation of photocatalytic TiO2 transparent thin film by thermal decomposition of Ti-alkoxide with α-terpineol as a solvent[J], Thin solid films, 2001,392 (Issue 2):249-253.
    [8] Davis L., Properties of transparent conducting oxides deposited at room temperature[J], Thin solid films, 2001,392 (Issues1-2):1-5.
    [9] Haines W.G., Bube R.H., Effects of heat treatment on the optical and electrical properties of indium–tin oxide films[J], Journal of Applied Physics, 1978,49(1):304-307.
    [10] Wu W.F., Chiou B.S., Properties of radio-frequency magnetron sputtered ITO films without in-situ substrate heating and post-deposition annealing [J], Thin solid films, 1994,247 (2):201-207.
    [11] Latz R., Michael K., Scherer M., High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron Sputtering[J], Jpn. J. Appl. Phys., 1991,30: L149-L151.
    [12] Nagatomo T., Maruta Y., Omoto O., Electrical and optical properties of vacuum-evaporated indium-tin oxide films with high electron mobility [J], Thin solid films, 1990,192 (1):17-25.
    [13] Minami T., Ida S.i, Miyata T., MinaminY., Transparent conducting ZnO thin films deposited by vacuum arc plasma evaporation[J], Thin solid films, 2003,445 (2):268-273.
    [14] Jeong W.J., Park G.G., Electrical and optical properties of ZnO thin films as a function of deposition parameters[J], Solar Energy Materials and Solar Cell, 2001, 65:37-45.
    [15] Miyata T., Mochizuki Y., Minami T., Blue-violet phosphate phosphor thin films for EL [J], Thin solid films, 2006,496 (1):174-178.
    [16] Ting J.M., Tsai B.S., Decreative sputter deposition of ZnO:Al thin film on glass[J], Materials Chemistry and Physics, 2000, 72:273-277.
    [17] Tominaga K., Murayama T., Umezu N., Mori I., Ushiro T., Moriga T., Nakabayashi I., Properties of films of multilayered ZnO: Al and ZnO deposited by an alternating sputtering method [J], Thin solid films, 1999, 343-344:160-163.
    [18] 章壮健, 陈华仙, 孟扬, 杨锡良, 沈杰, 沃松涛, 蒋益明, 孔令柱, 陈佾, 透明导电氧化物薄膜的新进展[J], 光电子技术, 2002, 22(3): 125-130.
    [19] Chopra K.L., Major S., Pandya D.K., Transparent conductors- a status review[J], Thin Solid Films, 1983, 102(1): 1-46.
    [20] Ginley D.S, Bright C., Transparent conducting oxide[J], MRS Bull, 2000, 25:15.
    [21] Nanto H., Minami T., Shooji S., Takata S., Electrical and optical properties of zinc oxide thin films prepared by RF magnetron sputtering for transparent electrode applications[J], Journal of Applied Physics, 1984,55,1029-1034.
    [22] 宋健全,刘正堂,红外增透膜系软件设计及应用 [J], 红外技术,2001,23(2):1-7.
    [23] Yang Z.W., Han S.G., Yan T.L. Preparation of ITO films on water-cooled flexible substrate by bias RF Magnetron Sputtering[J], J.Phys, 2000, 6 (49):1196-1201.
    [24] 姜燮昌,胡勇,ITO 透明导电玻璃的应用前景及工业化生产[J],真空,1995,12(4):1-8.
    [25] Weijtens C.H.L., Van Loon P.A.C., Influence of annealing on the optical properties of indium tin oxide[J], Thin solid films, 1991,196(1):1-10.
    [26] Tahar R B. H., Ban T., Ohya Y.,Tin doped indium oxide thin films:electrical properties[J], Journal of Applied Physics,1998,83(5):2631.
    [27] Schuler T., Aegerter.M.A., Optical, electrical and structural properties of Sol-Gel ZnO:Al coatings[J], Thin solid films, 1999,351:125-131.
    [28] Fan Z.X., Liquid crystal devices faces brilliant prospects[J], J.Phys, 2000, 29(11):681-688.
    [29] Tahar R.B.H., Ban T., Ohya Y., TakahashiY., Tin doped indium oxide thin films: Electrical properties[J], Journal of Applied Physics, 1998, 83(5):2631-2645.
    [30] 范志新, 孙以材, 陈玖琳, 氧化物半导体透明导电薄膜的最佳掺杂含量理论计算[J], 半导体学报, 2001, 22(11): 1382-1386.
    [31] Hamberg I., Granqvist C.G., Evaporated Sn-doped In2O3 films: Basic optical properties and applications to energy-efficient windows [J], Journal of Applied Physics,1986,60:R123-R160.
    [32] Coutts T.J., Wu X., Mulligan W.P., High performance transoarent conducting films of cadmium indate prepared by RF sputtering[J], Mat Res Soc Symp Proc, 1996,426:479.
    [33] Minami T., Kakumu T., Takeda Y., Takata S., Preparation of transparent conducting Zn2In2O5 films by d.c. magnetron sputtering[J], Thin solid films, 1997,308-309:13.
    [34] Yang T.L., Zhang D.H., Ma J., Transparent conducting ZnO:Al films deposited on organic substrates deposited by RF magnetron-sputtering[J], Thin solid films, 1998,326:60.
    [35] 陈源,张德恒,马谨,不同有机衬底上沉积 ZnO:Al 透明导电膜研究[J],半导体杂志,1999,24(3):1.
    [36] Hahn B., Heindel G., Pschorr E., MOCVD layer growth of ZnO and tertiary butanol[J], Semicond Sci Technol,1998,13:788.
    [37] Myong S.Y., Baik S.J., Lee C.H., Extremely transparent and conductive ZnO:Al thin films prepared by photo-assisted metalorganic chemicalvapor deposition using AlCl3.6H2O as new doping material[J], Jpn.J.Appl.Phys, 1997, 36 (8B):1078.
    [38] Ray S.C., Karanjai M.K., Dasguta D., Preparation and study of doped and undoped tin dioxide films by the open air chemical vapor deposition technique[J], Thin Solid Films,1997,307(Issues 1-2):221-227.
    [39] Ning Z.Y., Cheng S.H., Ge S.B., Y. Chao., Gang Z.Q., Zhang Y.X., Liu Z.G., Preparation and characterization of ZnO:Al films by pulsed laser deposition[J], Thin Solid Films,1997,307(Issues 1-2):50-53.
    [40] Nunes P., Fernanges B., Fortunato E., Vilarinho P., Martins R., Performances presented by zinc oxide thin films deposited by spray pyrolysis[J], Thin Solid Films,1999,337(Issues 1-2):176-179.
    [41] Kamalasanan M.N., Chandra S., Sol-gel synthesis of ZnO thin films[J], Thin Solid Films,1996,288(Issues 1-2):112-115.
    [42] Ohyama M., Kozuka H., Yoko T., Sol-gel preparation of ZnO films with extremely preferred orientation along (002) plan from zinc acetate solution[J], Thin Solid Films,1997,306(1):78-83.
    [43] Choi Y.S., Lee C.G., Cho S.M., Transparent conducting ZnxCd1-xO thin films prepared by the sol-gel process[J], Thin Solid Films, 1996, 289(Issues1-2): 153-158.
    [44] Kim S.S., Choi S.Y.,Park C.G., Jin H.W., Transparent conductive ITO thin films through the sol-gel process using metal salts[J], Thin Solid Films, 1999,347(Issues 1-2):155-160.
    [45] Tahar R.B.H., Ban T., Ohya Y., Electronics transport in tin-doped indium oxide thin films prepared by sol-gel technique[J], J. Appl. Phys., 1998, 83(4):2139.
    [46] 杨烈宇,关文译等,《材料表面薄膜技术》[M],北京:人民交通出版社,1991.
    [47] Fouad O.A., Ismail A.A., Zaki Z.I., Mohamed R.M., Zinc oxide thin films prepared by thermal evaporation deposition and its photocatalytic activity[J], Applied Catalysis B: Environmental, 2006,62(1-2): 144-149.
    [48] ?zgür ü., Alivov Y.I., Liu C., Teke A., Reshchikov M.A., Dogan S., Avrutin V., Cho S.J., Morko? H., A comprehensive review of ZnO materials and devices[J], J. Appl. Phys., 2005, 98: 1-103.
    [49] 赵炳辉, 叶志镇, 汪雷, 吕建国, ZnO薄膜应用的最新研究进展[J], 功能材料与器件学报, 2002, 8(3): 303-308.
    [50] Vasiliev A.A., Godovski D.Y., Buturlin A.I., Gabuzyan T.A., Semiconductor sensors for determination of fluorine-containing gas mixtures[J], Sensors and Actuators B: Chemical, 1993, 14(1-3): 705-707.
    [51] Nanto H., Sokooshi H., Kawai T., Aluminum-doped ZnO thin film gas sensor capable of detecting freshness of sea foods[J], Sensors and Actuators B: Chemical, 1993, 14(1-3): 715-717.
    [52] 徐毓龙, 氧化物与化合物半导体基础[M], 陕西: 西安电子科技大学出版社, 1991: 18.
    [53] Shimizu Y, Lin F.C., Takao Y., Makoto E., Zinc Oxide Varistor Gas Sensors: II, Effect of Chromium(III) Oxide and Yttrium Oxide Additives on the Hydrogen-Sensing Properties[J], J.Am.Ceram.Soc.,1998, 81(8):1633-1643.
    [54] Rao B B., Zinc oxide ceramic semi-conductor gas sensor for ethanol vapour [J] ,Materials Chemistry and Physics, 2000, 64: 62-65.
    [55] Gordon R.G., Criteria for choosing transparent conductors[J], MRS Bulletin, 2000, 25(8):52-57.
    [56] Minami T., New n-type transparent conducting oxides[J], MRS Bulletin,2000, 25(8):38-44.
    [57] Hang F.J., Geller Z.S., Zogg H., Tiwari A.N., Vignali C., Influence of deposited conditions on the thermal stability of ZnO:Al films grown by RF magnetron sputtering[J], Journal of Vacuum Science and Technology A, 2001,19(1):171-174.
    [58] Hu J.H., Gordon R.G., Deposition of boron doped zinc-oxide films and their electrical and optical properties[J], Journal of the Electrochemistry Society, 1992, 139(7):2014-2022.
    [59] Hagiwara Y., Nakada T., Kunioka A. Improved J(sc) in CIGS thin film solar cells using a transparent conducting ZnO:B window layer[J], Solar Energy Materials and Solar Cells,2001,67(1-4):267-271.
    [60] Hu J.H., Gordon R.G., Atmospheric-pressure chemical vapor deposition of gallium doped zinc-oxide thin films from diethyl zinc, water, and triethyl gallium[J], Journal of Applied Physics, 1992,72(11):5381-5392.
    [61] Suzuki A., Matsushita T., Yamanishi H., Tanaka D., Aoki T., Okuda M., Large transmittance changes induced in Ga-doped ZnO thin films prepared by pulsed laser deposition[J], J.Jap.Appl.Phys 2., 1996, 35(12A): L1603-L1604.
    [62] Hirasawa H., YoshidaM., Nakamura S., Suzuki Y,Okada S., KondoK., ZnO:Ga conducting films grown by DC arc-discharge ionplating[J], Solar Energy Materials and Solar Cells,2001,67(1-4):231-236.
    [63] Kim K.J., Park Y.R., Large and abrupt optical band gap variation in In-doped ZnO[J], Applied Physics Letter, 2001,78(4):475-477.
    [64] Miki Y.M., Paraguay D.F., Estrada L.W., Andrade E., Structure and morphology of high quality indium doped ZnO films obtained by spray pyrolysis[J], Thin Solid Film,2000,376(1-2):99-109.
    [65] Minami T., Yamamoto T., Miyata T., Highly transparent and conductive rare earth-doped ZnO thin films prepared by magnetron sputtering[J], Thin Solid Film, 2000,366(1-2):63-68.
    [66] Demerchant J., Cocivera M., Preparation and doping of zinc oxide using spray-pyrolysis[J], Chemistry of Materials, 1995,7(9):1742-1749.
    [67] Sato H., Minami T., Takata S., Highly transparent and conductive group-Ⅳ impurity-doped ZnO thin films prepared by radio-frequency magnetron sputtering[J], Journal of Vacuum Science and Technology A., 1993, 11 (6):2975-2979.
    [68] Gordon R.G., Liang H.F., Surface reaction in the chemical vapor deposition of highly transparent and conductive fluorine doped zinc oxide[J], Abstracts of Papers of the American Chemical Society, 1998,216:201.
    [69] Hu J.H., Gordon R.G., Textured fluorine doped ZnO films by atmospheric pressure chemical vapor deposited and their use in amorphous silicon solar-cells[J], Solar cells,1991,30(1-4):437-450.
    [70] Ye J., Gu S.L., Zhu S.M., Chen T., Hu L.Q., Qin F., Zhang R., Shi Y., Zheng Y.D., The growth and annealing of single crystalline ZnO films by low pressure MOCVD[J], J Cryst Growth, 2002, 243(1):151-156.
    [71] Zu P, Tang Z. K., Wong G. K. L., Kawasaki M., Ohtomo A., Koinuma H., Segawa Y., Ultraviolet spontaneous and stimulatedem is from ZnOmicrocrytallite thin film at room temperature[J], Solid State Common, 1997, 103:459-463.
    [72] Tamura K., Ohtomo A., Saikusa K., Osaka Y., Makino T., Segawa Y., Sumiya M., Fuke S., Koinuma H., Kawasaki M., Epitaxial growth of ZnO films on lattice-matched ScAlMgO4 (0001) substrates[J], J Cryst Growth, 2000, 214-215 (2):59-62.
    [73] Makino T., Chia C. H., Segawa Y., High-throughput optical characterization for the development of a ZnO-based ultraviolet semiconductor-laser[J], Appl Surf Sci, 2002,189:277-283.
    [74] 杨成兴, 季振国, 刘坤, 樊瑞新, 叶志镇, 雾化热解法制备ZnO薄膜及其光电特性[J], 半导体学报, 2002, 23(10): 1083-1087.
    [75] 傅竹西, 林碧霞, 郭常新, 氧化锌半导体薄膜的发光光谱特性[J], 半导体学报, 1999, 20(9): 827-830.
    [76] 陈汉鸿,叶志镇,ZnO薄膜的掺杂和转型的研究进展[J],半导体情报,2001,38(2):37.
    [77] Ye Z.Z., Fei Z.G., Lu J.G., Zhang Z.H., Zhu L.P., Zhao B.H., Huang J.Y., Preparation of p-type ZnO films by Al+N-codoping method[J], J Cryst Growth, 2004, 265 (Issues 1-2),127-132.
    [78] Bian J.M., Li X.M., Zhang C.Y., Yu W.D., Gao X.D., p-type ZnO films by monodoping of nitrogen and ZnO-based p–n homojunctions[J], Appl.Phys.Lett. 2004, 85,(18):4070-4072.
    [79] Ryu Y. R., Zhu S., Look D. C., Wrobel J. M., Jeong H. M., White H. W., Synthesis of p-type ZnO films[J], J Crystal Growth, 2000, 216 (6):330-334.
    [80] 贾晓林,张海军,谭伟,氧化锌薄膜研究的新进展[J],材料导报,2003,17(9):207-209.
    [81] Jarzebski Z.M., Marton J.P., Physical properties of SnO2 materials II: Electrical Properties[J], Electrochem. Soc., 1976, 123(9): 299-310.
    [82] 郭玉忠, 王剑华, 黄瑞安, 王贵青, 掺杂SnO2透明导电薄膜电学及光学性[J], 无机材料学报, 2002, 17(1): 131-138.
    [83] Guglielmi M., Menegazzo E., Paolizzi M., Sol-Gel deposited Sb-doped tin oxide films[J], J.Sol-Gel Sci. Tech, 1998, 13(1-3): 679-683.
    [84] Ganz.D, Gasparro G., Aegerter M.A., Laser sintering of SnO2:Sb Sol-Gel coatings[J], J.Sol-Gel Sci.Tech, 1998,13(1-3): 961-967.
    [85] Shanthi S., Subramanian C., Ramasamy P., Growth and characterization of antimony doped tin oxide thin films[J], Journal of Crystal Growth, 1999,197(4):858-864.
    [86] Putz J., Ganz D., Gasparro G., Aegerter M.A., Influence of the heating rate on the microstructure and on macroscopic properties of Sol-Gel SnO2:Sb coatings[J], J.Sol-Gel Sci. Tech., 1998, 13 (1-3):1005-1010.
    [87] Detlef B., Christian G., Rudiger N., Synthesis of nanocrystalline, redispersable antimony-doped SnO2 particles for the preparation of conductive, transparent coatings[J], J.Sol-Gel Sci Tech, 1998, 13 (1– 3) :789-792.
    [88] Ganz D., Reich A., Aegerter M.A., Laser firing of transparent conducting SnO2 Sol-Gel coatings [J], J.Non-crystall.Solids, 1997, 218: 242-246.
    [89] Kim H., Pique A., Transparent conducting Sb-doped SnO2 thin films grown by pulsed-laser deposition [J], Appl.Phys.Letters, 2004, 84 (2):218-230.
    [90] Senguttuvan T.D, Malhotra L.K., Sol gel deposition of pure and antimony doped tin dioxide thin films by non alkoxide precursors [J], Thin Solid Films, 1996, 289:22-28.
    [91] Kim K.H., Lee S.W., Effect of antimony addition on electrical and optical properties of tin oxide film[J], J.Am.Ceram.Soc,1994,77(4):915-921.
    [92] Park S.S., Mackenzie J.D., Sol-Gel-derived tin oxide thin films[J], Thin Solid Films,1995, 258:268-273.
    [93] Tsuchiya T., Emoto T., Sei T., Preparation and properties of transparent conductive thin films by Sol-Gel process[J], J.Crystall.Solids, 1994, 178:327-332.
    [94] Terrier C., Chatrlon J.P., Bejoan R., Roger J.A., Sb-doped SnO2 transparent conducting oxide from the Sol-Gel dip-coating technique[J], Thin Solid Films, 1995,263:37-41.
    [95] Chatelon J.P., Terrier C., Bernstein E., Berjoan R., Roger A., Morphology of SnO2 thin films obtained by the Sol-Gel techniqhe[J], Thin Solid Films, 1994,247:162-168.
    [96] Janose S., The origin of haze in CVD tin oxide thin films[J], AppliedSurface,2002,185:161-171.
    [97] Pramod S. P., Versatility of chemical spray pyroloysis technique[J], Material Chemistry and Physics, 1999,59:185-198.
    [98] 雷智,冯良桓,张静全,蔡亚平,蔡伟,郑家贵,李卫,武莉莉,黎兵,夏庚培,鄢强,低温制备透明SnO2:F薄膜的光电性研究[J],光电子技术,2004, 24(1):4-7.
    [99] 罗文秀,李凤玲,几种MOCVD 掺杂 SnO2 膜的结构、透明度与导电性[J],无机材料学报,1990,5(2):185-188.
    [100] Gardner J. W., Bartlettceds P. N., Sensors and Sensory Systems for Electronic [M], Dordrecht: Kluwer Academic Publisher,992.
    [101] Lee D.S., Jung H.Y., Lim J.W., Lee M., Ban S.W., Huh J.S., Lee D.D., Explosive gas recognition system using thick film sensor array and neural network[J], Sensors and Actuators, 2000,71(1):90-98.
    [102] 山崎映一, 发光型显示(上)[M], 北京: 科学出版社, 2003:128-142.
    [103] 孟宪, 朱宁, 交流粉末电致发光体的老化研究[J], 发光学报, 1992, 13(2): 154-158.
    [104] Kim T.K., Lee M.N., Lee S.H., Park Y.C., Jung C.K., Boo J.H., Development of surface coating technology of TiO2 powder and improvement of photocatalytic activity by surface modification[J], Thin Solid Films, 2005, 475(1-2): 171-177.
    [105] Kubo H., Isobe T., Takahashi H., Itoh S., Characterization on thermal stability of ZnS:Mn2+/MPS/SiO2 nano-phosphor film[J], Applied Surface Science, 2005, 244 (1-4): 465-468.
    [106] Kim J., Han G. Y., Chung C.H., Encapsulating the electroluminescent phosphor micro-particles using a pulsed metal-organic chemical vapor deposition process in a fluidized bed[J], Thin Solid Films, 2002, 409(1): 58-65.
    [107] Fahlman B.D., Barron A.R., CVD of conformal alumina thin films via hydrolysisofAlH3(Nme2Et)[J], dv.Mater.Opt.Electron,2000,10:136-144.
    [108] 张晓, 刘行仁, CaSiO3中Tb3+的发光及Ce3+-Tb3+的能量传递[J], 中国稀土学报, 1991, 9(4): 324-328.
    [109] 陈春霞, 姜继森, 宫峰飞, 钱思明, 杨燮龙, 高能球磨法制备铁/聚四氟乙烯纳米复合材料[J], 中国粉体技术, 2000, 6(6): 11-13.
    [110] Poulat S., Sun H., Teer D.G., Micro-scale Abrasion and Medium Load Multiple Scratch Tests of PVD Coatings[J], TRANSACTIONS OF MATERIALS AND HEAT TREATMENT, 2004, 25(5): 1199-1202.
    [111] 贾瑞宝, 余大书, 王锐, 张明福, ZnS:Cu 发光粉的包覆研究进展[J], 哈尔滨工业大学学报, 2004, 36(3): 401-405.
    [112] 罗振华, 张昌盛, 陈树德, 纳米晶铁基丝的制备及其导磁性能的研究[J], 上海大学学报(自然科学版), 2002, 8(5): 437-440.
    [113] 张光业, 郭建亭, 张华, 杨华明, 李云龙, 新型导电粉制备工艺[J], 非金属矿, 2002, 25(5): 30- 32.
    [114] 匡汉茂, 邓兆祥, 李春辉, 孙晓明, 李亚栋, 庄京, CdS/SiO2 纳米棒核/壳结构的制备和发光性能[J], 物理化学学报, 2002, 18(5): 477-480.
    [115] Mikrajuddin A., Iskandar F., Okuyama K., Stable photoluminescence of zinc oxide quantum dots in silica nanoparticles matrix prepared by the combined sol-gel and spray drying method[J], Journal of Applied Physics, 2001, 89(11): 6431-6434.
    [116] 尹春雷, 袁方利, 黄淑兰, 纳米氧化锌表面包覆氧化铝复合粉体制备及其光催化活性[J], 过程工程学报, 2003, 3(4): 346-350.
    [117] 刘波, 庄志强, 刘勇, 王悦辉, 粉体的表面修饰与表面包覆方法的研究[J], 中国陶瓷工业, 2004, 11(1): 50-54, 31.
    [118] 雷景轩, 马学鸣, 朱丽慧, 液相包覆技术及其在材料制备中的应用[J], 材料科学与工程, 2002, 20(1): 93-96.
    [119] 李晖, 朱振峰, 朱敏, 微乳液法制备核-壳及空心结构纳米材料的研究进展[J], 材料导报, 2005, 19 (2): 177-179, 183.
    [120] Choi H.H., Ollinger M., Singh R.K., Enhanced cathodoluminescent properties of ZnO encapsulated ZnS:Ag phosphors using an electrochemical deposition coating[J], Applied Physics Letters, 2003, 82(15): 2494-2496.
    [121] 刘恩科, 朱秉生, 罗晋生等, 半导体物理学(第 4 版)[M], 北京: 国防工业出版社, 1999: 253-258.
    [122] 李旦振, 陈亦琳, 林熙, 王绪绪, 付贤智, 纳米 ZnO 的制备及发光特性研究[J], 无机化学学报, 2002, 18 (12): 1229-1232.
    [123] Izaki M., Preparation of Transparent and Conductive Zinc Oxide Films by Optimization of the Two-Step Electrolysis Technique[J], J. Electrochem. Soc., 1999, 146 (12): 4517-4521.
    [124] S. Peulon and D. Lincot, Cathodic Electrodeposition from Aqueous Solution of Dense or Open-Structured Zinc Oxide Films [J], Adv. Mater., 1996,8 (2): 166- 170.
    [125] Wei W.S., Wang T.M., Zhang C.X., Li G.H., Han H.X., Ding K., Study on optical band gap of boron-doped NC-Si:H film[J], Journal of Modern Physics B, 2002, 16(28-29): 4327-4330.
    [126] Shanthi E., Dutta V., Banerjee A., Chopra K.L., Electrical and optical properties of undoped and antimony-doped tin oxide films[J], Journal of Applied Physics, 1980,51(12):6243-6251.
    [127] Sanon G., Rup R., Mansingh A., Growth and characterization of tin oxide films prepared by chemical vapour deposition[J], Thin Solid Films, 1989,190(2): 287-301.
    [128] Ghosh S., Sarkars A., Chaudhuri S., Pal A.K., Grain boundary scattering in aluminium-doped ZnO films[J], Thin Solid Films, 1991,205: 64-68.
    [129] Yang T.L., Zhang D.H., Ma J., Chen Y., Transparent conducting ZnO:Al films deposited on organic substrates deposited by r.f. magnetron-sputtering[J], Thin Solid Films, 1998, 326(Issues 1-2),60-62.
    [130] Saxena A.K., Singii S.P., Thangaraj R., Agnihotri O.P., Thickness dependence of the electrical and structural properties of In2O3:Sn films[J], Thin Solid Films, 1984,117(2): 95-100.
    [131] Zhou Y., Kelly P.J., Postill A., Abu-Zeid O., Alnajjar A.A., The characteristics of aluminum-doped zinc oxide films prepared by pulsed magnetron sputtering from powder targets[J], Thin Solid Films, 2004, 447-448: 33-39.
    [132] 黄昆,谢希德,半导体物理学[M],北京:科学出版社,1958,79-89.
    [133] Alma M.J., Cameron D.C., Optical and electrical properties of transparent conductive ITO thin films deposited by sol-gel process[J], Thin Solid Films, 2000,377-378:455-459.
    [134] Islam M.N., Ghosh T.B., Chopra K.L., Acharya H.N., XPS and X-ray diffraction studies of aluminum–doped zinc oxide transparent and conducting films[J], Thin solid films, 1996(280):20-25.
    [135] Jeong S.H., Kho S., Jung D., Lee S.B., Boo J.H., Deposition of aluminum –doped zinc oxide films by RF magnetron sputtering and study of their surface characteristics [J], Surface and Coatings Technology,2003,(174-175):187-192.
    [136] S?uberlich F., Fritsche J., Hunger R., Klein A., Properties of sputtered ZnO films and its interfaces with CdS[J], Thin solid films, 2003(431-432):378-381.
    [137] 何则强,熊利芝,麻明友,肖卓炳,吴显明,黄可龙,纳米SnO2的非水溶剂溶胶凝胶法制备和表征[J],无机化学学报,2005(21):1691-1696.
    [138] 潘庆谊, 董晓雯, 张剑平, 溶胶凝胶法制备二氧化锡薄膜[J],硅酸盐学报,2001,1:6.
    [139] Jiang L., Sun G., Zhou Z., Sun S., Wang Q., Yan S., Li H., Tian J., Guo J., Zhou B., Xin Q., Size-Controllable Synthesis of Monodispersed SnO2 Nanoparticles and Application in Electrocatalysts[J], J.Phys.Chem.B, 2005,109 :8774-8778.
    [140] Chatelon J.P., Terrier C., Roger J.A., Influence of Elaboration Parameters on the Properties of Tin Oxide Films Obtained by the Sol-Gel Process[J], J. Sol-Gel Sci. Techn., 1997,10:55-66.
    [141] Gu F., Wang S.F., Lu M.K., Cheng X.F., Liu S.W., Zhou G.J., Xu D., Yuan D.R., Luminescence of SnO2 thin films prepared by spin-coating method[J], J. Crystal Growth, 2004,262:182-185.
    [142] Ahmed SK.F., Ghosh P.K., Khan S., Mitra M.K., Chattopadhyay K.K., Low-macroscopic field emission from nanocrystalline Al doped SnO2 thin films synthesized by sol–gel technique[J], Appl. Phys. A, 2007,86:139-143.
    [143] Ahmed S.F., Khan S., Ghosh P.K., Mitra M.K., Chattopadhyay K.K., Effect of Al doping on the conductivity type inversion and electro-optical properties of SnO2 thin films synthesized by sol-gel technique[J], J. Sol-Gel Sci. Techn., 2006,39: 241-247.
    [144] Korotkov R.Y., Farran A.J.E., Culp T., Russo D., Roger C., Transport properties of undoped and NH3-doped polycrystalline SnO2 with low background electron concentrations [J], Journal of Applied Physics, 2004,96(11):6445-6453.
    [145] Terrier C., Chatelon J.P., Roger J.A., Electrical and optical properties of Sb:SnO2 thin films obtained by the sol-gel method [J], Thin Solid Films, 1997, 295 (Issues 1-2 ): 95-100.
    [146] Liu P.Y., Chen J.F., Sun W.D., Characterizations of SnO2 and SnO2:Sb thin films prepared by PECVD[J], Vacuum, 2004,76:7-11.
    [147] Shin S.H., Kang J.H., Jeon D.Y., Zang D.S., Effect of nanoscaled SnO2 coating on ZnS:Mn phosphors under electron irradiation[J], Journal of Solid State Chemistry, 2005,178:2205–2210.
    [148] Kawabe T., Tabata K., Suzuki E., Yamaguchi Y., Nagasawa Y., Electronic States of Chemisorbed Oxygen Species and Their Mutually Related Studies on SnO2 Thin Film[J], J. Phys. Chem. B, 2001,105: 4239-4244.
    [149] Jeong S.H., Kho S., Jung D., Lee S.B., Boo J.H., Deposition of aluminum-doped zinc oxide films by RF magnetron sputtering and study of their surface characteristics[J], Surface and Coatings Technology, 2003, 174 -175:187-192.
    [150] Ovenston A., Sprinceana D., Walls J.R., Caldararu M., Effect of frequency on the electrical characteristics of tin-antimony-oxide mixtures[J], Journal of Materials Science,1994, 29: 4946-4952.
    [151] 薄占满,掺Sb二氧化锡半导体导电机理的实验探讨[J],无机材料学报, 1990, 5(4): 324-329.
    [152] 谭 俊 茹 , 沈 腊 珍 , 付 贤 松 , 侯 文 祥 , 陈 秀 增 , 湿 法 制 备 纳 米xSb2O3·(1-x)SnO2导电颜料及导电机理研究[J],硅酸盐学报, 2003, 31(9): 892-895.

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