近红外截止滤光片的研究与制备
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摘要
当前近红外滤光片在军用，数码影像方面，光学全息和光电技术中应用非常广泛，因此其具有广阔的市场和应用前景。尤其是红外截止滤光片已经成为数码产品不可或缺的重要组成部分，它的性能直接影响数码成像的质量。
本文通过简单地介绍红外截止滤光片在数码影像产品中的作用及工作原理，引出了红外截止滤光膜的研究目的和意义。要实现红外截止滤光片在高良品率下的量产，就需要优秀的膜系设计和和生产工艺予以保证。本文结合具体的膜系详细地阐述了薄膜的基本原理，着重讨论在现有特定的生产条件下，如何通过相关理论，根据材料的特性及薄膜的应用条件而选择合适的材料，并计算材料的实际折射率，进行红外截止滤光膜的膜系设计。对薄膜的厚度均匀性分布规律进行理论分析。对半波孔的消除，工具因子制备工艺过程，以及对影响薄膜光学稳定性的因素进行讨论，筛选出影响光学稳定性的主要因素重点分析，最终得出解决该问题的方法。
The Near Infrared Filter is widely used in military affairs, digital figure, optical holography and photoelectric technology at present. So it has both wide market and foreground. Especialy, the IR-cut filter is indispensably important part of digital produces. And its capability affect the quality of digital image straightway.
From introducing its function in digital figure produces and theory. This paper fetch out researchful intention and significance about the Infrared-cut Filter. In order to produce IR-cut filter with large quantity and high quality, we need excellent film design and perfect production technology. Under existing specific production condition this paper discuss emphatically that how to select suitable material according to the property of material and the application condition of film, by related theory. And compute the real refractive index of material. As emphasis, the paper introduces coating design, theoretical analysis for the thickness uniformity distribution law, half-wave hole elimination, tooling, deposition process ,At the same time, we discuss for the factors that affect film optical stability, screen the major factor key analysis that affects optical stability, and get the method of solving this problem eventually.
本文通过简单地介绍红外截止滤光片在数码影像产品中的作用及工作原理，引出了红外截止滤光膜的研究目的和意义。要实现红外截止滤光片在高良品率下的量产，就需要优秀的膜系设计和和生产工艺予以保证。本文结合具体的膜系详细地阐述了薄膜的基本原理，着重讨论在现有特定的生产条件下，如何通过相关理论，根据材料的特性及薄膜的应用条件而选择合适的材料，并计算材料的实际折射率，进行红外截止滤光膜的膜系设计。对薄膜的厚度均匀性分布规律进行理论分析。对半波孔的消除，工具因子制备工艺过程，以及对影响薄膜光学稳定性的因素进行讨论，筛选出影响光学稳定性的主要因素重点分析，最终得出解决该问题的方法。
The Near Infrared Filter is widely used in military affairs, digital figure, optical holography and photoelectric technology at present. So it has both wide market and foreground. Especialy, the IR-cut filter is indispensably important part of digital produces. And its capability affect the quality of digital image straightway.
From introducing its function in digital figure produces and theory. This paper fetch out researchful intention and significance about the Infrared-cut Filter. In order to produce IR-cut filter with large quantity and high quality, we need excellent film design and perfect production technology. Under existing specific production condition this paper discuss emphatically that how to select suitable material according to the property of material and the application condition of film, by related theory. And compute the real refractive index of material. As emphasis, the paper introduces coating design, theoretical analysis for the thickness uniformity distribution law, half-wave hole elimination, tooling, deposition process ,At the same time, we discuss for the factors that affect film optical stability, screen the major factor key analysis that affects optical stability, and get the method of solving this problem eventually.
引文
1 唐晋发，顾培夫．薄膜光学与技术．北京：北京机械工业出版社．1989．4～8
2 严一心，林鸿海．薄膜技术．北京：北京兵器工业出版社．1994．162
3 李正中．红外滤光片在资讯影像科技中的应用．台湾中央大学光电中心网站，2003
4 Kitten Barry. The Next-Generation Digital Camera. OPN. 2003. 14(5): 12～21
5 Optron's Engineer. Evaporation Source Material. Japan: Optron. Inc, 2004, 14
6 李正中．薄膜光学与镀膜技术．台湾：艺轩出版社，2001．203
7 E-Ritter. Properties of Optical Film Materials. App. Opt. 2001. 20:1～8
8 Thornton. The Film Ouality's Influence of Deposition Condition. App. Opt. 1985. 17: 8～14
9 Pocsik I, Veres M, Fule M. The Research of Ti02's Evaporation Source. Vacuum 2003. 71:1～3
10 钟迪生．真空镀膜材料．沈阳：辽宁大学出版社，2001．252
11 Hayashi N, Sakamoto I. About The Position of Source in Vacuum Chamber. Surf Coat Tech. 2001. 16(4) 23～31
12 曹仁福．真空镀膜厚度均匀性计算与工件架的设计．真空，1998．1：11～15
13 陈国平．薄膜物理与技术．南京：东南大学出版社，1993．255
14 唐晋发 顾培夫．薄膜光学与技术．浙江：浙江大学出版社，1998．364
15 Holland L. Vacuum Deposition of Thin Films. London: Chapman and Hall Ltd, 2001.153
16 麻莳立男著，陈晶存译．薄膜技术基础．北京：电子工业出版社，1994．191
17 Kinosita. The Research of Film's Stability.Applied Optics. 1999.7:5～9
18 高本辉 崔素言．真空物理．北京：科学技术出版，1983．319
19 刘卫国．截止滤光片通带波纹的失调修正．西安工业学院学报1995．5(1)：41～44
20 顾培夫．薄膜技术．杭州：浙江大学出版社，1990．24
21 F.F lorry, optical coatings. Appl. Opt. 1989, 28(14):29—52
22 Macleod H A. Monitoring of optical coatings. Appl. Optics. 1981, 20(1):82～89
23 C. C. White. K.B. Migler, and W. L. Wu. Measuring Tg in Ultra-Thin Polymer Films With an Excimer Fluorescence Technique. Polymer Engineering and Science, 2001.41(9): 137～146
24 DennisW. Morelli. Interference Filter Handhook
25 BingZhang and Mohammed Atiquzzaman. Low pass filter/over drop voidance(LPF/ODA):an algorithm to improve response Time RED gateways. Int. J. Commun. syst. 2002, 15 (3):899～906;
26 J. S. Seeley. Resolving power of multiplayer. J. Opt. Soc. Amer. 1964, 54:342
27 S.D. Smith. Design of multiplayer filter by considering two effective interfaces. J. Opt. Soc. Amen 1958, 48(1):43
28 A. Thelen. Equivalent layers in multiplayer filters. J. Opt. Soc. Amer. 1966,56:1533
29 M. Banning. Practical methods of making and using multiplayer filters. J. Opt. Soc. Amer. 1947, 37:792
30 E. Spiller. Reflective multiplayer coatings for the far UV region. Appl. Opt. 1976, 15 (10):2333
31 Richard L. Seddon. Optical coatings and utilization. Proc. of SPIE. 1974, 50(4):153
32 Alfred Thelen. Design of opticalminus filters. J. Opt. Soc. Amer. 1976, 61(3):365
33 周九林，尹树百译．光学薄膜技术．北京：国防工业出版社．1974，82
34 宋继鑫．国外光学薄膜的应用和真空镀膜工艺．光学技术．1994，20(1)：32～34
2 严一心，林鸿海．薄膜技术．北京：北京兵器工业出版社．1994．162
3 李正中．红外滤光片在资讯影像科技中的应用．台湾中央大学光电中心网站，2003
4 Kitten Barry. The Next-Generation Digital Camera. OPN. 2003. 14(5): 12～21
5 Optron's Engineer. Evaporation Source Material. Japan: Optron. Inc, 2004, 14
6 李正中．薄膜光学与镀膜技术．台湾：艺轩出版社，2001．203
7 E-Ritter. Properties of Optical Film Materials. App. Opt. 2001. 20:1～8
8 Thornton. The Film Ouality's Influence of Deposition Condition. App. Opt. 1985. 17: 8～14
9 Pocsik I, Veres M, Fule M. The Research of Ti02's Evaporation Source. Vacuum 2003. 71:1～3
10 钟迪生．真空镀膜材料．沈阳：辽宁大学出版社，2001．252
11 Hayashi N, Sakamoto I. About The Position of Source in Vacuum Chamber. Surf Coat Tech. 2001. 16(4) 23～31
12 曹仁福．真空镀膜厚度均匀性计算与工件架的设计．真空，1998．1：11～15
13 陈国平．薄膜物理与技术．南京：东南大学出版社，1993．255
14 唐晋发 顾培夫．薄膜光学与技术．浙江：浙江大学出版社，1998．364
15 Holland L. Vacuum Deposition of Thin Films. London: Chapman and Hall Ltd, 2001.153
16 麻莳立男著，陈晶存译．薄膜技术基础．北京：电子工业出版社，1994．191
17 Kinosita. The Research of Film's Stability.Applied Optics. 1999.7:5～9
18 高本辉 崔素言．真空物理．北京：科学技术出版，1983．319
19 刘卫国．截止滤光片通带波纹的失调修正．西安工业学院学报1995．5(1)：41～44
20 顾培夫．薄膜技术．杭州：浙江大学出版社，1990．24
21 F.F lorry, optical coatings. Appl. Opt. 1989, 28(14):29—52
22 Macleod H A. Monitoring of optical coatings. Appl. Optics. 1981, 20(1):82～89
23 C. C. White. K.B. Migler, and W. L. Wu. Measuring Tg in Ultra-Thin Polymer Films With an Excimer Fluorescence Technique. Polymer Engineering and Science, 2001.41(9): 137～146
24 DennisW. Morelli. Interference Filter Handhook
25 BingZhang and Mohammed Atiquzzaman. Low pass filter/over drop voidance(LPF/ODA):an algorithm to improve response Time RED gateways. Int. J. Commun. syst. 2002, 15 (3):899～906;
26 J. S. Seeley. Resolving power of multiplayer. J. Opt. Soc. Amer. 1964, 54:342
27 S.D. Smith. Design of multiplayer filter by considering two effective interfaces. J. Opt. Soc. Amen 1958, 48(1):43
28 A. Thelen. Equivalent layers in multiplayer filters. J. Opt. Soc. Amer. 1966,56:1533
29 M. Banning. Practical methods of making and using multiplayer filters. J. Opt. Soc. Amer. 1947, 37:792
30 E. Spiller. Reflective multiplayer coatings for the far UV region. Appl. Opt. 1976, 15 (10):2333
31 Richard L. Seddon. Optical coatings and utilization. Proc. of SPIE. 1974, 50(4):153
32 Alfred Thelen. Design of opticalminus filters. J. Opt. Soc. Amer. 1976, 61(3):365
33 周九林，尹树百译．光学薄膜技术．北京：国防工业出版社．1974，82
34 宋继鑫．国外光学薄膜的应用和真空镀膜工艺．光学技术．1994，20(1)：32～34