曲面激光直接写入技术
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摘要
在曲面上制作衍射光学元件有很多重要的应用。含有曲面衍射光学元件的光学系统结构更加简化，重量更轻，体积更小，因此在航天成像系统、军事领域、光学表面检测、光谱分析等领域具有重要的应用价值。
本文在国家自然科学基金(60078006)和中科院创新基金(2002LQ4)，以及中科院应用光学国家重点实验室的资助和支持下，开展了利用光刻技术在大口径凹球面玻璃基底上制作衍射光学元件的相关工作：
1．对激光直写光刻的曝光量分布和线宽控制进行了相关理论分析和实验。
2．利用对线条端部数据进行优化的方法解决了激光直写线条对接技术。
3．通过选择合适的涂胶参数，在凹透镜表面上进行了薄光刻胶胶层的均匀涂布。
4．利用激光直写光刻技术在大口径凹透镜表面上制作衍射光学元件。
5．采用两次曝光的方法在凹透镜表面上厚光刻胶中制作衍射光学元件。
6．在凹透镜表面上制作出了用于凸非球面检测的曲面全息图。
最后给出了下一步的工作和该技术的发展前景。
It is useful in many applications to fabricate large computer-generated diffractive optical elements (DOEs) on curved surfaces. The refractive/diffractive hybrid optical system is more simple, light, and compact. There are many applications for use in the measurement of convex secondary mirrors, ultraviolet spectroscopic instruments, armament, and space optical system.
In this paper, series of work about the fabrication of large computer-generated diffractive optical elements on curved surfaces is carried out supported by the National Natural Science Foundation (60078006) and State Key Laboratory of Applied Optics of the Chinese Academy of Science.
1. The exposure dose distribution and line width control for the laser direct writing system are analyzed. Some experiments are also carried out.
2. We present a new method to correct the joint error of laser writer without the reduction of throughput. By digitization, we optimize the intensity data of the incidence beam at the vicinity of start point and end point.
3. We obtained photoresist film with uniform thickness on the large concave substrate by selecting proper spin-coating parameters, which mainly involve spin rate, spin acceleration, and viscosity of the photoresist.
4. We demonstrate experimentally the lithography technique to fabricate a large computer-generated diffractive optical element (DOE) pattern on a concave lens surface with precise alignment by using a laser direct writer.
5. We demonstrate experimentally the technique to fabricate large DOEs in the thick film on a concave lens (mirrors) surface with precise alignment by using the strategy of exposure twice.
6. We fabricated a large computer-generated holography on a concave lens surface to test the convex secondary mirrors surface.
At the end of this paper, the prospect of this work and technique is given.
本文在国家自然科学基金(60078006)和中科院创新基金(2002LQ4)，以及中科院应用光学国家重点实验室的资助和支持下，开展了利用光刻技术在大口径凹球面玻璃基底上制作衍射光学元件的相关工作：
1．对激光直写光刻的曝光量分布和线宽控制进行了相关理论分析和实验。
2．利用对线条端部数据进行优化的方法解决了激光直写线条对接技术。
3．通过选择合适的涂胶参数，在凹透镜表面上进行了薄光刻胶胶层的均匀涂布。
4．利用激光直写光刻技术在大口径凹透镜表面上制作衍射光学元件。
5．采用两次曝光的方法在凹透镜表面上厚光刻胶中制作衍射光学元件。
6．在凹透镜表面上制作出了用于凸非球面检测的曲面全息图。
最后给出了下一步的工作和该技术的发展前景。
It is useful in many applications to fabricate large computer-generated diffractive optical elements (DOEs) on curved surfaces. The refractive/diffractive hybrid optical system is more simple, light, and compact. There are many applications for use in the measurement of convex secondary mirrors, ultraviolet spectroscopic instruments, armament, and space optical system.
In this paper, series of work about the fabrication of large computer-generated diffractive optical elements on curved surfaces is carried out supported by the National Natural Science Foundation (60078006) and State Key Laboratory of Applied Optics of the Chinese Academy of Science.
1. The exposure dose distribution and line width control for the laser direct writing system are analyzed. Some experiments are also carried out.
2. We present a new method to correct the joint error of laser writer without the reduction of throughput. By digitization, we optimize the intensity data of the incidence beam at the vicinity of start point and end point.
3. We obtained photoresist film with uniform thickness on the large concave substrate by selecting proper spin-coating parameters, which mainly involve spin rate, spin acceleration, and viscosity of the photoresist.
4. We demonstrate experimentally the lithography technique to fabricate a large computer-generated diffractive optical element (DOE) pattern on a concave lens surface with precise alignment by using a laser direct writer.
5. We demonstrate experimentally the technique to fabricate large DOEs in the thick film on a concave lens (mirrors) surface with precise alignment by using the strategy of exposure twice.
6. We fabricated a large computer-generated holography on a concave lens surface to test the convex secondary mirrors surface.
At the end of this paper, the prospect of this work and technique is given.
引文
1 J. H. Burge, D. S. Anderson, T. D. Milster, and C. L. Vernold, "Measurement of a convex secondary mirror using a holographic test plat," in Advanced Technology Optical Telescopes V, Larry M. stepp, ed., Proc. SPIE, 1994, 2199, 193-198.
2 Tatsuo Harada, Shigeo Moriyama, and Toshiaki K.ita, "Mechanically Ruled Stigmatic Concave Gratings," Japanese Journal of Applied Physics, 1974, 14, 175-179.
3 金国藩，严瑛百，邬敏贤，二元光学，国防工业出版社，1996，3-13。
4 Cynthia L. Vernold and Thomas D. Milster, "Non-photolithographic fabrication of large computer-generrated diffractive optical elements," in Current Developments in Optical Design and Optical Engineering Ⅳ, Robert. E. Fischer and Warren J. Smith, eds., Proc. SPIE, 1994, 2263, 125-133.
5 J. H. Burge, D. S. Anderson, T. D. Milster, and C. L. Vernold, "Measurement of a convex secondary mirror using a holographic test plat," in Advanced Technology Optical Telescopes V, Larry M. stepp, ed., Proc. SPIE, 1994, 2199, 193-198.
6 Michael T.Gale, Markus Rossi, Jorn Pedersen, and Helmut Schutz, "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists ," Opt. Eng., 1994, 33, 3556-3566.
7 Nicholas F. Borrelli, Microoptics technology, Marcel Dekker, Inc, 1999. New York.
8 Rebecca J. Jackman, Scott T. Brittain, Allan Adams, Mara G. Prentiss, and George M. Whitesides, "Design and abrication of Topologically Complex, Three-Dimensional Microstructures," Science, 1998, 280, 2091-2098.
9 Y. Xie, Z. Lu, F. Li, J. Zhao, and Z. Weng, "Lithographic fabrication of large diffractive optical elements on a concave lens surface,"Optics Express, 2002, 10, 1043-1047.
10 Y. Xie, Z. Lu, and F. Li, "Method for correcting the joint error of a laser writer," Optics Express, 2003, 11,975-979.
11 Y, Xie, Z. Lu, and F. Li, "Fabrication of large diffractive optical elements in thick film on a concave lens surface," Optics Express, 2003, 11, 992-995.
12 Nicholas F. Borrelli, Microoptics Technology, Marcel Dekker INC, NEW YORK, 1999, 24-27.
13 P.Hannah and R. R.horer, Basics of diamond turning, tutorial,Am. Soc. Precision Eng., Atlanta, GA, October 24,1988.
14 M. A.Fitch, Molded Optics, Photonics Spectra, October 1991.
15 Brittain-S,Paul K.E, Zhao X.M, et al. Soft Lithography and microfabrication, Physics World, 1998, 5, 31-36.
16 Xia Y N, Whitesides G M, Soft Lithography, Annu. Rev, Mater. Sci, 1998, 28, 153-184.
17 Kumar A, Biebuyck H.A, Whitesides G M, "Patterning self-assembled monolayers: applications in material science", Langmuir, 1994, 10, 1498-1511.
18 Xia Y. N, Venkateswaran N, Qin D, "Use of electroless silver as the substrate in microcontract printing of alkanethiols and its application in microfabrication", Langmuir, 1998,14, 363-371.
19 Wang D W, Thomas S G, Wang K L, "Nanometer scale patterning and pattern transfer on amorphous Si, crystal Si, and Sio2 surface using self-assembled monolayers", Appl. Phys, Lett, 1997,70, 1593-1595.
20 Xia Y. N, Kim E, Zhao X M, "Complex optical surfaces formed by relica molding against elastomeric masters", Science, 1996, 273, 347-349.
21 Kim E, Xia Y. N, Whitesides G M, "Micromolding in capillaries: application in material science", Am Chem Soc, 1996, 118, 5722-5731.
22 Kim E, Whitesides G M. "Imbibition and flow of wetting liquids in noncircular capillaries",Phys Chem B, 1997,101,855-863.
23 Trau M, Yao N, Kim E, "Microscopic patterning of orientated of mesoscopic
silica through guided growth", Nature, 1997,390, 674-676.
24 Rogers J A, Bao Z N, Dhar L. "Fabrication of patterned electroluminedcent polymers that emit in geometriedwith feature sizes into the submicron range", Appl.Phys. Lett, 1998,73, 294-296.
25 Rogers J A, Paul K E, Jackman R J, "Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field", Appl.Phys. Lett, 1997,70, 2658-2660.
26 Paul K E, Breen T L , Aizenberg J, "Maskless photolithography: Embossed photoresist as its own optical element", Appl.Phys. Lett, 1998, 73, 2893-2895.
27 Gale M. T., Lang G. K., Raynor J. M., "The fabrication of fine lens arrays by laser beam writing ", Proc. SPIE 398, 1983, 347-353.
28 Gale M. T., Lang G. K., Raynor J. M., "Fabrication of kinoform structures for optical computing",Appl. Opt.,1992, 31, 5712-5715.
29 Gale M. T., Rossi M., Pedersen J., "Fbrication of continues-relief micro-optical elements by direct laser writing in photoresist", Opt. Eng., 1994,33, 3556-3566.
30 V. P. Koronkevich, V. P. Kiriyanov, F. I. Koulin, "Fabrication of kinoform optical elements", Optik, 1984, 67, 257-266.
31 C. Rensch, S.Hell, M.V.Schickfus, "Laser scanner for direct writing lithography", Appl. Opt. 1989,28, 3754-3758.
32 S.charel Baber, "Application of high resolution laser writers tocomputer generated holograms and binary diffractive optics", Proc. SPIE, 1989, 1052, 66-76.
33 Andrei Y.Smuk Nabil M.Lawandy, "Direct laser writing of diffractive optics in glass" Opt. Lett. 1997, 22, 1030-1032.
34 Heng Su, Michael R.Wang, "Laser direct-write optical grating lenses and lenslet arrays on glass for optical interconnect applications", Proc. SPIE, 1996,2891, 82-87.
35 Michael R. Wang, Heng Su, "Multilevel diffractive microlens fabrication by
one-step laser-assisted chemical etching upon high-energy-beam sensitive glass",Opt.Lett, 1998, 23, 876-878.
36 Masamitsu Haruma, Masanobu Takahashi, "Laser beam lithographed micro-fresnel lenses", Appl.Opt., 1990,29, 5120-5126.
37 M.Harurna, H.Nishara, "Laser-beam writing for integrated-optics device in Ti: LiNbO3", Proc. SPIE, 1998,3348, 58-68.
38 Takashi Nomura, Kazuhide Kamiya, Hiroshi Miyashiro, "An instrument for manufacturing aone-plates by using a lathe", Prec., Eng., 1994,16, 292-295.
39 Michael T.Gale, Karl Knop, "The fabrication of fine lens arrays by laser beam writing", Proc. SPIE, 1983, 398, 347-353.
40 V.P.Koronkevich, V.P.Kiriyanov, F.I.Kokoulin, "Fabrication of kinoform optical elements", Optik, 1984, 67, 257-266.
41 M.T.Gale, M.Rossi, H.Schutz, "Fabrication of 2-dimensional continuous-relief diffractive optical elements", Proc.SPIE,1994. 2045, 54-62.
42 M.T.Gale, "Continuous-relief diffractive optical elements for two-dimensition array generation", Appl. Opt, 1993, 32, 2526-2533.
43 P.E.hbets, M.Rossi, H.P.Herizig, "Continuous-relief fan-out elements with optimized fabrication tolerances", Opt.Eng, 1995,34, 3456-3463.
44 T.Hessler, M.rossi, R.E.Kuna, M.T.Gale, "Analysis and optimization of fabrication of continuous-relief diffractive optical elements", Appl.Opt, 1998,37,4069-4079.
45 P.Langlois, H.Jerominek, L.Leclerc, "Diffractive optical elements fabricated by laser direct writing and other techniques", Proc. SPIE, 1992, 1751, 2-12.
46 Bing SHEN, Ricardo Izquierdo, Michael Meunier, "Laser fabrication of three dimensional microstructures, cavities and columns" Proc, SPIE, 1994, 2045, 91-98.
47 G. Auvert, "Continuous-wave laser-assisted fabrication of microstructures in silicon microelectronics", Proc, SPIE, 1994, 2045, 72-83.
48 J.Remes, H.Moilanen, S.Leppavuor, "The direct laser write-on exposure of thick film screens", Proc., SPIE, 1994, 2045, 47-53.
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64 T. Brewer, R. Carlson, and J. Arnold, "The Reduction of the Standing wave effects in positive photoresists", J. Appl. Photogr. Eng., 1981, 7, 184-186.
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68 H.J.Levinson and W.H.Amold, "Focus: the critical parameter for submicron lithography", J.Vac. Sci. Technol, 1987, B5, 293-298.
69 Hamna M, Takahashi M, Wakahayashi K, "Laser beam lithographed microfresnel lenses", Applied Optics, 1999, 29, 5120-5126.
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72 W. H. Hamaker, G. Bums and P. Buch, "Optimizing the use of multipass priting to minimize printing errors in advanced laser reticle-writing systems," Proc. SPIE, 1995, 2621, 319-328.
73 Alexander Poleshchuk, Jim Burge, "polar coordinate writing systems: error analysis of fabricated DOEs", Proc., SPIE, 2001, 4440,161-172.
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75 T.D.Milster and C.L.Vernold, "Technique for aligning optical and mechanical axes based on a rotating linear grating", Opt. Eng., 1995,34, 2840-2844.
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77 Zhenwu Lu and Zhicheng Weng, "Lens centering by using binary phase grating", Proc. SPIE., 2000, 176-180.
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81 J.H.Burge,"Applications of computer-generated holograms for interferometric measurement of large aspheric optics," Proc. SPIE. 1995, 2576, 258-269.
82 J. H. Burge, D. S. Anderson, T. D. Milster, and C. L. Vernold, "Measurement of a convex secondary mirror using a holographic test plat," Proc. SPIE, 1994, 2199, 193-198.
83 J.H.Burge and D.S.Anderson, "Full aperture interferometeric test of convex secondary mirrors using holographic test plates", Proc. SPIE, 1994, 2199, 181-192.
84 J.H.Burge," Fizeau interferometery for large convex surface", Proc. SPIE, 1995, 2536, 127-137.
85 J.H.Burge, "Measurement of large convex aspheres", Proc. SPIE, 1997, 2871, 362-373.
86 卢振武，李凤有，刘华，谢永军，翁志成，“利用曲面计算全息图进行凸面非球面检测”，已投稿。
2 Tatsuo Harada, Shigeo Moriyama, and Toshiaki K.ita, "Mechanically Ruled Stigmatic Concave Gratings," Japanese Journal of Applied Physics, 1974, 14, 175-179.
3 金国藩，严瑛百，邬敏贤，二元光学，国防工业出版社，1996，3-13。
4 Cynthia L. Vernold and Thomas D. Milster, "Non-photolithographic fabrication of large computer-generrated diffractive optical elements," in Current Developments in Optical Design and Optical Engineering Ⅳ, Robert. E. Fischer and Warren J. Smith, eds., Proc. SPIE, 1994, 2263, 125-133.
5 J. H. Burge, D. S. Anderson, T. D. Milster, and C. L. Vernold, "Measurement of a convex secondary mirror using a holographic test plat," in Advanced Technology Optical Telescopes V, Larry M. stepp, ed., Proc. SPIE, 1994, 2199, 193-198.
6 Michael T.Gale, Markus Rossi, Jorn Pedersen, and Helmut Schutz, "Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists ," Opt. Eng., 1994, 33, 3556-3566.
7 Nicholas F. Borrelli, Microoptics technology, Marcel Dekker, Inc, 1999. New York.
8 Rebecca J. Jackman, Scott T. Brittain, Allan Adams, Mara G. Prentiss, and George M. Whitesides, "Design and abrication of Topologically Complex, Three-Dimensional Microstructures," Science, 1998, 280, 2091-2098.
9 Y. Xie, Z. Lu, F. Li, J. Zhao, and Z. Weng, "Lithographic fabrication of large diffractive optical elements on a concave lens surface,"Optics Express, 2002, 10, 1043-1047.
10 Y. Xie, Z. Lu, and F. Li, "Method for correcting the joint error of a laser writer," Optics Express, 2003, 11,975-979.
11 Y, Xie, Z. Lu, and F. Li, "Fabrication of large diffractive optical elements in thick film on a concave lens surface," Optics Express, 2003, 11, 992-995.
12 Nicholas F. Borrelli, Microoptics Technology, Marcel Dekker INC, NEW YORK, 1999, 24-27.
13 P.Hannah and R. R.horer, Basics of diamond turning, tutorial,Am. Soc. Precision Eng., Atlanta, GA, October 24,1988.
14 M. A.Fitch, Molded Optics, Photonics Spectra, October 1991.
15 Brittain-S,Paul K.E, Zhao X.M, et al. Soft Lithography and microfabrication, Physics World, 1998, 5, 31-36.
16 Xia Y N, Whitesides G M, Soft Lithography, Annu. Rev, Mater. Sci, 1998, 28, 153-184.
17 Kumar A, Biebuyck H.A, Whitesides G M, "Patterning self-assembled monolayers: applications in material science", Langmuir, 1994, 10, 1498-1511.
18 Xia Y. N, Venkateswaran N, Qin D, "Use of electroless silver as the substrate in microcontract printing of alkanethiols and its application in microfabrication", Langmuir, 1998,14, 363-371.
19 Wang D W, Thomas S G, Wang K L, "Nanometer scale patterning and pattern transfer on amorphous Si, crystal Si, and Sio2 surface using self-assembled monolayers", Appl. Phys, Lett, 1997,70, 1593-1595.
20 Xia Y. N, Kim E, Zhao X M, "Complex optical surfaces formed by relica molding against elastomeric masters", Science, 1996, 273, 347-349.
21 Kim E, Xia Y. N, Whitesides G M, "Micromolding in capillaries: application in material science", Am Chem Soc, 1996, 118, 5722-5731.
22 Kim E, Whitesides G M. "Imbibition and flow of wetting liquids in noncircular capillaries",Phys Chem B, 1997,101,855-863.
23 Trau M, Yao N, Kim E, "Microscopic patterning of orientated of mesoscopic
silica through guided growth", Nature, 1997,390, 674-676.
24 Rogers J A, Bao Z N, Dhar L. "Fabrication of patterned electroluminedcent polymers that emit in geometriedwith feature sizes into the submicron range", Appl.Phys. Lett, 1998,73, 294-296.
25 Rogers J A, Paul K E, Jackman R J, "Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field", Appl.Phys. Lett, 1997,70, 2658-2660.
26 Paul K E, Breen T L , Aizenberg J, "Maskless photolithography: Embossed photoresist as its own optical element", Appl.Phys. Lett, 1998, 73, 2893-2895.
27 Gale M. T., Lang G. K., Raynor J. M., "The fabrication of fine lens arrays by laser beam writing ", Proc. SPIE 398, 1983, 347-353.
28 Gale M. T., Lang G. K., Raynor J. M., "Fabrication of kinoform structures for optical computing",Appl. Opt.,1992, 31, 5712-5715.
29 Gale M. T., Rossi M., Pedersen J., "Fbrication of continues-relief micro-optical elements by direct laser writing in photoresist", Opt. Eng., 1994,33, 3556-3566.
30 V. P. Koronkevich, V. P. Kiriyanov, F. I. Koulin, "Fabrication of kinoform optical elements", Optik, 1984, 67, 257-266.
31 C. Rensch, S.Hell, M.V.Schickfus, "Laser scanner for direct writing lithography", Appl. Opt. 1989,28, 3754-3758.
32 S.charel Baber, "Application of high resolution laser writers tocomputer generated holograms and binary diffractive optics", Proc. SPIE, 1989, 1052, 66-76.
33 Andrei Y.Smuk Nabil M.Lawandy, "Direct laser writing of diffractive optics in glass" Opt. Lett. 1997, 22, 1030-1032.
34 Heng Su, Michael R.Wang, "Laser direct-write optical grating lenses and lenslet arrays on glass for optical interconnect applications", Proc. SPIE, 1996,2891, 82-87.
35 Michael R. Wang, Heng Su, "Multilevel diffractive microlens fabrication by
one-step laser-assisted chemical etching upon high-energy-beam sensitive glass",Opt.Lett, 1998, 23, 876-878.
36 Masamitsu Haruma, Masanobu Takahashi, "Laser beam lithographed micro-fresnel lenses", Appl.Opt., 1990,29, 5120-5126.
37 M.Harurna, H.Nishara, "Laser-beam writing for integrated-optics device in Ti: LiNbO3", Proc. SPIE, 1998,3348, 58-68.
38 Takashi Nomura, Kazuhide Kamiya, Hiroshi Miyashiro, "An instrument for manufacturing aone-plates by using a lathe", Prec., Eng., 1994,16, 292-295.
39 Michael T.Gale, Karl Knop, "The fabrication of fine lens arrays by laser beam writing", Proc. SPIE, 1983, 398, 347-353.
40 V.P.Koronkevich, V.P.Kiriyanov, F.I.Kokoulin, "Fabrication of kinoform optical elements", Optik, 1984, 67, 257-266.
41 M.T.Gale, M.Rossi, H.Schutz, "Fabrication of 2-dimensional continuous-relief diffractive optical elements", Proc.SPIE,1994. 2045, 54-62.
42 M.T.Gale, "Continuous-relief diffractive optical elements for two-dimensition array generation", Appl. Opt, 1993, 32, 2526-2533.
43 P.E.hbets, M.Rossi, H.P.Herizig, "Continuous-relief fan-out elements with optimized fabrication tolerances", Opt.Eng, 1995,34, 3456-3463.
44 T.Hessler, M.rossi, R.E.Kuna, M.T.Gale, "Analysis and optimization of fabrication of continuous-relief diffractive optical elements", Appl.Opt, 1998,37,4069-4079.
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86 卢振武，李凤有，刘华，谢永军，翁志成，“利用曲面计算全息图进行凸面非球面检测”，已投稿。