窄带滤光片与相干长度可调准单色光干涉研究
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摘要
随着半导体材料与器件、光盘技术和微光学、微机械、计算机和信息等产业的发展,表面质量的检测越来越引起人们重视,其中面形误差的检测是表面质量检测的重要内容。激光移相干涉技术是测量光学及半导体零件表面面形最常用的方法,但是在利用这种方法检测双抛光透明平行平板的面形时,将会出现三表面干涉现象,导致测量误差较大。针对这个问题本文提出了一种不对被测表面进行任何预处理且可实现低成本、高精度的测量方法,即使用白光光源和不同带宽的带通滤光片代替激光光源,通过更换滤光片来调节所得准单色光光源的谱线宽度,从而调节其相干长度,实现对不同厚度的双抛平行平板表面面形的测量。
本文介绍了常见的带通滤光片薄膜的设计方方法,其中重点介绍了多半波法布里—珀珞滤光片的台伦设计法,并建立了相应的数学模型。利用所建立的数学模型求解了5nm和10nm带宽窄带滤光片的初始膜系,进而利用薄膜设计软件进行了模拟和优化。在制备薄膜之前,首先选择了TiO_2、SiO_2作为最佳镀膜材料,然后对其最佳的镀膜工艺参数进行了研究。在此基础上分别镀制了带宽50nm,10nm,和5nm滤光片,并对其透过率光谱和相干长度进行了测量。最后,利用所镀滤光片消除了三表面干涉现象,得到了所需的干涉条纹。
With the development of semiconductor materials and devices, micro-optical disc technology, micro-machinery, computer and information industries, growing attention has be paid on the testing of the surface quality of the semiconductor and optical elements, including the surface error testing as an important item. Laser phase-shifting interferometry is one widely used method to test the surface of the semiconductor and optical elements, but when we use this method to test the surface of the daul-polishing transparent elements with parallel surfaces, there will be three-surface interference, leading to greater measurement error. To address this issue, this paper presents a method, which applies no pretreatment to the surfaces and can achieve low cost, high accuracy measurement, that replacing laser light source by white light source and different bandwidth band-pass filters. We can adjust the bandwidth of the quasi-monochromatic light source by changing filters, accordingly adjust its coherent length, and then achieve the surface testing of the daul-polishing transparent elements with parallel surfaces with different thickness.
The commonly used design methods of the band-pass filter films are introduced in this paper, especially the Thelen design method of the Fabry - Perot filter with several cavities, correspondingly a mathematical model is established. Using the model we work out the initial film stacks of the 5 nm and 10 nm bandwidth filters, and then use film design software to do the simulation and the further optimization. Before the fabrication of the films, we firstly choose TiO_2, SiO_2 as the best coating materials, secondly study their best coating process parameters. On the basis of the studies above, we fabricate bandwidth 50 nm, 10nm, and 5 nm filters respectively, and then measure their transmittance spectrum and coherence length. Finally, we eliminate the three-surface interference with the help of the filters, and obtain the interference fringes we want.
本文介绍了常见的带通滤光片薄膜的设计方方法,其中重点介绍了多半波法布里—珀珞滤光片的台伦设计法,并建立了相应的数学模型。利用所建立的数学模型求解了5nm和10nm带宽窄带滤光片的初始膜系,进而利用薄膜设计软件进行了模拟和优化。在制备薄膜之前,首先选择了TiO_2、SiO_2作为最佳镀膜材料,然后对其最佳的镀膜工艺参数进行了研究。在此基础上分别镀制了带宽50nm,10nm,和5nm滤光片,并对其透过率光谱和相干长度进行了测量。最后,利用所镀滤光片消除了三表面干涉现象,得到了所需的干涉条纹。
With the development of semiconductor materials and devices, micro-optical disc technology, micro-machinery, computer and information industries, growing attention has be paid on the testing of the surface quality of the semiconductor and optical elements, including the surface error testing as an important item. Laser phase-shifting interferometry is one widely used method to test the surface of the semiconductor and optical elements, but when we use this method to test the surface of the daul-polishing transparent elements with parallel surfaces, there will be three-surface interference, leading to greater measurement error. To address this issue, this paper presents a method, which applies no pretreatment to the surfaces and can achieve low cost, high accuracy measurement, that replacing laser light source by white light source and different bandwidth band-pass filters. We can adjust the bandwidth of the quasi-monochromatic light source by changing filters, accordingly adjust its coherent length, and then achieve the surface testing of the daul-polishing transparent elements with parallel surfaces with different thickness.
The commonly used design methods of the band-pass filter films are introduced in this paper, especially the Thelen design method of the Fabry - Perot filter with several cavities, correspondingly a mathematical model is established. Using the model we work out the initial film stacks of the 5 nm and 10 nm bandwidth filters, and then use film design software to do the simulation and the further optimization. Before the fabrication of the films, we firstly choose TiO_2, SiO_2 as the best coating materials, secondly study their best coating process parameters. On the basis of the studies above, we fabricate bandwidth 50 nm, 10nm, and 5 nm filters respectively, and then measure their transmittance spectrum and coherence length. Finally, we eliminate the three-surface interference with the help of the filters, and obtain the interference fringes we want.
引文
[1]浦昭邦 等.几何光探针法在表面形貌测量中的应用.计量技术.2001,1:20-23
[2]沈中伟 等.晶体的超精密平面抛光.浙江工业大学学报.2001,(29)1:20-25
[3]徐建程 等.三表面干涉条纹空域傅里叶分析.中国激光.2006,33(9):1260-1264
[4]Gao-Wei Chang et.al..Design and implementation of high-performance and cost-effective white-light interferometric profile measurement systems.SPIE,2005,58781C:1-10
[5]何永辉 等.基于扫描白光干涉法的表面三维轮廓仪.光学技术.2001,27(2):150-155
[6]傅凯文 等.薄膜滤波器的研制.深圳特区科技.2005,11:43-45
[7]王秋平 等.光栅单色器及相关技术.现代科学仪器.2001,1:49-52
[8]吴震等.光干涉测量技术.第一版.北京.中国计量出版社,1995
[9]唐晋发 等.现代光学薄膜技术.第一版.杭州:浙江大学出版社,2006
[10]A.Thelen.Equivalent Layers in Multilayer Filters.J.Opt.Soc.Amer.,1966,56(11):1533,
[11]钟迪生.真空镀膜:光学材料的选择与应用.沈阳:辽宁大学出版社,2001
[12]D.E.Morton,R.Danielsen.Ion Assisted Deposition(lAD)of TiO_2,Al_2O_3 and MgF_2Using a High Current,Low Energy Ion Source.40~(th)Annual Tech.Conf.Proceedings of the SVC,1997:203
[13]D.E.Morton.DVI China Course,2003:98
[14]Communications,volume unk.,1966:225
[15]IC/5薄膜镀层控制仪使用说明书
[16]朱日宏 等.移相干涉测量术及其应用.应用光学.2006,(27)2:85-88
[17]袁学德.用迈克尔逊干涉仪比较钠光和激光的相干长度.德州学院学报.2005,19(3):61-64
[18]熊玉卿.超窄带滤光片制作技术.真空与低温.2005,11(3):125-130
[19]相凤华 等.光源的非单色性对干涉条纹可见度的影响.天津工程师范学院学报.2006,16(2):42-44
[20]唐晋发.光学中的固体薄膜.第一版.北京.科学出版社,1987
[21]唐晋发.应用薄膜光学.第一版.上海.上海科学出版社,1984
[22]殷纯永.现代干涉测量技术.第一版.天津.天津大学出版社,1999
[23]TFCalc中文软件介绍,2006
[24]顾培夫 等.TiO_2膜消光系数的确定及制备参量的影响.光学学报.2005,25(7):1005-1008
[25]熊玉卿.超窄带滤光片制作技术.真空与低温.2005,11(3):125-130
[26]王世平.光源宽度与干涉条纹可见度的关系.山东大学学报(理学版).2005,40(5):85-88
[27]王秋平 等.光栅单色器及相关技术.现代科学仪器.2001,1:49-52
[28]张玲玲 等.基于扫描白光干涉法的接触式表面形貌轮廓测量仪计量技术.测量与设备.2007,3:21-24
[29]于瀛洁 等.基于时域傅里叶变换的波长移相算法.计量学报.2004,25(4):310-313
[30]郭爱云 等.钛氧化物的蒸发特性.真空.2006,43(1):39-42
[31]洪永强 等.微电子机械系统及硅微机械加工工艺.电子工艺技术.2003,24(5):185-188
[32]高红 等.真空蒸发镀膜膜厚影响因素的实验研究.鞍山师范学院学报.2003,5(2):40-42
[33]Macleod H.A..Thin Film Optical Filters,3rd ed..Bristol and Philadelphia:Institute of Physics Publishing.2001
[34]Smith D..Thin Film Deposition.New York:MaGraw-Hill Co.,Inc.1995
[35]伊恩·史蒂文森 等.镀膜工艺与镀膜系统配置.真空科学与技术.2003,23(6):443-448
[36]占美琼 等.石英晶体震荡法监控膜厚研究.光子学报.2004,33(5):586-589
[37]胡良剑 等.数学实验:使用MATLAB.第一版.上海:上海科学技术出版社.2001
[38]尹树百.薄膜光学——理论与实践.第一版.北京:科学出版社.1987
[39]J.L.沃森 等.薄膜加工工艺.第一版.北京:机械工业出版社.1987
[40]潘永强 等.电子束蒸发TiO_2薄膜的光学特性.应用光学.2004,25(5):53-55,50
[41]王大珩.现代仪器仪表技术与设计.上册.北京:科学出版社.2002
[42]曹天宇,周鹏飞.光学零件制造工艺学.北京:机械工业出版社.1981
[43]Michael Quirk,Julian Serda著,韩郑生 译.半导体制造技术.北京:电子工业出版社,2004
[44]Jay Lee,Nikolay Novikov.Innovative Superhard Materials and Sustainable Coatings for Advanced Manufacturing.1 st ed..Dordrecht:Springer.2005
[45]Ronald R.Willey.Practical Design and Production of Optical Thin Films.2nd ed..New York:Marcel Dekker,Inc..2002
[46]高本辉,崔素言.真空物理.北京:科学出版社.1983
[47]恽正中 等.半导体及薄膜物理.北京:国防工业出版社.1981
[48]麻莳立男.真空薄膜基础.沈阳:沈阳机械工程学会(论文集).1981
[49]金原粲 著,杨希光 译.薄膜的基础技术.北京:科学出版社,1982
[50]藤原史郎.光学薄膜.东京:共立出版株式会社,1984
[51]H.K.Pulker.Coating on Glass.Elsevier,1984
[52]E.D.Palik.Handbook of Optical Constants of Solids.Academic Press,Inc..1985
[53]李正中.薄膜光学与镀膜技术.第二版.北京:艺轩图书出版社.2001
[54]L.Eckertova.Physics of Thin Films.2nd ed..Prague:Plenum and SNTL.1986
[55]沈伟东 等.用透过率测试曲线确定半导体薄膜的光学常数和厚度.半导体学报.2005,26(2):335-340
[56]朱谧 等.TiO_2薄膜的色散温度特性.舰船光学.2003,39(3):15-18
[2]沈中伟 等.晶体的超精密平面抛光.浙江工业大学学报.2001,(29)1:20-25
[3]徐建程 等.三表面干涉条纹空域傅里叶分析.中国激光.2006,33(9):1260-1264
[4]Gao-Wei Chang et.al..Design and implementation of high-performance and cost-effective white-light interferometric profile measurement systems.SPIE,2005,58781C:1-10
[5]何永辉 等.基于扫描白光干涉法的表面三维轮廓仪.光学技术.2001,27(2):150-155
[6]傅凯文 等.薄膜滤波器的研制.深圳特区科技.2005,11:43-45
[7]王秋平 等.光栅单色器及相关技术.现代科学仪器.2001,1:49-52
[8]吴震等.光干涉测量技术.第一版.北京.中国计量出版社,1995
[9]唐晋发 等.现代光学薄膜技术.第一版.杭州:浙江大学出版社,2006
[10]A.Thelen.Equivalent Layers in Multilayer Filters.J.Opt.Soc.Amer.,1966,56(11):1533,
[11]钟迪生.真空镀膜:光学材料的选择与应用.沈阳:辽宁大学出版社,2001
[12]D.E.Morton,R.Danielsen.Ion Assisted Deposition(lAD)of TiO_2,Al_2O_3 and MgF_2Using a High Current,Low Energy Ion Source.40~(th)Annual Tech.Conf.Proceedings of the SVC,1997:203
[13]D.E.Morton.DVI China Course,2003:98
[14]Communications,volume unk.,1966:225
[15]IC/5薄膜镀层控制仪使用说明书
[16]朱日宏 等.移相干涉测量术及其应用.应用光学.2006,(27)2:85-88
[17]袁学德.用迈克尔逊干涉仪比较钠光和激光的相干长度.德州学院学报.2005,19(3):61-64
[18]熊玉卿.超窄带滤光片制作技术.真空与低温.2005,11(3):125-130
[19]相凤华 等.光源的非单色性对干涉条纹可见度的影响.天津工程师范学院学报.2006,16(2):42-44
[20]唐晋发.光学中的固体薄膜.第一版.北京.科学出版社,1987
[21]唐晋发.应用薄膜光学.第一版.上海.上海科学出版社,1984
[22]殷纯永.现代干涉测量技术.第一版.天津.天津大学出版社,1999
[23]TFCalc中文软件介绍,2006
[24]顾培夫 等.TiO_2膜消光系数的确定及制备参量的影响.光学学报.2005,25(7):1005-1008
[25]熊玉卿.超窄带滤光片制作技术.真空与低温.2005,11(3):125-130
[26]王世平.光源宽度与干涉条纹可见度的关系.山东大学学报(理学版).2005,40(5):85-88
[27]王秋平 等.光栅单色器及相关技术.现代科学仪器.2001,1:49-52
[28]张玲玲 等.基于扫描白光干涉法的接触式表面形貌轮廓测量仪计量技术.测量与设备.2007,3:21-24
[29]于瀛洁 等.基于时域傅里叶变换的波长移相算法.计量学报.2004,25(4):310-313
[30]郭爱云 等.钛氧化物的蒸发特性.真空.2006,43(1):39-42
[31]洪永强 等.微电子机械系统及硅微机械加工工艺.电子工艺技术.2003,24(5):185-188
[32]高红 等.真空蒸发镀膜膜厚影响因素的实验研究.鞍山师范学院学报.2003,5(2):40-42
[33]Macleod H.A..Thin Film Optical Filters,3rd ed..Bristol and Philadelphia:Institute of Physics Publishing.2001
[34]Smith D..Thin Film Deposition.New York:MaGraw-Hill Co.,Inc.1995
[35]伊恩·史蒂文森 等.镀膜工艺与镀膜系统配置.真空科学与技术.2003,23(6):443-448
[36]占美琼 等.石英晶体震荡法监控膜厚研究.光子学报.2004,33(5):586-589
[37]胡良剑 等.数学实验:使用MATLAB.第一版.上海:上海科学技术出版社.2001
[38]尹树百.薄膜光学——理论与实践.第一版.北京:科学出版社.1987
[39]J.L.沃森 等.薄膜加工工艺.第一版.北京:机械工业出版社.1987
[40]潘永强 等.电子束蒸发TiO_2薄膜的光学特性.应用光学.2004,25(5):53-55,50
[41]王大珩.现代仪器仪表技术与设计.上册.北京:科学出版社.2002
[42]曹天宇,周鹏飞.光学零件制造工艺学.北京:机械工业出版社.1981
[43]Michael Quirk,Julian Serda著,韩郑生 译.半导体制造技术.北京:电子工业出版社,2004
[44]Jay Lee,Nikolay Novikov.Innovative Superhard Materials and Sustainable Coatings for Advanced Manufacturing.1 st ed..Dordrecht:Springer.2005
[45]Ronald R.Willey.Practical Design and Production of Optical Thin Films.2nd ed..New York:Marcel Dekker,Inc..2002
[46]高本辉,崔素言.真空物理.北京:科学出版社.1983
[47]恽正中 等.半导体及薄膜物理.北京:国防工业出版社.1981
[48]麻莳立男.真空薄膜基础.沈阳:沈阳机械工程学会(论文集).1981
[49]金原粲 著,杨希光 译.薄膜的基础技术.北京:科学出版社,1982
[50]藤原史郎.光学薄膜.东京:共立出版株式会社,1984
[51]H.K.Pulker.Coating on Glass.Elsevier,1984
[52]E.D.Palik.Handbook of Optical Constants of Solids.Academic Press,Inc..1985
[53]李正中.薄膜光学与镀膜技术.第二版.北京:艺轩图书出版社.2001
[54]L.Eckertova.Physics of Thin Films.2nd ed..Prague:Plenum and SNTL.1986
[55]沈伟东 等.用透过率测试曲线确定半导体薄膜的光学常数和厚度.半导体学报.2005,26(2):335-340
[56]朱谧 等.TiO_2薄膜的色散温度特性.舰船光学.2003,39(3):15-18