准分子激光器性能测试技术研究
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摘要
作为微电子光刻系统中的关键设备，193nm准分子激光器输出光谱、能量、光束参数以及寿命、稳定性与光刻系统成本，光刻质量、成品率、效率和设备利用率等密切相关，需要在投入使用前进行准确测试评估和使用过程中的实时监测控制。因此，本文针对准分子激光器输出各参数的高精度测量方法开展深入研究，提出测试方案，对测试装置的测量精度进行分析，并通过实验和数据处理方法对测试方案的可行性进行验证。
准分子激光器输出光谱特性测试方面，本文通过高分辨率中阶梯光栅光谱仪对准分子激光器输出光谱进行测量，测量精度达到0.02pm（FWHM）和0.1pm（E95），并应用数学反卷积方法有效减小了光谱仪器衍射元件、有限孔径、系统像差等因素引起的光谱展宽。采用Fe原子灯在193nm附近的谱线对光谱测量仪器标定并在测量过程中实时监测由于环境和机械波动引起的波长漂移以修正绝对中心波长测量结果，使准分子激光器输出中心波长测量精度优于0.1pm，波长稳定性测量精度达0.01pm。另外提出一种高重复频率脉冲激光器单脉冲提取装置和同步时序控制方法，通过理论和实验验证了该方法的可行性。将该装置应用于准分子激光器输出光谱参数测量中，消除了由于多脉冲叠加对谱宽和波长稳定性测量结果的影响。
通过热释电能量计对光电探测器标定实现准分子激光器输出单脉冲能量、能量稳定性、剂量能量稳定性以及积分脉冲宽度的实时采集与分析。实验分析不同测试条件对能量和脉宽测量结果的影响。最终确定测试方案，即采用楔形镜或棱镜衰减器件对准分子激光器输出激光能量衰减，由聚焦透镜经散射元件后照射到光电探测器接收面，通过高速采集卡采集光电探测器信号，积分能量由能量计标定，最终获得准分子激光器输出能量参数。
基于国际标准ISO11146和ISO11670提出的测量方法对准分子激光器输出光束特性进行了测量，采用大面阵紫外光束诊断相机和紫外可见荧光转换器两种方法对激光器输出光束近场光斑尺寸和位置稳定性进行测量，比较测量结果，结果表明采用紫外光束诊断相机直接测量方法更能反应准分子激光器输出光束特性。本文采用布鲁斯特窗法和Rochon棱镜偏振器法测量准分子激光器输出光束偏振度，采用氟化钙基片作为布鲁斯特窗材料，通过实验和数据处理对两种方法的测量精度进行分析，两种方法的偏振度测量精度优于1%。
采用透过率法、激光量热法和荧光光谱法对紫外级熔石英和氟化钙材料在193nm激光照射下的性能稳定性进行测量分析。通过ArF激光量热计测量不同激光重复频率时，不同厚度熔石英样品吸收随能量密度变化关系以及同一样品在不同能量密度时吸收损耗随激光重复频率变化关系，建立吸收模型，得到样品表面吸收、有效单、双光子吸收系数随激光频率变化关系以及与激光器重复频率无关的熔石英材料在193nm的单、双光子吸收系数。另外应用激光量热法测量了氟化钙样品吸收随能量密度变化关系，计算得到氟化钙样品在193nm激光照射下的有效线性吸收项和有效非线性吸收系数。
通过荧光光谱仪测量紫外级熔石英和氟化钙材料在193nm激光照射下激发荧光特性。结合其吸收损耗随激光频率和能量密度变化关系以及国内外在该领域研究现状简单分析了紫外级熔石英在193nm激光照射下与吸收有关的缺陷产生变化过程。给出紫外级熔石英材料在193nm激光长时间和高能量照射下性能下降的原因，为发展高性能深紫外光学元件提供有用信息。
As the key equipment of microlithography system, some properties of the excimer lasercentered at193nm are closely related to the Cost of Ownership, lithographic quality,yield, throughput and equipment utilization of lithography, which need to be measuredprecisely before being used and monitored during operation. Therefore, high-precisionmeasurement methods for the characterization of excimer laser have been performed inthis paper. And the accuracy as well as feasibility of the measurement equipments hasbeen analysis through experiments and data processing.
The spectra of excimer laser are measured with a high-resolution Echelle spectrometer,the resolution of the spectrometer is0.02pm (FWHM) and0.1pm (E95), which isenhanced by using deconvolution. In addition, the accuracy of absolute centerwavelength and stability are better than0.1and0.01respectively aftercalibration with the spectra of Fe lamp. In order to obtain the spectrum of one pulse ofhigh repetition rate excimer laser, an equipment and synchronization control method isproposed.
The pulse energy, energy stability, dose energy stability and integrated pulse length aremeasured with photodetector, which is calibrated by using pyroelectric energymeter.According to the measurement results in different test conditions, a test program isproposed.
The beam characterizations of excimer laser are analyzed based on the internationalstandards ISO11146and ISO11670. The beam width and position stability aremeasured with large area UV camera and UV to visible fluorescence converter. Theresults indicate that the method by using UV camera is better than another method. Thepolarization of excimer laser is measured with Brewster window method and Rochonprism polarizer. And the Brewster window is Calcium fluoride substrate in this paper.The measurement accuracy of both methods is better than1%.
Transmission measurement, laser calorimetry technique and fluorescence measurement are used for analysis of durability of synthetic fused silica and CaF2at193nmirradiation. Repetition rate-dependent absorptance measurements of synthetic fusedsilica were performed with an ArF laser calorimeter. By measuring the laserfluence-dependent absorptance of fused silica samples with different thickness indifferent repetition rate to separate the surface absorption and bulk absorption, and thesurface absorptance, effective single-and two-photon absorption coefficients weredetermined in different repetition rate. In addition, the repetition independent single-and two-photon absorption coefficients are obtained by measuring therepetition-dependent absorptance of fused silica sample with different laser fluence. Theeffective linear absorptance and nonlinear absorption coefficient of CaF2are alsodetermined with an ArF laser calorimeter.
193nm laser induced fluorescence of fused silica and CaF2materials are measured byusing fluorescence spectrometer. Combine with the aborption measurement results andsome published papers, the reasons and mechanisms of absorption of fused silica underlong term or high energy irradiation at193nm have been given. These results provideuseful information for the development of high performance deep UV components.
准分子激光器输出光谱特性测试方面，本文通过高分辨率中阶梯光栅光谱仪对准分子激光器输出光谱进行测量，测量精度达到0.02pm（FWHM）和0.1pm（E95），并应用数学反卷积方法有效减小了光谱仪器衍射元件、有限孔径、系统像差等因素引起的光谱展宽。采用Fe原子灯在193nm附近的谱线对光谱测量仪器标定并在测量过程中实时监测由于环境和机械波动引起的波长漂移以修正绝对中心波长测量结果，使准分子激光器输出中心波长测量精度优于0.1pm，波长稳定性测量精度达0.01pm。另外提出一种高重复频率脉冲激光器单脉冲提取装置和同步时序控制方法，通过理论和实验验证了该方法的可行性。将该装置应用于准分子激光器输出光谱参数测量中，消除了由于多脉冲叠加对谱宽和波长稳定性测量结果的影响。
通过热释电能量计对光电探测器标定实现准分子激光器输出单脉冲能量、能量稳定性、剂量能量稳定性以及积分脉冲宽度的实时采集与分析。实验分析不同测试条件对能量和脉宽测量结果的影响。最终确定测试方案，即采用楔形镜或棱镜衰减器件对准分子激光器输出激光能量衰减，由聚焦透镜经散射元件后照射到光电探测器接收面，通过高速采集卡采集光电探测器信号，积分能量由能量计标定，最终获得准分子激光器输出能量参数。
基于国际标准ISO11146和ISO11670提出的测量方法对准分子激光器输出光束特性进行了测量，采用大面阵紫外光束诊断相机和紫外可见荧光转换器两种方法对激光器输出光束近场光斑尺寸和位置稳定性进行测量，比较测量结果，结果表明采用紫外光束诊断相机直接测量方法更能反应准分子激光器输出光束特性。本文采用布鲁斯特窗法和Rochon棱镜偏振器法测量准分子激光器输出光束偏振度，采用氟化钙基片作为布鲁斯特窗材料，通过实验和数据处理对两种方法的测量精度进行分析，两种方法的偏振度测量精度优于1%。
采用透过率法、激光量热法和荧光光谱法对紫外级熔石英和氟化钙材料在193nm激光照射下的性能稳定性进行测量分析。通过ArF激光量热计测量不同激光重复频率时，不同厚度熔石英样品吸收随能量密度变化关系以及同一样品在不同能量密度时吸收损耗随激光重复频率变化关系，建立吸收模型，得到样品表面吸收、有效单、双光子吸收系数随激光频率变化关系以及与激光器重复频率无关的熔石英材料在193nm的单、双光子吸收系数。另外应用激光量热法测量了氟化钙样品吸收随能量密度变化关系，计算得到氟化钙样品在193nm激光照射下的有效线性吸收项和有效非线性吸收系数。
通过荧光光谱仪测量紫外级熔石英和氟化钙材料在193nm激光照射下激发荧光特性。结合其吸收损耗随激光频率和能量密度变化关系以及国内外在该领域研究现状简单分析了紫外级熔石英在193nm激光照射下与吸收有关的缺陷产生变化过程。给出紫外级熔石英材料在193nm激光长时间和高能量照射下性能下降的原因，为发展高性能深紫外光学元件提供有用信息。
As the key equipment of microlithography system, some properties of the excimer lasercentered at193nm are closely related to the Cost of Ownership, lithographic quality,yield, throughput and equipment utilization of lithography, which need to be measuredprecisely before being used and monitored during operation. Therefore, high-precisionmeasurement methods for the characterization of excimer laser have been performed inthis paper. And the accuracy as well as feasibility of the measurement equipments hasbeen analysis through experiments and data processing.
The spectra of excimer laser are measured with a high-resolution Echelle spectrometer,the resolution of the spectrometer is0.02pm (FWHM) and0.1pm (E95), which isenhanced by using deconvolution. In addition, the accuracy of absolute centerwavelength and stability are better than0.1and0.01respectively aftercalibration with the spectra of Fe lamp. In order to obtain the spectrum of one pulse ofhigh repetition rate excimer laser, an equipment and synchronization control method isproposed.
The pulse energy, energy stability, dose energy stability and integrated pulse length aremeasured with photodetector, which is calibrated by using pyroelectric energymeter.According to the measurement results in different test conditions, a test program isproposed.
The beam characterizations of excimer laser are analyzed based on the internationalstandards ISO11146and ISO11670. The beam width and position stability aremeasured with large area UV camera and UV to visible fluorescence converter. Theresults indicate that the method by using UV camera is better than another method. Thepolarization of excimer laser is measured with Brewster window method and Rochonprism polarizer. And the Brewster window is Calcium fluoride substrate in this paper.The measurement accuracy of both methods is better than1%.
Transmission measurement, laser calorimetry technique and fluorescence measurement are used for analysis of durability of synthetic fused silica and CaF2at193nmirradiation. Repetition rate-dependent absorptance measurements of synthetic fusedsilica were performed with an ArF laser calorimeter. By measuring the laserfluence-dependent absorptance of fused silica samples with different thickness indifferent repetition rate to separate the surface absorption and bulk absorption, and thesurface absorptance, effective single-and two-photon absorption coefficients weredetermined in different repetition rate. In addition, the repetition independent single-and two-photon absorption coefficients are obtained by measuring therepetition-dependent absorptance of fused silica sample with different laser fluence. Theeffective linear absorptance and nonlinear absorption coefficient of CaF2are alsodetermined with an ArF laser calorimeter.
193nm laser induced fluorescence of fused silica and CaF2materials are measured byusing fluorescence spectrometer. Combine with the aborption measurement results andsome published papers, the reasons and mechanisms of absorption of fused silica underlong term or high energy irradiation at193nm have been given. These results provideuseful information for the development of high performance deep UV components.
引文
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