MEMS微结构几何特征提取与评定的方法
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摘要
近几年来微机电系统(MEMS)蓬勃增长,越来越向微小化发展,以其自身的体积小、重量轻、功耗低、速度快、灵敏度高等优点受到世界各国的青睐,被迅速而广泛地应用于航空航天、军事、生物医学、信息、自动控制等领域。MEMS测试计量理论与技术、MEMS测试计量基本框架的确立是MEMS设计、制造及质量控制和评价的关键环节之一,目前还很薄弱甚至于处在真空期,迫切需要进行系统而深入的研究。本论文针对MEMS微结构特征测试计量关键理论与技术展开研究,主要研究MEMS微结构特征的分析、提取、表征和评定方法,包括基准面数学模型构造,微结构功能特征区域分割技术,从而初步建立MEMS微结构几何特征的评价标准体系。
论文首先通过多种类型MEMS器件结构特点和加工工艺特性的分析,提出了MEMS微结构表面特征的主要分类。一类为台阶,沟槽和狭缝；另一类为半球体,圆柱体或自由曲面体基元组成的周期性阵列。这两类微结构特征是具有典型性和代表性的MEMS几何特征,也是MEMS测试计量的关键,从而建立了MEMS几何特征分析评定的重要基础。
提出并建立了基于最小二乘和B样条理论的MEMS微结构基准面算法模型,用基准面这一理想的几何要素来评定微结构在MEMS器件中的位置及微结构各个尺度参数,从而实现多样性MEMS微结构评定基准面的有效准确提取。
提出并建立了基于Wolf Pruning的MEMS器件微结构功能特征区域分割方法。该方法在分水岭算法的基础上使用符合拓扑学三大定律的修剪规则,加快了区域准确性。相比之前的图像分割方法,该理论不仅在数学上具有拓扑理论的完备性,而且抗噪能力好,鲁棒性高。
提出了基于功能的MEMS微结构几何特征评定参数系列,并给出了各参数的定义、评定方法。
基于本文提出的MEMS微结构几何特征分析评定方法,给出了两类典型MEMS微结构特征分析与评定实例,得到了相关参数,并分析了这些参数对MEMS器件关键功能的影响。
In recent years, Micro-Electro-Mechanical Systems (MEMS) with their own, such as small size, light weight, low power consumption, high-speed, high sensitivity, has been very rapidly applied to the aero space, military, biomedical, information, automation and other fields. A metrology infrastructure has underpinned all industrial revolutions, and this infrastructure is weak or nonexistent for many of the proposed MEMS devices. Such systemic theoretical research is more urgent and needs to be carried thoroughly on. Metrology and testing technology of MEMS is one of the key requirements of MEMS designing, fabricating, quality control and evaluation. The main research contents of this paper fall into several parts as below:the theories of analysis, extracting, characterization and evaluation of MEMS microstructure are proposed, and the mathematical modelling for datum plane of characteristic microstructure as well as the identification of characteristic functional regions with the microstructure division technology are studied; the research above mentioned will systematically study the metrology and testing technology of MEMS, and establish the initial standard evaluation system of MEMS characteristic structure, and meet the further needs of MEMS technology. For MEMS geometrical parameters, there is no standard definition acceptable for worldwide, which brings much difficulty in MEMS communication, that is why it need to be further described.
One of MEMS microstructure surface is most composed of a number of steps, grooves and slots; the other is a type of pattern structures included hemisphere, cylinder, and pillar. Pattern analysis and recognition of these microstructures with particular feature is one of the key problems in metrology and testing technology of MEMS.
In this paper, the mathematical model to evaluate MEMS microstructure is shown by extracting datum plane of characteristic microstructure. The reference plane for evaluation is defined by the least square method and B-spline theory, a group of statistical parameters base on the reference plane are presented.
This paper explains that how the SU-8 photoresist lithography process and the character of material caused the microstructure surface roughness and the error of geometrical size and shape-position error, and how these parameter affect the delivery efficiency of MEMS devices.
Based on the wolf pruning morphological segment and a novel method of pattern detection are proposed, which can detect functional areas in most situations. It is the most important that this method is consistent topologically. Experiment results prove the efficiency of the method proposed even in measurement data with very low SNR
The geometrical parameter of MEMS microstructure and roughness of sidewall are distinguished. In line with the development trend of microstructure surface characterization, as well as the practical demand in the semiconductor and lithography industry, the evaluate procedures, bring forward a group of parameters to describe character of MEMS microstructure, is given out.
论文首先通过多种类型MEMS器件结构特点和加工工艺特性的分析,提出了MEMS微结构表面特征的主要分类。一类为台阶,沟槽和狭缝；另一类为半球体,圆柱体或自由曲面体基元组成的周期性阵列。这两类微结构特征是具有典型性和代表性的MEMS几何特征,也是MEMS测试计量的关键,从而建立了MEMS几何特征分析评定的重要基础。
提出并建立了基于最小二乘和B样条理论的MEMS微结构基准面算法模型,用基准面这一理想的几何要素来评定微结构在MEMS器件中的位置及微结构各个尺度参数,从而实现多样性MEMS微结构评定基准面的有效准确提取。
提出并建立了基于Wolf Pruning的MEMS器件微结构功能特征区域分割方法。该方法在分水岭算法的基础上使用符合拓扑学三大定律的修剪规则,加快了区域准确性。相比之前的图像分割方法,该理论不仅在数学上具有拓扑理论的完备性,而且抗噪能力好,鲁棒性高。
提出了基于功能的MEMS微结构几何特征评定参数系列,并给出了各参数的定义、评定方法。
基于本文提出的MEMS微结构几何特征分析评定方法,给出了两类典型MEMS微结构特征分析与评定实例,得到了相关参数,并分析了这些参数对MEMS器件关键功能的影响。
In recent years, Micro-Electro-Mechanical Systems (MEMS) with their own, such as small size, light weight, low power consumption, high-speed, high sensitivity, has been very rapidly applied to the aero space, military, biomedical, information, automation and other fields. A metrology infrastructure has underpinned all industrial revolutions, and this infrastructure is weak or nonexistent for many of the proposed MEMS devices. Such systemic theoretical research is more urgent and needs to be carried thoroughly on. Metrology and testing technology of MEMS is one of the key requirements of MEMS designing, fabricating, quality control and evaluation. The main research contents of this paper fall into several parts as below:the theories of analysis, extracting, characterization and evaluation of MEMS microstructure are proposed, and the mathematical modelling for datum plane of characteristic microstructure as well as the identification of characteristic functional regions with the microstructure division technology are studied; the research above mentioned will systematically study the metrology and testing technology of MEMS, and establish the initial standard evaluation system of MEMS characteristic structure, and meet the further needs of MEMS technology. For MEMS geometrical parameters, there is no standard definition acceptable for worldwide, which brings much difficulty in MEMS communication, that is why it need to be further described.
One of MEMS microstructure surface is most composed of a number of steps, grooves and slots; the other is a type of pattern structures included hemisphere, cylinder, and pillar. Pattern analysis and recognition of these microstructures with particular feature is one of the key problems in metrology and testing technology of MEMS.
In this paper, the mathematical model to evaluate MEMS microstructure is shown by extracting datum plane of characteristic microstructure. The reference plane for evaluation is defined by the least square method and B-spline theory, a group of statistical parameters base on the reference plane are presented.
This paper explains that how the SU-8 photoresist lithography process and the character of material caused the microstructure surface roughness and the error of geometrical size and shape-position error, and how these parameter affect the delivery efficiency of MEMS devices.
Based on the wolf pruning morphological segment and a novel method of pattern detection are proposed, which can detect functional areas in most situations. It is the most important that this method is consistent topologically. Experiment results prove the efficiency of the method proposed even in measurement data with very low SNR
The geometrical parameter of MEMS microstructure and roughness of sidewall are distinguished. In line with the development trend of microstructure surface characterization, as well as the practical demand in the semiconductor and lithography industry, the evaluate procedures, bring forward a group of parameters to describe character of MEMS microstructure, is given out.
引文
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