全息光栅掩模图形转移理论模型及新工艺研究
|
摘要
全息光栅作为光谱仪器的核心光学元件，其设计制造技术水平直接决定了光谱仪器的性能。与传统的机械刻划光栅相比，全息光栅具有完全无鬼线、高信噪比、制造周期短、光栅面型多样和易制成大面积等诸多优点。离子束刻蚀技术的发展进一步推动了全息光栅的发展，全息光栅与离子束刻蚀技术的成功结合，极大地提高了全息光栅的衍射效率。但是，对全息光栅掩模进行离子束刻蚀是源自离子源的离子与光刻胶及光栅基底粒子碰撞发生溅射的过程，建立预测性的全息光栅掩模离子束刻蚀图形转移理论模型，对离子束刻蚀工艺进行理论指导十分必要。大深宽比光栅掩模的离子束刻蚀图形转移是全息光栅制作中的难题之一，大气CO2探测项目却急需此类大深宽比光栅，探索离子束刻蚀图形转移新工艺已迫在眉睫。宽波段全息光栅在光谱分析领域具有使仪器结构简单、使用便捷等独特优势，如何在同一块光栅上制作出不同闪耀角的全息离子束刻蚀光栅是光栅领域的前沿课题。本文围绕全息光栅掩模图形转移理论模型及新工艺进行了研究。第一，在分析全息离子束刻蚀物理过程基础上，建立了以特征曲线法为依据的光栅掩模图形转移理论模型，对全息光栅掩模图形转移过程进行数值模拟，并以三角形、矩形、梯形等槽形光栅为例，模拟了光栅槽形的形成过程。第二，依据光栅掩模图形转移理论模型，给出了大气CO2探测仪器用可见-近红外SiC基底全息光栅的设计和制作方法，通过研究离子束刻蚀和反应离子刻蚀相结合的混合刻蚀方法，解决了高深宽比SiC基底图形转移中的氩、氧、三氟甲烷等反应气体的配比、离子束刻蚀速率比、刻蚀速率比与光栅槽深关系等关键技术，并通过物理抛光和化学抛光技术对掩模及光栅刻槽粗糙度进行处理，使可见—近红外SiC基底全息光栅粗糙度降低至20%。第三，提出了宽波段全息光栅槽形参数分段设计方法，给出利用宽波段全息光栅槽形参数优化光栅衍射效率的计算模型，采用分段、分步离子束刻蚀技术，在同一光栅基底上分区制作了位相相同但闪耀角不同的宽波段闪耀光栅，研制了200nm~900nm宽波段全息离子束刻蚀光栅。
Holographic grating, as the core optical element of the spectrometer, the designand manufacture of technical level directly determines the performance of thespectrometer. Compared with traditional mechanically ruled gratings, holographicgrating with a completely ghost-free line, high signal-to-noise ratio, shortmanufacturing cycle, low-cost type diversity easy grating surface made of a largearea, and many other advantages. Ion beam etching technology development tofurther promote the development of the holographic grating, holographic gratingwith a successful combination of ion beam etching technology, greatly improves theholographic grating diffraction efficiency. However, ion beam etching ions from theion source with photoresist and grating substrate particle collision sputtering processto establish the predictive holographic grating mask ion beam etching patterntransfer theoretical model of holographic grating mask theoretical guidance for theion beam etching process is necessary. Ion beam etching of high aspect ratio gratingmask pattern transfer is one of the problems in the production of holographic grating,due to the urgent needs of the detection of atmospheric CO2, explore new techniqueof ion beam etching pattern transfer is imminent. Wide-band holographic gratingspectroscopic areas has the unique advantages of the instrument structure is simple,easy to use, and how to produce different blaze angle holographic ion beam etched grating is the cutting edge topic of the grating field. The paper focuses on thepattern-transfer theoretical models of holographic grating mask and new technologyresearch. First, based on the analysis of the physical process of the ion beam etchingand the method of characteristic curve, this paper establishs the pattern-transfertheoretical models of holographic grating mask, makes the numerical simulation ofholographic grating mask pattern transfer process and simulates the process offorming grating groove by taking the examples of triangular grating, rectangulargrating, trapezoidal grating, etc. Second, on the basis of pattern-transfer theoreticalmodels of holographic grating mask, the paper gives the design and productionmethods of SiC substrate’s holographic grating which is used in atmospheric CO2detection instrument with visible-near infrared, through the study on methodcombination of the ion beam etching and reactive ion etching, solve the keytechnology for high aspect in the SiC substrate pattern transfer of argon, oxygen,trifluoromethane reaction gas ratio, the ion beam etch rate ratio, the relationshipbetween etch rate and the depth of grating groove, and deal with the roughness of themask and grating groove by physical polishing and chemical polishing technique,reduce to20%of the holographic grating roughness. Third, propose the segmenteddesign method of groove parameters for wide band holographic grating, give thecalculation model for diffraction efficiency of optimized parameters grating, make awide-band blazed grating with the same phase but different blaze angles in differentarea, by using segmented and step-by-step ion beam etching technology, develop200nm~900nm wide-band holographic ion beam etching grating..
Holographic grating, as the core optical element of the spectrometer, the designand manufacture of technical level directly determines the performance of thespectrometer. Compared with traditional mechanically ruled gratings, holographicgrating with a completely ghost-free line, high signal-to-noise ratio, shortmanufacturing cycle, low-cost type diversity easy grating surface made of a largearea, and many other advantages. Ion beam etching technology development tofurther promote the development of the holographic grating, holographic gratingwith a successful combination of ion beam etching technology, greatly improves theholographic grating diffraction efficiency. However, ion beam etching ions from theion source with photoresist and grating substrate particle collision sputtering processto establish the predictive holographic grating mask ion beam etching patterntransfer theoretical model of holographic grating mask theoretical guidance for theion beam etching process is necessary. Ion beam etching of high aspect ratio gratingmask pattern transfer is one of the problems in the production of holographic grating,due to the urgent needs of the detection of atmospheric CO2, explore new techniqueof ion beam etching pattern transfer is imminent. Wide-band holographic gratingspectroscopic areas has the unique advantages of the instrument structure is simple,easy to use, and how to produce different blaze angle holographic ion beam etched grating is the cutting edge topic of the grating field. The paper focuses on thepattern-transfer theoretical models of holographic grating mask and new technologyresearch. First, based on the analysis of the physical process of the ion beam etchingand the method of characteristic curve, this paper establishs the pattern-transfertheoretical models of holographic grating mask, makes the numerical simulation ofholographic grating mask pattern transfer process and simulates the process offorming grating groove by taking the examples of triangular grating, rectangulargrating, trapezoidal grating, etc. Second, on the basis of pattern-transfer theoreticalmodels of holographic grating mask, the paper gives the design and productionmethods of SiC substrate’s holographic grating which is used in atmospheric CO2detection instrument with visible-near infrared, through the study on methodcombination of the ion beam etching and reactive ion etching, solve the keytechnology for high aspect in the SiC substrate pattern transfer of argon, oxygen,trifluoromethane reaction gas ratio, the ion beam etch rate ratio, the relationshipbetween etch rate and the depth of grating groove, and deal with the roughness of themask and grating groove by physical polishing and chemical polishing technique,reduce to20%of the holographic grating roughness. Third, propose the segmenteddesign method of groove parameters for wide band holographic grating, give thecalculation model for diffraction efficiency of optimized parameters grating, make awide-band blazed grating with the same phase but different blaze angles in differentarea, by using segmented and step-by-step ion beam etching technology, develop200nm~900nm wide-band holographic ion beam etching grating..
引文
[1] LI Wen-hao, Bayanheshig, QI Xiang-dong, and TANG Yu-guo. Fabrication ofblazed gratings used in ultraviolet region by holographic ion beam etching basedon photoresist melting. OPTOELECTRONICS LETTERS,1May2008Vol.4No.3,0177-0179
[2] E. G. Loewen and E. Popov. Diffraction gratings and applications. New York:Marcel Dekker,1997
[3] J. M. Burch and D. A. Palmer. Interferometric methods for the photographicproduction of large gratings, Opt. Acta.,1961,8:73-80
[4]徐向东，洪义麟，傅绍军等．全息离子束刻蚀衍射光栅．物理，2004，33(5):340-344
[5] L. F. Johnson and K. A. Ingersoll. Asymmetric triangular grating profiles with90degrees groove angles produced by ion-beam erosion. Appl. Opt.,1981,20(17):2951-2961
[6] L. F. Johnson. Evolution of grating profiles under ion-beam erosion. Appl. Opt.,1979,18(15):2559-2574
[7]徐向东，洪义麟，霍同林等．同步辐射Laminar光栅的研制．光学技术，2001，27(5):459-468
[8]傅绍军，洪义麟，陶晓明等．离子束刻蚀位相型Ronchi光栅研究．量子电子学，1995，12(2):146-149
[9]郑玉权，高志良. CO2探测仪光学系统设计[J]，光学精密工程，2012,20(12):2645-2653
[10]郑玉权.超光谱成像仪的精细光谱定标[J]，光学精密工程，2010,18(11):2347-2354
[11]郑玉权.温室气体遥感探测仪器发展现状[J]，中国光学，2011,4（6）：546-561
[12]郑玉权，王慧，王一凡.星载高光谱成像仪光学系统的选择与设计[J]，光学精密工程，2009,17(11):2629-2637
[13]M. Breidne, S. Johansson, L. E. Nilsson and H. Ahlen. Blazed holographicgratings[J]. Opt. Acta,1979,26:1427-1431.
[14]Y. Aoyagi and S. Namba. Blazed ion-etched holographicgratings[J]. Opt. Acta.,1976,23:701-707.
[15]H. Lin, L. F. Li. Fabrication of extreme-ultraviolet blazed gratings by use ofdirect argon–oxygen ion-beam etching through a rectangular photoresist mask[J].Appl. Opt.,2008,47:6212-6218.
[16]B. Nelles, K. F. Heidemann and B. Kleemann. Design, manufacturing and testingof gratings for synchrotron radiation[J]. Nucl. Instrum. Methods Phys. Res,2001,A467–468:260–266.
[17]林华.介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控.清华大学博士论文，2005,10
[18]J. C. Moreno-Marin, et al. Second effects in ion milling [J] J. Vac. Sci.Technol. B4(1),1986
[19]Robert E. Lee, Microfabrication by ion-beam etching[J] Journal of VacuumScience and Technology,1979,16(2).
[20]胡新宁，刘刚，田杨超.离子束刻蚀入射角对图形侧壁陡度影响的研究[J].精细加工技术，2003,4,14-17.
[21]周杰.大高宽比纳米光学元件制作工艺及应用研究.中国科学技术大学博士学位论文，2012,4
[22]张善文.衍射光栅积分理论与宽波段金属光栅、激光器调谐光栅设计方法研究[D].[博士学位论文].北京：中国科学院研究生院，2009.
[23]祝绍箕,邹海兴,包学诚,等.衍射光栅[M].北京：机械工业出版社，1986
[24]庄夔，梁浩明，张庆英等.衍射光栅集光效率的研究[J].光学精密工程，1980,1:74-84
[25]К.И.Tapacob (writer), Zhu S J et al(translator)1985Optical spectrometerК.И.(Beijing: Mechanism industry press)塔拉索夫著，包学诚等译.光谱仪器[M].北京：机械工业出版社，1985
[26]Backlund J P, Wilson D W, andMuller R E, Structured-groove phase gratings forcontrol and optimization of spectral efficiency[C], in Diffractive Optics andMicro-Optics, OSA Tech. Digest2004.
[27]A. R. Neureuther. Process modeling and simulation tools[J]. J. Vac. Sci.Technol.,1986,4(3):912-915
[28]Youngner, D. W., Haynes, C. M.. Modeling ion beam milling[J]. J. Vac.Sci.Technol.,1982,21(2):677-680
[29]S. M. Rosnagel, R. S. Robinson. Monte Carlo model of topography developmentduring sputtering[J]. J. Vac. Sci. Technol. A,1983,1(2):426-429
[30]杨卫鹏，刘全，吴建宏.啁啾光纤光栅相位掩模槽形控制新方法研究.激光杂志，2009,30（1）：51-52
[31]Minghui，ChenQuan Liu，Jianhong Wu. A method of fabricating blazed gratingby homogeneous grating mask. Proc.SPIE8202
[32]TAN Xin. Fabrication of high-efficiency ultraviolet blazed gratings by use ofdirect Ar2–CHF3ion-beam etching through a rectangular photoresist mask. Proc.of SPIE Vol.819181910L-1-10
[33]吴娜，谭鑫，巴音贺希格，唐玉国.闪耀全息光栅离子束刻蚀工艺模拟及实验验证[J].光学精密工程，2012,20（9）：1904-1912
[34]王建鹏，林毅，李祯.用特征曲线法求解线性偏微分方程[J]，科技资讯,2010,4:217-218
[35]MAKOTO ISHIKAWA, MASARU INOUE, TOSHIAKI KITA et al.. Infraredspectrophotometers using a double blazed grating [J]. J. Spectrosc. Soc. Jpn,1978,27(4),304-310.
[36]庄夔，梁浩明，张庆英等.衍射光栅集光效率的研究[J].光学精密工程，1980,1:74-84
[37]张善文，巴音贺希格.宽波段金属光栅设计中闪耀波长对光栅异常的补偿效应[J].光学精密工程，2009,17（5）：990-1000
[38]Shanwen Zhang, Bayanheshig. Using the compensating effect for Rayleighanomalies to design a type of broadband mid-IR grating. OPTICSEXPRESS,2008,16(10):7049-7054
[39]Mouroulis Pantazis, Wilson Daniel W, Maker Paul D, et al., Convex GratingTypes for Concentric Imaging Spectrometers[J], Appl. Opt.199837:7200-7208.
[40]Backlund J P, Wilson D W, andMuller R E, Structured-groove phase gratings forcontrol and optimization of spectral efficiency[C], in Diffractive Optics andMicro-Optics, OSA Tech. Digest2004.
[41]孔鹏.平场全息凹面光栅设计方法及制作关键技术研究[D].[博士学位论文].北京：中国科学院研究生院，2011.
[42]韩建.全息光栅曝光光学系统优化及光栅掩模参数控制方法研究.[D],[博士学位论文].北京：中国科学院研究生院，2012
[43]陈刚.光刻胶全息光栅掩模槽形的控制和检测.硕士学位论文.苏州大学，2006
[44]曾瑾. IV型凹面全息光栅参数优化及误差分析方法研究.[D],[博士学位论文].北京：中国科学院研究生院，2012
[45]巴音贺希格.衍射光栅色散理论与光栅设计、制作和检验方法研究[D].[博士学位论文].北京：中国科学院研究生院，2004.
[46]李文昊.平面及Ⅳ型凹面全息光栅曝光系统设计与掩模制作关键技术研究
[D],[博士学位论文].北京：中国科学院研究生院，2008
[47]Emslie A G.. Flow of a viscous liquid on a rotating disk[J]. Appl Phys,1958,29:858-862.
[48]Acrivos A, Shan M J, Petersen E E. On the Flow of a Non-Newtonian Liquid on aRotating Disk[J]. J Appl Phys,1960,31:963-968.
[49]Meyerhofer D. Characteristics of resist film produced by spinning[J]. J Appl Phys,1978,49:3993-3997.
[50]Daughton W J, Givens F L. An investigation of the thickness variation of spun-onthin film commonly associated with the semiconductor industry[J]. J ElectrochemSoc,1982,129:173-179.
[51]Givens F L, Daughton W J. On the uniformity of thin films: a news techniqueapplied to polyimides[J]. J Electrochem Soc,1979,126:269-272.
[52]Feng X, Sun L. Mathematical model of spin-coated photoresist on a sphericalsubstrate[J]. Optics Express,2005,13:7070-7075.
[53]巴音贺希格，张浩泰，李文昊.凹球面基底离心式涂胶的数学模型及实验验证[J].光学精密工程，2008,16(2):229-234.
[54]He Y Z, Han Y L, Zhao Y G, et al. Investigation into the flange problem of resistalong the edge of substrate caused by spin coating[J]. MicroelectronicEngineering,2002,63:347-352.
[55]徐向东．全息离子束刻蚀真空紫外及软X射线衍射光栅研究[D].[博士学位论文]．中国科学技术大学博士学位论文，2001,4
[56]祝绍箕.制造全息光栅的新装置.光学学报，1990,10(2):189-191
[57]巴音贺希格，邵先秀，崔继承,等.制作平面全息光栅的离轴抛物镜/洛艾镜干涉系统[J].光学精密工程，2011,19(1):56-63.
[58]徐向东，洪义麟，傅绍军.光刻胶灰化用于全息离子束刻蚀光栅制作[J].真空科学与技术，2003,23(5),362-372.
[59]王旭迪，刘颖，洪义麟，徐向东，傅绍军.反应离子束刻蚀应用于光刻胶灰化技术研究[J].2004,2,23-26.
[60]徐向东，洪义麟，傅绍军，王占山.全息离子束刻蚀衍射光栅[J].物理前沿进展.340-344.
[61]陈刚，吴建宏，刘全.全息光栅光刻胶掩模槽形演化及其规律研究[J].光学技术，2008,34（1）：133-140
[62]G. Wehner. Influence of the angle of incidence on sputtering yields[J]. J. Appl.Phys.1959,30(10):1762-1765
[63]J. P. Ducommun, M. Cantagrel. Evolution of well-defined sureface contoursubmitted to ion bombardment[J]. J. Mater. Sci.1975,10(7):52-62
[64]Y.Aoyagi, S.Namba. Blazed ion-etched holographic gratings[J]. Opt. Acta.1976,23(9):701-707
[65]庄夔,刘桂琴,李永贵,全息光栅[J],光学精密工程,1981,12（05）:226-230.ZHUANG X, LIU G Q, LI Y G, Holographic Gratings[J], Optics and PrecisionEngineering1981,12（05）:226-230(in Chinese).
[66]M. C. Hutley, Diffraction Gratings [M]. Academic, New York,1982.
[67]TAN X, LIU Y, LIU ZH K, Performance of a soft x-ray splitter gratingparallelism measuring system by diffraction method[J], Journal of FunctionalMaterials and Devices,2009,24(15):61-65.
[68]Y Liu, X Tan, Zh K Liu, Soft X-ray holographic grating beam splitter including adouble frequency grating for interferometer pre-alignment[J], Optics Express,2008,18(16):14761-14770.
[69]谭鑫，刘颖，徐向东等，13.9nm Laminar分束光栅的研制[J]，光学精密工程，2009,12（01）：33-37.TAN X, LIU Y, XU X D, et a1..13.9nm Laminar grating as beam splitter[J],Optics and Precision Engineering,2009,12（01）：33-37(in Chinese).
[70]谭鑫，李文昊，巴音贺希格，等.紫外全息闪耀光栅的制作[J]，光学精密工程，2010，18（7）：1536-1544.TAN X., LI W. H., Ba Yin H. X. G., et a1. Fabrication of the ultravioletholographic blazed grating [J]. Opt. Precision Eng.,2010,18(7):1536-1544(inChinese).
[71]OLDHAM W. G., NEUREUTHER A. R., SUNG C., et a1. A general simulatorfor VISI lithography and etching process：Part ii-Application to deposition andetching[J]．IEEE Trans Electron Devices．1980，45(27):1455-1465．
[72]MCVITTIE J P. J., REY C., CHENG L. Y., et a1. LPCVD profile simulationusing a Re-emission model[J]. IEDM90.1990,245(19):917-920.
[73]ZHOU R. C., ZHANG H. X., HAO Y. Y., et a1. Simulation of profile evolution inetching-polymerization alternation in DRIE of silicon with SF6／C4F8[J].MEMS03.2003,27(16), l6l-l64．
[74]H. W. Lehmann, et al. Redeposition-A Serious problem in RF sputter etching ofstructureswith micron meter dimensions [J] J. Vac. Sci. Technol. Vol.14, No.1,1977.
[75]刘金声，离子束技术及应用[M]北京：国防工业出版社，1995.03
[76]I.Golecki,RaPid vapor-phase densification of refractory composites,MaterialsScience and Engineering,1997,20(2):37-119
[77]S.R.Levine,Flight-vehicle materials,structure and dynamics assessment and futuredirection Vol.3ceramics and ceramic-matrix composites,The American Society ofMechanical Engineers19921-19,113-139
[78]GH.Abumeri and C.C.Chamis,Performance evaluation of conceptual designs forhigh temperature turbine blades.AAIA-96-1380-CP.551-561
[79]吕振林，高积强，金志浩.碳化硅陶瓷材料及其制备[J].机械工程材料，1999,23(3):1-4.
[80]李鹏.碳化硅等含硅纳米材料的溶剂热合成[D];山东大学，2008.
[81]SCACE R I, SLACK G A. Solubility of Carbon in Silicon and Germanium [J].The Journal of Chemical Physics,1959,30(6):1551-5.
[82]Klosterman D,Chartoff R,et al,Laminated object manufacturing,a new process forthe direct manufacture of monolithic ceramics and continuous fiber CMCs,CeramEng&Sci Proe,1997,18(4B):113
[83]Angelovici M M,Bryant R G,et al,Carbon/ceramic microcomposites,preparationand properties,Mater Lett,1998,36:254
[84]Zhou X,Zhang C,et al,Preparation and mechanical properties of unidirectionalHi-nicalon fiber reinforced silicon carbide composites,J Mater SciLett,2001,20:261
[85]Brennan J J,Interfacial characterization of a slurry-cast melt-infiltrated SiC/SiCceramic-matrix composite,Acta Mater,2000,48:4619
[86]JEONG Y K, NIIHARA K. Microstructure and mechanical properties ofpressureless sintered A1203/Sic nanocomposites [J]. Nanostructured Materials,1997,9(1-8):193-6
[87]刘玲，亢茂青，王心葵.SiC晶须表面化学与力学性能的研究[J].兵器材料科学与工程2000,23(5):59-64.
[88]ALIVISATOS A P. Semiconductor Clusters, Nanocrystals, and Quantum Dots [J].Science,1996,271(525I):933-7
[89]YANG W, ARAKI H, TANG C, et al. Single-Crystal SiC Nanowires with a ThinCarbon Coating for Stronger and Tougher Ceramic Composites [J]. AdvancedMaterials,2005,17(12):1519-23.
[90]SHOR J S, ZHANG X G, OSGOOD R M. Laser-Assisted PhotoelectrochemicalEtching of n-type Beta-SiC [J]. J Electrochem Soc,1992,139(4):1213-6.
[91]CASADY J B, JOHNSON R W Status of silicon carbide (SiC) as awide-bandgap semiconductor for high-temperature applications: A review [J].Solid-State Electronics,1996,39(10):1409-22.
[92]LIU R, YANG B, FU Z, et al. Stable blue-green and ul travioletphotoluminescence from silicon carbide on porous silicon [J]. Solid StateCommunications,1998,106(4):211-4.
[93]Dong S,Katoh Y,Kohyama A,PreParation of SiC/SiC composites by hotPressing,using tyranno-SA fiber as reinforcement,J Eur Ceram Soc,2003,23:1223
[94]European Patent,0,519,641
[95]European Patent,0,519,643
[96]Fan Di, Zhang Zongyu,Niu Haiyan et al.. Surfacing fabrication of silicon opticalmirror[J].J. Chinese Ceramic Society,2003,31(11):1096~1100范镝，张忠玉，牛海燕等.碳化硅光学镜面加工[J].硅酸盐学报，2003，,3（11）：1096~1100
[97]Vogli E,Mukerji J,et al,Conversion of Oak to cellular silicon carbide ceramic bygas-phase reaction with silicon monoxide,J.Am Ceram Soc,2001,84:1236
[98]Liu Guiling, Huang Zhengren, Liu Xuejian et al.. Recent developments of surfacecoatings and optical fabrication of silicon carbide[J]. J. Inorganic Materials,2007,22(5):769~774刘桂玲，黄政仁，刘学建等.碳化硅表面改性和光学镜面加工的研究现状[J].无极材料学报，2007,22(5):769~774
[99]Sheng Zhenfeng,Gao Jinsong, Wang Xiaoyi et al.. Improvement of technologicalprocess for surface modification of RB-SiC mirror[J]. Optics and PrecisionEngineering,2009,17(5):969~974申振峰，高劲松，王笑夷等. RB-SiC基底反射面表面改性工艺的改进[J].光学精密工程，2009,17(5):969~974
[100] Gao Jinsong,Shen Zhenfeng, Wang Xiaoyi et al.. Research on surfacemodification of space used SiC mirror [J]. Acta OpticaSinica,2009,29(9):2624~2629高劲松，申振峰，王笑夷等.空间反射镜基底材料碳化硅表面改性研究[J].光学学报，2009,29(9):2624~2629
[101] Bayanheshig, Gao J X, Qi X D et al2005Chin. J. Laser32301(in Chinese)[巴音贺希格、高键翔、齐向东李英海、张坊城、李春启2005中国激光32301]
[102] Petit R1980Electromagnetic Theory of Gratings (New York:Springer-Verlag) P63-75
[103] E.G..Loewen, M.Nevière, D.Maystre1993Appl Opt.321154
[104] R. W. Wood, Phil. Mag19024,396.
[105] C. H. Palmer1952, J. Opt. Soc. Am.42,269.
[106] C. H. Palmer1956, J. Opt. Soc. Am.46,50.
[107] J. E. Stewart, W. S. Gallaway1962Appl. Opt.4,421.
[108] A.Marechal, G.W.Stroke,1959C.R.Ac.Sci.2492042
[2] E. G. Loewen and E. Popov. Diffraction gratings and applications. New York:Marcel Dekker,1997
[3] J. M. Burch and D. A. Palmer. Interferometric methods for the photographicproduction of large gratings, Opt. Acta.,1961,8:73-80
[4]徐向东，洪义麟，傅绍军等．全息离子束刻蚀衍射光栅．物理，2004，33(5):340-344
[5] L. F. Johnson and K. A. Ingersoll. Asymmetric triangular grating profiles with90degrees groove angles produced by ion-beam erosion. Appl. Opt.,1981,20(17):2951-2961
[6] L. F. Johnson. Evolution of grating profiles under ion-beam erosion. Appl. Opt.,1979,18(15):2559-2574
[7]徐向东，洪义麟，霍同林等．同步辐射Laminar光栅的研制．光学技术，2001，27(5):459-468
[8]傅绍军，洪义麟，陶晓明等．离子束刻蚀位相型Ronchi光栅研究．量子电子学，1995，12(2):146-149
[9]郑玉权，高志良. CO2探测仪光学系统设计[J]，光学精密工程，2012,20(12):2645-2653
[10]郑玉权.超光谱成像仪的精细光谱定标[J]，光学精密工程，2010,18(11):2347-2354
[11]郑玉权.温室气体遥感探测仪器发展现状[J]，中国光学，2011,4（6）：546-561
[12]郑玉权，王慧，王一凡.星载高光谱成像仪光学系统的选择与设计[J]，光学精密工程，2009,17(11):2629-2637
[13]M. Breidne, S. Johansson, L. E. Nilsson and H. Ahlen. Blazed holographicgratings[J]. Opt. Acta,1979,26:1427-1431.
[14]Y. Aoyagi and S. Namba. Blazed ion-etched holographicgratings[J]. Opt. Acta.,1976,23:701-707.
[15]H. Lin, L. F. Li. Fabrication of extreme-ultraviolet blazed gratings by use ofdirect argon–oxygen ion-beam etching through a rectangular photoresist mask[J].Appl. Opt.,2008,47:6212-6218.
[16]B. Nelles, K. F. Heidemann and B. Kleemann. Design, manufacturing and testingof gratings for synchrotron radiation[J]. Nucl. Instrum. Methods Phys. Res,2001,A467–468:260–266.
[17]林华.介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控.清华大学博士论文，2005,10
[18]J. C. Moreno-Marin, et al. Second effects in ion milling [J] J. Vac. Sci.Technol. B4(1),1986
[19]Robert E. Lee, Microfabrication by ion-beam etching[J] Journal of VacuumScience and Technology,1979,16(2).
[20]胡新宁，刘刚，田杨超.离子束刻蚀入射角对图形侧壁陡度影响的研究[J].精细加工技术，2003,4,14-17.
[21]周杰.大高宽比纳米光学元件制作工艺及应用研究.中国科学技术大学博士学位论文，2012,4
[22]张善文.衍射光栅积分理论与宽波段金属光栅、激光器调谐光栅设计方法研究[D].[博士学位论文].北京：中国科学院研究生院，2009.
[23]祝绍箕,邹海兴,包学诚,等.衍射光栅[M].北京：机械工业出版社，1986
[24]庄夔，梁浩明，张庆英等.衍射光栅集光效率的研究[J].光学精密工程，1980,1:74-84
[25]К.И.Tapacob (writer), Zhu S J et al(translator)1985Optical spectrometerК.И.(Beijing: Mechanism industry press)塔拉索夫著，包学诚等译.光谱仪器[M].北京：机械工业出版社，1985
[26]Backlund J P, Wilson D W, andMuller R E, Structured-groove phase gratings forcontrol and optimization of spectral efficiency[C], in Diffractive Optics andMicro-Optics, OSA Tech. Digest2004.
[27]A. R. Neureuther. Process modeling and simulation tools[J]. J. Vac. Sci.Technol.,1986,4(3):912-915
[28]Youngner, D. W., Haynes, C. M.. Modeling ion beam milling[J]. J. Vac.Sci.Technol.,1982,21(2):677-680
[29]S. M. Rosnagel, R. S. Robinson. Monte Carlo model of topography developmentduring sputtering[J]. J. Vac. Sci. Technol. A,1983,1(2):426-429
[30]杨卫鹏，刘全，吴建宏.啁啾光纤光栅相位掩模槽形控制新方法研究.激光杂志，2009,30（1）：51-52
[31]Minghui，ChenQuan Liu，Jianhong Wu. A method of fabricating blazed gratingby homogeneous grating mask. Proc.SPIE8202
[32]TAN Xin. Fabrication of high-efficiency ultraviolet blazed gratings by use ofdirect Ar2–CHF3ion-beam etching through a rectangular photoresist mask. Proc.of SPIE Vol.819181910L-1-10
[33]吴娜，谭鑫，巴音贺希格，唐玉国.闪耀全息光栅离子束刻蚀工艺模拟及实验验证[J].光学精密工程，2012,20（9）：1904-1912
[34]王建鹏，林毅，李祯.用特征曲线法求解线性偏微分方程[J]，科技资讯,2010,4:217-218
[35]MAKOTO ISHIKAWA, MASARU INOUE, TOSHIAKI KITA et al.. Infraredspectrophotometers using a double blazed grating [J]. J. Spectrosc. Soc. Jpn,1978,27(4),304-310.
[36]庄夔，梁浩明，张庆英等.衍射光栅集光效率的研究[J].光学精密工程，1980,1:74-84
[37]张善文，巴音贺希格.宽波段金属光栅设计中闪耀波长对光栅异常的补偿效应[J].光学精密工程，2009,17（5）：990-1000
[38]Shanwen Zhang, Bayanheshig. Using the compensating effect for Rayleighanomalies to design a type of broadband mid-IR grating. OPTICSEXPRESS,2008,16(10):7049-7054
[39]Mouroulis Pantazis, Wilson Daniel W, Maker Paul D, et al., Convex GratingTypes for Concentric Imaging Spectrometers[J], Appl. Opt.199837:7200-7208.
[40]Backlund J P, Wilson D W, andMuller R E, Structured-groove phase gratings forcontrol and optimization of spectral efficiency[C], in Diffractive Optics andMicro-Optics, OSA Tech. Digest2004.
[41]孔鹏.平场全息凹面光栅设计方法及制作关键技术研究[D].[博士学位论文].北京：中国科学院研究生院，2011.
[42]韩建.全息光栅曝光光学系统优化及光栅掩模参数控制方法研究.[D],[博士学位论文].北京：中国科学院研究生院，2012
[43]陈刚.光刻胶全息光栅掩模槽形的控制和检测.硕士学位论文.苏州大学，2006
[44]曾瑾. IV型凹面全息光栅参数优化及误差分析方法研究.[D],[博士学位论文].北京：中国科学院研究生院，2012
[45]巴音贺希格.衍射光栅色散理论与光栅设计、制作和检验方法研究[D].[博士学位论文].北京：中国科学院研究生院，2004.
[46]李文昊.平面及Ⅳ型凹面全息光栅曝光系统设计与掩模制作关键技术研究
[D],[博士学位论文].北京：中国科学院研究生院，2008
[47]Emslie A G.. Flow of a viscous liquid on a rotating disk[J]. Appl Phys,1958,29:858-862.
[48]Acrivos A, Shan M J, Petersen E E. On the Flow of a Non-Newtonian Liquid on aRotating Disk[J]. J Appl Phys,1960,31:963-968.
[49]Meyerhofer D. Characteristics of resist film produced by spinning[J]. J Appl Phys,1978,49:3993-3997.
[50]Daughton W J, Givens F L. An investigation of the thickness variation of spun-onthin film commonly associated with the semiconductor industry[J]. J ElectrochemSoc,1982,129:173-179.
[51]Givens F L, Daughton W J. On the uniformity of thin films: a news techniqueapplied to polyimides[J]. J Electrochem Soc,1979,126:269-272.
[52]Feng X, Sun L. Mathematical model of spin-coated photoresist on a sphericalsubstrate[J]. Optics Express,2005,13:7070-7075.
[53]巴音贺希格，张浩泰，李文昊.凹球面基底离心式涂胶的数学模型及实验验证[J].光学精密工程，2008,16(2):229-234.
[54]He Y Z, Han Y L, Zhao Y G, et al. Investigation into the flange problem of resistalong the edge of substrate caused by spin coating[J]. MicroelectronicEngineering,2002,63:347-352.
[55]徐向东．全息离子束刻蚀真空紫外及软X射线衍射光栅研究[D].[博士学位论文]．中国科学技术大学博士学位论文，2001,4
[56]祝绍箕.制造全息光栅的新装置.光学学报，1990,10(2):189-191
[57]巴音贺希格，邵先秀，崔继承,等.制作平面全息光栅的离轴抛物镜/洛艾镜干涉系统[J].光学精密工程，2011,19(1):56-63.
[58]徐向东，洪义麟，傅绍军.光刻胶灰化用于全息离子束刻蚀光栅制作[J].真空科学与技术，2003,23(5),362-372.
[59]王旭迪，刘颖，洪义麟，徐向东，傅绍军.反应离子束刻蚀应用于光刻胶灰化技术研究[J].2004,2,23-26.
[60]徐向东，洪义麟，傅绍军，王占山.全息离子束刻蚀衍射光栅[J].物理前沿进展.340-344.
[61]陈刚，吴建宏，刘全.全息光栅光刻胶掩模槽形演化及其规律研究[J].光学技术，2008,34（1）：133-140
[62]G. Wehner. Influence of the angle of incidence on sputtering yields[J]. J. Appl.Phys.1959,30(10):1762-1765
[63]J. P. Ducommun, M. Cantagrel. Evolution of well-defined sureface contoursubmitted to ion bombardment[J]. J. Mater. Sci.1975,10(7):52-62
[64]Y.Aoyagi, S.Namba. Blazed ion-etched holographic gratings[J]. Opt. Acta.1976,23(9):701-707
[65]庄夔,刘桂琴,李永贵,全息光栅[J],光学精密工程,1981,12（05）:226-230.ZHUANG X, LIU G Q, LI Y G, Holographic Gratings[J], Optics and PrecisionEngineering1981,12（05）:226-230(in Chinese).
[66]M. C. Hutley, Diffraction Gratings [M]. Academic, New York,1982.
[67]TAN X, LIU Y, LIU ZH K, Performance of a soft x-ray splitter gratingparallelism measuring system by diffraction method[J], Journal of FunctionalMaterials and Devices,2009,24(15):61-65.
[68]Y Liu, X Tan, Zh K Liu, Soft X-ray holographic grating beam splitter including adouble frequency grating for interferometer pre-alignment[J], Optics Express,2008,18(16):14761-14770.
[69]谭鑫，刘颖，徐向东等，13.9nm Laminar分束光栅的研制[J]，光学精密工程，2009,12（01）：33-37.TAN X, LIU Y, XU X D, et a1..13.9nm Laminar grating as beam splitter[J],Optics and Precision Engineering,2009,12（01）：33-37(in Chinese).
[70]谭鑫，李文昊，巴音贺希格，等.紫外全息闪耀光栅的制作[J]，光学精密工程，2010，18（7）：1536-1544.TAN X., LI W. H., Ba Yin H. X. G., et a1. Fabrication of the ultravioletholographic blazed grating [J]. Opt. Precision Eng.,2010,18(7):1536-1544(inChinese).
[71]OLDHAM W. G., NEUREUTHER A. R., SUNG C., et a1. A general simulatorfor VISI lithography and etching process：Part ii-Application to deposition andetching[J]．IEEE Trans Electron Devices．1980，45(27):1455-1465．
[72]MCVITTIE J P. J., REY C., CHENG L. Y., et a1. LPCVD profile simulationusing a Re-emission model[J]. IEDM90.1990,245(19):917-920.
[73]ZHOU R. C., ZHANG H. X., HAO Y. Y., et a1. Simulation of profile evolution inetching-polymerization alternation in DRIE of silicon with SF6／C4F8[J].MEMS03.2003,27(16), l6l-l64．
[74]H. W. Lehmann, et al. Redeposition-A Serious problem in RF sputter etching ofstructureswith micron meter dimensions [J] J. Vac. Sci. Technol. Vol.14, No.1,1977.
[75]刘金声，离子束技术及应用[M]北京：国防工业出版社，1995.03
[76]I.Golecki,RaPid vapor-phase densification of refractory composites,MaterialsScience and Engineering,1997,20(2):37-119
[77]S.R.Levine,Flight-vehicle materials,structure and dynamics assessment and futuredirection Vol.3ceramics and ceramic-matrix composites,The American Society ofMechanical Engineers19921-19,113-139
[78]GH.Abumeri and C.C.Chamis,Performance evaluation of conceptual designs forhigh temperature turbine blades.AAIA-96-1380-CP.551-561
[79]吕振林，高积强，金志浩.碳化硅陶瓷材料及其制备[J].机械工程材料，1999,23(3):1-4.
[80]李鹏.碳化硅等含硅纳米材料的溶剂热合成[D];山东大学，2008.
[81]SCACE R I, SLACK G A. Solubility of Carbon in Silicon and Germanium [J].The Journal of Chemical Physics,1959,30(6):1551-5.
[82]Klosterman D,Chartoff R,et al,Laminated object manufacturing,a new process forthe direct manufacture of monolithic ceramics and continuous fiber CMCs,CeramEng&Sci Proe,1997,18(4B):113
[83]Angelovici M M,Bryant R G,et al,Carbon/ceramic microcomposites,preparationand properties,Mater Lett,1998,36:254
[84]Zhou X,Zhang C,et al,Preparation and mechanical properties of unidirectionalHi-nicalon fiber reinforced silicon carbide composites,J Mater SciLett,2001,20:261
[85]Brennan J J,Interfacial characterization of a slurry-cast melt-infiltrated SiC/SiCceramic-matrix composite,Acta Mater,2000,48:4619
[86]JEONG Y K, NIIHARA K. Microstructure and mechanical properties ofpressureless sintered A1203/Sic nanocomposites [J]. Nanostructured Materials,1997,9(1-8):193-6
[87]刘玲，亢茂青，王心葵.SiC晶须表面化学与力学性能的研究[J].兵器材料科学与工程2000,23(5):59-64.
[88]ALIVISATOS A P. Semiconductor Clusters, Nanocrystals, and Quantum Dots [J].Science,1996,271(525I):933-7
[89]YANG W, ARAKI H, TANG C, et al. Single-Crystal SiC Nanowires with a ThinCarbon Coating for Stronger and Tougher Ceramic Composites [J]. AdvancedMaterials,2005,17(12):1519-23.
[90]SHOR J S, ZHANG X G, OSGOOD R M. Laser-Assisted PhotoelectrochemicalEtching of n-type Beta-SiC [J]. J Electrochem Soc,1992,139(4):1213-6.
[91]CASADY J B, JOHNSON R W Status of silicon carbide (SiC) as awide-bandgap semiconductor for high-temperature applications: A review [J].Solid-State Electronics,1996,39(10):1409-22.
[92]LIU R, YANG B, FU Z, et al. Stable blue-green and ul travioletphotoluminescence from silicon carbide on porous silicon [J]. Solid StateCommunications,1998,106(4):211-4.
[93]Dong S,Katoh Y,Kohyama A,PreParation of SiC/SiC composites by hotPressing,using tyranno-SA fiber as reinforcement,J Eur Ceram Soc,2003,23:1223
[94]European Patent,0,519,641
[95]European Patent,0,519,643
[96]Fan Di, Zhang Zongyu,Niu Haiyan et al.. Surfacing fabrication of silicon opticalmirror[J].J. Chinese Ceramic Society,2003,31(11):1096~1100范镝，张忠玉，牛海燕等.碳化硅光学镜面加工[J].硅酸盐学报，2003，,3（11）：1096~1100
[97]Vogli E,Mukerji J,et al,Conversion of Oak to cellular silicon carbide ceramic bygas-phase reaction with silicon monoxide,J.Am Ceram Soc,2001,84:1236
[98]Liu Guiling, Huang Zhengren, Liu Xuejian et al.. Recent developments of surfacecoatings and optical fabrication of silicon carbide[J]. J. Inorganic Materials,2007,22(5):769~774刘桂玲，黄政仁，刘学建等.碳化硅表面改性和光学镜面加工的研究现状[J].无极材料学报，2007,22(5):769~774
[99]Sheng Zhenfeng,Gao Jinsong, Wang Xiaoyi et al.. Improvement of technologicalprocess for surface modification of RB-SiC mirror[J]. Optics and PrecisionEngineering,2009,17(5):969~974申振峰，高劲松，王笑夷等. RB-SiC基底反射面表面改性工艺的改进[J].光学精密工程，2009,17(5):969~974
[100] Gao Jinsong,Shen Zhenfeng, Wang Xiaoyi et al.. Research on surfacemodification of space used SiC mirror [J]. Acta OpticaSinica,2009,29(9):2624~2629高劲松，申振峰，王笑夷等.空间反射镜基底材料碳化硅表面改性研究[J].光学学报，2009,29(9):2624~2629
[101] Bayanheshig, Gao J X, Qi X D et al2005Chin. J. Laser32301(in Chinese)[巴音贺希格、高键翔、齐向东李英海、张坊城、李春启2005中国激光32301]
[102] Petit R1980Electromagnetic Theory of Gratings (New York:Springer-Verlag) P63-75
[103] E.G..Loewen, M.Nevière, D.Maystre1993Appl Opt.321154
[104] R. W. Wood, Phil. Mag19024,396.
[105] C. H. Palmer1952, J. Opt. Soc. Am.42,269.
[106] C. H. Palmer1956, J. Opt. Soc. Am.46,50.
[107] J. E. Stewart, W. S. Gallaway1962Appl. Opt.4,421.
[108] A.Marechal, G.W.Stroke,1959C.R.Ac.Sci.2492042