衍射光学系统杂散光研究
|
摘要
光刻机是制作极大规模集成电路的核心设备。光刻照明系统是光刻机的重要组成部分，它包括扩束系统、光束整形系统、匀光系统和照明物镜系统，其主要作用是利用衍射元件实现离轴照明以及利用复眼透镜提高照明均匀性。
本文围绕ArF光刻照明系统中的微光学器件（衍射元件与复眼透镜）产生的杂散光展开研究。因杂散光的存在会严重影响光刻机最终的曝光质量，所以本课题研究是保证光刻机曝光质量的关键技术之一。研究的最终目的在于能够采取有效措施抑制微光学元件产生的杂散光。论文的主要研究工作包括以下几个部分：
(1)衍射元件设计算法的研究。通过对以往衍射元件设计算法的调研与比较，提出了一种混合型算法用以设计衍射元件。该算法集多种算法优点，从设计源头上减小衍射元件产生的杂散光。
(2)衍射光学元件设计参数对杂散光的影响。采用标量衍射理论，详细分析了衍射元件产生高级次衍射杂散光的原因，并在此基础上提出了一个新的评价参数Trp。它与光波波长成正比，与衍射光学元件的采样单元尺寸以及远场衍射角成反比。通过对该参数的调节能够有效抑制高级次衍射杂散光的产生。
(3)衍射光学元件加工误差对杂散光的影响。详细介绍了衍射元件的制作工艺，并对加工误差的来源进行了分析。接着分析了各加工误差对杂散光的影响，其中包括对台阶量化误差、对准误差、随机刻蚀深度误差以及球形刻蚀深度误差的分析。为了达到设计要求，对加工提出了改进意见。
(4)搭建实验平台，对实现四级照明的衍射元件进行了测试，其中包括对衍射元件表面轮廓的检测以及对光束整形效果的测试。并将实验结果与仿真结果进行了对比，对衍射元件产生的主要杂散光进行了分析，讨论了抑制衍射杂散光，提高衍射效率的方法。
(5)详细研究了复眼透镜的匀光原理，在ASAP软件中通过光线追迹的方法，数值仿真了复眼透镜和聚光镜组实现匀光的过程。分析了双排复眼透镜中主要的加工误差导致的杂散光对匀光效果的影响，并对加工提出了改进意见。
(6)介绍了光刻系统的总体结构；计算了整个系统的能量利用率，并分析了衍射元件产生的杂散光在像面上所占比例；采用Prolith软件分析了衍射元件产生的杂散光对光刻曝光质量的影响。
对深紫外光刻照明系统中微光学元件产生的杂散光进行深入细致的研究有利于减小光刻系统中的杂散光，保证最终的曝光质量。论文的这些研究成果为深紫外光刻照明系统的研制提供了有价值的参考。
Lithography is the core equipment for the production of ultra large scaleintegrated circuit. Illumination system, as one of the most important parts oflithography, includes beam expander system, beam shaping system, uniformillumination system and illumination lens system. It enables to realize off-axisillumination modes with diffractive optical element and supply high uniformityintensity distribution on the mask with fly’s eye condenser.
In this paper, the stray light of micro optical elements (diffractive optical elementand fly’s eye condenser) in the ArF lithography illumination system is studied. Due tothe stray light will seriously affect the quality of the final exposure, this research isone of the key technologies to ensure the quality of exposure. The purpose of thispaper is that many effective measures can be adopted to suppress the stray light ofmicro optical elements. The main research work in this paper includes the followingparts:
(1) Algorithms for the Design of Diffractive Optical Element for Beam Shaping.Through the investigation and comparison of many design algorithms of thediffractive optical elements, a hybrid algorithm is proposed to design diffractiveoptical elements. This advanced algorithm can reduce stray light of diffractive opticalelements effectively.
(2) Influences of design parameters of diffractive optical element on stray light.Scalar diffraction theory is used to analysis the reasons of high order diffraction light.Then, a new parameter Trpis defined. It is proportional to the wavelength andinversely proportional to the far-field max diffraction angle and the size of diffractiveoptical element cells. Through the simulation analysis, the stray light of highdiffractive orders can be suppressed effectively by regulating this new parameter.
(3) Influences of fabrication errors of diffractive optical element on stray light. Fabrication methods of diffractive optical elements are introduced and the influencesof fabrication errors are analyzed, including step quantization error, alignment error,random etching depth error, as well as spherical etching depth error. Finally,improvements are suggested.
(4) An experiment is used to test the performance of diffractive optical elements,including some tests about the surface of diffractive optical elements and tests aboutbeam shaping. The experimental results are compared with the simulation results.Finally, some methods of suppression diffractive stray light are discussed.
(5) The method of ray tracing in ASAP is used to simulate the uniform processwith fly’s eye condenser. Fabrication errors of fly’s eye and influences are analyzed.Finally, Fabrication improvements are suggested.
(6) Based on the structure of lithography system, energy efficiency of thelithography system is caculatied and energy of stray light from diffractive opticalelement is analyzed. In addition, influences of stray light of diffractive opticalelements on the performance of lithography are discussed with Prolith software.
These researches have advantages of reduction of stray light in lithographysystem and the results provide valuable references for the development of deepultraviolet lithography illumination system.
本文围绕ArF光刻照明系统中的微光学器件（衍射元件与复眼透镜）产生的杂散光展开研究。因杂散光的存在会严重影响光刻机最终的曝光质量，所以本课题研究是保证光刻机曝光质量的关键技术之一。研究的最终目的在于能够采取有效措施抑制微光学元件产生的杂散光。论文的主要研究工作包括以下几个部分：
(1)衍射元件设计算法的研究。通过对以往衍射元件设计算法的调研与比较，提出了一种混合型算法用以设计衍射元件。该算法集多种算法优点，从设计源头上减小衍射元件产生的杂散光。
(2)衍射光学元件设计参数对杂散光的影响。采用标量衍射理论，详细分析了衍射元件产生高级次衍射杂散光的原因，并在此基础上提出了一个新的评价参数Trp。它与光波波长成正比，与衍射光学元件的采样单元尺寸以及远场衍射角成反比。通过对该参数的调节能够有效抑制高级次衍射杂散光的产生。
(3)衍射光学元件加工误差对杂散光的影响。详细介绍了衍射元件的制作工艺，并对加工误差的来源进行了分析。接着分析了各加工误差对杂散光的影响，其中包括对台阶量化误差、对准误差、随机刻蚀深度误差以及球形刻蚀深度误差的分析。为了达到设计要求，对加工提出了改进意见。
(4)搭建实验平台，对实现四级照明的衍射元件进行了测试，其中包括对衍射元件表面轮廓的检测以及对光束整形效果的测试。并将实验结果与仿真结果进行了对比，对衍射元件产生的主要杂散光进行了分析，讨论了抑制衍射杂散光，提高衍射效率的方法。
(5)详细研究了复眼透镜的匀光原理，在ASAP软件中通过光线追迹的方法，数值仿真了复眼透镜和聚光镜组实现匀光的过程。分析了双排复眼透镜中主要的加工误差导致的杂散光对匀光效果的影响，并对加工提出了改进意见。
(6)介绍了光刻系统的总体结构；计算了整个系统的能量利用率，并分析了衍射元件产生的杂散光在像面上所占比例；采用Prolith软件分析了衍射元件产生的杂散光对光刻曝光质量的影响。
对深紫外光刻照明系统中微光学元件产生的杂散光进行深入细致的研究有利于减小光刻系统中的杂散光，保证最终的曝光质量。论文的这些研究成果为深紫外光刻照明系统的研制提供了有价值的参考。
Lithography is the core equipment for the production of ultra large scaleintegrated circuit. Illumination system, as one of the most important parts oflithography, includes beam expander system, beam shaping system, uniformillumination system and illumination lens system. It enables to realize off-axisillumination modes with diffractive optical element and supply high uniformityintensity distribution on the mask with fly’s eye condenser.
In this paper, the stray light of micro optical elements (diffractive optical elementand fly’s eye condenser) in the ArF lithography illumination system is studied. Due tothe stray light will seriously affect the quality of the final exposure, this research isone of the key technologies to ensure the quality of exposure. The purpose of thispaper is that many effective measures can be adopted to suppress the stray light ofmicro optical elements. The main research work in this paper includes the followingparts:
(1) Algorithms for the Design of Diffractive Optical Element for Beam Shaping.Through the investigation and comparison of many design algorithms of thediffractive optical elements, a hybrid algorithm is proposed to design diffractiveoptical elements. This advanced algorithm can reduce stray light of diffractive opticalelements effectively.
(2) Influences of design parameters of diffractive optical element on stray light.Scalar diffraction theory is used to analysis the reasons of high order diffraction light.Then, a new parameter Trpis defined. It is proportional to the wavelength andinversely proportional to the far-field max diffraction angle and the size of diffractiveoptical element cells. Through the simulation analysis, the stray light of highdiffractive orders can be suppressed effectively by regulating this new parameter.
(3) Influences of fabrication errors of diffractive optical element on stray light. Fabrication methods of diffractive optical elements are introduced and the influencesof fabrication errors are analyzed, including step quantization error, alignment error,random etching depth error, as well as spherical etching depth error. Finally,improvements are suggested.
(4) An experiment is used to test the performance of diffractive optical elements,including some tests about the surface of diffractive optical elements and tests aboutbeam shaping. The experimental results are compared with the simulation results.Finally, some methods of suppression diffractive stray light are discussed.
(5) The method of ray tracing in ASAP is used to simulate the uniform processwith fly’s eye condenser. Fabrication errors of fly’s eye and influences are analyzed.Finally, Fabrication improvements are suggested.
(6) Based on the structure of lithography system, energy efficiency of thelithography system is caculatied and energy of stray light from diffractive opticalelement is analyzed. In addition, influences of stray light of diffractive opticalelements on the performance of lithography are discussed with Prolith software.
These researches have advantages of reduction of stray light in lithographysystem and the results provide valuable references for the development of deepultraviolet lithography illumination system.
引文
[1] Katherine Derbyshire．Issues in advanced lithography[J]．Solid state technol,1997：133-138．
[2]姚汉民,胡松,邢廷文.光学投影曝光微纳加工技术[M].北京:北京工业大学出版社,2006,1-18.
[3] Brian J. Thompson. Microlithography science and technology[M]. Taylor&Francis Group, Second edition,2007:6-10.
[4]李晓光.紫外光刻仿真及掩模优化设计研究[D].合肥:中国科学与技术大学,2007.
[5] K. Jain. A novel high resolution, large field scan-and-repeat, projectionlithography system[J]. SPIE,1991,1463:666-671．
[6] Martin van den Brink, Hans Jasper, Steve Slonaker, et al. Step-and-scan andstep-and-repeat, a technology comparison[J]. SPIE,1996,2726:734-753.
[7] Eric Hendrickx, Philippe Monnoyer, Lieve Van Look, et al. Optical extensionstowards the45-nm node[J]. SPIE,2004,5377:357-368.
[8] Bruce W. Smith, Yongfa Fan, Michael Slocum, et al.25nm immersionlithography at193nm wavelength[J]. SPIE,2005,5754:141-147.
[9] Kevin Monahan, Brian Trafas. Design and process limited yield at the65-nm nodeand beyond[J]. SPIE,2005,5756:230-239.
[10] Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem, et al. Extendingoptical lithography with immersion[J]. SPIE,2004,5377:285-305.
[11] Hans Meiling, Vadim Banine, Noreen Harned, et al. Development of the ASMLEUV alpha demo tool[J]. SPIE,2005,5751:90-101.
[12]陈安.曝光光学系统性能对光刻性能影响的研究[D].成都:中国科学院大学,2013.
[13] Patrick P. Naulleau, James A. Liddle, Farhad Salmassi, et al. Design andfabrication of advanced EUV diffractive elements[J]. SPIE,2003,5347:9-17.
[14] Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, et al. Fabrication on of anaspherical mirror for extreme-ultraviolet lithography (EUVL) optics[J]. SPIE,1998,3447:32-39.
[15] B. R. Brown, A. W. Lohman. Complex spatial filtering with binary masks[J].Appl. Opt.,1966,5(6):967-969.
[16] J Lcgcr, M Holz, G Swanson, et al. Coherent Laser beam addiction: Anapplication of binary optics technologh[J]. Journal of Lincoln Lab,1988,1(2).
[17] Yang G Z, Gu B Y. On the amplitude-phase retrieval problem in the opticalsystem[J]. Acta Phys. Sin,1981.
[18] Li Yuan-yuan, Qiu Chuan-kai, Li Pan, et al. Shape the unstable laser beam usingdiffractive optical element array[J]. SPIE,2010,7848X:1-9.
[19]马韬.多层衍射光学元件设计理论及其在混合光学系统中的应用[D].杭州:浙江大学,2006.
[20] Mikael Karlsson, F. Nikolajeff. Fabrication and evaluation of a diamonddiffractive fan-out element for high power lasers[J]. Optics Express,2003,11(3):191-198.
[21] Wenbo Jiang, Jun Wang, Xiucheng Dong. A novel hybrid algorithm for thedesign of the phase diffractive optical elements for beam shaping[J]. Optics&LaserTechnology,2012.
[22] M. T. Gale et al. Continuous-relief diffractive optical elements fortwo-dimensional array generation[J]. Appl. Opt.,1993,32(14):2526-2533.
[23] Fu Yong-Qi, Ngoi Kok Ann Bryan, Ong Shing. Diffractive optical elements withcontinuous relief fabricated by focused ion beam for monomode fiber coupling[J].Optics Express,2000,7(3):141-147.
[24] Douglas Wayne Ricks. LIGHT SCATTERING FROM BINARY OPTICS[D].California, THE UNIVERSITY OF ARIZONA,1993.
[25] Markus Rossi, Thomas Hessler. Stray-light effects of diffractive beam-shapingelements in optical Microsystems[J]. APPLIED OPTICS,1999,38(14):3068-3076.
[26]留浩飞.含衍射元件的高功率激光装置中的鬼像分析[D].杭州:浙江大学,2006.
[27]刘强.束匀滑衍射光学器件的设计方法和制作工艺[D].合肥:中国科学与技术大学,2009.
[28]叶钧,许乔,侯西云等.二元光学元件衍射效率的逐层分析法研究[J].光学学报,1996,16(10):1350-1355.
[29]李红军,赵晶丽,卢振武.二元光学元件制作过程中的线宽误差[J].光电子.激光,2000,11(3):279-281.
[30]徐平,张晓春,郭履容等.二元光学元件制作误差分析与模拟[J].光学学报,1996,16(6):833-838.
[31] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Investigating fabricationerrors for diffractive optical elements[J]. SPIE,2006,61850E:1-8.
[32] Hyun Choi, Wan-Chin Kim, Sang-Hyuck Lee, et al. Effects of fabrication errorsin the diffractive optical element on the modulation transfer function of a hybridlens[J]. Optical Society of America,2008,25(11):2764-2766.
[33] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Analysis of multimaskfabrication errors for diffractive optical elements[J]. APPLIED OPTICS,2007,46(12):2180-2189.
[34] X. Deng, X. Liang, Z. Chen, et al. Uniform illumination of large targets using alens array[J]. Applied Optics,1986,25(3):377-381.
[35] N. Nishi, T. Jitsuno, K. Tsubakimoto, et al. A spherical multi lens array foruniform target illumination[J]. SPIE,1993,1870:105-111.
[36]丘悦,钱列加,黄宏一等.用消衍射方法改善透镜列阵的辐照均匀性[J].中国激光,1995,22(1):27-31.
[37]张为国,董小春,高洪涛等.微透镜列阵衍射效应所致的串扰[J].光电工程,2010,37(5):80-90.
[38] F. C. Wippermann, P. Dannberg, A. Brauer, et al. Improved homogenization offly’s eye condenser setups under coherent illumination using chirped microlensarrays[J]. SPIE,2007,64660R:1-9.
[39] Reinhard Voelkel, Kenneth J. Weible. Laser beam Homogenizing: Limitationsand Constraints[J]. SPIE,2008.
[40]黄威,尉昊赟,李岩.双复眼透镜间相对位置误差对光束匀化的影响[J].激光技术,2013,37(1):11-15.
[41]匡丽娟,翟金会,阮玉等.复眼透镜阵列应用于均匀照明系统的特性研究[J].光学与光电技术,2005,3(6):29-31.
[42]贾文武,汪岳峰,黄峰等.像差对复眼透镜光束整形性能的影响分析[J].激光与光电子学进展,2010.
[43] Stephen P. Renwick. Flare and its effects on imaging[J]. SPIE,2004,5377:442-450.
[44] Jae-Hwan KIM, Toshifumi Suganaga, Kunio Watanabe, Noriyoshi Kanda,Toshiro Itani. Wavefront Aberration Measurement in157nm High Numerical ApertureLens [J]. SPIE,2003,5040:1408-1419.
[45] Chris A.Mack. Measuring and modeling flare in optical lithography[J].SPIE,2003,5040:151-161.
[46] Tomoyuki Matsuyama, Yasuhiro Ohmura, Yohei Fujishima, Takashi Koyama.Catadioptric Projection Lens for1.3NA scanner [J]. SPIE,2007,6520.
[47] Young-Je Yun, Ju-Hyung Moon, Haeng-Leem Jeon, Jea-Hee Kim, Keeho Kim.Flare Effect of Different Shape of Illumination Apertures in193nm OpticalLithography System [J]. SPIE,2006,6154.
[48] Joseph P. Kirk. Scattered light in photolithographic lenses[J]. SPIE,1994,2197:566-572.
[49] Manish Chandhok, Sang H. Lee, Christof Krautschik, Guojing Zhang, Bryan J.Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell.Comparison of Techniques to Measure the Point Spread Function due to Scatter andFlare in EUV Lithography Systems [J]. SPIE,2004,5374:854-860.
[50] Sang H. Lee, Patrick Naulleau, Chris Krautschik, Manish Chandhok, Henry N.Chapman, Donna J. O’Connell, Michael Goldstein. Lithographic flare measurementsof EUV full-field projection optics [J]. SPIE,2003,5037:103-111.
[51] Joseph W. Goodman.傅里叶光学导论[M].北京:电子工业出版社,2006,57-88.
[52]苏显渝,李继陶.信息光学[M].北京:科学出版社,1999,34-56.
[53]李晖.光学系统杂散光分析方法研究[D].西安:中国科学院西安光学精密机械研究所,1996.
[54] ASAP Procedural Note, Stray Light Analysis with ASAP.: Breault ResearchOrganization, Inc,2001-10-01.
[55]侯海虹,范正修,邵建达等.光学表面的标量散射理论[J].激光与光电子学进展,2005,42(11):35-44.
[56] ASAP Technical Guide, Scattering.: Breault Research Organization, Inc,2004-02-09.
[57]王骞,张景旭.红外系统中杂散辐射的抑制方法[J].光机电信息,2002,12:21-24.
[58]黄智强.红外系统杂散光分析研究[D].成都:中国科学院光电技术研究所，2006.
[59] Dongseok Nam, Eunmi Lee, Sung-gon Jung, et al. Effectiveness andConfirmation of Local Area Flare Measurement Method in Various Pattern Layouts[J].SPIE,2002,4691:57-66.
[60] Hans Becker, Markus Renno, Ulrich Hermanns, et al. Antireflection solutions fornext generation193-nm binary and phase-shifting maskes[J]. SPIE,2005,59920I:1-8.
[61] R. W. Gerchberg, W. O. Saxton. A practical Algorithm for the Determination ofPhase from Image and diffraction plane Pictures[J]. Optik,1972,35(2):237.
[62] M. P. Chang, O. K. Erosy. The modified input-output algorithm for the synthesisof computer-generated holograus[J]. Optik,1994,95(4):155.
[63] Yang G Z, Gu B Y. On the amplitude-phase retrieval problem in the opticalsystem[J]. Acta Phys. Sin,1981.
[64] S. Kirkpatrik, C. P. Gelatt, M. P. Vecchi. Optimization by simulated annealing[J].Science,1983,220(4598):2145-2158.
[65] A. P. Bennett, J. L. Shapiro. Analysis of genetic algorithms using statisticalmechanics[J]. Phys. Rev. Lett.,1994,72(9):1305-1309.
[66] J. H. Holland. A Adaptation in Natural and Artificial System[M]. Univ. ofMichigan Press. Ann Arbor,1989.
[67] Mahalb U, Shamir J, Caulfield H J. Genetic algorithm for optical patternrecognition[J]. Opt. Lett.,1991,16(9):648-650.
[68]维克多.索菲尔.衍射光学元件的计算机设计方法[M].天津:天津科学技术出版社,2007,39-58.
[69]金国藩等.二元光学[M].北京:国防工业出版社,1995,298-313.
[70] Joseph W. Goodman.傅里叶光学导论[M].北京:电子工业出版社,2006,20-24.
[71]殷可为,黄智强,林妩媚,邢廷文.角谱理论用于衍射光学元件的数字仿真[J].光电工程,2012,39(4):125-128.
[72] Kewei Yin, Zhiqiang Huang, Wumei Lin, Tingwen Xing. Effects of DesignParameters of Diffractive Optical Element on Stray Light [J].红外与激光工程,2013,42(11):3095-3064.
[73]崔铮.微纳米加工技术及其应用[M].北京:高等教育出版社,2009.
[74]姚汉民,胡松,邢廷文等.光学投影曝光微纳加工技术[M].机械工业大学出版社,2006.
[75]金国藩等.二元光学[M].北京:国防工业出版社,1995,22-25.
[76] Elias N. Glytsis, Michael E. Harrigan, Thomas K. Gaylord, et al. Effects offabrication errors on the performance of cylindrical diffractive lenses: rigorousboundary-element method and scalar approximation[J]. APPLIED OPTICS,1998,37(28):6591-6602.
[77]郑学哲,严瑛白,金国藩等.对准误差对二元光学器件衍射效率的影响[J].光电子.激光,1997,8(4):241-245.
[78]李红军,卢振武,廖江红等.对准误差对菲涅尔透镜衍射效率的影响[J].光学精密工程,2000,8(1):11-15.
[79] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Investigating fabricationerrors for diffractive optical elements[J]. SPIE,2006,61850E:1-8.
[80] Yasuyuki Unno. Point-spread function for binary diffractive lenses fabricatedwith misaligned masks[J]. APPLIED OPTICS,1998,37(16):3401-3407.
[81]殷可为,黄智强,林妩媚,邢廷文.二元光学元件横向加工误差对衍射效率的影响[J].光电工程,2011,38(9):46-49.
[82]刘强,张晓波,邬融等.离子束刻蚀工艺误差对DOE器件的影响[J].光电工程,2007,34(11):50-60.
[83] Li Yuan-yuan, Qiu Chuan-kai, Li Pan, et al. Shape the unstable laser beam usingdiffractive optical element array[J]. SPIE,2010,78481X:1-9.
[84] Blake G. Crowther, Donald G. Koch, Joseph M. Kunick, et al. A Fly’s CondenserSystem for Uniform Illunination[J]. SPIE,2002,4832:302-310.
[85] Martin Antoni, Wolfgang Singer, J rg Schultz, et al. Illumination Optics Designfor EUV-Lithography[J]. SPIE,2000,4146:25-34.
[86] Wenzi Zhang, Qinxiao Liu, Huifang Gao, et al. Fly-eyes Illumination Analysis[J].SPIE,2009,75061W:1-10.
[87]林妩媚.高均匀复杂光刻照明系统技术研究[D].成都:中国科学院研究生院,2011,14-20.
[88] F. M. Dickey, S. C. Holswade. Laser Beam Shaping Theory and Techniques[M].New York, Marcel Dekker,2000:271-311.
[89]王伟,周常河.一种新型聚合物微透镜阵列的制造技术[J].中国激光,2009,36(11):2869-2872.
[90]刘德森,胡建明,刘炜.平面交叉型微透镜阵列的制作及成像特性研究[J].中国激光,2005,32(6):743-748.
[91]窦任生,林海,胡继承.控制液晶器件产生的程控透镜和微透镜阵列[J].光学学报,2005,25(7):959-964.
[92] Reinhard Voelkel, Kenneth J. Weible. Laser Beam Homogenizing: Limitationsand Constraints[J]. SPIE,2008.
[93]马科斯.波恩,埃米尔.沃耳夫.光学原理[M].北京:电子工业出版社,2009,470-480.
[94] Andreas Schilling, Roman Merz, Christian Ossmann, et al. Surface profiles ofreflow microlenses under the influence of surface tension and gravity[J]. Opt. Eng.,2000,39(8):2171-2176.
[95]何苗,易新建,程祖海.凹型Si微透镜阵列的制作[J].红外与毫米波学报,2002,21(1):33-36.
[96]张新宇,易新建,赵兴荣等.石英微透镜阵列的制作研究[J].光子学报,1997,26(8):710-714.
[97]朱咸昌,伍凡,曹学东等.光栅衍射法测量微透镜列阵焦距时产生的光斑干扰分析[J].光学学报,2011,31(11):1-7.
[98]王绍明,赵道木.矩阵光学原理[M].杭州:杭州大学出版社,1994,24-74.
[99]巩岩,张巍.193nm光刻曝光系统的现状及发展[J].中国光学与应用光学,2008,1(1):25-35.
[100]赵阳.深紫外光刻复杂照明光学系统设计[D].长春:中国科学院研究生院,2010.
[101]林妩媚.高均匀复杂光刻照明系统技术研究[D].成都:中国科学院研究生院,2011.
[2]姚汉民,胡松,邢廷文.光学投影曝光微纳加工技术[M].北京:北京工业大学出版社,2006,1-18.
[3] Brian J. Thompson. Microlithography science and technology[M]. Taylor&Francis Group, Second edition,2007:6-10.
[4]李晓光.紫外光刻仿真及掩模优化设计研究[D].合肥:中国科学与技术大学,2007.
[5] K. Jain. A novel high resolution, large field scan-and-repeat, projectionlithography system[J]. SPIE,1991,1463:666-671．
[6] Martin van den Brink, Hans Jasper, Steve Slonaker, et al. Step-and-scan andstep-and-repeat, a technology comparison[J]. SPIE,1996,2726:734-753.
[7] Eric Hendrickx, Philippe Monnoyer, Lieve Van Look, et al. Optical extensionstowards the45-nm node[J]. SPIE,2004,5377:357-368.
[8] Bruce W. Smith, Yongfa Fan, Michael Slocum, et al.25nm immersionlithography at193nm wavelength[J]. SPIE,2005,5754:141-147.
[9] Kevin Monahan, Brian Trafas. Design and process limited yield at the65-nm nodeand beyond[J]. SPIE,2005,5756:230-239.
[10] Bob Streefkerk, Jan Baselmans, Wendy Gehoel-van Ansem, et al. Extendingoptical lithography with immersion[J]. SPIE,2004,5377:285-305.
[11] Hans Meiling, Vadim Banine, Noreen Harned, et al. Development of the ASMLEUV alpha demo tool[J]. SPIE,2005,5751:90-101.
[12]陈安.曝光光学系统性能对光刻性能影响的研究[D].成都:中国科学院大学,2013.
[13] Patrick P. Naulleau, James A. Liddle, Farhad Salmassi, et al. Design andfabrication of advanced EUV diffractive elements[J]. SPIE,2003,5347:9-17.
[14] Masahito Niibe, Atsushi Miyafuji, Hiroo Kinoshita, et al. Fabrication on of anaspherical mirror for extreme-ultraviolet lithography (EUVL) optics[J]. SPIE,1998,3447:32-39.
[15] B. R. Brown, A. W. Lohman. Complex spatial filtering with binary masks[J].Appl. Opt.,1966,5(6):967-969.
[16] J Lcgcr, M Holz, G Swanson, et al. Coherent Laser beam addiction: Anapplication of binary optics technologh[J]. Journal of Lincoln Lab,1988,1(2).
[17] Yang G Z, Gu B Y. On the amplitude-phase retrieval problem in the opticalsystem[J]. Acta Phys. Sin,1981.
[18] Li Yuan-yuan, Qiu Chuan-kai, Li Pan, et al. Shape the unstable laser beam usingdiffractive optical element array[J]. SPIE,2010,7848X:1-9.
[19]马韬.多层衍射光学元件设计理论及其在混合光学系统中的应用[D].杭州:浙江大学,2006.
[20] Mikael Karlsson, F. Nikolajeff. Fabrication and evaluation of a diamonddiffractive fan-out element for high power lasers[J]. Optics Express,2003,11(3):191-198.
[21] Wenbo Jiang, Jun Wang, Xiucheng Dong. A novel hybrid algorithm for thedesign of the phase diffractive optical elements for beam shaping[J]. Optics&LaserTechnology,2012.
[22] M. T. Gale et al. Continuous-relief diffractive optical elements fortwo-dimensional array generation[J]. Appl. Opt.,1993,32(14):2526-2533.
[23] Fu Yong-Qi, Ngoi Kok Ann Bryan, Ong Shing. Diffractive optical elements withcontinuous relief fabricated by focused ion beam for monomode fiber coupling[J].Optics Express,2000,7(3):141-147.
[24] Douglas Wayne Ricks. LIGHT SCATTERING FROM BINARY OPTICS[D].California, THE UNIVERSITY OF ARIZONA,1993.
[25] Markus Rossi, Thomas Hessler. Stray-light effects of diffractive beam-shapingelements in optical Microsystems[J]. APPLIED OPTICS,1999,38(14):3068-3076.
[26]留浩飞.含衍射元件的高功率激光装置中的鬼像分析[D].杭州:浙江大学,2006.
[27]刘强.束匀滑衍射光学器件的设计方法和制作工艺[D].合肥:中国科学与技术大学,2009.
[28]叶钧,许乔,侯西云等.二元光学元件衍射效率的逐层分析法研究[J].光学学报,1996,16(10):1350-1355.
[29]李红军,赵晶丽,卢振武.二元光学元件制作过程中的线宽误差[J].光电子.激光,2000,11(3):279-281.
[30]徐平,张晓春,郭履容等.二元光学元件制作误差分析与模拟[J].光学学报,1996,16(6):833-838.
[31] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Investigating fabricationerrors for diffractive optical elements[J]. SPIE,2006,61850E:1-8.
[32] Hyun Choi, Wan-Chin Kim, Sang-Hyuck Lee, et al. Effects of fabrication errorsin the diffractive optical element on the modulation transfer function of a hybridlens[J]. Optical Society of America,2008,25(11):2764-2766.
[33] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Analysis of multimaskfabrication errors for diffractive optical elements[J]. APPLIED OPTICS,2007,46(12):2180-2189.
[34] X. Deng, X. Liang, Z. Chen, et al. Uniform illumination of large targets using alens array[J]. Applied Optics,1986,25(3):377-381.
[35] N. Nishi, T. Jitsuno, K. Tsubakimoto, et al. A spherical multi lens array foruniform target illumination[J]. SPIE,1993,1870:105-111.
[36]丘悦,钱列加,黄宏一等.用消衍射方法改善透镜列阵的辐照均匀性[J].中国激光,1995,22(1):27-31.
[37]张为国,董小春,高洪涛等.微透镜列阵衍射效应所致的串扰[J].光电工程,2010,37(5):80-90.
[38] F. C. Wippermann, P. Dannberg, A. Brauer, et al. Improved homogenization offly’s eye condenser setups under coherent illumination using chirped microlensarrays[J]. SPIE,2007,64660R:1-9.
[39] Reinhard Voelkel, Kenneth J. Weible. Laser beam Homogenizing: Limitationsand Constraints[J]. SPIE,2008.
[40]黄威,尉昊赟,李岩.双复眼透镜间相对位置误差对光束匀化的影响[J].激光技术,2013,37(1):11-15.
[41]匡丽娟,翟金会,阮玉等.复眼透镜阵列应用于均匀照明系统的特性研究[J].光学与光电技术,2005,3(6):29-31.
[42]贾文武,汪岳峰,黄峰等.像差对复眼透镜光束整形性能的影响分析[J].激光与光电子学进展,2010.
[43] Stephen P. Renwick. Flare and its effects on imaging[J]. SPIE,2004,5377:442-450.
[44] Jae-Hwan KIM, Toshifumi Suganaga, Kunio Watanabe, Noriyoshi Kanda,Toshiro Itani. Wavefront Aberration Measurement in157nm High Numerical ApertureLens [J]. SPIE,2003,5040:1408-1419.
[45] Chris A.Mack. Measuring and modeling flare in optical lithography[J].SPIE,2003,5040:151-161.
[46] Tomoyuki Matsuyama, Yasuhiro Ohmura, Yohei Fujishima, Takashi Koyama.Catadioptric Projection Lens for1.3NA scanner [J]. SPIE,2007,6520.
[47] Young-Je Yun, Ju-Hyung Moon, Haeng-Leem Jeon, Jea-Hee Kim, Keeho Kim.Flare Effect of Different Shape of Illumination Apertures in193nm OpticalLithography System [J]. SPIE,2006,6154.
[48] Joseph P. Kirk. Scattered light in photolithographic lenses[J]. SPIE,1994,2197:566-572.
[49] Manish Chandhok, Sang H. Lee, Christof Krautschik, Guojing Zhang, Bryan J.Rice, Michael Goldstein, Eric Panning, Robert Bristol, Alan Stivers, Melissa Shell.Comparison of Techniques to Measure the Point Spread Function due to Scatter andFlare in EUV Lithography Systems [J]. SPIE,2004,5374:854-860.
[50] Sang H. Lee, Patrick Naulleau, Chris Krautschik, Manish Chandhok, Henry N.Chapman, Donna J. O’Connell, Michael Goldstein. Lithographic flare measurementsof EUV full-field projection optics [J]. SPIE,2003,5037:103-111.
[51] Joseph W. Goodman.傅里叶光学导论[M].北京:电子工业出版社,2006,57-88.
[52]苏显渝,李继陶.信息光学[M].北京:科学出版社,1999,34-56.
[53]李晖.光学系统杂散光分析方法研究[D].西安:中国科学院西安光学精密机械研究所,1996.
[54] ASAP Procedural Note, Stray Light Analysis with ASAP.: Breault ResearchOrganization, Inc,2001-10-01.
[55]侯海虹,范正修,邵建达等.光学表面的标量散射理论[J].激光与光电子学进展,2005,42(11):35-44.
[56] ASAP Technical Guide, Scattering.: Breault Research Organization, Inc,2004-02-09.
[57]王骞,张景旭.红外系统中杂散辐射的抑制方法[J].光机电信息,2002,12:21-24.
[58]黄智强.红外系统杂散光分析研究[D].成都:中国科学院光电技术研究所，2006.
[59] Dongseok Nam, Eunmi Lee, Sung-gon Jung, et al. Effectiveness andConfirmation of Local Area Flare Measurement Method in Various Pattern Layouts[J].SPIE,2002,4691:57-66.
[60] Hans Becker, Markus Renno, Ulrich Hermanns, et al. Antireflection solutions fornext generation193-nm binary and phase-shifting maskes[J]. SPIE,2005,59920I:1-8.
[61] R. W. Gerchberg, W. O. Saxton. A practical Algorithm for the Determination ofPhase from Image and diffraction plane Pictures[J]. Optik,1972,35(2):237.
[62] M. P. Chang, O. K. Erosy. The modified input-output algorithm for the synthesisof computer-generated holograus[J]. Optik,1994,95(4):155.
[63] Yang G Z, Gu B Y. On the amplitude-phase retrieval problem in the opticalsystem[J]. Acta Phys. Sin,1981.
[64] S. Kirkpatrik, C. P. Gelatt, M. P. Vecchi. Optimization by simulated annealing[J].Science,1983,220(4598):2145-2158.
[65] A. P. Bennett, J. L. Shapiro. Analysis of genetic algorithms using statisticalmechanics[J]. Phys. Rev. Lett.,1994,72(9):1305-1309.
[66] J. H. Holland. A Adaptation in Natural and Artificial System[M]. Univ. ofMichigan Press. Ann Arbor,1989.
[67] Mahalb U, Shamir J, Caulfield H J. Genetic algorithm for optical patternrecognition[J]. Opt. Lett.,1991,16(9):648-650.
[68]维克多.索菲尔.衍射光学元件的计算机设计方法[M].天津:天津科学技术出版社,2007,39-58.
[69]金国藩等.二元光学[M].北京:国防工业出版社,1995,298-313.
[70] Joseph W. Goodman.傅里叶光学导论[M].北京:电子工业出版社,2006,20-24.
[71]殷可为,黄智强,林妩媚,邢廷文.角谱理论用于衍射光学元件的数字仿真[J].光电工程,2012,39(4):125-128.
[72] Kewei Yin, Zhiqiang Huang, Wumei Lin, Tingwen Xing. Effects of DesignParameters of Diffractive Optical Element on Stray Light [J].红外与激光工程,2013,42(11):3095-3064.
[73]崔铮.微纳米加工技术及其应用[M].北京:高等教育出版社,2009.
[74]姚汉民,胡松,邢廷文等.光学投影曝光微纳加工技术[M].机械工业大学出版社,2006.
[75]金国藩等.二元光学[M].北京:国防工业出版社,1995,22-25.
[76] Elias N. Glytsis, Michael E. Harrigan, Thomas K. Gaylord, et al. Effects offabrication errors on the performance of cylindrical diffractive lenses: rigorousboundary-element method and scalar approximation[J]. APPLIED OPTICS,1998,37(28):6591-6602.
[77]郑学哲,严瑛白,金国藩等.对准误差对二元光学器件衍射效率的影响[J].光电子.激光,1997,8(4):241-245.
[78]李红军,卢振武,廖江红等.对准误差对菲涅尔透镜衍射效率的影响[J].光学精密工程,2000,8(1):11-15.
[79] Adam J. Caley, Markus Braun, Andrew J. Waddie, et al. Investigating fabricationerrors for diffractive optical elements[J]. SPIE,2006,61850E:1-8.
[80] Yasuyuki Unno. Point-spread function for binary diffractive lenses fabricatedwith misaligned masks[J]. APPLIED OPTICS,1998,37(16):3401-3407.
[81]殷可为,黄智强,林妩媚,邢廷文.二元光学元件横向加工误差对衍射效率的影响[J].光电工程,2011,38(9):46-49.
[82]刘强,张晓波,邬融等.离子束刻蚀工艺误差对DOE器件的影响[J].光电工程,2007,34(11):50-60.
[83] Li Yuan-yuan, Qiu Chuan-kai, Li Pan, et al. Shape the unstable laser beam usingdiffractive optical element array[J]. SPIE,2010,78481X:1-9.
[84] Blake G. Crowther, Donald G. Koch, Joseph M. Kunick, et al. A Fly’s CondenserSystem for Uniform Illunination[J]. SPIE,2002,4832:302-310.
[85] Martin Antoni, Wolfgang Singer, J rg Schultz, et al. Illumination Optics Designfor EUV-Lithography[J]. SPIE,2000,4146:25-34.
[86] Wenzi Zhang, Qinxiao Liu, Huifang Gao, et al. Fly-eyes Illumination Analysis[J].SPIE,2009,75061W:1-10.
[87]林妩媚.高均匀复杂光刻照明系统技术研究[D].成都:中国科学院研究生院,2011,14-20.
[88] F. M. Dickey, S. C. Holswade. Laser Beam Shaping Theory and Techniques[M].New York, Marcel Dekker,2000:271-311.
[89]王伟,周常河.一种新型聚合物微透镜阵列的制造技术[J].中国激光,2009,36(11):2869-2872.
[90]刘德森,胡建明,刘炜.平面交叉型微透镜阵列的制作及成像特性研究[J].中国激光,2005,32(6):743-748.
[91]窦任生,林海,胡继承.控制液晶器件产生的程控透镜和微透镜阵列[J].光学学报,2005,25(7):959-964.
[92] Reinhard Voelkel, Kenneth J. Weible. Laser Beam Homogenizing: Limitationsand Constraints[J]. SPIE,2008.
[93]马科斯.波恩,埃米尔.沃耳夫.光学原理[M].北京:电子工业出版社,2009,470-480.
[94] Andreas Schilling, Roman Merz, Christian Ossmann, et al. Surface profiles ofreflow microlenses under the influence of surface tension and gravity[J]. Opt. Eng.,2000,39(8):2171-2176.
[95]何苗,易新建,程祖海.凹型Si微透镜阵列的制作[J].红外与毫米波学报,2002,21(1):33-36.
[96]张新宇,易新建,赵兴荣等.石英微透镜阵列的制作研究[J].光子学报,1997,26(8):710-714.
[97]朱咸昌,伍凡,曹学东等.光栅衍射法测量微透镜列阵焦距时产生的光斑干扰分析[J].光学学报,2011,31(11):1-7.
[98]王绍明,赵道木.矩阵光学原理[M].杭州:杭州大学出版社,1994,24-74.
[99]巩岩,张巍.193nm光刻曝光系统的现状及发展[J].中国光学与应用光学,2008,1(1):25-35.
[100]赵阳.深紫外光刻复杂照明光学系统设计[D].长春:中国科学院研究生院,2010.
[101]林妩媚.高均匀复杂光刻照明系统技术研究[D].成都:中国科学院研究生院,2011.