用户名: 密码: 验证码:
电弧离子镀氮化钛、氮化铬薄膜制备及特性研究
详细信息    本馆镜像全文|  推荐本文 |  |   获取CNKI官网全文
摘要
在过去的二十几年里,物理气相沉积(PVD)过渡族金属氮化物涂层的研究得到了迅速的发展,其中最早应用于金属表面的涂层是TiN,其次是CrN_x薄膜。由于它们具有高硬度,高耐磨,良好的抗腐蚀性能,较高的高温稳定性等优点,而被广泛用作工模具的保护涂层,材料的装饰涂层,微电子领域的扩散阻挡层以及生物领域等。
     本文采用直流叠加脉冲偏压电弧离子镀技术在不锈钢和45钢基体上制备了TiN和CrN_x薄膜。对比分析了两种薄膜的基本特性,比如:显微硬度,表面粗糙度和膜基结合强度。对比研究了摩擦过程中摩擦参数(速度,载荷,摩擦副)对两种薄膜耐磨性等的影响,并对薄膜的摩擦磨损机理进行了分析。探讨了三种不同环境介质(干摩擦,水润滑,油润滑)条件下,两种薄膜的摩擦学特性及磨损机理。
     研究结果表明:TiN薄膜的摩擦学特性受摩擦速度,载荷和摩擦副的影响均较大,而CrNx薄膜的摩擦学特性受速度和载荷的影响较大,受摩擦副的影响不明显。干摩擦条件下,TiN薄膜主要表现为磨粒磨损和氧化磨损;水润滑条件下,薄膜主要表现为疲劳磨损;油润滑条件下,薄膜几乎无磨损。水和油分别起到边界润滑和流体润滑作用,与薄膜无化学反应,仅物理吸附在薄膜表面。CrN_x薄膜在干摩擦条件下,主要表现为磨粒磨损;水润滑条件下,主要表现为腐蚀磨损;而油润滑条件下,油分子与摩擦表面相互作用,在表面形成保护膜或改性层,使薄膜表面几乎无磨损。相对于千摩擦条件下,水润滑和油润滑条件下TiN和CrN_x薄膜的摩擦系数和磨痕深度都降低。在相同的介质条件下,CrN_x薄膜的摩擦系数和磨痕深度始终小于TiN薄膜。因此,在一定的应用领域CrN_x薄膜很有潜力替代TiN薄膜。
Transition metal nitride cluster have developed rapidly in the last twenty decades. TiN film was the earliest horniess film,and the second one was CrN_x film.Due to their excellent properties,such as their high hardness,wear-resisting,chemical inertness with corrosive resistance and thermal stability.TiN films and CrN_x films have found several important applications in cutting tools,die mold,decoration,microelectronics, biotechnology field and so on.
     For this study,TiN films and CrN_x films were prepared by Arc Ion Plating method on stainless steel and 45 steel substrates.Micro-hardness,surface roughness and adehesion strength of TiN films were compared with those of CrN_x films.Effect of parameter including velocity,load and Counterpart on tribological properties of TiN films and CrN_x films.The wear resistance of TiN films and CrN_x films were studied in different tribological conditions(in dry,water and oil lubricated) by the ball—disk wear tester.
     The results showed that tribological properties of TiN films were effected obviously by the friction velocity,load and Counterpart.But the tribological properties of CrN_x films were little effected by courterpart.It was verified that TiN films present abrasive pxidized wear under dry friction,fatigue wear with water's boundery lubrication under water lubricating condition and almost no wear because of oil's fluidic lubricability under oil lubricating condition.Tribological mechanism of CrN_x films were abrasion in dry、corrosion in water and little wear in oil.both the grinding crack depth and friction coefficient of TiN films and CrN_x films clearly tend to decrease under water/oil lubricating conditions in comparison under dry friction.But CrN_x films possess much better wear ressistance than TiN films under all conditions.So CrN_x films is thus a potential candidate for replacing TiN in certain applications.
引文
[1]Xu Junhua,Li Geyang,Gu Mingyuan.The microstructure and superhardness effect of the polycrystalline TaN/TiN and TaWN/TiN superlattice films[J].Acta Metallurgica Sinica(china).1999,35(11):1214-1218.
    [2]Xu Junhua,Lihua Yu,Kojima I,et al.Thermal stress hardening of α-Si_3N_4/nc-TiN nanostructureed multilayers[J].Applied Physics Letters,2002,81(22):4139-4141.
    [3]Junhua Xu,Effect deposition parameters on composition,structure,density and t opography of CrNx films deposited by r.f magenetron sputtering[J],Applied Su rface Science,2002(201):201-218.
    [4]Fan B W.The Property of CrN Films[J].Thin Solid Films,2000(4):377-378.
    [5]Cunha L,Andritschky M.Multi-arc Ion Planting[J].Thin Solid Films,1999(5):355-356.
    [6]Gunter B,Christoph F,Erhard B.Preparation and Properties of CrN Coating[J].Surface and Coatings Technology,1996(2):84-87.
    [7].Cunha,M.Andritschky,K.Pischow et al.Microstructure of CrN coatings produce by PVD techniques.Thin Solid Films,1999(355/356):465-471.
    [8]韩增虎,戴维嘉.磁控溅射CrN_x薄膜的制备与力学性能.功能材料.2002,33(5):500-502.
    [9]周庆刚,白新德.CrN/Cr镀膜改性的H13钢摩擦学性能.清华大学学报(自然科学版)2003,43(6):762-765.
    [10]Saki Krishnamurthy,Ivar Reimanis.Multiple cracking in CrN and Cr_2N films on brass。Surface and Coatings Technology,2005,(192):291-298.
    [11]Guntere B,Christoph F,Erhard B,et al.Delopoment of chromium nitride coatings substituting titanium nitride.Surface and coatings Technology.1996(86/87):184-191.
    [12]刘晓红,陈志勇,邓山江.气相沉积技术的现状与发展,2006,16:26
    [13]扬烈宇,关文锋,顾卓明。材料表面薄膜技术。北京:人民交通出版社,1991
    [14]顾培夫.薄膜技术。浙江大学出版社。1990,61
    [15]郑伟涛.薄膜材料与薄膜技术.北京:化学工业出版社.2004,12-13.
    [16]唐伟忠,薄膜材料制备原理,技术及应用。北京:冶金工业出版社,1998
    [17]Martin P J,Bendavid A.Surf Coat Tech.2002(163/164):245-250.
    [18]郑伟涛.薄膜材与薄膜技术.北京:化学工业出版社.2004:100-101.
    [19]Sathrum P,Coll B F.Plasma and deposition enhancement by modified arc evaporation source[J].Surface and Coating Technology,1992(50):103-109
    [20]Vetter J.Vacuum arc coating for tools:potential and application[J].surf Coat Technol,1995(76/77):719-724.
    [21]CUNHA L,ANDR ITSCHKYM,PISCHOW K.et al Microstructure of CrN coatings produced by PVD techniques[J].Thin Solid Films.1999,(355/356):465-471.
    [22]NAV NSEK B,PANIAN P,CVELBAR A.Characterization of low temperature CrN and TiN(PVD) hard coatings[J].Surface and Coatings Technology,1995,74(1-3,part1):155-161.
    [23]HOY R,SLOOF W G,JANSSEN G C A M.Hard dence CrN_X coatings on three-dimensional objects[J].Surface and coating Technology,2004,179(2-3):215-222
    [24]PDTO,GAUTIER C,MACHET J.Comparative study of CrN coatings deposited by ion plating and vacuum arc evaporation influence of the nature and the energy of the layer-forming species on the structure and mechanical properties[J].Surface and caotings Technology.1997,94-95(1-3):409-415
    [25]GAUTIER C,MOUSSAOU I H,ELSINER F.Comparative study of mechanical and structure properties of CrN films deposited by d c magnetron sputtering and vacuum arc evaporation[J].Surfce and coatings technology.1996,86-87(1-3,part1):254-262
    [26]NAV NSEKB,PANJAN P.Oxidation of CrN_x hard coatings reactively sputtered at low temperature[J].Thin Solid Films,1993,223(1):4-6
    [27]SU Y L,YAO S H,WU C T.Comparisons of characterization and tribological performance of TiN and CrN deposited by cathodic arc plasma deposition pro cess[J],Wear,1996,199(1):132-141
    [28]莫继良,朱吴,安剑等.物理气相沉积CrN涂层的研究进展[J].中国表面工程,2006,19(4-Ⅱ):71-75
    [29]薛群基 润滑材料科学研究的发展趋势。1991年兰州空间机械学术报告会议论文集,兰州,1991,183-187
    [30]黄鹤,王学刚,朱晓东,陈华,何家文.离子束辅助磁控溅射沉积TiN薄膜的研究[J].稀有金属材料与工程,2002,(3):205-208.
    [31]俞春福,徐久军,王亮,徐晓磊,黑祖昆.TiN薄膜腐蚀过程中的电化学原子力显微镜原位研究[J],材料保护,2001,(12):14-15.
    [32]马胜利,李雁淮,余可为.脉冲电压幅值对等离子体化学气相沉积TiN薄膜膜基结合行为的影响[J].金属学报,2000,(1):77-80.
    [33]王宇,张丽娜,陈忠财,李振香,胡慧娟,杨剑光,王敬义.反应磁控溅射制备 TiN薄膜的生长速率模型研究[J].微精细加工,1997,(1):47-52.
    [34]唐壁玉,九成,李绍绿.CVD金刚石薄膜的应力研究[J].高压物理学报,1997,11(1):56-60.
    [35]ZAB IN SK I J S,VO EVOD IN A A.Recent development of design of de position and processing of hard coatings[J].J Vac Sci Technol:A,1998,16(3):1890
    [36]Holl L,Ojha S M.Thin Solid Films,1979,58:107-112.
    [37]J P Zhao,X Wang,Z Y Cheno Overall energy model for prefered growth of TiN films during filtered arc deposition[J]。J Phys D:Appl Phys,1997,30:5-12。
    [38]宫秀敏,孙伟,叶卫平。TiN多弧离子镀过渡层的组成及其对涂层结合力的影响。化工及表面处理,2000(9):35-37
    [39]Bertrand G,Mahdjoub H,Meunijer C.A study of the corrosion behaviour and protective quality of sputteredchromium nitride coatings[J].Surf.Coat.T echnol,2000,126:199-209.
    [40]田民波,刘德令.薄膜科学与技术手册[M].北京:机械工业出版社,1991.
    [41]L.Cunha,M.Andritschky,K.Pischow et al.Microstructure of CrN coatings produce by PVD techniques.Thin Solid Films.1999(355/356):465-471.
    [42]韩增虎,戴嘉维.磁控溅射CrN_x薄膜的制备与力学性能.功能材料.2002,(33):762-765
    [43]Saki Krishnamurthy,Ivar Reimanis.Multiple cracking in CrN and C_2N films on brass.Surface and coating Technology.2005(192):291-298
    [44]Guntere B,Christoph F,Erhard B,et al.Development of chromium nitride coatings substituting titanium nitride.Surface and Coatings Technology.1996(86/87):184-191
    [45]李光,孙跃,夏立芳,马欣新.类金刚石碳膜的摩擦学性能及摩擦机制.金属热处理.2001(26):1-4.
    [46]Liu Y,Erdemir A,Meletis EI.An investigation of relationship between graphi tization and frictional behavior of DLC coating[J].Surf coat Technol.1996(86-87):564.
    [47]关世瑛.TiN薄膜对碳钢和铬钢耐磨性影响的研究.哈尔滨理工大学学报.2002(8):87-89.
    [48]邱万奇,刘正义.电弧离子镀TiN薄膜中的缺陷极其形成原因.中国表面工程.2006,19(1):43-46.
    [49]张俊彦.薄膜/涂层的摩擦学设计极其研究进展.摩擦学学报.2006(26):387-396.
    [50]沟引宁,孙鸿,黄楠,张文英,冷永祥.磁过滤真空弧源沉积技术制备C/C多层类金刚石及其摩擦磨损性能研究.摩擦学学报.2006(2):121-124.
    [51]韩修训,阎鹏勋,阎逢元,刘伟民等.两种物理气相沉积氮化钛涂层的结构及摩擦性能研究[J].摩擦学学报.2002(22):175-178.
    [52]J Xu.K Kato.Formation of tribochemical layer of ceramics sliding in water and its role for low friction[J].Wear.2000(245):61-75.
    [53]徐轶.磁控溅射和离子镀TiAlN涂层的往复滑动摩擦学行为研究[M].博士学位论文.2006.
    [54]高玉周,张会臣,王亮.物理气相沉积疲劳磨损形貌的AFM观测[J].润滑与密封.2006(179):68-70.
    [55]Y.L.Su,S.H.Yao,Z.L.Leu,C.S.Wei,C.T.Wu.Comparison of tribological behavior of three films-TiN,TiCN and CrNx-grown by physical vapor deposition[J].wear.1997(213):165-174.
    [56]Y.L.Su,S.H.Yao,C.T.Wu.Comparisons of characterizations and tribological performance of TiN and CrN_X deposited by cathodic arc plasma deposition process[J].wear.1996(199):132-141.
    [57]Fei zhou.Kangmin Chen.Meiling Wang.et al.Friction and wear properties of CrN coating sliding against SigN4 balls in water and air.Wear.2008(265):1029-1037.
    [58]J Xu.K Kato.Formation of tribochemical layer of ceramics sliding in water and its role for low friction.Wear.2000(245):61-75.
    [59]杜军,田林海.IBAD制备非晶碳膜与CrN_x镀层的耐磨性能比较及机理分析.真空科学与技术学报.2006(26):255-258.
    [60]Y.L.Su,S.H.Yao,Z.L.Leu,C.S.Wei,C.T.Wu.Comparison of tribological behavior of three films-TiN,TiCN andCrNx-grown by physical vapor deposition.Wear.1997(213):165-174.
    [61]Y.L.Su,S.H.Yao,C.T.Wu.Comparisons of characterizations and tribological performance of TiN and CrN_X deposited by cathodic arc plasma deposition process.Wear.1996(199):132-141.
    [62]钟彬,苟伟,李国卿,胡远荣.氮气含量对CrN薄膜相结构及摩擦磨损性能的影响.材料热处理学报.2007(28):134-138.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700