基于DSP的图形发生器系统的曝光软件研究
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摘要
本论文主要介绍了图形发生器软件系统中，涉及曝光功能的软件部分的研究。
论文分析了国内外电子束曝光技术的发展和图形发生器的工作原理。针对现有图形发生器存在的问题，对TI公司的TMS320VC33功能进和系统软件的开发进行分析，将以DSP芯片为核心的新型图形发生器的曝光软件系统分成两部分：上位机与下位机，分别进行开发。
第一部分是上位机——PC机上的系统程序。在借鉴CIF、GDSⅡ等文件格式的基础上，论文首先完成了曝光机系统文件的定义：图形处理格式、曝光文件存储格式和曝光文件发送格式。论文比较和论证了几种计算机接口，最终选择USB2.0作为上位机与下位机之间文件传输接口，并为其编写了驱动程序及能够完成设计功能的简单的客户端程序。
第二部分是下位机——DSP上的单元图形曝光算法。论文在分析前人工作的基础上，提出了新的单元图形生成算法。该方法通过利用DSP出众的计算功能，将各种图形的计算尽可能转化为加、减、乘法，在经过修正设计后可以做出令人满意的图形。这种算法应用于以DSP芯片为基础的电子束曝光机图形发生器，简化了数据处理过程并提高了图形绘制速度和图形精度，具有不输于Bresenham算法的效率。
本论文从图形发生器的软件部分入手，研究了图形发生器的结构和工作原理。系统的曝光控制程序和单元图形生成算法的研究和实现是本论文的核心内容。
In this thesis, the software in terms of exposure is mainly discussed with the whole software
system presented.
This paper introduces the development of electron beam lithography around the world and
basic fundamentals of pattern generator. Further analysis and research to both TI's
TMS320VC33 DSP chip and development of software is given according to the existing
problem of pattern generator. Besides that, the software system in the novel type of pattern
generator which use DSP chip as CPU is divided into two parts to study: the upper and the
lower.
The first part is the software locating on the upper, the PC. The paper finished the definition
of the files, PPF, EDF and the format of data transmitted, based on the formats of CIF, GDSII
etc. After comparison with several other interfaces, the USB2.0 is chosen as the one for the
upper and the lower and proved that it worked well with the system driver and the program
fulfilled the basic function.
The second part is the algorithm of cells locating on the DSP, the lower. The new algorithm is
proposed based on the study of formers' work. The algorithm is realized by trying to turn the
operations into plus, minus and multiplication and amending in someway. The result proved
to be satisfied. This algorithm not only fits the performance of hardware such as DSP chips
but improves the generation speed and precision of primitives as well with the efficiency
comparable with Bresenham.
This thesis focuses on the software part of pattern generator and analyses its structures and fundamentals. And the research of the exposure control program and the algorithm of cells are the core part of this thesis.
论文分析了国内外电子束曝光技术的发展和图形发生器的工作原理。针对现有图形发生器存在的问题，对TI公司的TMS320VC33功能进和系统软件的开发进行分析，将以DSP芯片为核心的新型图形发生器的曝光软件系统分成两部分：上位机与下位机，分别进行开发。
第一部分是上位机——PC机上的系统程序。在借鉴CIF、GDSⅡ等文件格式的基础上，论文首先完成了曝光机系统文件的定义：图形处理格式、曝光文件存储格式和曝光文件发送格式。论文比较和论证了几种计算机接口，最终选择USB2.0作为上位机与下位机之间文件传输接口，并为其编写了驱动程序及能够完成设计功能的简单的客户端程序。
第二部分是下位机——DSP上的单元图形曝光算法。论文在分析前人工作的基础上，提出了新的单元图形生成算法。该方法通过利用DSP出众的计算功能，将各种图形的计算尽可能转化为加、减、乘法，在经过修正设计后可以做出令人满意的图形。这种算法应用于以DSP芯片为基础的电子束曝光机图形发生器，简化了数据处理过程并提高了图形绘制速度和图形精度，具有不输于Bresenham算法的效率。
本论文从图形发生器的软件部分入手，研究了图形发生器的结构和工作原理。系统的曝光控制程序和单元图形生成算法的研究和实现是本论文的核心内容。
In this thesis, the software in terms of exposure is mainly discussed with the whole software
system presented.
This paper introduces the development of electron beam lithography around the world and
basic fundamentals of pattern generator. Further analysis and research to both TI's
TMS320VC33 DSP chip and development of software is given according to the existing
problem of pattern generator. Besides that, the software system in the novel type of pattern
generator which use DSP chip as CPU is divided into two parts to study: the upper and the
lower.
The first part is the software locating on the upper, the PC. The paper finished the definition
of the files, PPF, EDF and the format of data transmitted, based on the formats of CIF, GDSII
etc. After comparison with several other interfaces, the USB2.0 is chosen as the one for the
upper and the lower and proved that it worked well with the system driver and the program
fulfilled the basic function.
The second part is the algorithm of cells locating on the DSP, the lower. The new algorithm is
proposed based on the study of formers' work. The algorithm is realized by trying to turn the
operations into plus, minus and multiplication and amending in someway. The result proved
to be satisfied. This algorithm not only fits the performance of hardware such as DSP chips
but improves the generation speed and precision of primitives as well with the efficiency
comparable with Bresenham.
This thesis focuses on the software part of pattern generator and analyses its structures and fundamentals. And the research of the exposure control program and the algorithm of cells are the core part of this thesis.
引文
【1】Overney, NanoScience and Nanotechnology, university of Washington
【2】纳米科技现在与未来，白春礼，四川教育出版社，2001年7月
【3】Y.J. Chan, C.K. Lin, H.C. Chiu and S.C. Yang, Nano Lithography and Etching Technologies, Department of Electrical Engineering, National Central University
【4】David J. Grant, Electron-Beam Lithography: From Past to Present, Department of Electrical & Computer Engineering, University of Waterloo, 2003.8
【5】C. M. Park, B. H. Choi and C. K. Hyon, Nano Mold Lithography for 40-nm Patterns, School of Electrical Engineering, Korea University, 2001.8
【6】F. Romanato, E. Di Fabrizio, M. Galli, X-RAY AND e-BEAM LITHOGRAPHY OF THREE DIMENSIONAL ARRAY STRUCTURES FOR PHOTONICS
【7】吴克华，电子束曝光技术，宇航出版社，1985年6月
【8】P. Seidel, J. Canning, S. Mackay, W. Trybula, Sematech, Austin, Next Generation Advanced Lithography, TX, USA
【9】Fabrication of nanoscale structures,2001.9
【10】Eric H. Anderson, Volker Boegli, and Lawrence P. Muray, Electron beam lithography digital pattern generator and electronics for generalized curvilinear structure, J. Vac. Sci. Technol. B13(6), Nov/Dec 1995
【11】User Manual, RAITH Lithography Systems
【12】Joe Nabity, JC Nabity Lithography Systems, NPGS Nanometer Pattern Generation System, JC Nabity Listhography Systems
【13】Handbook of microlithography, micromachining and microfabrication, volume 1: microlithography, editor P.RAI-CHOUDHURY
【14】蒋欣荣，微细加工技术，北京，电子工业出版社，1990
【15】JEOL51 FORMAT MANUAL, JEOL
【16】Mark A. McCord, Michael J. Rooks, Electron Beam Lithography, handbook of microlithography, micromachining, and microfabrication
【17】张弘，USB接口设计，西安电子科技大学出版社，2003年1月
【18】Philips Semiconductors, ISP1581, USB 2.0 HS interface device,2002
【19】ATMEL, 8-bit Microcontroller with 8K Bytes Flash AT89C52, 1999
【20】Walter Oney, programming the Microsoft Windows Driver Model, Microsoft Press, 1999
【21】Jan Axelson等，USB大全，中国电力出版社，2001
【22】Chris Cant等，Windows WDM设备驱动程序开发指南，机械工业出版社，2000
【23】张念淮 江浩，USB总线接口开发指南，国防工业出版社，2002
【24】周立功，PDIUSBD12 USB固件编程与驱动开发，北京航空航天大学出版社，2003
【25】孙家广，杨长贵．计算机图形学．北京：清华大学出版社，1995
【26】应道宁，吴中奇，王尔健，计算机绘图，杭州：浙江大学出版社，1991．4
【27】商涛，以DSP处理器为核心的图形发生器单元图形算法研究，中国科学院电工研究所，2003．6
【28】美国德州仪器公司．TMS320C32x User's Guide．美国：德州仪器公司，1997
【29】北京瑞泰创新公司，ICETEK-VC33-C板
【30】美国德州仪器公司．TMS320C3x/C4x Optimizing C Compiler User's Guide．美国：德州仪器公司，1997
【31】美国德州仪器公司．Code Composer User's Guide．美国：德州仪器公司，1997
【32】美国德州仪器公司．TMS320C3x/C4x Assembly Language Tools User's Guide．美国：德州仪器公司，1997
【33】美国德州仪器公司．TMS320VC33 Data Sheet．美国：德州仪器公司，1997
【34】陈天麒，C／C++语言硬件程序设计——基于TMS320C5000系列DSP，西安电子科技大学出版社，2003．5
【2】纳米科技现在与未来，白春礼，四川教育出版社，2001年7月
【3】Y.J. Chan, C.K. Lin, H.C. Chiu and S.C. Yang, Nano Lithography and Etching Technologies, Department of Electrical Engineering, National Central University
【4】David J. Grant, Electron-Beam Lithography: From Past to Present, Department of Electrical & Computer Engineering, University of Waterloo, 2003.8
【5】C. M. Park, B. H. Choi and C. K. Hyon, Nano Mold Lithography for 40-nm Patterns, School of Electrical Engineering, Korea University, 2001.8
【6】F. Romanato, E. Di Fabrizio, M. Galli, X-RAY AND e-BEAM LITHOGRAPHY OF THREE DIMENSIONAL ARRAY STRUCTURES FOR PHOTONICS
【7】吴克华，电子束曝光技术，宇航出版社，1985年6月
【8】P. Seidel, J. Canning, S. Mackay, W. Trybula, Sematech, Austin, Next Generation Advanced Lithography, TX, USA
【9】Fabrication of nanoscale structures,2001.9
【10】Eric H. Anderson, Volker Boegli, and Lawrence P. Muray, Electron beam lithography digital pattern generator and electronics for generalized curvilinear structure, J. Vac. Sci. Technol. B13(6), Nov/Dec 1995
【11】User Manual, RAITH Lithography Systems
【12】Joe Nabity, JC Nabity Lithography Systems, NPGS Nanometer Pattern Generation System, JC Nabity Listhography Systems
【13】Handbook of microlithography, micromachining and microfabrication, volume 1: microlithography, editor P.RAI-CHOUDHURY
【14】蒋欣荣，微细加工技术，北京，电子工业出版社，1990
【15】JEOL51 FORMAT MANUAL, JEOL
【16】Mark A. McCord, Michael J. Rooks, Electron Beam Lithography, handbook of microlithography, micromachining, and microfabrication
【17】张弘，USB接口设计，西安电子科技大学出版社，2003年1月
【18】Philips Semiconductors, ISP1581, USB 2.0 HS interface device,2002
【19】ATMEL, 8-bit Microcontroller with 8K Bytes Flash AT89C52, 1999
【20】Walter Oney, programming the Microsoft Windows Driver Model, Microsoft Press, 1999
【21】Jan Axelson等，USB大全，中国电力出版社，2001
【22】Chris Cant等，Windows WDM设备驱动程序开发指南，机械工业出版社，2000
【23】张念淮 江浩，USB总线接口开发指南，国防工业出版社，2002
【24】周立功，PDIUSBD12 USB固件编程与驱动开发，北京航空航天大学出版社，2003
【25】孙家广，杨长贵．计算机图形学．北京：清华大学出版社，1995
【26】应道宁，吴中奇，王尔健，计算机绘图，杭州：浙江大学出版社，1991．4
【27】商涛，以DSP处理器为核心的图形发生器单元图形算法研究，中国科学院电工研究所，2003．6
【28】美国德州仪器公司．TMS320C32x User's Guide．美国：德州仪器公司，1997
【29】北京瑞泰创新公司，ICETEK-VC33-C板
【30】美国德州仪器公司．TMS320C3x/C4x Optimizing C Compiler User's Guide．美国：德州仪器公司，1997
【31】美国德州仪器公司．Code Composer User's Guide．美国：德州仪器公司，1997
【32】美国德州仪器公司．TMS320C3x/C4x Assembly Language Tools User's Guide．美国：德州仪器公司，1997
【33】美国德州仪器公司．TMS320VC33 Data Sheet．美国：德州仪器公司，1997
【34】陈天麒，C／C++语言硬件程序设计——基于TMS320C5000系列DSP，西安电子科技大学出版社，2003．5