羟乙基丁硝胺硝酸酯的膜蒸发模拟装置设计及应用研究
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摘要
羟乙基丁硝胺硝酸酯(BuNENA)是一种含能增塑剂,其具有大比容、低爆温、难挥发等优异的性能,广泛的应用于各种发射药配方,因此要求其要有较高的纯度。但传统的后处理方法具有操作时间长、安全性低和不能实现连续化工业生产等缺点。本论文根据BuNENA生产的特点和薄膜蒸发器性能的优点,引入薄膜蒸发器对BuNENA进行后处理。针对BuNENA后处理中的蒸发过程模拟和装置设计及应用,主要研究结果如下：
根据物料特性进行相关安全性分析并编写了旋转薄膜蒸发器结构参数的VB计算程序,并计算出实验室小试蒸发条件下最小蒸发面积为0.0391m2；通过实际蒸发实验与ANSYS CFX模拟传热、传质、流体力学性能得到的数据,修正计算程序并模拟计算中试工艺条件下所需最小蒸发面积为0.1816m2；设计一套中试用旋转薄膜蒸发装置,设备参数为：蒸发面积0.2m2,冷却面积2m2,滚筒式刮板直径20mmm,100-500rpm调速电机,电加热功率12KW,抽气量7L/s的水喷射式真空泵；中试设备进行蒸发实验的最佳操作工艺为：蒸发温度140℃,刮板转速200rpm,进料量80L/h(质量浓度20%的BuNENA溶液),一级自来水、二级低温冷却液冷凝二氯甲烷。经蒸发后能得到含量大于99%的BuNENA,软件的模拟度为90.8%。
旋转薄膜蒸发器后处理BuNENA-二氯甲烷溶液具有处理时间短,加热时间11.6s；最大感度仅为1.6N·m,远小于BuNENA的感度24.5N-m,可实现连续化工业生产。
The 2-(butyl-nitro-amino) ethyl nitrate (BuNENA BuNENA) is a kind of majority specific volume, low detonation temperature, nonvolatile and other excellent performance of the energetic plasticizer, which is widely used in various propellant formulations. Therefore it was required a high purity. However, there are many shortcomings in the conventional post-processing procedure, including long treatment time, low security degree and impossibility of continuous industrial production. According the characteristics of product BuNENA and the preformance advantages of thin-film evaporator, the thin-film evaporator was introduced into the BuNENA post-processing procedure, the evaporation process has been simulated and a new evaporator has been designed according to the simulation in this paper. There are main contents as follows:
The security analysis of the process was conducted according to the materials characteristics, and the VB calculating program for structure parameters of thin-film evaporator has been developed. And we calculate the minimum evaporation area that is in the evaporation laboratory test conditions is 0.0381m2. The program was revised according to the experimental data of evaporation and the heat and mass transfer, fluid dynamics data obtained via ANSYS CFX simulation, and the minimum evaporation area, which is 0.1816 m2, was recalculated under the pilot test conditions by the revision program. A thin-film evaporator for pilot test was designed. The device parameters are as follows:the evaporation area is 0.2m2, the cooling area is 2m2, scraper diameter is 20mm, scraper speed is 100-500 rpm, electric heating power is 12 KW, the water-jet vacuum pump exhaust volume is 7 L/s. The optimum process parameters used in pilot test are as follows:the evaporation temperature is 140℃, the scraper speed is 200rpm, fluxes 80L/h (20% concentration of BuNENA solution), dichloromethane was cooled by water and low-temperature coolant. The purity of the BuNENA could be up to 99%, and the program simulation degree is 90.8%.
Shortor processing time which is just 11.6s; maximum sensitivity is 1.6Nm (BuNENA the sensitivity is 24.5Nm) were showed during the post-processing procedure by using thin-film evaporator treatment BuNENA-dichloromethane solution. And it makes the continuous industrial manufacturing possible.
根据物料特性进行相关安全性分析并编写了旋转薄膜蒸发器结构参数的VB计算程序,并计算出实验室小试蒸发条件下最小蒸发面积为0.0391m2；通过实际蒸发实验与ANSYS CFX模拟传热、传质、流体力学性能得到的数据,修正计算程序并模拟计算中试工艺条件下所需最小蒸发面积为0.1816m2；设计一套中试用旋转薄膜蒸发装置,设备参数为：蒸发面积0.2m2,冷却面积2m2,滚筒式刮板直径20mmm,100-500rpm调速电机,电加热功率12KW,抽气量7L/s的水喷射式真空泵；中试设备进行蒸发实验的最佳操作工艺为：蒸发温度140℃,刮板转速200rpm,进料量80L/h(质量浓度20%的BuNENA溶液),一级自来水、二级低温冷却液冷凝二氯甲烷。经蒸发后能得到含量大于99%的BuNENA,软件的模拟度为90.8%。
旋转薄膜蒸发器后处理BuNENA-二氯甲烷溶液具有处理时间短,加热时间11.6s；最大感度仅为1.6N·m,远小于BuNENA的感度24.5N-m,可实现连续化工业生产。
The 2-(butyl-nitro-amino) ethyl nitrate (BuNENA BuNENA) is a kind of majority specific volume, low detonation temperature, nonvolatile and other excellent performance of the energetic plasticizer, which is widely used in various propellant formulations. Therefore it was required a high purity. However, there are many shortcomings in the conventional post-processing procedure, including long treatment time, low security degree and impossibility of continuous industrial production. According the characteristics of product BuNENA and the preformance advantages of thin-film evaporator, the thin-film evaporator was introduced into the BuNENA post-processing procedure, the evaporation process has been simulated and a new evaporator has been designed according to the simulation in this paper. There are main contents as follows:
The security analysis of the process was conducted according to the materials characteristics, and the VB calculating program for structure parameters of thin-film evaporator has been developed. And we calculate the minimum evaporation area that is in the evaporation laboratory test conditions is 0.0381m2. The program was revised according to the experimental data of evaporation and the heat and mass transfer, fluid dynamics data obtained via ANSYS CFX simulation, and the minimum evaporation area, which is 0.1816 m2, was recalculated under the pilot test conditions by the revision program. A thin-film evaporator for pilot test was designed. The device parameters are as follows:the evaporation area is 0.2m2, the cooling area is 2m2, scraper diameter is 20mm, scraper speed is 100-500 rpm, electric heating power is 12 KW, the water-jet vacuum pump exhaust volume is 7 L/s. The optimum process parameters used in pilot test are as follows:the evaporation temperature is 140℃, the scraper speed is 200rpm, fluxes 80L/h (20% concentration of BuNENA solution), dichloromethane was cooled by water and low-temperature coolant. The purity of the BuNENA could be up to 99%, and the program simulation degree is 90.8%.
Shortor processing time which is just 11.6s; maximum sensitivity is 1.6Nm (BuNENA the sensitivity is 24.5Nm) were showed during the post-processing procedure by using thin-film evaporator treatment BuNENA-dichloromethane solution. And it makes the continuous industrial manufacturing possible.
引文
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