超光滑表面X射线散射特性研究
|
摘要
软X射线-极紫外波段复合型望远镜是空间天气预报以及科学研究的重要仪器。本文围绕Wolter I型掠入射X射线望远镜系统，对望远镜反射镜镜面薄膜密度测定、超光滑表面粗糙度测量、表面异常散射现象进行了研究，为后续工程立项奠定基础。
1．研究了畸变波玻恩近似理论及微扰理论，给出了能够从散射分布直接测得表面功率谱函数的一级矢量微扰公式。讨论了一级矢量微扰理论的适用性：测量散射分布时所采用的掠入射角和散射角不能太大，对应不同材料、表面均方根粗糙度σ不应超过1-2.5nm。
2．首先介绍了X射线散射分布测量装置。用电子束蒸发法镀制了金薄膜和镍薄膜，用磁控溅射法镀制了钼薄膜，用原子层沉积法沉积了A_2O_3薄膜。应用修正的布拉格方程计算了A_2O_3薄膜厚度，结果表明，原子层沉积薄膜的均匀性、厚度可控性好。最后，利用X射线表面散射特性、给出了一种由X射线反射率曲线精确测量薄膜密度的方法(XRR_(DEN))，并对金、镍、钼和A_2O_3薄膜分别进行了测量。为利用X射线散射法准确测量薄膜表面功率谱函数打下基础。
3．针对所用的X射线散射测量装置，分析了接收狭缝宽度、入射光束宽度和系统校正误差对测量结果的影响，根据分析结果确定实验参数。测量光学表面及薄膜样品的X射线散射分布，用一级矢量微扰法计算超光滑表面一维功率谱密度(PSD)函数和有效均方根粗糙度，测量结果与原子力显微镜(AFM)所测结果吻合。结果表明，应用一级矢量微扰法可以测量超光滑表面粗糙度。特别地，对于薄膜样品根据XRR_(DEN)法实测密度值计算光学常数，可以提高一级矢量微扰法的测量精度。
4．在掠入射散射法测量超光滑表面和薄膜表面粗糙度的实验过程中,发现存在异常散射现象。波长一定时，表面异常散射的位置与样品的材料有关、与掠入射角和表面粗糙度无关，且总在略小于临界角处，与实测临界角的误差在-8%至-0.3%之间，异常散射随着掠入射角和表面粗糙度的增大更加显著。分析了异常散射产生的原因，分析结果与实验结果一致，为进一步研究异常散射对掠入射系统成像质量的影响奠定基础。
The complex space soft X-ray and EUV telescope is mainly applied to the spatialenvironment monitoring and scientific studies for the solar and other celestialactivities. According to the Wolter-I type mirror adopted in this system, thin filmdensity measurement, surface roughness measurement of supersmooth surface andanomalous surface scattering (ASS) phenomenon are studied in detail.
1．Distorted wave Born approximation (DWBA) theory and perturbation theory(PT) have been introduced. Furthermore, first order perturbation theory (FOPT)formulas have been deduced to extract power spectral density (PSD) functions of thesurface roughness directly from the measured scattering distribution. At last, theconditions of applicability of FOPT have been discussed. The measurement of thescattering diagram should be carried out at not too large incidence angle andscattering angle. And the RMS roughnessσ does not exceed1-2.5nm, the largervalue corresponding to the case of light materials.
2． Firstly, the X-ray scatting distribution measurement facility has beenintroduced. Secondly, Au thin film and Ni thin film have been evaporated by electronbeam coater, Mo thin film has been sputtered by magnetron sputtering coatingmachine, and A_2O_3thin films have been deposited by Atomic layer deposition (ALD).Thirdly, thin film thickness has been calculated according to the modified Braggequation, which indicates that ALD is a thin film coating method with high uniformityand thickness controllability. Lastly, a simple method to evaluate thin film massdensity accurately from the X-ray reflectivity distribution has been given, whichnamed XRR_(DEN)method. According to the measured mass density, optical constant of thin film could be calculated. This is very important for evaluating the surfaceroughness PSD function of thin film sample from X-ray scattering distribution.
3．The instrument was determined according to the analysis of the factors causingsystematic errors on the PSD function measurement. These factors include the effectsof the finite width of the detector slit, the width of the primary beam and the systemalignment error etc. Then the scattering indicatrix for different optical surfaces andthin film samples were measured, and one-dimensional PSD functions and effectiveRMS roughness were calculated by FOPT. Which coincide well with themeasurements of atomic force microscopy(AFM)。The results demonstrated thatFOPT is validity for measuring the surface roughness of supersmooth surface.Specifically, calculating optical constants from the experimentally measured massdensities by XRR_(DEN)of the studied thin film samples could improve the measurementaccuracy.
4．There presents an anomalous surface scattering (ASS) phenomenon during themeasurement of surface roughness of smooth surface. Experimental results indicatethat the anomalous scattering angle is various with the kind of materials used undercertain incidence wavelength and change slightly with the glancing angle and RMSsurface roughness. Moreover, all the measured anomalous scattering angles areslightly smaller than the critical angle values, and the measurement errors range from-8%to-0.3%。On the other hand, the anomalous surface scattering phenomenon ismore obviously as the increasing of grazing incidence angle and surface roughness.The reasons of anomalous surface scattering occurring have been analyzed. This is afoundation of future study about the anomalous surface scattering affect on the imagequality of grazing incidence image system.
1．研究了畸变波玻恩近似理论及微扰理论，给出了能够从散射分布直接测得表面功率谱函数的一级矢量微扰公式。讨论了一级矢量微扰理论的适用性：测量散射分布时所采用的掠入射角和散射角不能太大，对应不同材料、表面均方根粗糙度σ不应超过1-2.5nm。
2．首先介绍了X射线散射分布测量装置。用电子束蒸发法镀制了金薄膜和镍薄膜，用磁控溅射法镀制了钼薄膜，用原子层沉积法沉积了A_2O_3薄膜。应用修正的布拉格方程计算了A_2O_3薄膜厚度，结果表明，原子层沉积薄膜的均匀性、厚度可控性好。最后，利用X射线表面散射特性、给出了一种由X射线反射率曲线精确测量薄膜密度的方法(XRR_(DEN))，并对金、镍、钼和A_2O_3薄膜分别进行了测量。为利用X射线散射法准确测量薄膜表面功率谱函数打下基础。
3．针对所用的X射线散射测量装置，分析了接收狭缝宽度、入射光束宽度和系统校正误差对测量结果的影响，根据分析结果确定实验参数。测量光学表面及薄膜样品的X射线散射分布，用一级矢量微扰法计算超光滑表面一维功率谱密度(PSD)函数和有效均方根粗糙度，测量结果与原子力显微镜(AFM)所测结果吻合。结果表明，应用一级矢量微扰法可以测量超光滑表面粗糙度。特别地，对于薄膜样品根据XRR_(DEN)法实测密度值计算光学常数，可以提高一级矢量微扰法的测量精度。
4．在掠入射散射法测量超光滑表面和薄膜表面粗糙度的实验过程中,发现存在异常散射现象。波长一定时，表面异常散射的位置与样品的材料有关、与掠入射角和表面粗糙度无关，且总在略小于临界角处，与实测临界角的误差在-8%至-0.3%之间，异常散射随着掠入射角和表面粗糙度的增大更加显著。分析了异常散射产生的原因，分析结果与实验结果一致，为进一步研究异常散射对掠入射系统成像质量的影响奠定基础。
The complex space soft X-ray and EUV telescope is mainly applied to the spatialenvironment monitoring and scientific studies for the solar and other celestialactivities. According to the Wolter-I type mirror adopted in this system, thin filmdensity measurement, surface roughness measurement of supersmooth surface andanomalous surface scattering (ASS) phenomenon are studied in detail.
1．Distorted wave Born approximation (DWBA) theory and perturbation theory(PT) have been introduced. Furthermore, first order perturbation theory (FOPT)formulas have been deduced to extract power spectral density (PSD) functions of thesurface roughness directly from the measured scattering distribution. At last, theconditions of applicability of FOPT have been discussed. The measurement of thescattering diagram should be carried out at not too large incidence angle andscattering angle. And the RMS roughnessσ does not exceed1-2.5nm, the largervalue corresponding to the case of light materials.
2． Firstly, the X-ray scatting distribution measurement facility has beenintroduced. Secondly, Au thin film and Ni thin film have been evaporated by electronbeam coater, Mo thin film has been sputtered by magnetron sputtering coatingmachine, and A_2O_3thin films have been deposited by Atomic layer deposition (ALD).Thirdly, thin film thickness has been calculated according to the modified Braggequation, which indicates that ALD is a thin film coating method with high uniformityand thickness controllability. Lastly, a simple method to evaluate thin film massdensity accurately from the X-ray reflectivity distribution has been given, whichnamed XRR_(DEN)method. According to the measured mass density, optical constant of thin film could be calculated. This is very important for evaluating the surfaceroughness PSD function of thin film sample from X-ray scattering distribution.
3．The instrument was determined according to the analysis of the factors causingsystematic errors on the PSD function measurement. These factors include the effectsof the finite width of the detector slit, the width of the primary beam and the systemalignment error etc. Then the scattering indicatrix for different optical surfaces andthin film samples were measured, and one-dimensional PSD functions and effectiveRMS roughness were calculated by FOPT. Which coincide well with themeasurements of atomic force microscopy(AFM)。The results demonstrated thatFOPT is validity for measuring the surface roughness of supersmooth surface.Specifically, calculating optical constants from the experimentally measured massdensities by XRR_(DEN)of the studied thin film samples could improve the measurementaccuracy.
4．There presents an anomalous surface scattering (ASS) phenomenon during themeasurement of surface roughness of smooth surface. Experimental results indicatethat the anomalous scattering angle is various with the kind of materials used undercertain incidence wavelength and change slightly with the glancing angle and RMSsurface roughness. Moreover, all the measured anomalous scattering angles areslightly smaller than the critical angle values, and the measurement errors range from-8%to-0.3%。On the other hand, the anomalous surface scattering phenomenon ismore obviously as the increasing of grazing incidence angle and surface roughness.The reasons of anomalous surface scattering occurring have been analyzed. This is afoundation of future study about the anomalous surface scattering affect on the imagequality of grazing incidence image system.
引文
[1] Baker D N． Effects of the Sun on the Earth’s environment[J]，Atmos Solar-TerrPhys，2000，62：1669-1681
[2] Baker D N． What is space weather[J]．Adv Space Res，1998，22：7-16
[3]王赤．空间物理和空间天气探测与研究[J]，中国工程科学，2008，10(6)：41-45
[4]李保权，朱光武，王世金等．太阳X-EUV成像望远镜[J]，地球物理学报，2005，48(2)：235-242
[5]李保权，朱光武，林华安等．天基X射线掠入射式成像望远镜发展现状[J]．空间科学学报，2004，24(4)：302-311
[6]曹志宇，陆国平，李保全．空间太阳X射线成像望远镜技术[J]．上海航天，2004，2：40-44
[7] Tang Y H， Sakurai T． The activation characteristics of a disappearingfilament[C]． Proceedings of the Third SOLTIP Symposium． Bering：International Academic Press．1998：4-53
[8] Canfield R C，Hudson H S，Mckenzie D E． Sigmoidal morphology anderuptive solar activity [J]．Geophys Res Lett，1999，26(6)：627-630
[9] Alphonse C S．Sigmoid CME source at the Sun：Some recent results [J]．J AtmosSolar-Terr Phys，2000，62：1427-143
[10]http://zh.wikipedia.org/wiki/%E6%97%A5%E5%86%95%E7%89%A9%E8%B4%A8%E6%8A%9B%E5%B0%84
[11] http://baike.baidu.com/view/1191722.htm
[12] Hudson H S，Lemen J R，St Cyr O C，et a1．X-ray coronal changes during haloCMEs[J]．Geophysical Research Letters，1998，25：2481-2484
[13]http://zh.wikipedia.org/zh/%E6%97%A5%E5%86%95
[14]D．阿特伍德著张杰等译．软X射线与极紫外辐射的原理和应用[M]．北京：科学出版社，2003：60-62
[15]Kirkpatrick P，Baez A V． Formation of optical images by X-rays[J]．J Opt SocAm，1948，38：766-773
[16]http://bzhang.lamost.org/website/index.php?p=335
[17]http://zh.wikipedia.org/wiki/%E6%8E%A0%E5%B0%84%E6%9C%9B%E8%BF%9C%E9%95%9C
[18]Aschenbach Bernd. Realization of X-ray telescopes-from design toperformance[J]．Exp Astron，2009，26：95-109
[19] Giacconi R．Grazing incidence telescopes for X-ray astronomy [J]．Space SciRev，1969，9(1)：3-5
[20] Wolter H．Mirror systems with glancing incidence on imaging producing opticsfor X-ray[J]．Ann Phys，1952，94(10)：866-875
[21]王永刚．Wolter-Ι型反射镜的加工及表面粗糙度检测[D]：[博士学位论文]．长春，长春光学精密机械与物理研究所：2010
[22] Saha T T．Aberrations for grazing incidence telescopes[J]．Appl Opt，1988，27(8)：1492-1498
[23] Mangus J D and Underwood J H．Optical Design of a Glancing IncidenceX-ray Telescope[J]．Appl Opt，1969，8(1)：95-102
[24] Schmidt W H K． A proposed x-ray focusing device with wide field of viewfor use in x-ray astronomy[J]．Nucl Instr Meth，1975，127：285–292
[25] Angel J R P．Lobster eyes as x-ray telescopes[J]．The Astrophysical Journal，1979，233：364-373
[26] Van Speybroeck L P．Einstein observatory/HEAO-B/mirror design andperformance[C]．SPIE，1979，184：2-10
[27] Giacconi R，Branduardi G，Briel U，et al．The Einstein (HEAO-2) X-rayobservatory [J]．Astrophys J，1979，230：540-550
[28] http://heasarc.nasa.gov/docs/einstein/heao2.html
[29] http://heasarc.gsfc.nasa.gov/docs/heasarc/missions/solarmax.html
[30] http://en.wikipedia.org/wiki/Salyut_7
[31] De Korte P A J，Giralt R，Coste J N，et al．EXOSAT x-ray imagingoptics[J]．Appl Opt，20，1981：1080-1088
[32] De Korte P A J，Bleeker J A M，McKechnie S P． The X-ray imagingtelescopes on Exosat[J]．Space Science Reviews，1981，30(1-4)：495-511．
[33] Aschenbach B． Design， construction， and performance of the ROSAThigh-resolution x-ray mirror assembly[J]．Appl Opt，1988，27：1404-1413．
[34] http://baike.baidu.com/view/858834.htm
[35] Tsuneta S，Acton L，Bruner M, et al．The soft X-Ray telescope for the Solar-Amission [J]．Solar Phys，1991，136：37-67
[36] http://space.skyrocket.de/doc_sdat/astro-d.htm
[37] Bornmann P L，Speich D，Hirman J，et a1．The GOES solar X-ray imager：overview and operational goals [C]．SPIE，1996，2812：309-319
[38] Van Speybroeck L P．Grazing incidence optics for the U.S. high-resolutionx-ray astronomy program[J]．Appl Opt，1988，27：1398-1403
[39] Van Speybroeck L P，Jerius D，Edgar R J，et al．Performance expectationversus reality[C]．SPIE Proc．1997，3113：89-104
[40] http://www.nasa.gov/centers/marshall/news/background/facts/cxoquick.html
[41]http://xmm.esac.esa.int/external/xmm_user_support/documentation/technical/Mirrors/index.shtml
[42] Aschenbach B，Briel U G，Haberl F，et al．Imaging performance of theXMM-Newton x-ray telescope[C]．SPIE，2000，4012：731–739
[43]http://zh.wikipedia.org/wiki/XMM-%E7%89%9B%E9%A1%BF%E5%8D%AB%E6%98%9F
[44] Citterio O，Campano S，Conconi P，et al．Characteristics of the flight modeloptics for the JET-X telescope onboard the Spectrum-X-Gammasatellite[C]．SPIE，1996，2805：56-65
[45] Burrows D N，Hill J E，Nousek J A，et al．The Swift x-ray telescope [J]．SpaceSci Rev，2005，120：165-195
[46] Burrows D N，Hill J E，Nousek J A，et al．The Swift X Ray Telescope[C]．AIPConf Proc，2003，662：488-490
[47] Serlemitsos P J，Soong Y，Chan K-W，et al．The X-ray telescope onboardSuzaku[J]．Pub Astron Soc Jap，2007，59：9–21
[48] Golub L，DeLuca E，Austin G，et al．The X-ray Telescope (XRT) for theHinode Mission[J]．Solar Phys，2007，243：63-86
[49]Kano R，Sakao T，Hara H，et al．The Hinode X-Ray Telescope (XRT)：CameraDesign，Performance and Operations[J]，Solar Physics，2008，249(2)：263-279
[50] http://baike.baidu.com/view/1301516.htm
[51]金原粲(日)著，王力衡，郑海涛译．薄膜[M]．北京，电子工业出版社，1988．1-12
[52]刘震，空间极紫外成像仪多层膜反射镜研究[D]：[博士学位论文]．长春：长春光学精密机械与物理研究所，2011
[53] http://baike.baidu.com/view/3033029.htm
[54] Hans-Ulrich Krebs，Martin Weisheit，J rg Faupel，et al．Pulsed laser deposition(PLD)-A Versatile Thin Film Technique[J]．Advances in Solid State Physics，2003，43：101-107
[55] Suntola T，Antson J．US Patent，1977，4058430
[56] Goodman C H L， Pessa M V．Atomic layer epitaxy[J]．J App Phys，1986，60(3)：65-82
[57] Suntola T．Atomic layer epitaxy[J]．Thin Solid Films，1992，216(1)：84-89
[58] Nalwa H S．Deposition and Processing of Thin Films in Handbook of ThinFilm Materials[M]，San Diego：Academic Press，2002：103-159
[59] Ki-Seok An，Wontae Cho，Kiwhan Sung et al．Preparation of Al2O3Thin Filmsby Atomic Layer Deposition Using Dimethylaluminum Isopropoxide and Waterand Their Reaction Mechanisms[J]．Bull Korean Chem Soc，2003，24(11)：1659-1663
[60]Tiilikainen Jouni．Novel genetic fitting algorithms and statistical error analysismethods for x-ray reflectivity analysis[D]．Doctoral Dissertation，Espoo，Finland，Helsinki University of Technology：2008
[61] Kozhevnikov I V， Asadchikov V E． Alaudinov B M et al．， X-rayinvestigations of supersmooth surfaces[C]． SPIE，1995，2453：141-153
[62]崔天刚．Wolter I型反射镜面形检测及成像性能检测研究[D]：[博士学位论文]．长春：长春光学精密机械与物理研究所，2011
[63] Duparre′A，Ferre-Borrull J，Gliech S et al． Surface characterizationtechniques for determining the root-mean-square roughness and power spectraldensities of optical components[J]．Appl Opt，2002，41(1)：154-170
[64] Bennett J M and Dancy J H． Stylus profiling instrument for measuringstatistical properties of smooth optical surfaces[J]，Appl Opt，1981，20：1785-1802
[65] http://baike.baidu.com/view/1380968.htm
[66] Binning G，Quate F，Gerber C．Atomic force microscope[J]．Phys Rev Lett，1986，56(9)：930-933．
[67] http://en.wikipedia.org/wiki/Atomic_force_microscopy
[68]朱杰，孙润广．原子力显微镜的基本原理及其方法学研究[J]．生命科学仪器，2005，3(1)：22-25
[69] Ruppe C，Duparre A．Roughness analysis of optical films and substrates byatomic force microscopy[J]．Thin solid films，1996，288：8-13
[70] Asadchikov V E，Duparré A，Jakobs S，et al．Comparative study of theroughness of optical surfaces and thin films by use of x-ray scattering andatomic force microscopy[J]．Appl Opt，1999，38：684-691
[71] Bawolek E J，Mohr J B，Hirleman E D，et al．Light scatter from polysiliconand aluminum surfaces and comparison with surface-roughness statistics byatomic force microscopy [J]．Appl Opt，1993，32(19)：3377-3400
[72] Wriston R S， Froechtenigt J F． Soft X-ray scattering by opticalsurfaces[J]．Appl Opt，1973，12(1)：25-28
[73]尼启良，陈波．散射法表面粗糙度测量[J]．光学精密工程，2001，9(2)：151-154
[74]陈淑妍，齐立红，陈波．光学散射法表面特征的测量与分析[J]．红外与激光工程，2006，35(1)：82-85
[75] Meng Yanli，Wang Yonggang，Chen Shuyan，et al．Assessment of surfaceroughness by use of soft x-ray scattering [C]．SPIE，2009，7451(16)：1-8
[76] Wang Y G，Meng Y L，Ma W S，et al．Comparative study of X-ray scatteringby first-order perturbation theory and generalized Harvey-Shack theory[C]．SPIE，2009，7448(10)
[77]王永刚，孟艳丽，马文生等．掠入射X射线散射法测量超光滑表面粗糙度[J]，光学精密工程，2010，9(2)：151-154
[78] Davies H．The reflection of electromagnetic waves from a rough surfaces[J]．SPIE，1954，101：208-210
[79] Bennett H E，Porteus J O．Relation between surface roughness and specularreflectance at normal incidence[J]．Opt Soc Am，1961，51：123-129
[80] Kroger E，Kretschmann E．Scattering of light by slightly rough surfaces or thinfilms including plasma resonance emission[J]，Z Physik，1970，237(1):1-15
[81] Elson J M，Bennett H E，Bennett J M．Scattering from optical surfaces[J]．Applied Optics and Optical Engineering，1979，7：191-244
[82] Harvey J E．Light-Scattering charateristics of optical surfaces [D]．Universityof Arizona：1976
[83] Harvey J E．Surface scatter phenomena：a Linear，shift-invariant process[J]．SPIE，1989，1165：87-98
[84] Harvey J E, Moran E C, and Zmek W P. Transfer function characterization ofgrazing incidence optical systems[J]．Appl Opt，1988，27：1527-1533
[85] Harvey J E. Scattering Effects in X-ray Imaging Systems[J]．SPIE，1995，2515:246-272
[86] Thompson P L., Harvey J E. System engineering analysis of aplanatic WoltertypeⅠ X-ray telescopes [J]. Optical Engineering,2000,39:1677-1691.
[87] Werner W．Imaging properties of Wolter type I X-ray teleseope[J]．Appl Opt，1977，16(5)：1036-1042
[88] Alehyane N，Arbaoui M，Barchewitz R，et al．Extreme UV and x-ray scatteringmeasurements from a rough LiF crystal surface characterized by electronmicrography[J]．Appl Opt，1989，28(10)：1763-1772
[89] Spiller E，Stearns D，Krumrey M，et al. Multilayer x-ray mirrors: Interfacialroughness, scattering, and image quality[J]．J Appl Phys，1993，74：107
[90] Vinogradov AV，Artyukov I A，Borisova S S，et al．Investigation ofsuperpolished surfaces by x-ray scattering[C]．SPIE，1989，1140：490-500
[91] Alaudinov B M，Asadchikova V E，Artyukov I A，et al．An optical model ofa surface in the x-ray range[J]．Crystallography Reports，1994，39(4)：540-550
[92] Artyukov I A， Asadchikova V E and Kozhevnikov I V． Effects of anear-surface transition layer on x-ray reflection and scattering[J]．J X-Ray SciTechnol，1996，6(3)：223-243
[93] Kozhevnikov I V and Vinogradov AV．Multilayer X-ray mirrors[J]．J RussianLaser Research，1995，16(4)：343-385
[94] Vinogradov AV，Zorev N N，Kozhevnikov I V，et al．Phenomenon of totalexternal reflection of x rays [J]．Sov Phys JETP，1985，62(6)：1225-1229
[95] Palasantzas G and Krim J．Effect of the form of the height-height correlationfunction on diffuse x-ray scattering from a self-affine surface [J]．Phys Rev B，1993，48：2873-2877
[96] Sinha S K，Sirota E B，Garoff S，et al．X-ray and neutron scattering from roughsurfaces[J]．Phys Rev B，1988，38(4)：2297-2312
[97] Vinogradov AV，Zorev N N， Kozhevnikov I V，et al．X-ray scattering byhighly polished surfaces[J]．Sov Phys JETP，1988，67：1631-1638
[98] Asadchikova V E，Kozhevnikov I V，Krivonosov Y S，et al． Application ofX-ray scattering technique to the study of supersmooth surfaces [J]．NuclearInstruments and Methods in Physics Research A，2004，530：575–595
[99] Asadchikova V E，Bukreeva I N，Duparre A，et al． X-ray study of surfacesand interfaces [J]．SPIE，2001，4449：253-264
[100] Asadchikov V E， Kozhevnikov I V， and Krivonosov Yu S， X-rayInvestigations of Surface Roughnesses[J]．Crystallography Reports，2003，48(5)：835-850
[101] Kozhevnikov I V and Pyatakhin M V．Use of DWBA and perturbation theoryin X-ray control of the surface roughness [J]．Journal of X-ray Science andTechnology．2000，8：253–275
[102] Zanaveskin M L，Grishchenko Y V，Tolstikhina A L，et al． The surfaceroughness investigation by the atomic force microscopy，x-ray scattering andlight scattering [J]．SPIE，2006，6260：62601A1-62601A9
[103] Lodha G S，Koujun Y，Hideyo I K，et al．Effect of surface roughness andsubsurface damage on grazing-incidence x-ray scattering and specularreflectance [J]．Appl Opt，1998，37(22)：5239-5252
[104] Kozhevnikov I V，Asadchikov V E，Bukreeva I V，et al． X-ray study of theroughness of surfaces and interfaces[J]．SPIE，2000，4099：267-278
[105] Asadchikov V E，Karabekov A Yu，Klechkovskaya V V，et al．Experimentalx-ray study of the correlation of the surface profiles of a film and asubstrate[J]． Crystallog Rep，1998，110-120．
[106] Wilk G D，Wallace R M，Anthony J M．High-k gate dielectrics:current statusand material properties considerations[J]．J Appl Phys，2001，89：5243-5275
[107] Careia P F，Mclean R S，Reilly M H，et a1．Ca test of Al2O3gas diffusionbarriers grown by atomic layer deposition on polymers[J]．Appl Phys Lett，2006，89(3)：031915-1–031915-3
[108] Nikolov A，Wang J，Ouyang x，et a1．NanoOpto Corp，Films for optical useand methods of making such films[J]．US Patent．2006：7142375
[109] Groner M D， Fabreguette F H，Elam J W，et al．Low-Temperature Al2O3Atomic Layer Deposition[J]．Chem Mater，2004，16：639-645
[110]张继成，唐永建，吴卫东．X射线反射法测量α：CH薄膜的密度和厚度[J]．强激光与粒子束，2007，19(8)：1317-1320
[111] Paratta L G．Surface studies of solids by total reflection X rays [J]．Phys Rev，1954，95(2)：359-369
[112] Als-Nielsen J， McMorrow D． Elements of Modern X-rayPhysics[M]．Wiley，Chichester，2001：23-24，61-106
[113] Holy V，Pietsch U，Baumbach T．High resolution x-ray scattering from thinfilms and multilayers[M]．Springer in Berlin，New York，1999：130
[114] Jensen J M， Oelkers A B， Toivola R， et al． X-ray reflectivitycharacterization of ZnO/Al2O3multilayers prepared by Atomic LayerDeposition[J]．Chem Mater，2002，14：2276-2282
[115] Azaroff L V， Elements of X-ray Crystallography[M]． New York:McGraw-Hill，1968：Chapter6
[116] Bergese P，Bontempi E，Depero L E．A simple solution to systematic errorsin density determination[J]．Applied Surface Science，2006，253：28-32
[117] http://henke.lbl.gov/optical_constants/
[118] Yoneda Y．Anomalous surface Reflection of X Rays[J]．Physical Review，1963，131：2010-2013
[119] Filatova E O，Blagoveshchenskaya T A．The Yoneda effect in the region ofultrasoft X-ray emission[J]．JETP Lett，1990，52：396-398
[2] Baker D N． What is space weather[J]．Adv Space Res，1998，22：7-16
[3]王赤．空间物理和空间天气探测与研究[J]，中国工程科学，2008，10(6)：41-45
[4]李保权，朱光武，王世金等．太阳X-EUV成像望远镜[J]，地球物理学报，2005，48(2)：235-242
[5]李保权，朱光武，林华安等．天基X射线掠入射式成像望远镜发展现状[J]．空间科学学报，2004，24(4)：302-311
[6]曹志宇，陆国平，李保全．空间太阳X射线成像望远镜技术[J]．上海航天，2004，2：40-44
[7] Tang Y H， Sakurai T． The activation characteristics of a disappearingfilament[C]． Proceedings of the Third SOLTIP Symposium． Bering：International Academic Press．1998：4-53
[8] Canfield R C，Hudson H S，Mckenzie D E． Sigmoidal morphology anderuptive solar activity [J]．Geophys Res Lett，1999，26(6)：627-630
[9] Alphonse C S．Sigmoid CME source at the Sun：Some recent results [J]．J AtmosSolar-Terr Phys，2000，62：1427-143
[10]http://zh.wikipedia.org/wiki/%E6%97%A5%E5%86%95%E7%89%A9%E8%B4%A8%E6%8A%9B%E5%B0%84
[11] http://baike.baidu.com/view/1191722.htm
[12] Hudson H S，Lemen J R，St Cyr O C，et a1．X-ray coronal changes during haloCMEs[J]．Geophysical Research Letters，1998，25：2481-2484
[13]http://zh.wikipedia.org/zh/%E6%97%A5%E5%86%95
[14]D．阿特伍德著张杰等译．软X射线与极紫外辐射的原理和应用[M]．北京：科学出版社，2003：60-62
[15]Kirkpatrick P，Baez A V． Formation of optical images by X-rays[J]．J Opt SocAm，1948，38：766-773
[16]http://bzhang.lamost.org/website/index.php?p=335
[17]http://zh.wikipedia.org/wiki/%E6%8E%A0%E5%B0%84%E6%9C%9B%E8%BF%9C%E9%95%9C
[18]Aschenbach Bernd. Realization of X-ray telescopes-from design toperformance[J]．Exp Astron，2009，26：95-109
[19] Giacconi R．Grazing incidence telescopes for X-ray astronomy [J]．Space SciRev，1969，9(1)：3-5
[20] Wolter H．Mirror systems with glancing incidence on imaging producing opticsfor X-ray[J]．Ann Phys，1952，94(10)：866-875
[21]王永刚．Wolter-Ι型反射镜的加工及表面粗糙度检测[D]：[博士学位论文]．长春，长春光学精密机械与物理研究所：2010
[22] Saha T T．Aberrations for grazing incidence telescopes[J]．Appl Opt，1988，27(8)：1492-1498
[23] Mangus J D and Underwood J H．Optical Design of a Glancing IncidenceX-ray Telescope[J]．Appl Opt，1969，8(1)：95-102
[24] Schmidt W H K． A proposed x-ray focusing device with wide field of viewfor use in x-ray astronomy[J]．Nucl Instr Meth，1975，127：285–292
[25] Angel J R P．Lobster eyes as x-ray telescopes[J]．The Astrophysical Journal，1979，233：364-373
[26] Van Speybroeck L P．Einstein observatory/HEAO-B/mirror design andperformance[C]．SPIE，1979，184：2-10
[27] Giacconi R，Branduardi G，Briel U，et al．The Einstein (HEAO-2) X-rayobservatory [J]．Astrophys J，1979，230：540-550
[28] http://heasarc.nasa.gov/docs/einstein/heao2.html
[29] http://heasarc.gsfc.nasa.gov/docs/heasarc/missions/solarmax.html
[30] http://en.wikipedia.org/wiki/Salyut_7
[31] De Korte P A J，Giralt R，Coste J N，et al．EXOSAT x-ray imagingoptics[J]．Appl Opt，20，1981：1080-1088
[32] De Korte P A J，Bleeker J A M，McKechnie S P． The X-ray imagingtelescopes on Exosat[J]．Space Science Reviews，1981，30(1-4)：495-511．
[33] Aschenbach B． Design， construction， and performance of the ROSAThigh-resolution x-ray mirror assembly[J]．Appl Opt，1988，27：1404-1413．
[34] http://baike.baidu.com/view/858834.htm
[35] Tsuneta S，Acton L，Bruner M, et al．The soft X-Ray telescope for the Solar-Amission [J]．Solar Phys，1991，136：37-67
[36] http://space.skyrocket.de/doc_sdat/astro-d.htm
[37] Bornmann P L，Speich D，Hirman J，et a1．The GOES solar X-ray imager：overview and operational goals [C]．SPIE，1996，2812：309-319
[38] Van Speybroeck L P．Grazing incidence optics for the U.S. high-resolutionx-ray astronomy program[J]．Appl Opt，1988，27：1398-1403
[39] Van Speybroeck L P，Jerius D，Edgar R J，et al．Performance expectationversus reality[C]．SPIE Proc．1997，3113：89-104
[40] http://www.nasa.gov/centers/marshall/news/background/facts/cxoquick.html
[41]http://xmm.esac.esa.int/external/xmm_user_support/documentation/technical/Mirrors/index.shtml
[42] Aschenbach B，Briel U G，Haberl F，et al．Imaging performance of theXMM-Newton x-ray telescope[C]．SPIE，2000，4012：731–739
[43]http://zh.wikipedia.org/wiki/XMM-%E7%89%9B%E9%A1%BF%E5%8D%AB%E6%98%9F
[44] Citterio O，Campano S，Conconi P，et al．Characteristics of the flight modeloptics for the JET-X telescope onboard the Spectrum-X-Gammasatellite[C]．SPIE，1996，2805：56-65
[45] Burrows D N，Hill J E，Nousek J A，et al．The Swift x-ray telescope [J]．SpaceSci Rev，2005，120：165-195
[46] Burrows D N，Hill J E，Nousek J A，et al．The Swift X Ray Telescope[C]．AIPConf Proc，2003，662：488-490
[47] Serlemitsos P J，Soong Y，Chan K-W，et al．The X-ray telescope onboardSuzaku[J]．Pub Astron Soc Jap，2007，59：9–21
[48] Golub L，DeLuca E，Austin G，et al．The X-ray Telescope (XRT) for theHinode Mission[J]．Solar Phys，2007，243：63-86
[49]Kano R，Sakao T，Hara H，et al．The Hinode X-Ray Telescope (XRT)：CameraDesign，Performance and Operations[J]，Solar Physics，2008，249(2)：263-279
[50] http://baike.baidu.com/view/1301516.htm
[51]金原粲(日)著，王力衡，郑海涛译．薄膜[M]．北京，电子工业出版社，1988．1-12
[52]刘震，空间极紫外成像仪多层膜反射镜研究[D]：[博士学位论文]．长春：长春光学精密机械与物理研究所，2011
[53] http://baike.baidu.com/view/3033029.htm
[54] Hans-Ulrich Krebs，Martin Weisheit，J rg Faupel，et al．Pulsed laser deposition(PLD)-A Versatile Thin Film Technique[J]．Advances in Solid State Physics，2003，43：101-107
[55] Suntola T，Antson J．US Patent，1977，4058430
[56] Goodman C H L， Pessa M V．Atomic layer epitaxy[J]．J App Phys，1986，60(3)：65-82
[57] Suntola T．Atomic layer epitaxy[J]．Thin Solid Films，1992，216(1)：84-89
[58] Nalwa H S．Deposition and Processing of Thin Films in Handbook of ThinFilm Materials[M]，San Diego：Academic Press，2002：103-159
[59] Ki-Seok An，Wontae Cho，Kiwhan Sung et al．Preparation of Al2O3Thin Filmsby Atomic Layer Deposition Using Dimethylaluminum Isopropoxide and Waterand Their Reaction Mechanisms[J]．Bull Korean Chem Soc，2003，24(11)：1659-1663
[60]Tiilikainen Jouni．Novel genetic fitting algorithms and statistical error analysismethods for x-ray reflectivity analysis[D]．Doctoral Dissertation，Espoo，Finland，Helsinki University of Technology：2008
[61] Kozhevnikov I V， Asadchikov V E． Alaudinov B M et al．， X-rayinvestigations of supersmooth surfaces[C]． SPIE，1995，2453：141-153
[62]崔天刚．Wolter I型反射镜面形检测及成像性能检测研究[D]：[博士学位论文]．长春：长春光学精密机械与物理研究所，2011
[63] Duparre′A，Ferre-Borrull J，Gliech S et al． Surface characterizationtechniques for determining the root-mean-square roughness and power spectraldensities of optical components[J]．Appl Opt，2002，41(1)：154-170
[64] Bennett J M and Dancy J H． Stylus profiling instrument for measuringstatistical properties of smooth optical surfaces[J]，Appl Opt，1981，20：1785-1802
[65] http://baike.baidu.com/view/1380968.htm
[66] Binning G，Quate F，Gerber C．Atomic force microscope[J]．Phys Rev Lett，1986，56(9)：930-933．
[67] http://en.wikipedia.org/wiki/Atomic_force_microscopy
[68]朱杰，孙润广．原子力显微镜的基本原理及其方法学研究[J]．生命科学仪器，2005，3(1)：22-25
[69] Ruppe C，Duparre A．Roughness analysis of optical films and substrates byatomic force microscopy[J]．Thin solid films，1996，288：8-13
[70] Asadchikov V E，Duparré A，Jakobs S，et al．Comparative study of theroughness of optical surfaces and thin films by use of x-ray scattering andatomic force microscopy[J]．Appl Opt，1999，38：684-691
[71] Bawolek E J，Mohr J B，Hirleman E D，et al．Light scatter from polysiliconand aluminum surfaces and comparison with surface-roughness statistics byatomic force microscopy [J]．Appl Opt，1993，32(19)：3377-3400
[72] Wriston R S， Froechtenigt J F． Soft X-ray scattering by opticalsurfaces[J]．Appl Opt，1973，12(1)：25-28
[73]尼启良，陈波．散射法表面粗糙度测量[J]．光学精密工程，2001，9(2)：151-154
[74]陈淑妍，齐立红，陈波．光学散射法表面特征的测量与分析[J]．红外与激光工程，2006，35(1)：82-85
[75] Meng Yanli，Wang Yonggang，Chen Shuyan，et al．Assessment of surfaceroughness by use of soft x-ray scattering [C]．SPIE，2009，7451(16)：1-8
[76] Wang Y G，Meng Y L，Ma W S，et al．Comparative study of X-ray scatteringby first-order perturbation theory and generalized Harvey-Shack theory[C]．SPIE，2009，7448(10)
[77]王永刚，孟艳丽，马文生等．掠入射X射线散射法测量超光滑表面粗糙度[J]，光学精密工程，2010，9(2)：151-154
[78] Davies H．The reflection of electromagnetic waves from a rough surfaces[J]．SPIE，1954，101：208-210
[79] Bennett H E，Porteus J O．Relation between surface roughness and specularreflectance at normal incidence[J]．Opt Soc Am，1961，51：123-129
[80] Kroger E，Kretschmann E．Scattering of light by slightly rough surfaces or thinfilms including plasma resonance emission[J]，Z Physik，1970，237(1):1-15
[81] Elson J M，Bennett H E，Bennett J M．Scattering from optical surfaces[J]．Applied Optics and Optical Engineering，1979，7：191-244
[82] Harvey J E．Light-Scattering charateristics of optical surfaces [D]．Universityof Arizona：1976
[83] Harvey J E．Surface scatter phenomena：a Linear，shift-invariant process[J]．SPIE，1989，1165：87-98
[84] Harvey J E, Moran E C, and Zmek W P. Transfer function characterization ofgrazing incidence optical systems[J]．Appl Opt，1988，27：1527-1533
[85] Harvey J E. Scattering Effects in X-ray Imaging Systems[J]．SPIE，1995，2515:246-272
[86] Thompson P L., Harvey J E. System engineering analysis of aplanatic WoltertypeⅠ X-ray telescopes [J]. Optical Engineering,2000,39:1677-1691.
[87] Werner W．Imaging properties of Wolter type I X-ray teleseope[J]．Appl Opt，1977，16(5)：1036-1042
[88] Alehyane N，Arbaoui M，Barchewitz R，et al．Extreme UV and x-ray scatteringmeasurements from a rough LiF crystal surface characterized by electronmicrography[J]．Appl Opt，1989，28(10)：1763-1772
[89] Spiller E，Stearns D，Krumrey M，et al. Multilayer x-ray mirrors: Interfacialroughness, scattering, and image quality[J]．J Appl Phys，1993，74：107
[90] Vinogradov AV，Artyukov I A，Borisova S S，et al．Investigation ofsuperpolished surfaces by x-ray scattering[C]．SPIE，1989，1140：490-500
[91] Alaudinov B M，Asadchikova V E，Artyukov I A，et al．An optical model ofa surface in the x-ray range[J]．Crystallography Reports，1994，39(4)：540-550
[92] Artyukov I A， Asadchikova V E and Kozhevnikov I V． Effects of anear-surface transition layer on x-ray reflection and scattering[J]．J X-Ray SciTechnol，1996，6(3)：223-243
[93] Kozhevnikov I V and Vinogradov AV．Multilayer X-ray mirrors[J]．J RussianLaser Research，1995，16(4)：343-385
[94] Vinogradov AV，Zorev N N，Kozhevnikov I V，et al．Phenomenon of totalexternal reflection of x rays [J]．Sov Phys JETP，1985，62(6)：1225-1229
[95] Palasantzas G and Krim J．Effect of the form of the height-height correlationfunction on diffuse x-ray scattering from a self-affine surface [J]．Phys Rev B，1993，48：2873-2877
[96] Sinha S K，Sirota E B，Garoff S，et al．X-ray and neutron scattering from roughsurfaces[J]．Phys Rev B，1988，38(4)：2297-2312
[97] Vinogradov AV，Zorev N N， Kozhevnikov I V，et al．X-ray scattering byhighly polished surfaces[J]．Sov Phys JETP，1988，67：1631-1638
[98] Asadchikova V E，Kozhevnikov I V，Krivonosov Y S，et al． Application ofX-ray scattering technique to the study of supersmooth surfaces [J]．NuclearInstruments and Methods in Physics Research A，2004，530：575–595
[99] Asadchikova V E，Bukreeva I N，Duparre A，et al． X-ray study of surfacesand interfaces [J]．SPIE，2001，4449：253-264
[100] Asadchikov V E， Kozhevnikov I V， and Krivonosov Yu S， X-rayInvestigations of Surface Roughnesses[J]．Crystallography Reports，2003，48(5)：835-850
[101] Kozhevnikov I V and Pyatakhin M V．Use of DWBA and perturbation theoryin X-ray control of the surface roughness [J]．Journal of X-ray Science andTechnology．2000，8：253–275
[102] Zanaveskin M L，Grishchenko Y V，Tolstikhina A L，et al． The surfaceroughness investigation by the atomic force microscopy，x-ray scattering andlight scattering [J]．SPIE，2006，6260：62601A1-62601A9
[103] Lodha G S，Koujun Y，Hideyo I K，et al．Effect of surface roughness andsubsurface damage on grazing-incidence x-ray scattering and specularreflectance [J]．Appl Opt，1998，37(22)：5239-5252
[104] Kozhevnikov I V，Asadchikov V E，Bukreeva I V，et al． X-ray study of theroughness of surfaces and interfaces[J]．SPIE，2000，4099：267-278
[105] Asadchikov V E，Karabekov A Yu，Klechkovskaya V V，et al．Experimentalx-ray study of the correlation of the surface profiles of a film and asubstrate[J]． Crystallog Rep，1998，110-120．
[106] Wilk G D，Wallace R M，Anthony J M．High-k gate dielectrics:current statusand material properties considerations[J]．J Appl Phys，2001，89：5243-5275
[107] Careia P F，Mclean R S，Reilly M H，et a1．Ca test of Al2O3gas diffusionbarriers grown by atomic layer deposition on polymers[J]．Appl Phys Lett，2006，89(3)：031915-1–031915-3
[108] Nikolov A，Wang J，Ouyang x，et a1．NanoOpto Corp，Films for optical useand methods of making such films[J]．US Patent．2006：7142375
[109] Groner M D， Fabreguette F H，Elam J W，et al．Low-Temperature Al2O3Atomic Layer Deposition[J]．Chem Mater，2004，16：639-645
[110]张继成，唐永建，吴卫东．X射线反射法测量α：CH薄膜的密度和厚度[J]．强激光与粒子束，2007，19(8)：1317-1320
[111] Paratta L G．Surface studies of solids by total reflection X rays [J]．Phys Rev，1954，95(2)：359-369
[112] Als-Nielsen J， McMorrow D． Elements of Modern X-rayPhysics[M]．Wiley，Chichester，2001：23-24，61-106
[113] Holy V，Pietsch U，Baumbach T．High resolution x-ray scattering from thinfilms and multilayers[M]．Springer in Berlin，New York，1999：130
[114] Jensen J M， Oelkers A B， Toivola R， et al． X-ray reflectivitycharacterization of ZnO/Al2O3multilayers prepared by Atomic LayerDeposition[J]．Chem Mater，2002，14：2276-2282
[115] Azaroff L V， Elements of X-ray Crystallography[M]． New York:McGraw-Hill，1968：Chapter6
[116] Bergese P，Bontempi E，Depero L E．A simple solution to systematic errorsin density determination[J]．Applied Surface Science，2006，253：28-32
[117] http://henke.lbl.gov/optical_constants/
[118] Yoneda Y．Anomalous surface Reflection of X Rays[J]．Physical Review，1963，131：2010-2013
[119] Filatova E O，Blagoveshchenskaya T A．The Yoneda effect in the region ofultrasoft X-ray emission[J]．JETP Lett，1990，52：396-398