电化学沉积类金刚石薄膜及其场发射性能研究
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摘要
类金刚石碳(diamond-like carbon, DLC)是一类含有大量sp~3相碳的非晶亚稳碳材料的统称。DLC薄膜由于具有高硬度、化学稳定性、高光学透过率和比较宽的光学带隙,有非常广泛的应用前景,尤其是作为真空微电子器件的场发射阴极材料,近几年倍受关注。很多物理气相沉积(PVD)和化学气相沉积(CVD)方法都能制备DLC薄膜。但是气相制备方法难以实现大尺度沉积,并且成本较高,因此寻找一种低成本、可大尺度沉积的方法迫在眉睫。
近几年Namba等人实践了液相电化学沉积DLC薄膜。与气相方法相比较,液相方法具有设备简单、成本低、实验温度低、实验易控制等特点。在研究者的努力下,液相电化学沉积DLC薄膜取得了很大的进展。
本论文主要探索利用电化学方法制备DLC薄膜,并对其场发射性质进行研究,主要内容包括:
1.常压下,在不同的直流电压下电解甲醇溶液在铝衬底表面制备DLC薄膜。利用SEM、FTIR、XPS和Raman光谱对薄膜的表面形貌和微结构进行了检测。随着沉积电压的上升,DLC薄膜中的sp~2相含量下降,且薄膜的表面形貌有显著地变化。这两个因素同时对DLC薄膜场发射性质产生影响,使DLC薄膜的场发射性质随沉积电压发生非单调变化。在1200V下沉积的DLC薄膜显示了最优的场发射性质。
2.600V直流电压下,利用不同摩尔比的尿素/甲醇溶液为电解液在Si(100)表面沉积了不同氮含量的掺氮类金刚石(DLC:N)薄膜。XPS、FTIR和Raman检测显示氮元素与碳元素以C-N或C=N方式结合,并且氮元素的掺杂有利于薄膜中sp~2相的形成。对不同氮含量DLC:N薄膜场发射性质检测发现:场发射开启电场随着薄膜中氮含量的增加而降低,同时23.5 V/μm电场下场发射电流密度随着氮含量的增加而上升。氮含量增加对液相电沉积DLC:N薄膜场发射性质的提高是由于氮元素的施主电掺杂作用和薄膜中sp~2相的增加。
3.在前面实验的基础上,利用简单的电化学装置,电解N,N-二甲基甲酰胺在衬底两面同时沉积了DLC薄膜。Raman检测显示铝衬底两面DLC薄膜不同位置的微结构高度相似,厚度分布在260-300nm。针对导电性衬底两面同时沉积DLC薄膜提出了一个简单的理论模型。铝衬底两面同时沉积DLC薄膜为在三维复杂结构衬底表面全方位沉积DLC薄膜提供了可能性。
Diamond-like carbon (DLC) is a metastable form of amorphous carboncontaining a significant fraction of sp~3 bonds.It can have a high mechanical hardness,chemical inertness,optical transparency,and it is a wide band gap semiconductor.DLC films have widespread applications in many areas,especially as field emissioncathode materials for vacuum microelectronic devices.DLC films have been preparedby physical vapor deposition (PVD) or chemical vapor deposition (CVD).The aboveprocess is still questioned for its scalability and cost-effectiveness.Search forlow-cost and scalable technique for DLC deposition is still on the hot anvil.
In recent times,possibility of depositing DLC films from organic liquids byelectrochemical technique was demonstrated by Namba.Electrodeposition techniquehas demonstrated some advantages over vapor phase deposition,such as thesimplicity and low cost of experimental apparatus,possibility of low temperaturesynthesis and ease of experimental control to produce films with diverse properties,etc.Subsequent efforts were devoted to the progress of electrodeposition of DLCfilms.
The research work is concerned with the preparation of DLC films byelectrochemical deposition.The field electron emission properties of DLC films werealso investigated.The main research contents of this thesis are shown as follows:
1.At ambient pressure,DLC films were deposited on Al substrates by electrolysis ina methanol solution under various voltages.The surface morphology andmicrostructure of the synthesized films were characterized by SEM,FTIR,XPSand Raman spectroscopy.With the increase of deposition voltage,the sp2 phaseconcentration decreased and the surface morphology changed dramatically.Theinfluence of deposition voltage on the field electron emission (FEE) properties ofDLC films was not monotonic due to two adverse effects of deposition voltage onthe surface morphology and compositions.The DLC film deposited under 1200 V exhibited optimum FEE property.
2.Nitrogen incorporated diamond-like carbon (DLC:N) films with different Ncontent were deposited on Si(100) substrates by electrolysis of urea/methanolorganic solution with different mole ratios under a constant voltage of 600 V.Analysis by XPS,FTIR,and Raman spectrometry showed that N wasincorporated into the DLC films by sp~3 C-N and sp~2 C=N bonds and inducedgraphitization of the films.The influence of N content on the electronic fieldemission properties of these films was investigated.The turn-on field (Ec) waslowered with increasing N content,and there was a simultaneous rise in the fieldemission current densities under the electric field of 23.5 V/mm.Enhancement infield emission is attributed to the donor activity of nitrogen and the fieldenhancement effect of sp~2 clusters.
3.On the basis of the investigation on deposition of DLC films in methanol,byelectrolysis of the N,N-dimethylformamide solution with simple electrochemicalapparatus,an attempt was made to simultaneously deposit DLC films on bothsurfaces of an aluminum Al substrate.Raman spectra showed that the structuresof the DLC film were uniform.The thickness distribution of the film was260-300 nm.A simple model of the sustaining mechanism was proposed forsimultaneous electrodeposition of the DLC film on both surfaces of conductivesubstrates.The simultaneous formation of the DLC film on both surfaces of theAl substrate showed a possibility in the three-dimensional deposition of DLCfilms on complex conductive substrates.
近几年Namba等人实践了液相电化学沉积DLC薄膜。与气相方法相比较,液相方法具有设备简单、成本低、实验温度低、实验易控制等特点。在研究者的努力下,液相电化学沉积DLC薄膜取得了很大的进展。
本论文主要探索利用电化学方法制备DLC薄膜,并对其场发射性质进行研究,主要内容包括:
1.常压下,在不同的直流电压下电解甲醇溶液在铝衬底表面制备DLC薄膜。利用SEM、FTIR、XPS和Raman光谱对薄膜的表面形貌和微结构进行了检测。随着沉积电压的上升,DLC薄膜中的sp~2相含量下降,且薄膜的表面形貌有显著地变化。这两个因素同时对DLC薄膜场发射性质产生影响,使DLC薄膜的场发射性质随沉积电压发生非单调变化。在1200V下沉积的DLC薄膜显示了最优的场发射性质。
2.600V直流电压下,利用不同摩尔比的尿素/甲醇溶液为电解液在Si(100)表面沉积了不同氮含量的掺氮类金刚石(DLC:N)薄膜。XPS、FTIR和Raman检测显示氮元素与碳元素以C-N或C=N方式结合,并且氮元素的掺杂有利于薄膜中sp~2相的形成。对不同氮含量DLC:N薄膜场发射性质检测发现:场发射开启电场随着薄膜中氮含量的增加而降低,同时23.5 V/μm电场下场发射电流密度随着氮含量的增加而上升。氮含量增加对液相电沉积DLC:N薄膜场发射性质的提高是由于氮元素的施主电掺杂作用和薄膜中sp~2相的增加。
3.在前面实验的基础上,利用简单的电化学装置,电解N,N-二甲基甲酰胺在衬底两面同时沉积了DLC薄膜。Raman检测显示铝衬底两面DLC薄膜不同位置的微结构高度相似,厚度分布在260-300nm。针对导电性衬底两面同时沉积DLC薄膜提出了一个简单的理论模型。铝衬底两面同时沉积DLC薄膜为在三维复杂结构衬底表面全方位沉积DLC薄膜提供了可能性。
Diamond-like carbon (DLC) is a metastable form of amorphous carboncontaining a significant fraction of sp~3 bonds.It can have a high mechanical hardness,chemical inertness,optical transparency,and it is a wide band gap semiconductor.DLC films have widespread applications in many areas,especially as field emissioncathode materials for vacuum microelectronic devices.DLC films have been preparedby physical vapor deposition (PVD) or chemical vapor deposition (CVD).The aboveprocess is still questioned for its scalability and cost-effectiveness.Search forlow-cost and scalable technique for DLC deposition is still on the hot anvil.
In recent times,possibility of depositing DLC films from organic liquids byelectrochemical technique was demonstrated by Namba.Electrodeposition techniquehas demonstrated some advantages over vapor phase deposition,such as thesimplicity and low cost of experimental apparatus,possibility of low temperaturesynthesis and ease of experimental control to produce films with diverse properties,etc.Subsequent efforts were devoted to the progress of electrodeposition of DLCfilms.
The research work is concerned with the preparation of DLC films byelectrochemical deposition.The field electron emission properties of DLC films werealso investigated.The main research contents of this thesis are shown as follows:
1.At ambient pressure,DLC films were deposited on Al substrates by electrolysis ina methanol solution under various voltages.The surface morphology andmicrostructure of the synthesized films were characterized by SEM,FTIR,XPSand Raman spectroscopy.With the increase of deposition voltage,the sp2 phaseconcentration decreased and the surface morphology changed dramatically.Theinfluence of deposition voltage on the field electron emission (FEE) properties ofDLC films was not monotonic due to two adverse effects of deposition voltage onthe surface morphology and compositions.The DLC film deposited under 1200 V exhibited optimum FEE property.
2.Nitrogen incorporated diamond-like carbon (DLC:N) films with different Ncontent were deposited on Si(100) substrates by electrolysis of urea/methanolorganic solution with different mole ratios under a constant voltage of 600 V.Analysis by XPS,FTIR,and Raman spectrometry showed that N wasincorporated into the DLC films by sp~3 C-N and sp~2 C=N bonds and inducedgraphitization of the films.The influence of N content on the electronic fieldemission properties of these films was investigated.The turn-on field (Ec) waslowered with increasing N content,and there was a simultaneous rise in the fieldemission current densities under the electric field of 23.5 V/mm.Enhancement infield emission is attributed to the donor activity of nitrogen and the fieldenhancement effect of sp~2 clusters.
3.On the basis of the investigation on deposition of DLC films in methanol,byelectrolysis of the N,N-dimethylformamide solution with simple electrochemicalapparatus,an attempt was made to simultaneously deposit DLC films on bothsurfaces of an aluminum Al substrate.Raman spectra showed that the structuresof the DLC film were uniform.The thickness distribution of the film was260-300 nm.A simple model of the sustaining mechanism was proposed forsimultaneous electrodeposition of the DLC film on both surfaces of conductivesubstrates.The simultaneous formation of the DLC film on both surfaces of theAl substrate showed a possibility in the three-dimensional deposition of DLCfilms on complex conductive substrates.
引文
[1]J．Robertson， Diamond-like amorphous carbon．Mater．Sci．Eng．R-Rep．2002， 37， 129-281．
[2]A．Grill， Diamond-like carbon： state of the art．Diam Relat．Mat．1999， 8， 428-434．
[3]A．H．Lettington， Applications of diamond-like carbon thin films．Carbon 1998， 36， 555-560．
[4]W．I．Milne， Electronic devices from diamond-like carbon．Semicond．Sci．Technol．2003．18，S81-S85．
[5]J．Robertson， Mechanical properties and coordinations of amorphous carbons．Phys．Rev．Lett．1992， 68， 220-223．
[6]A．Grill， Electrical and optical properties of diamond-like carbon．Thin Solid Films 1999， 356，89-193．
[7]S．Aisenberg， R．Chabot， Ion-beam deposition of thin films of diamondlike carbon．J．Appl．Phys．1971， 42， 2953-2958．
[8]W．Jacob， W．Moller， On the structure of thin hydrocarbon films．Appl．Phys．Lett．1993， 63，1771-1773．
[9]J．Robertson， E．P．O'Reilly， Electronic and atomic structure of amorphous carbon．Phys．Rev．B 1987， 35， 946-2957．
[10]J．C．Angus， F．Jansen， Dense “diamondlike” hydrocarbons as random covalent networks．J．Vac．Sci．Technol．A 1988， 6， 1778-1782．
[11]J．C．Angus， Diamond and diamond-like films．Thin Solid Films 1992， 216， 126-133．
[12]郑伟涛，《薄膜材料与薄膜技术》化学工业出版社，2004．
[13]S．M．Metev， M．Ozegowski， K．Meteva， et al， Laser-assisted ECR-plasma-CVD of a-C：H films．Diam Relat．Mat．1996， 5， 420-424．
[14]A．Crunteanu， M．Charbonnier， M．Romand， et al， Structural and vibrational characterization of hydrogenated carbon nitride thin films obtained by laser-induced CVD．Appl．Surf．Sci．2000， 168， 4-47
[15]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Technol．2000， 125．301-307．
[16] C. Corbella, M. Vives, G. Oncins, et al, Characterization of DLC films obtained at room temperature by pulsed-dc PECVD. Diam Relat. Mat. 2004, 13, 1494-1499.
[17] T. Michler, M. Grischke, I. Traus, et al, Mechanical properties of DLC films prepared by bipolar pulsed DC PACVD. Diam Relat. Mat. 1998, 7, 1333-1337.
[18] M. Suzuki, T. Watanabe, A. Tanaka, et al, Tribological properties of diamond-like carbon films produced by different deposition techniques. Diam Relat. Mat. 2003, 12, 2061-2065.
[19] S. Kuman, C. M. S. Rauthan, P. N. Dixit, et al, Versatile microwave PECVD technique for deposition of DLC and other ordered carbon nanostructures. Vacuum 2001, 63, 433-439.
[20] A. Bubenzer, B. Dischler, G Brandt,et al, RF-plasma deposited amorphous hydrogenated hard carbon thin films: preparation, properties, and applications. J. Appl. Phys. 1983, 54,4590-4595.
[21] G. Fedosenko, A. Schwabedissen, D. Korzec, et al, Diamond-like carbon film deposition by a 13.56 MHz hollow cathode RF-RF system using different precursor gases. Surf. Coat. Technol. 2001, 142-144, 693-697.
[22] H. X, T. Xu, J. M. Chen, et al, The effect of applied dc bias voltage on the properties of a-C:H films prepared in a dual dc-rf plasma system. Appl. Surf. Sci. 2004,227, 364-372.
[23] L. Martinu, A. Raveh, D. Boutard, et al, Properties and stability of diamond-like carbon films related to bonded and unbonded hydrogen. Diam. Relat. Mat. 1993,2, 673-677.
[24] M. Weiler, K. Lang, E. Li, et al, Deposition of tetrahedral hydrogenated amorphous carbon using a novel eletron cyclotron wave resonance reactor. Appl. Phys. Lett. 1998, 72, 1314-1316.
[25] V. Kopustinskas, S. Meskinis, S. Tamulevicius, et al, Direct ion beam deposited carbon films and clusters. Vacuum 2003, 72. 193-198.
[26] A. Yu. Belov, H. U. J(a|¨)ger, Atomistic study of ion-beam deposition conditions for hard amorphous carbon. Comput. Mater. Sci. 2003, 27,16-22.
[27] I. Gerhards, C. Ronning, U. Vetter, et al, Ion beam synthesis of amorphous carbon thin films containing metallic nanoclusters. Surf. Coat. Technol. 2002, 158-159, 114-119.
[28] C. Weissmantel, K. Bewilogua, D. Dietrich, et al, Structure and properties of quasi-amorphous films prepared by ion beam techniques. Thin Solid Films 1980, 72, 19-32.
[29] Y. Hoshi, E. Suzuki, T. Osaka, Diamond-like carbon films deposited without deposition particles of large incidence angles by sputtering. J. Magn. Magn. Mater. 1997, 176, 51-55.
[30] T. Y. You, O. Niwa, M. Tomita, et al, Characterization and electrochemical properties of highly dispersed copper oxide/hydroxide nanoparticles in graphite-like carbon films prepared by RF sputtering method. Electrochem. Commun. 2002, 4, 468-471.
[31] S. Chowdhury, M. T. Laugier, 1. Z. Tahman, Effect of target self-bias voltage on the mechanical properties of diamond-like carbon films deposited by RF magnetron sputtering. Thin Solid Films 2004, 468, 149-154.
[32] M. Sasaki, Y. Kozukue, K. Hashinoto, et al, Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputtering. Vacuum 2001, 74, 455-459.
[33] I. G. Brown, Cathodic arc deposition of films. Annu. Rev. Mater. Sci. 1998, 28, 243-269.
[34] M. C. polo, J. L. Andujar, A. Hart, et al, Preparation of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition. Diam Relat. Mat. 2000, 9, 663-667.
[35] C. K. Park, S. M. Chang, H. S. Uhm, et al, XPS and XRR studies on microstructures and interfaces of DLC films deposited by FCVA method. Thin Solid Films 2002, 420-421,235-240.
[36] Zs. Geretovszky, T. Haraszti, T. Sz(o|¨)rényi, et al, Morphological study of PLD grown carbon films. Appl. Surf. Sci. 2003, 208-209, 566-574.
[37] S. M. Mominuzzaman, T. Soga, T. Jimbo, et al, Camphoric carbon soot: a new target for deposition of diamond-like carbon films by pulsed laser ablation. Thin Solid Films 2000, 376, 1-4.
[38] S. S. Pang, S. Y. Lee, H. S. Jung, et al, Effect of laser parameters on the property of DLC films grown by pulsed laser deposition. Surf. Coat. Technol. 1999, 115, 266-269.
[39] H. Pan, M. Pruski, B. C. Gerstein, et al, Local coordination of carbon atoms in amorphous carbon. Phys. Rev. B 1991, 44, 6741-6745.
[40] S. Kaplan, F. Jansen, M. Machonkin, Characterization of amorphous carbon-hydrogen films by solid-state nuclear magnetic resonance. Appl. Phys. Lett. 1985,47, 750-753.
[41] C. Jager, J. Gottwald, H. W. Spiess, et al, Structural properties of amorphous hydrogenated carbon. Ⅲ. NMR investigations. Phys. Rev. B., 1994, 50, 846-852.
[42] M A. Tamor, W. C. Vassell, K. R. Carduner, Atomic constraint in hydrogenated diamond-like carbon. Appl. Phys. Lett., 1991, 58, 592-594.
[43] C. Donnet, J. Fontaine, F. Lefbvre, et al, Solid state ~(13)C and ~1H nuclear magnetic resonance investigations of hydrogenated amorphous carbon. J. Appl. Phys. 1999, 85, 3264-3270.
[44] R. Haerle, E. Riedo, A. Pasquarello, et al, sp~2/sp~3 hybridization retio in amorphous carbon from C ls core-level shifts: X-ray photoelectron spectroscopy and first-principles calculation. Phys. Rev. B2001, 65,45101-45110.
[45] C. K. Park, S. M. Chang, H. S. Uhm, et al, XPS and XRR studies on microstructures and interfaces of DLC films deposited by FCVA method. Thin Solid Films 2002, 420-421,235-240.
[46] P. Mérel, M. Tabbal, M. Chaker, et al, Direct evaluation of the sp~3 content in diamond-like-carbon films by XPS. Appl. Surf. Sci. 1998, 136, 105-110.
[47] C. M(o|¨)βner, P. Grant, H. Tran, et al, Characterization of diamond-like carbon by Raman spectroscopy, XPS and optical constants. Thin Solid Films 1998, 317, 397-401.
[48] D. S. Knight, W. B. White, Characterization of diamond films by Raman spectroscopy. J. Mater. Res. 1989,4,385-393.
[49] R. J. Nemanich, S. A. Solin, First- and second-order Raman scattering from finite-size crystals of graphite. Phys. Rev. B 1979, 20, 392-401.
[50] B. S. Elman, M. Shayegan, M. S. Dresselhaus, et al, Structural characterization of ion-implanted praphite. Phys. Rev. B 1982, 25,4142-4156.
[51] M. H. Grimsditch, A. K. Ramdas, Brillouin scattering in diamond. Phys. Rev. B 1975, 11,3139-3148.
[52] F. Tuinstra, J. L. Koenig, Raman spectrum of Graphite. J. Chem. Phys. 1970, 53, 1126-1130.
[53] P. Lespade, R. Al-Jishi, M. S. Dresselhaus, Model of Raman scattering from incompletely graphitized carbons. Carbon 1982, 20,427-431.
[54] R. J. Nemanich, J. T. Glass,G. Lucovsky, et al.,Raman scattering characterization of carbon bonding in diamond and diamondlike thin films. J. Vac. Sci. Technol. A 1988, 6, 1783-1787.
[55] M. A. Tamor, W. C. Vassell, Raman Fingerprinting of Amorphous-Carbon Films. J. Appl. Phys. 1994, 76, 3823-3830.
[56] B.Marcus, L. Fayette, M. Mermoux, et al.,Analysis of the structure of multicomponent carbon-films by resonant Raman-Scattering. J. Appl. Phys. 1994, 76, 3463-3470.
[57]J．Schwan， S．Ulrich， V．Batori， et al， Raman spectroscopy on amorphous carbon films．J．Appl．Phys．1996， 80， 440-447．
[58]B．K．Tay， X．Shi， H．S．Tan， et al， Raman studies of tetrahedral amorphous carbonfilms deposited by filtered cathodic vacuum arc．Surf．Coat．Technol．1998， 105， 155-158．
[59]A．C．Ferrari， J．Roberson， Interpretation of Raman Sprectra of disordered and amorphous carbon Phys．Rev．B 2000， 61，14095-14107．
[60]M．Ransteiner， J．Wagner， Resonant Raman scattering of hydrogenated amorphous carbon：Evidence for pi-bonded carbon clusters．Appl．Phys．Lett．1987， 51，1355-1357．
[61]N．Wada， P．J．Gaczi， A．Solin．“Diamond-like” 3-fold coordinated amorphous carbon．J．Non-Cryst．Solids 1980， 35-36， 543-548．
[62]K．W．R．Gilkes， H．S．Sands， D．N．Batchelder， et al， Direct observation of sp~3 bonding in tetrahedral amorphous carbon using ultraviolet Raman spectroscopy．Appl．Phys．Lett．1997，70， 1980-1982．
[63]V．I．Merkulov， J．S．Lannin， C．H．Munro， et al， UV studies of tetrahedral bonding in diamondlike amorphous carbon．Phys．Rev．Lett．1997， 78， 4869-4872．
[64]K．W．R．Gilkes， S．Prawer， K．W．Nugent， et al， Direct quantitative detection of the sp~3 bonding in diamond-like carbon films using ultraviolet and visible Raman spectroscopy．J Appl．Phys．2000， 87， 7283-7289．
[65]G．Adamopoulos， K．W．R．Gilkes， J．Robertson， et al， Ultraviolet Raman characterization of diamond-like carbon films．Diam．Relat．Mat．1999， 8， 541-544．
[66]J．R．Shi， X．Shi， Z．Sun， et al， Resonant Raman studies of tetrahedral amorphous carbon films．Diam．Relat．Mat．2001，10， 76-81．
[67]G．P．Lopinski， V．I．Merkulov．J．S．Lannin， Vibrational states of tetrahedral amorphous carbon．Appl．Phys．Lett．1996， 69， 3348-3350．
[68]唐伟忠《薄膜材料制备原理、技术及应用》冶金工业出版社，2003．
[69]Richard Lossy， David L．Pappas， Ronnen A．Roy， et al， Filtered arc deposition of amorphous diamond．Appl．Phys．Lett．1992， 61，171-173．
[70]D．Y．Wang， K．W．Weng， S．Y．Hwang， Study on metal-doped diamond-like carbon films synthesized by cathodic arc evaporation．Diam．Relat．Mat．2000， 9， 1762-1766．
[71]C．Donnet， Advanced solid lubricant coatings for high vacuum environments．Surf．Coat． Technol．1996， 80， 151-156．
[72]K．Enke， Dry machining and increase of endurance of machine parts with improved doped DLC coatings on steel， ceramics and aluminium．Surf．Coat．Technol．1999， 116-119，488-491．
[73]K．Vercammen， J．Meneve， E．Dekempeneer， et al，Study of RF PACVD diamond-like carbon coatings for space mechanism applications．Surf．Coat．Technol．1999， 120-121，612-617．
[74]沈风雷，《钛合金表面液相法沉积DLC薄膜及其血液相容性研究》南京工业大学博士论文，2003．
[75]F．Z．Cui， D．J．Li， A review of investigations on biocompatibility of diamond-like carbon and carbon nitride films．Surf．Coat．Technol．2000， 131， 481-487．
[76]V．M．Tiainen， Amorphous carbon as a bio-mechanical coating-mechanical properties and biological applications．Diam．Relat．Mat．2001， 10， 153-160．
[77]M．Mohanty， T．V．Anilkumar， P．V．Mohanan， et al．， Long term tissue response to titanium coated with diamond like carbon．Biomol．Eng．2002， 19， 125-128．
[78]G．A．Abbas， J．A．McLaughlin， E．Harkin-Jones， A study of ta-C， a-C：H and Si-a：C：H thin films on polymer substrates as a gas barrier．Diam．Relat．Mat．2004， 13， 1342-1345．
[79]N．V．Novikov， A．G．Gontar， S．I．Khandozhko， et al， Protective diamond-like coatings for optical materials and electronic devices．Diam．Relat．Mat．2000， 9， 792-795．
[80]A．Grill， From tribological coatings to low-k dielectrics for ULSI interconnects．Thin Solid Films 2001， 398 -399， 527-532．
[81]B．S．Satyanarayana， A．Hart， W．I．Milne， et al， Field emission from tetrahedral amorphous carbon．Appl．Phys．Lett．1997， 71 (10)， 1430-1432．
[82]A．P．Burden， R．D．Forrest， S．R．P．Silva， Enhancing the field emission properties of amorphous carbon films by thermal annealing．Thin Solid Films 1999， 337， 257-260．
[83]J．J．Li， C．Z．Gu， H．Y．Peng， et al， Field emission properties of diamond-like carbon films annealed at different temperatures．Appl．Surf．Sci．2005， 251， 236-241．
[84]X．Lu， Q．Yang， C．Xiao， A．Hirose， Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration．Thin Solid Films 2008，516，4217-4221．
[85]彭鸿雁，赵立新．类金刚石膜结构的制备性能与应用[M]．材料科学与工-程，2004， 18．
[86]戴达煌，周克松．金刚石薄膜沉积制备工艺与应用[M]．冶金工业出版社，2001， 171．
[87]田民波，刘德令编译，《薄膜科学与技术手册》机械工业出版社，1991．
[88]L．L．Maissel， R．Glang， Handbook of thin film technology， (McGraw-Hill)， New York， 1970，Chap．5．p5．
[89]Y．Namba， Attempt to grow diamond phase carbon film from an organic solution[J]．J．Vac．Sci．Technol．A 1992， 10， 3368-3370．
[90]T．Suzuki， Y．Manita， T．Yamazaki， et al，Deposition of carbon-films by electrolysis of a water-ethylene glycol solution．J．Mater Sci 1995， 30， 2067-2069．
[91]H．Wang， M．R．Shen， Z．Y．Ning， Deposition of diamond-like carbon films by electrolysis of methanol solution．Appl．Phys．Lett．1996， 69， 1074-1076
[92]H．S．Zhu， J．T．Jiu， Q．Fu， Aroused problems in the deposition of diamond-like carbon films by using the liquid phase electrodeposition technique．J．Mater．Sci．2003， 38， 141-145．
[93]X．B．Yan， T．Xu， G．Chen， et al， Effect of deposition voltage on the microstructure of electrochemically deposited hydrogenated amorphous carbon films．Carbon 2004， 42，3103-3108．
[94]H．Wang， M．R．Shen， Z．Y．Ning．et al， Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions．Thin Solid Films， 1997， 293，1-2， 87-90．
[95]L．T．Li， Y．Huang， Electrodeposition of diamond-like amorphous carbon films on Si from N，N-dimethylformamide．Chem．Phys．Lett．2000， 329， 346-3 50．
[96]K．Cai， D．Guo，H．S．Zhu， Deposition of diamond-like carbon films on aluminum in the liquid phase by an electrochemical method．Carbon 1999， 37， 1860-1862．
[97]J．T．Jiu， K．Cai， Q．Fu， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41，2， 63-66．
[98]C．b．Cao， H．S．Zhu， H．Wang， Electrodeposition diamond-like carbon films from organic liquids．Thin Solid Films 2000， 368， 2， 203-207．
[99]Q．Fu， J．T．Jiu， C．B．Cao， Electrodeposition of carbon films from various organic liquids．Surf．Coat．Technol．2000， 124， 2-3， 196-200．
[100]Q．Fu， J．T．Jiu， H．Wang， Simultaneous formation of diamond-like carbon and carbon nitride films in the electrodeposition of an organic liquid．Chem．Phys．Lett．1999， 301，87-90．
[101]P．Aublanc， V．P．Novikov， L．V．Kuznetsova， Diamond synthesis by electrolysis of acetates Diam．Relat．Mat．2001， 10， 942-946．
[102]R．K．Roy， B．Deb， B．Bhattacharjee， et al， Synthesis of diamond-like carbon film by novel electrodeposition route．Thin Solid Films， 2002， 422， 1-2， 92-97．
[103]S．Gupta， R．K．Roy， B．Deb， et al， Low voltage electrodeposition of diamond-like carbon films．Mater．Lett， 2003， 57， 22-23， 3479-3485．
[104]S．Gupta， M．Pal Chowdhury， A．K．Pal， Synthesis of DLC films by electrodeposition technique using formic acid as electrolyte．Diam Relat．Mat．2004， 13， 9， 1680-1689．
[105]V．P．Novikov， V．P．Dymont， Synthesis of diamondlike films by an electrochemical method at atmospheric pressure and low temperature．Appl．Phys．Lett．1997， 70， 200．
[106]酒金婷，付强，汪浩等，液相电沉积类金刚石薄膜的相关物理化学问题[J]．无机材料学报，2002， 17(3)， 571-578．
[107]H．Wang， M．R．Shen， Z．Y．Ning， et al， Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions．Thin Solid Films， 1997， 293，87-90．
[108]K．Cai， D．Guo， Y．Huang， et al， Evaluation of diamond-like carbon films deposited on conductive glass from organic liquids using pulsed current．Surf．Coat．Technol．2000， 130，266-273．
[109]Z．Sun， Y．Sun， X．Wang， Investigation of phases in the carbon films deposited by electrolysis of ethanol liquid phase using Raman scattering．Chem．Phys．Lett．2000， 318，471-475．
[110]J．T．Jiu， H．Wang， K．Cai， et al， Liquid phase deposition of hydrogenated diamond-like carbon films on conductive glass substrates using a pulse-modulated source．Mater．Res．Bull 1999， 34， 1501-1506．
[111]D．Guo， K．Cai， L．T．Li， et al， Evaluation of diamond-like carbon films electrodeposited on an Al substrate from the liquid phase with pulse-modulated power．Carbon 2001， 39，1395-1398．
[112]T．M．Manhabosco， I．L．Muller， Electrodeposition of diamond-like carbon (DLC) films on Ti. Appl. Surf. Sci. 2009, 255, 4082-4086.
[113] R. K. Roy, B. Deb, B. Bhattacharjee, et al, Synthesis of diamond-like carbon film by novel electrodeposition route. Thin Solid Films 2002, 422, 92-97.
[114] M. C. Alex, P. Charoendee, D. G. Terea, J. Mater. Res. 2003, 18(7), 1561-1565.
[115] H. Wang, M. R. Shen, Z. Y. Ning, et al, Pulsed Elec-trodeposition of diamond-like carbon films. J. Mater. Res. 1997, 12( 11), 3102-3105.
[1]刘敏，雷威，张晓兵等，真空微电子学的研究和进展，电子器件2003， 26， 428-433．
[2]刘元震，王仲春，董亚强，电子发射与光电阴极，北京理工大学出版社，1995， 6．
[3]Meng Ding， Field Emission From Silicon， Massachusetts Institute of Technology， 2001， 31博士毕业论文．
[4]邓江，林祖伦，张仪德，场发射显示器研究现状．现代显示2005， 4， 8-11．
[5]基泰尔，固体物理导论，化学工业出版社，1979， 173．
[6]W．Schottky， Z．Phys．1923， 14， 63．
[7]L．W．Nordheim， Proc．Roy．Soc．A 1928， 121，626．
[8]N．A．de Bruyne， Proc．Roy．Soc．A 1928， 120， 423．
[9]W．W．Dolon， W．P．Dyke， Temperature-and-Field Emission of Electrons from Metals．Phys．Rev．1954， 95， 327-332
[10]C．A．Spindt， I， Brodie， L．Humphrey， et al， Physical properties of thin-film field emission cathodes with molybdenum cones．J．Appl．Phys．1976， 47， 5248-5263．
[11]L．Dvorson．M．Ding， A．I．Akinwande， Analytical electrostatic model of silicon conical field emitters．I．IEEE Trans．Electron Devices 2001，48， 134．
[12]R．Stratton， Field emission from semiconductors．Proc．Phys．Soc．London Vol．B68 pp 746-757 1955．
[13]R．Stratton， Theory of field emission from semiconductor．Phys．Rev．1962， 125， 67-82．[14]刘学壳著，阴极电子学，科学出版社，1980．
[15]C．A．Spindt， C．E．Holland， A．Rosengreen， et al， Field-emitter arrays for vacuum microelectronics．IEEE Trans．Electron Devices 1991，38， 2355-2363．
[16]K．Derbyshire， Beyond AMLCDs： field emission displays?．Solid State Technol．1994， 11， 55．
[17]茅东升，无氢非晶金刚石薄膜的制备及其电子场发射性能研究，中国科学院上海冶金研究所，博士学位研究生学位论文，2000．
[18]H．F．Gray．G．J．Campisi， R．F．Greene， A vacuum field effect transistor using silicon field emitter arrays．IEDM．Dig．Tech．Papers， 1986， 776-779．
[19]S．Kim， B．K．Ju， Y．H．Lee， et．al， Emission characteristic of diamond-tip field emitter arrays fabricated by transfer mold technique．J．Vac．Sci．Technol．B 1997， 15， 499．
[20]A．F．Myers， S．M．Camphausen， J．J．Cuomo， et al， Characterization of amorphous carbon coated silicon field emitters．J．Vac．Sci．Technol．B 1996， 14， 2024．
[21]V．V．Zhirnov， G．J．Wojak， W．B．Choi， et a]， Wide band gap materials for field emission devices．J．Vac．Sci．Technol．A 1997， 15， 1733-1738．
[22]F．J．Himpsel， J．A．Knapp， J．A．VanVechten， et al， Quantum photoyield of diamond(111)-A stable negative-affinity emitter．Phys．Rev．B 1979， 20， 624．
[23]J．Van der Weide， Z．Zhang， P．K．Baumann， et al， Negative-electron-affinity effects on the diamond (100) surface．Phys．Rev．B 1994， 50， 5803-5806．
[24]陈光华，邵乐喜，贺德衍等，宽带隙薄膜材料场电子发射研究的背景，现状和问题．物理2000， 29， 278-282．
[25]B．C．Djubua， N．N．Chubun， Emission properties of Spindt-type cold cathodes with different emission cone material．IEEE Trans．Electron．Devices 1991， 38， 2314．
[26]C．Wang， A．Garcia， D．C．Ingram， et al， Cold field emission from CVD diamond films observed in emission electron microscopy．Electron Lett．1991， 27， 1459．
[27]M．W．Geis， J．A．Gregory， B．B．Pate， Capacitance-voltage measurements on metal-SiO_2-diamond structures fabricated with (100)-and(111)-oriented substrates．IEEE Trans．Electron Devices 1991， 38， 619．
[28]K．Okano， K．Hoshina， S．Koizumi， et al， Fabrication of a miniature-size pyramidal-shape diamond field emitter array．IEEE Electron．Devices Lett．1995， 16， 239．
[29]K．Okano， K．Hoshina， S．Koizumi， et al， Fabrication of a diamond field emitter array．Appl．Phys．Lett．1994， 64， 2742．
[30]Walt A．de Heer， A．Chatelain， D．Ugarte， A Carbon Nanotube Field-Emission Electron Source．Science 1995， 17， 270， 1179．
[31]Q．L．Liao， Y．Zhang， J．J．Qi， et al， Field emission properties of a carbon nanotube cathode in different electric field modes．Mater．Lett．2008， 62， 1941-1944．
[32]T．Chen， Z．Sun， Y．W．Chen， et al， Enhancement of field emission property from hills-like carbon nanotubes film．Thin Solid Films 2008， 516， 1112-1115．
[33]S．M．C．Vieira， K．B．K．Teo， W．I．Milne， et al， Investigation of field emission properties of carbon nanotube arrays defined using nanoimprint lithography．Appl．Phys．Lett．2006， 89， 022111-022113.
[34] B. B. Pate, M. H. Hecht, C. Binns, et al, Photoemission and photon-stimulated ion desorption studies of diamond(111): Hydrogen. J. Vac. Sci. Technol. 1982,21,364.
[35] C. Bandis, B. B. Pate, Simultaneous field emission and photoemission from diamond. Appl.phys.Lett. 1996, 69, 366-368.
[36] O. Gr(o|¨)ning, O. M. Küttel, P. Gr(o|¨)ning, et al, Field emitted electron energy distribution from nitrogen-containing diamondlike carbon. Appl. Phys. Lett. 1997, 71,2253-2255.
[37] O. Ternyak, R. Akhvlediani, A. Hoffman, Field electron emission from undoped, continuous, submicron-thick diamond films. J. Appl. Phys. 2005, 98, 123522.
[38] J. Robertson, Recombination and photoluminescence mechanism in hydrogenated amorphous carbon. Phys. Rew. B 1996, 53, 16302-16305.
[39] J.Robertson, Mechanism of electron field emission from diamond, diamond-like and nanostructured carbon. J. Vac. Sci. Technol. B 1999, 17(2), 659-665.
[40] J. D. Carey, R. D. Forrest, R. U. A. Khan, et al, Influence of sp~2 clusters on the field emission properties of amorphous carbon thin films. Appl. Phys. Lett. 2000, 77, 2006-2008.
[41] J. P. Zhao, Z. Y. Chen, X. Wang, et al, Thickness-independent electron field emission from tetrahedral amorphous carbon films. Appl, Phys. Lett. 2000, 76, 191-193.
[42] J. D. Carey, R. D. Forrest, S. R. P. Silva, Origin of electric field enhancement in field emission from amorphous carbon thin films. Appl. Phys. Lett. 2001, 78, 2339-2341.
[43] M. W. Geis, J. C. Twichell, T. M. Lyszczarz, Diamond emitters fabrication and theory. J. Vac. Sci. Technol. 1996, 14,2060.
[44] R. D. Forrest, A. P. Burden, S. R. P. Silva, et al, A study of electron field emission as a function of film thickness from amorphous carbon films. Appl. Phys. Lett. 1998, 73,3784-3786.
[45] S. Gupta, B. L. Weiss, B. R. Weiner, et al, Study of the electron field emission and microstructure correlation in nanocrystalline carbon thin films. J Appl. Phys. 2001, 89, 5671-5675.
[46] Y. Umehara, S. Murai, Y. Koide, et al, Effects of sp~2/sp~3 bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition. Diam. Relat. Mat. 2002, 11, 1429-1435.
[47] W. Zhu, G. P. Kochanski, S. Jin, et al, Defect-enhanced electron field emission from chemical vapor deposited diamond. J. Appl. Phys. 1995, 78,2707.
[1] C. A. Spindt, I. Brodie, L. Humphrey, et al, Physical properties of thin-film field emission cathodes with molybdenum cones. J. Appl. Phys. 1976, 47, 5248-5263.
[2] F. J. Himpsel, J. A. Knapp, J. A. VanVechten, Quantum photoyield of diamond(111) -A stable negative-affinity emitter. Phys. Rev. B 1979, 20, 624-627.
[3] M. W. Geis, J. C. Twichell, J. Macaulay et al,Electron field emission from diamond and other carbon materials after H_2, O_2, and Cs treatment. Appl. Phys. Lett. 1995, 67,1328-1330.
[4] C. Bandis, B. B. Pate, Simultaneous field emission and photoemission from diamond. Appl. Phys. Lett. 1996, 69 (3), 366-368.
[5] M. W. Geis, J. C. Twichell, T. M. Lyszczarz, Diamond emitters fabrication and theory. J. Vac. Sci. Technol. B 1996, 14(3), 2060-2067.
[6] X. Lu, Q. Yang, C. Xiao, et al, Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration. Thin Solid Films 2008, 516,4217-4221.
[7] J. Robertson, Mechanisms of electron field emission from diamond, diamond-like carbon and nanostructured carbon. J. Vac. Sci. Technol. B 1999, 17.2, 659-665.
[8] P. W. May, S. Hohn, W. N. Wang, Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films. Appl. Phys. Lett. 1998, 72, 17, 2182-2184.
[9] P. W. May, S. Hohn, M. N. R. Ashfold, et al, Field emission from chemical vapor deposited diamond and diamond-like carbon films: Investigations of surface damage and conduction mechanisms. J. Appl. Phys. 1998, 84, 1618-1625.
[10] S. M. Metev, M. Ozegowski, K. Meteva, et al, Laser-assisted ECR-plasma-CVD of a-C:H films. Diam. Relat. Mat. 1996, 5, 420-424.
[11] A. Crunteanu, M. Charbonnier, M. Romand, et al,Structural and vibrational characterization of hydrogenated carbon nitride thin films obtained by laser-induced CVD. Appl. Surf. Sci.2000, 168, 44-47.
[12] C. Corbella, M. Vives, G. Oncins, et al, Characterization of DLC films obtained at room temperature by pulsed-dc PECVD．Diam．Relat．Mat．2004， 13， 1494-1499．
[13]A．Bubenzer， B．Dischler， G．Brandt， et al， RF-plasma deposited amorphous hydrogenated hard carbon thin films： preparation， properties，， and applications．J．Appl．Phys．1983， 54，4590-4595．
[14]L．Martinu， A．Raveh， D．Boutard， et al， Properties and stability of diamond-like carbon films related to bonded and unbonded hydrogen．Diam．Relat．Mat．1993， 2， 673-677．
[15]T．Y．You， O．Niwa， M．Tomita， et al， Characterization and electrochemical properties of highly dispersed copper oxide/hydroxide nanoparticles in graphite-like carbon films prepared by RF sputtering method．Eletrochem．Commun．2002， 4， 468-471．
[16]M．Sasaki， Y．Kozukue， K．Hashinoto， et al， Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputtering．Vacuum 2001， 74，455-459．
[17]Namba．， Attempt to grow diamond phase carbon-films from an organic solution．J．Vac．Sci．Technol．1992， A 10， 3368-3370．
[18]H．Kiyota， H．Araki， H．Kobayashi， et al， Electron field emission from diamond-like carbon films deposited by electrolysis of methanol liquid．Appl．Phys．Lett．1999， 75， 2331-2333．
[19]S．Gupta， M．Pal．Chowdhury， A．K．Pal， Field emission characteristics of diamond-like carbon films synthesized by electrodeposition technique．Appl．Surf．Sci．2004， 236，426-434．
[20]X．B．Yan， Tao．Xu， G．Chen， et al， Field-emission properties of diamond-like-carbon and nitrogen-doped diamond-like-carbon films prepared by electrochemical deposition．Appl．Phys．A 2005， 81， 41-46．
[21]H．Kiyota， M．Higashi， T．Kurosu， et al， Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid．J．Appl．Phys．2006， 99， 094903．
[22]叶凡，谢二庆，李瑞山等，类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究，物理学报，2005， 54卷，3935-3939．
[23]阎兴斌电化学沉积和聚合物先驱体热解法制备类金刚石碳及碳纳米复合薄膜的研究中国科学院兰州化学物理研究所博士论文2005．
[24][美]C．A．麦肯济著，大连工学院有机化学教研组，浙江大学有机化学教研组译，实验有机化学，人民教育出版社，1980．
[25] A. Grill, V. Patel, Characterization of diamondlike carbon by infrared spectroscopy. Appl. Phys. Lett. 1992, 60, 2089-2091.
[26] J. T. Jiu, K. Cai, Q. Fu, et al, Liquid deposition of hydrogenated carbon films in N,N-dimethyl formamide solution. Mater. Lett. 1999,41, 63-66.
[27] W. S. Simons, The Sadtler Handbook of Infrared Spectr, Sadtler Research Laboratories, 1978.
[28] A. Crunteanu, M. Charbonnier, M. Romand, et al, Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition. Surf. Coat. Technol. 2000,125,301-307.
[29] D. Briggs, J. C. Riviere, In Briggs D,Seah MP,editor. Practical Surface Analysis, Vol.1, Ch.3, Wiley,Great Britain, 1990, 160-162.
[30] E. Riedo, F. Comin, J. Chevrier, Structural properties and surface morphology of laser-deposited amorphous carbon and carbon nitride films. Surf. Coat. Technol. 2000, 125, 124-128.
[31] N. Paik, Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source. Surf. Coat. Techno. 2005, 200, 2170-2174.
[32] S. Lopez, H. M. Dunlop, M. Benmalek, XPS, XANES and ToF-SIMS Characterization of Reactively Magnetron-sputtered Carbon Nitride Films. Surf. Interface Anal. 1997, 25, 315-323.
[33] X. B. Yan, T. Xu, G. Chen, et al, Effect of deposition voltage on the microstructure of electrochemically deposited hydrogenated amorphous carbon films. Carbon 2004, 42,3103-3108.
[34] A. Hu, W. W. Duley, Surface enhanced Raman spectroscopic characterization of molecular structures in diamond-like carbon films. Chem. Phys. Lett. 2008, 450, 375-378.
[35] K. W. Sun, J. Y. Wang, T. Y. Ko, Raman spectroscopy of single nanodiamond: Phonon-confinement effects. Appl. Phys. Lett. 2008, 92, 153115.
[36] K. W. R. Gilkes, H. S. Sands, D. N. Batchelder, et al, Direct observation of sp~3 bonding in tetrahedral amorphous carbon using ultraviolet Raman spectroscopy. Appl. Phys. Lett. 1997, 70(15), 1980-1982.
[37] G. Inner, A. Dorner-Reisel, Micro-Raman studies on DLC coatings. Adv. Eng. Mater. 2005, 7(8), 694.
[38]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev．B 2001， 63，121405．
[39]酒金婷，付强等，液相电沉积类金刚石薄膜的相关物理化学问题，无机材料学报2002，17， 571-578．
[40]T．Suzuiki， Y．Manita， T．Yamazaki， et al， Deposition of carbon films by electrolysis of a water-ethylene glycol solution．J．Mater．Sci．1995， 30， 2067-2069．
[41]M．Tsuda， M．Nakajima， S．Oikawa， Epitaxial growth mechanism of diamond crystal in methane-hydrogen plasma．J．Am．Chem．Soc．1986， 108，5780-5783．
[42]阎兴斌，徐洮，王博等，电化学沉积DLC膜及其表征，材料科学与工程学报2003， 21，656-659．
[43]V．P．Novikov， V．P．Dymont， Synthesis of diamondlike films by an electrochemical method at atmospheric pressure and low temperature．Appl．Phys．Lett．1997， 70， 200-202．
[44]E．Shevchenko， E．Matiushenkov， D．Kochubey， et al， Chem．Commun．2001 317-318．
[45]茅东升，无氢非晶金刚石薄膜的制备及其电子场发射性能研究，中国科学院上海冶金研究所，博士学位研究生学位论文，2000．
[46]X．Lu， Q．Yang， C．Xiao， Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp2 phase concentration， Thin Solid Films 516 (2008) 4217-4221
[47]Y．Umehara， S．Murai， Yasuo Koide，et al， Effects of sp2ysp3bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition， Diamond and Related Materials 11 (2002) 1429-1435
[48]H．Kiyota， M．Higashi， T．Kurosu，et al， Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid．J．Appl．Phys．2006， 99， 094903．
[49]S．f．Shao， P．j．Jia， S．c．Liu， et al， Stable field emission from rose-like zinc oxide nanostructures synthesized through a hydrothermal route．Mater．Lett．2008， 62， 1200-1203．
[50]G．A．J．Amaratunga， S．R．P．Silva， Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes．Appl．Phys．Lett．1996， 68， 2529-2531．
[51]N．S．Xu， J．Chen， S．Z．Deng， et al， Physical origin of nonlinearity in the Fowler-Nordheim plot of field-induced emission from amorphous diamond films： Thermionic emission to field emission．Appl．Phys．Lett．2000， 76， 2463-2465．
[52] S. C. Lim, R. E. Stallcup Ⅱ, I.A. Akwani, et al, Effects of O_2, H_2, and N_2 gases on the field emission properties of diamond-coated microtips. Appl. Phys. Lett. 1999, 75, 1179.
[1] A. M. Liu, M. Cohen, Prediction of new low compressibility solids. Science 1989, 245, 841-842.
[2] J. Y. Hao, T. Xu, W. M. Liu, Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasma system. Mater. Sci. Eng. A 2005, 408, 297-302.
[3] T. I. T. Okpalugo, H. Murphy, A. A. Ogwu, Human Microvascular Endothelial Cellular Interaction With Atomic N-Doped DLC Compared With Si-Doped DLC Thin Films. J. Biomed. Mater. Res. B 2006, 78B, 2, 222-229.
[4] B. Zheng, W. T. Zheng, K. Zhang, et al, First-principle study of nitrogen incorporation in amorphous carbon. Carbon 2006, 44, 962-968.
[5] S. Kobayashi, S. Nozaki, H. Morisaki, et al, Carbon nitride thin films deposited by the reactive ion beam sputtering technique. Thin Solid Films 1996, 281-282, 289-293.
[6] N. Hellgren, M. P. Johansson, E. Broitman, et al, Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering. Phys. Rev. B 1999, 59, 5162-5169.
[7] D. Marton, K. J. Boyd, A. H. Al-Bayati, et al, Carbon Nitride Deposited using energetic species: A Two-Phase system. Phys. Rev. Lett. 1994, 73, 128-131.
[8] H. Z. Ma, L. Zhang, N. Yao, et al, The effect of nitrogen addition on field emission of diamond-like carbon films. Diam. Relat. Mat. 2000, 9, 1608-1611.
[9] A. P. Caricato, G. Leggieri, A. Luches, et al, Characterization of C-N thin films deposited by reactive excimer laser ablation of graphite targets in nitrogen atmosphere. Thin Solid Films 1997, 307, 54-59.
[10] D. S. Mao, J. Zhao, W. Li, et al, Electron field emission from nitrogen-containing diamond-like carbon films deposited by filtered arc deposition. Mater. Lett. 1999, 41, 117-121.
[11] R. McCann, S. S. Roy, P. Papakonstantinou, et al, Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing. Thin Solid Films 2005, 482, 34-40.
[12] Gehan A. J. Amaratunga, S. R. P. Silva, Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes. Appl. Phys. Lett. 1996, 68,2529-2531.
[13] S. R. P. Silva, J. Robertson, G. A. J. Amaratunga, et al, Nitrogen modification of hydrogenated amorphous carbon films. J. Appl. Phys. 1997, 81,2626-2634.
[14] Namba., Attempt to grow diamond phase carbon-films from an organic solution. J. Vac. Sci. Technol.A1992. 10,3368-3370.
[15] Q. Fu, J. T. Jiu, H. Wang, et al, Simultaneous formation of diamond-like carbon and carbon nitride films in the electrodeposition of an organic liquid. Chem. Phys. Lett. 1999, 301, 87-90.
[16] J. W. Sun, Y. F. Zhang, X. X. He, et al, Amorphous CN films prepared by electrochemical deposition. Mater. Lett. 1999, 38, 98-102.
[17] X. B. Yan, T. Xu, G Chen, et al, Study of structure, tribological properties and growth mechanism of DLC and nitrogen-doped DLC films deposited by electrochemical technique. Appl. Surf. Sci. 2004, 236, 328-335.
[18] S. Kundoo, A. N. Banerjee, P. Saha, et al, Synthesis of crystalline carbon nitride thin films by electrolysis of methanol-urea solution. Mater. Lett. 2003, 57,2193-2197.
[19] Q. Fu, C. B. Cao, H. S. Zhu, Synthesis of Nitrogenated Carbon Films by Cathodic Electrodeposition at the Solid-liquid Interface. Mater. Lett. 2000,42, 166-170.
[20] Q. Fu, J. T. Jiu, K. Cai, Attempt to deposit carbon nitride films by electrodeposition from an organic liquid. Phys. Rev. B 1999, 59, 1693-1696.
[21] S. F. Shao, P. J. Jia, S. C. Liu, et al, Stable field emission from rose-like zinc oxide nanostructures synthesized through a hydrothermal route. Mater. Lett. 2008, 62, 1200-1203.
[22] R. Z. Wang, H. Yan, B. Wang, et al, Field emission enhancement by the quantum structure in an untrathin multilayer paanar cold cathode. Appl. Phys. Lett. 2008, 92, 142102.
[23] X. Lu, Q. Yang, C. Xiao, et al, Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration. Thin Solid Films 2008, 516 4217-4221.
[24] S. Cui, Y. L. Li, Y. B. Guo, et al, Fabrication and Field-Emission Properties of Large-Area Nanostructures of the Organic Charge-Transfer Complex Cu-TCNAQ. Adv. Mater. 2008, 20,309-313.
[25] S. R. P. Silva, J. Robertson, G. A. J. Amaratunga, Nitrogen modification of hydrogenated amorphous carbon films．J．Appl．Phys．1997， 81(6)， 2626-2634．
[26]O．Amir， R．Kalish， properties of nitrogen-doped amorphous hydrogenated carbon films．J Appl．Phys．1991，70， 4958-4962．
[27]B．S．Satyanarayana， A．Hart， W．I．Milne， et al， Field emission from tetrahedral amorphous carbon．Appl．Phys．Lett．1997， 71，1430-1432．
[28]S．R．P．Silva， Gehan A．J．Amaratunga， J．R．Barnes， Self-texturing of nitrogenated amorphous carbon thin films for electron field emission．Appl．Phys．Lett．1997， 71(11)，1477-1479
[29]H．Z．Ma， L．Zhang， N．Yao， et al， The effect of nitrogen addition on field emission of diamond-like carbon films．Diam．Relat．Mat．2000， 9， 1608-1611．
[30]Gehan A．J．Amaratunga， S．R．P．Silva， Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes．Appl．Phys．Lett．1996， 68， 2529-2531．
[31]S．Kundoo， P．Saha， K．K．Chattopadhyay， Electron field emission from nitrogen and sulfur-doped diamond-like carbon films deposited by simple electrochemical route．Mater．Lett．2004， 58， 3920- 3924．
[32]叶凡，谢二庆，李瑞山等，类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究．物理学报2005， 54卷，3935-3939．
[33]X．B．Yan， T．Xu， G．Chen， et al， Field-emission properties of diamond-like-carbon and nitrogen-doped diamond-like-carbon films prepared by electrochemical deposition．Appl．Phys．A 2005， 81， 41-46．
[34]X．M．Tian， S．Adhikari， S．Adhikary， et al， Nitrogen incorporated diamond-like carbon films by microwave surface wave plasma CVD．Diam．Relat．Mat．2005， 14， 1839-1842．
[35]E．Riedo， F．Comin， J．Chevrier， et al， Structural properties and surface morphology of laser-deposited amorphous carbon and carbon nitride films．Surf．Coat．Technol．2000， 125，124-128．
[36]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Techno．2000，125，301-307．
[37]D．Marton， K．J．Boyd， A．H．Al-Bayati， et al， Carbon Nitride Deposition Using Energetic Species： A Two-Phase System．Phys．Rev．Lett．1994， 73， 118-121．
[38]A．Grill， V．Patel， Characterization of diamondlike carbon by infrared spectroscopy．Appl．Phys．Lett．1992， 60， 2089-2091．
[39]J．T．Jiu， K．Cai， Q．Fu， et al， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41， 63-66．
[40]W．S．Simons， The Sadtler Handbook of Infrared Spectr， Sadtler Research Laboratories， 1978．
[41]G．Irmer， A．Dorner-Reisel， Micro-Raman studies on DLC coatings．Adv．Eng．Mater．2005，7(8)， 694．
[42]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev．B 2001， 63， 121405
[43]X．B．Yan， T．Xu， G．Chen， et al， Study of structure， tribological properties and growth mechanism of DLC and nitrogen-doped DLC films deposited by electrochemical technique．Appl．Surf．Sci．2004， 236， 328-335．
[44]J．W．Sun， Y．F．Zhang， X．X．He， et al， Amorphous CN films prepared by electrochemical deposition．Mater．Lett．1999， 38， 98-102．
[45]S．Kundoo， A．N．Banerjee， P．Saha， et al， Synthesis of crystalline carbon nitride thin films by electrolysis of methanol-urea solution．Mater．Left．2003， 57， 2193-2197．
[46]阎兴斌电化学沉积和聚合物先驱体热解法制备类金刚石碳及碳纳米复合薄膜的研究中科院兰州化学物理研究所博士毕业论文2005．
[47]V．S．Veerasamy， J．Yuan， G．Amaratunga， et al， Nitrogen doping of highly tetrahedral amorphous carbon．Phys．Rev．B 1993， 48， 17954．
[48]C．A．Davis， D．R．McKenzie， Y．Yin， et al， Substitutional nitrogen doping of tetrahedral amorphous carbon．Philos．Mag．B 1994， 69， 1133-1140．
[49]M．Weiler， S．Sattel， T．Giessen，et al， Preparation and properties of highly tetrahedral hydrogenated amorphous carbon．Phys．Rev．B 1996， 53， 1594．
[50]D．I．Jones， A．D．Stewart， Properties of hydrogenated amorphous carbon films and the effects of doping．Philos．Mag．B 1982， 46， 423-434．
[51]A．Helmbold， P．Hammer， J．U．Thiele，et al， Electrical conductivity of amorphous hydrogenated carbon．Philos．Mag．B 1995， 72， 335-350．
[52]W．Zhu， G．P．Kochanski， S．Jin，et al， Defect-enhanced electron field emission from chemical vapor deposited diamond．J．Appl．Phys．1995， 78， 2707．
[53] G. A. J. Amaratunga, S. R. P. Silva, Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes. Appl. Phys. Lett. 1996, 68, 2529.
[54]Y. Umehara, S. Murai, Y. Koide, M. Murakami, Effects of sp~2/sp~3 bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition. Diam. Relat. Mater. 11 (2002), 1429-1435.
[55] J. J. Li, C. Z. Gu, H. Y. Peng, et al, Field emission properties of diamond-like carbon films annealed at different temperatures, Appl. Surf. Sci. 2005, 251, 236-241.
[1] J. Robertson, Diamond-like amorphous carbon, Mater. Sci. Eng. R. 2002, 37, 129-281.
[2] Peter R. Goglia, Jeffrey Berkowitz, Joel Hoehn, et al, Diamond-like carbon applications in high density hard disc recording heads. Diam. Relat. Mat. 2001, 10, 271-277.
[3] M. Vojs, E. Zdravecká, M. Marton, et al., Properties of amorphous carbon layers for bio-tribological applications. Microelectron. J. 2009, 40, 650-653.
[4] G.y Dearnaley, J. H. Arps, Biomedical applications of diamond-like carbon (DLC) coatings: A review. Surf. Coa. Technol. 2005, 200, 2518-2524.
[5] W. S. Choi, K. H. Kim, J. S. Yi, Diamond-like carbon protective anti-reflection coating for Si solar cell. Mater. Lett. 2008, 62, 577-580.
[6] S. Zhang, Y. Q. Fu, H. J. Du, Magnetron sputtering of nanocomposite (Ti,Cr)CN/DLC coatings. Surf. Coat. Technol. 2002, 162, 42-48.
[7] K. C. Park, J. H. Moon, J. Jang, et al, Deposition of hydrogen-free diamond-like carbon film by plasma enhanced chemical vapor deposition. Appl. Phys. Lett. 1996, 68(25), 3594-3696.
[8] H. Park, Y. K. Hong, J. S. Kim,et al, Surface morphology of laser deposited diamondlike films by atomic force microscopy imaging. Appl. Phys. Lett. 1996, 69(6), 779-781.
[9] Y. Ohgoe, K. K. Hirakuri, K. Tsuchimoto, et al, Uniform deposition of diamond-like carbon films on polymeric materials for biomedical applications. Surf. Coat. Technol. 2004, 184, 263-269.
[10] Y. Ohgoe, K. K. Hirakuri, Diamondlike carbon film deposition on a polycarbonate-tube inner wall using a cylindrical electrode with radio frequency glow discharge plasma. J. Appl. Phys. 2005, 97, 024906.
[11] Namba., Attempt to grow diamond phase carbon-films from an organic solution. J.Vac.Sci.Technol. A 1992, 10,3368-3370.
[12] H. Wang, M. R. Shen, Z. Y. Ning, Deposition of diamond-like carbon films by electrolysis of methanol solution. Appl. Phys. Lett. 1996, 69, 1074-1076.
[13] H. Wang, M. R. Shen, Z. Y. Ning, et al, Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions. Thin Solid Films 1997, 293, 87-90．
[14]K．Cai， D．Guo， Y．Huang， et al， Evaluation of diamond-like carbon films deposited on conductive glass from organic liquids using pulsed current．Surf．Coat．Technol．2000， 130，266-273．
[15]Z．Sun， Y．Sun， X．Wang， Investigation of phases in the carbon films deposited by electrolysis of ethanol liquid phase using Raman scattering．Chem．Phys．Lett．2000， 318， 471-475．
[16]J．T．Jiu， H．Wang， K．Cai， et al， Liquid phase deposition of hydrogenated diamond-like carbon films on conductive glass substrates using a pulse-modulated source．Mater．Res．Bull 1999， 34， 1501-1506．
[17]D．Guo， K．Cai， L．T．Li， et al， Evaluation of diamond-like carbon films electrodeposited on an Al substrate from the liquid phase with pulse-modulated power．Carbon 2001， 39，1395-1398．
[18]T．M．Manhabosco， I．L．Muller， Electrodeposition of diamond-like carbon (DLC) films on Ti．Appl．Surf．Sci．2009， 255， 4082-4086．
[19]R．K．Roy， B．Deb， B．Bhattacharjee， et al， Synthesis of diamond-like carbon film by novel electrodeposition route．Thin Solid Films 2002， 422， 92-97．
[20][美]C．A．麦肯济著，大连工学院有机化学教研组，浙江大学有机化学教研组译，实验有机化学，人民教育出版社，1980．
[21]A．Grill， V．Patel， Characterization of diamondlike carbon by infrared spectroscopy．Appl．Phys．Lett．1992， 60， 2089-2091．
[22]J．T．Jiu， K．Cai， Q．Fu， et al， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41， 63-66．
[23]W．S．Simons， The Sadtler Handbook of Infrared Spectr， Sadtler Research Laboratories， 1978．
[24]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Technol．2000，125，301-307．
[25]G．Irmer， A．Dorner-Reisel， Micro-Raman studies on DLC coatings， Adv．Eng．Mater．2005，7(8)， 694．
[26]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev B 2001， 63， 121405．
[2]A．Grill， Diamond-like carbon： state of the art．Diam Relat．Mat．1999， 8， 428-434．
[3]A．H．Lettington， Applications of diamond-like carbon thin films．Carbon 1998， 36， 555-560．
[4]W．I．Milne， Electronic devices from diamond-like carbon．Semicond．Sci．Technol．2003．18，S81-S85．
[5]J．Robertson， Mechanical properties and coordinations of amorphous carbons．Phys．Rev．Lett．1992， 68， 220-223．
[6]A．Grill， Electrical and optical properties of diamond-like carbon．Thin Solid Films 1999， 356，89-193．
[7]S．Aisenberg， R．Chabot， Ion-beam deposition of thin films of diamondlike carbon．J．Appl．Phys．1971， 42， 2953-2958．
[8]W．Jacob， W．Moller， On the structure of thin hydrocarbon films．Appl．Phys．Lett．1993， 63，1771-1773．
[9]J．Robertson， E．P．O'Reilly， Electronic and atomic structure of amorphous carbon．Phys．Rev．B 1987， 35， 946-2957．
[10]J．C．Angus， F．Jansen， Dense “diamondlike” hydrocarbons as random covalent networks．J．Vac．Sci．Technol．A 1988， 6， 1778-1782．
[11]J．C．Angus， Diamond and diamond-like films．Thin Solid Films 1992， 216， 126-133．
[12]郑伟涛，《薄膜材料与薄膜技术》化学工业出版社，2004．
[13]S．M．Metev， M．Ozegowski， K．Meteva， et al， Laser-assisted ECR-plasma-CVD of a-C：H films．Diam Relat．Mat．1996， 5， 420-424．
[14]A．Crunteanu， M．Charbonnier， M．Romand， et al， Structural and vibrational characterization of hydrogenated carbon nitride thin films obtained by laser-induced CVD．Appl．Surf．Sci．2000， 168， 4-47
[15]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Technol．2000， 125．301-307．
[16] C. Corbella, M. Vives, G. Oncins, et al, Characterization of DLC films obtained at room temperature by pulsed-dc PECVD. Diam Relat. Mat. 2004, 13, 1494-1499.
[17] T. Michler, M. Grischke, I. Traus, et al, Mechanical properties of DLC films prepared by bipolar pulsed DC PACVD. Diam Relat. Mat. 1998, 7, 1333-1337.
[18] M. Suzuki, T. Watanabe, A. Tanaka, et al, Tribological properties of diamond-like carbon films produced by different deposition techniques. Diam Relat. Mat. 2003, 12, 2061-2065.
[19] S. Kuman, C. M. S. Rauthan, P. N. Dixit, et al, Versatile microwave PECVD technique for deposition of DLC and other ordered carbon nanostructures. Vacuum 2001, 63, 433-439.
[20] A. Bubenzer, B. Dischler, G Brandt,et al, RF-plasma deposited amorphous hydrogenated hard carbon thin films: preparation, properties, and applications. J. Appl. Phys. 1983, 54,4590-4595.
[21] G. Fedosenko, A. Schwabedissen, D. Korzec, et al, Diamond-like carbon film deposition by a 13.56 MHz hollow cathode RF-RF system using different precursor gases. Surf. Coat. Technol. 2001, 142-144, 693-697.
[22] H. X, T. Xu, J. M. Chen, et al, The effect of applied dc bias voltage on the properties of a-C:H films prepared in a dual dc-rf plasma system. Appl. Surf. Sci. 2004,227, 364-372.
[23] L. Martinu, A. Raveh, D. Boutard, et al, Properties and stability of diamond-like carbon films related to bonded and unbonded hydrogen. Diam. Relat. Mat. 1993,2, 673-677.
[24] M. Weiler, K. Lang, E. Li, et al, Deposition of tetrahedral hydrogenated amorphous carbon using a novel eletron cyclotron wave resonance reactor. Appl. Phys. Lett. 1998, 72, 1314-1316.
[25] V. Kopustinskas, S. Meskinis, S. Tamulevicius, et al, Direct ion beam deposited carbon films and clusters. Vacuum 2003, 72. 193-198.
[26] A. Yu. Belov, H. U. J(a|¨)ger, Atomistic study of ion-beam deposition conditions for hard amorphous carbon. Comput. Mater. Sci. 2003, 27,16-22.
[27] I. Gerhards, C. Ronning, U. Vetter, et al, Ion beam synthesis of amorphous carbon thin films containing metallic nanoclusters. Surf. Coat. Technol. 2002, 158-159, 114-119.
[28] C. Weissmantel, K. Bewilogua, D. Dietrich, et al, Structure and properties of quasi-amorphous films prepared by ion beam techniques. Thin Solid Films 1980, 72, 19-32.
[29] Y. Hoshi, E. Suzuki, T. Osaka, Diamond-like carbon films deposited without deposition particles of large incidence angles by sputtering. J. Magn. Magn. Mater. 1997, 176, 51-55.
[30] T. Y. You, O. Niwa, M. Tomita, et al, Characterization and electrochemical properties of highly dispersed copper oxide/hydroxide nanoparticles in graphite-like carbon films prepared by RF sputtering method. Electrochem. Commun. 2002, 4, 468-471.
[31] S. Chowdhury, M. T. Laugier, 1. Z. Tahman, Effect of target self-bias voltage on the mechanical properties of diamond-like carbon films deposited by RF magnetron sputtering. Thin Solid Films 2004, 468, 149-154.
[32] M. Sasaki, Y. Kozukue, K. Hashinoto, et al, Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputtering. Vacuum 2001, 74, 455-459.
[33] I. G. Brown, Cathodic arc deposition of films. Annu. Rev. Mater. Sci. 1998, 28, 243-269.
[34] M. C. polo, J. L. Andujar, A. Hart, et al, Preparation of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition. Diam Relat. Mat. 2000, 9, 663-667.
[35] C. K. Park, S. M. Chang, H. S. Uhm, et al, XPS and XRR studies on microstructures and interfaces of DLC films deposited by FCVA method. Thin Solid Films 2002, 420-421,235-240.
[36] Zs. Geretovszky, T. Haraszti, T. Sz(o|¨)rényi, et al, Morphological study of PLD grown carbon films. Appl. Surf. Sci. 2003, 208-209, 566-574.
[37] S. M. Mominuzzaman, T. Soga, T. Jimbo, et al, Camphoric carbon soot: a new target for deposition of diamond-like carbon films by pulsed laser ablation. Thin Solid Films 2000, 376, 1-4.
[38] S. S. Pang, S. Y. Lee, H. S. Jung, et al, Effect of laser parameters on the property of DLC films grown by pulsed laser deposition. Surf. Coat. Technol. 1999, 115, 266-269.
[39] H. Pan, M. Pruski, B. C. Gerstein, et al, Local coordination of carbon atoms in amorphous carbon. Phys. Rev. B 1991, 44, 6741-6745.
[40] S. Kaplan, F. Jansen, M. Machonkin, Characterization of amorphous carbon-hydrogen films by solid-state nuclear magnetic resonance. Appl. Phys. Lett. 1985,47, 750-753.
[41] C. Jager, J. Gottwald, H. W. Spiess, et al, Structural properties of amorphous hydrogenated carbon. Ⅲ. NMR investigations. Phys. Rev. B., 1994, 50, 846-852.
[42] M A. Tamor, W. C. Vassell, K. R. Carduner, Atomic constraint in hydrogenated diamond-like carbon. Appl. Phys. Lett., 1991, 58, 592-594.
[43] C. Donnet, J. Fontaine, F. Lefbvre, et al, Solid state ~(13)C and ~1H nuclear magnetic resonance investigations of hydrogenated amorphous carbon. J. Appl. Phys. 1999, 85, 3264-3270.
[44] R. Haerle, E. Riedo, A. Pasquarello, et al, sp~2/sp~3 hybridization retio in amorphous carbon from C ls core-level shifts: X-ray photoelectron spectroscopy and first-principles calculation. Phys. Rev. B2001, 65,45101-45110.
[45] C. K. Park, S. M. Chang, H. S. Uhm, et al, XPS and XRR studies on microstructures and interfaces of DLC films deposited by FCVA method. Thin Solid Films 2002, 420-421,235-240.
[46] P. Mérel, M. Tabbal, M. Chaker, et al, Direct evaluation of the sp~3 content in diamond-like-carbon films by XPS. Appl. Surf. Sci. 1998, 136, 105-110.
[47] C. M(o|¨)βner, P. Grant, H. Tran, et al, Characterization of diamond-like carbon by Raman spectroscopy, XPS and optical constants. Thin Solid Films 1998, 317, 397-401.
[48] D. S. Knight, W. B. White, Characterization of diamond films by Raman spectroscopy. J. Mater. Res. 1989,4,385-393.
[49] R. J. Nemanich, S. A. Solin, First- and second-order Raman scattering from finite-size crystals of graphite. Phys. Rev. B 1979, 20, 392-401.
[50] B. S. Elman, M. Shayegan, M. S. Dresselhaus, et al, Structural characterization of ion-implanted praphite. Phys. Rev. B 1982, 25,4142-4156.
[51] M. H. Grimsditch, A. K. Ramdas, Brillouin scattering in diamond. Phys. Rev. B 1975, 11,3139-3148.
[52] F. Tuinstra, J. L. Koenig, Raman spectrum of Graphite. J. Chem. Phys. 1970, 53, 1126-1130.
[53] P. Lespade, R. Al-Jishi, M. S. Dresselhaus, Model of Raman scattering from incompletely graphitized carbons. Carbon 1982, 20,427-431.
[54] R. J. Nemanich, J. T. Glass,G. Lucovsky, et al.,Raman scattering characterization of carbon bonding in diamond and diamondlike thin films. J. Vac. Sci. Technol. A 1988, 6, 1783-1787.
[55] M. A. Tamor, W. C. Vassell, Raman Fingerprinting of Amorphous-Carbon Films. J. Appl. Phys. 1994, 76, 3823-3830.
[56] B.Marcus, L. Fayette, M. Mermoux, et al.,Analysis of the structure of multicomponent carbon-films by resonant Raman-Scattering. J. Appl. Phys. 1994, 76, 3463-3470.
[57]J．Schwan， S．Ulrich， V．Batori， et al， Raman spectroscopy on amorphous carbon films．J．Appl．Phys．1996， 80， 440-447．
[58]B．K．Tay， X．Shi， H．S．Tan， et al， Raman studies of tetrahedral amorphous carbonfilms deposited by filtered cathodic vacuum arc．Surf．Coat．Technol．1998， 105， 155-158．
[59]A．C．Ferrari， J．Roberson， Interpretation of Raman Sprectra of disordered and amorphous carbon Phys．Rev．B 2000， 61，14095-14107．
[60]M．Ransteiner， J．Wagner， Resonant Raman scattering of hydrogenated amorphous carbon：Evidence for pi-bonded carbon clusters．Appl．Phys．Lett．1987， 51，1355-1357．
[61]N．Wada， P．J．Gaczi， A．Solin．“Diamond-like” 3-fold coordinated amorphous carbon．J．Non-Cryst．Solids 1980， 35-36， 543-548．
[62]K．W．R．Gilkes， H．S．Sands， D．N．Batchelder， et al， Direct observation of sp~3 bonding in tetrahedral amorphous carbon using ultraviolet Raman spectroscopy．Appl．Phys．Lett．1997，70， 1980-1982．
[63]V．I．Merkulov， J．S．Lannin， C．H．Munro， et al， UV studies of tetrahedral bonding in diamondlike amorphous carbon．Phys．Rev．Lett．1997， 78， 4869-4872．
[64]K．W．R．Gilkes， S．Prawer， K．W．Nugent， et al， Direct quantitative detection of the sp~3 bonding in diamond-like carbon films using ultraviolet and visible Raman spectroscopy．J Appl．Phys．2000， 87， 7283-7289．
[65]G．Adamopoulos， K．W．R．Gilkes， J．Robertson， et al， Ultraviolet Raman characterization of diamond-like carbon films．Diam．Relat．Mat．1999， 8， 541-544．
[66]J．R．Shi， X．Shi， Z．Sun， et al， Resonant Raman studies of tetrahedral amorphous carbon films．Diam．Relat．Mat．2001，10， 76-81．
[67]G．P．Lopinski， V．I．Merkulov．J．S．Lannin， Vibrational states of tetrahedral amorphous carbon．Appl．Phys．Lett．1996， 69， 3348-3350．
[68]唐伟忠《薄膜材料制备原理、技术及应用》冶金工业出版社，2003．
[69]Richard Lossy， David L．Pappas， Ronnen A．Roy， et al， Filtered arc deposition of amorphous diamond．Appl．Phys．Lett．1992， 61，171-173．
[70]D．Y．Wang， K．W．Weng， S．Y．Hwang， Study on metal-doped diamond-like carbon films synthesized by cathodic arc evaporation．Diam．Relat．Mat．2000， 9， 1762-1766．
[71]C．Donnet， Advanced solid lubricant coatings for high vacuum environments．Surf．Coat． Technol．1996， 80， 151-156．
[72]K．Enke， Dry machining and increase of endurance of machine parts with improved doped DLC coatings on steel， ceramics and aluminium．Surf．Coat．Technol．1999， 116-119，488-491．
[73]K．Vercammen， J．Meneve， E．Dekempeneer， et al，Study of RF PACVD diamond-like carbon coatings for space mechanism applications．Surf．Coat．Technol．1999， 120-121，612-617．
[74]沈风雷，《钛合金表面液相法沉积DLC薄膜及其血液相容性研究》南京工业大学博士论文，2003．
[75]F．Z．Cui， D．J．Li， A review of investigations on biocompatibility of diamond-like carbon and carbon nitride films．Surf．Coat．Technol．2000， 131， 481-487．
[76]V．M．Tiainen， Amorphous carbon as a bio-mechanical coating-mechanical properties and biological applications．Diam．Relat．Mat．2001， 10， 153-160．
[77]M．Mohanty， T．V．Anilkumar， P．V．Mohanan， et al．， Long term tissue response to titanium coated with diamond like carbon．Biomol．Eng．2002， 19， 125-128．
[78]G．A．Abbas， J．A．McLaughlin， E．Harkin-Jones， A study of ta-C， a-C：H and Si-a：C：H thin films on polymer substrates as a gas barrier．Diam．Relat．Mat．2004， 13， 1342-1345．
[79]N．V．Novikov， A．G．Gontar， S．I．Khandozhko， et al， Protective diamond-like coatings for optical materials and electronic devices．Diam．Relat．Mat．2000， 9， 792-795．
[80]A．Grill， From tribological coatings to low-k dielectrics for ULSI interconnects．Thin Solid Films 2001， 398 -399， 527-532．
[81]B．S．Satyanarayana， A．Hart， W．I．Milne， et al， Field emission from tetrahedral amorphous carbon．Appl．Phys．Lett．1997， 71 (10)， 1430-1432．
[82]A．P．Burden， R．D．Forrest， S．R．P．Silva， Enhancing the field emission properties of amorphous carbon films by thermal annealing．Thin Solid Films 1999， 337， 257-260．
[83]J．J．Li， C．Z．Gu， H．Y．Peng， et al， Field emission properties of diamond-like carbon films annealed at different temperatures．Appl．Surf．Sci．2005， 251， 236-241．
[84]X．Lu， Q．Yang， C．Xiao， A．Hirose， Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration．Thin Solid Films 2008，516，4217-4221．
[85]彭鸿雁，赵立新．类金刚石膜结构的制备性能与应用[M]．材料科学与工-程，2004， 18．
[86]戴达煌，周克松．金刚石薄膜沉积制备工艺与应用[M]．冶金工业出版社，2001， 171．
[87]田民波，刘德令编译，《薄膜科学与技术手册》机械工业出版社，1991．
[88]L．L．Maissel， R．Glang， Handbook of thin film technology， (McGraw-Hill)， New York， 1970，Chap．5．p5．
[89]Y．Namba， Attempt to grow diamond phase carbon film from an organic solution[J]．J．Vac．Sci．Technol．A 1992， 10， 3368-3370．
[90]T．Suzuki， Y．Manita， T．Yamazaki， et al，Deposition of carbon-films by electrolysis of a water-ethylene glycol solution．J．Mater Sci 1995， 30， 2067-2069．
[91]H．Wang， M．R．Shen， Z．Y．Ning， Deposition of diamond-like carbon films by electrolysis of methanol solution．Appl．Phys．Lett．1996， 69， 1074-1076
[92]H．S．Zhu， J．T．Jiu， Q．Fu， Aroused problems in the deposition of diamond-like carbon films by using the liquid phase electrodeposition technique．J．Mater．Sci．2003， 38， 141-145．
[93]X．B．Yan， T．Xu， G．Chen， et al， Effect of deposition voltage on the microstructure of electrochemically deposited hydrogenated amorphous carbon films．Carbon 2004， 42，3103-3108．
[94]H．Wang， M．R．Shen， Z．Y．Ning．et al， Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions．Thin Solid Films， 1997， 293，1-2， 87-90．
[95]L．T．Li， Y．Huang， Electrodeposition of diamond-like amorphous carbon films on Si from N，N-dimethylformamide．Chem．Phys．Lett．2000， 329， 346-3 50．
[96]K．Cai， D．Guo，H．S．Zhu， Deposition of diamond-like carbon films on aluminum in the liquid phase by an electrochemical method．Carbon 1999， 37， 1860-1862．
[97]J．T．Jiu， K．Cai， Q．Fu， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41，2， 63-66．
[98]C．b．Cao， H．S．Zhu， H．Wang， Electrodeposition diamond-like carbon films from organic liquids．Thin Solid Films 2000， 368， 2， 203-207．
[99]Q．Fu， J．T．Jiu， C．B．Cao， Electrodeposition of carbon films from various organic liquids．Surf．Coat．Technol．2000， 124， 2-3， 196-200．
[100]Q．Fu， J．T．Jiu， H．Wang， Simultaneous formation of diamond-like carbon and carbon nitride films in the electrodeposition of an organic liquid．Chem．Phys．Lett．1999， 301，87-90．
[101]P．Aublanc， V．P．Novikov， L．V．Kuznetsova， Diamond synthesis by electrolysis of acetates Diam．Relat．Mat．2001， 10， 942-946．
[102]R．K．Roy， B．Deb， B．Bhattacharjee， et al， Synthesis of diamond-like carbon film by novel electrodeposition route．Thin Solid Films， 2002， 422， 1-2， 92-97．
[103]S．Gupta， R．K．Roy， B．Deb， et al， Low voltage electrodeposition of diamond-like carbon films．Mater．Lett， 2003， 57， 22-23， 3479-3485．
[104]S．Gupta， M．Pal Chowdhury， A．K．Pal， Synthesis of DLC films by electrodeposition technique using formic acid as electrolyte．Diam Relat．Mat．2004， 13， 9， 1680-1689．
[105]V．P．Novikov， V．P．Dymont， Synthesis of diamondlike films by an electrochemical method at atmospheric pressure and low temperature．Appl．Phys．Lett．1997， 70， 200．
[106]酒金婷，付强，汪浩等，液相电沉积类金刚石薄膜的相关物理化学问题[J]．无机材料学报，2002， 17(3)， 571-578．
[107]H．Wang， M．R．Shen， Z．Y．Ning， et al， Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions．Thin Solid Films， 1997， 293，87-90．
[108]K．Cai， D．Guo， Y．Huang， et al， Evaluation of diamond-like carbon films deposited on conductive glass from organic liquids using pulsed current．Surf．Coat．Technol．2000， 130，266-273．
[109]Z．Sun， Y．Sun， X．Wang， Investigation of phases in the carbon films deposited by electrolysis of ethanol liquid phase using Raman scattering．Chem．Phys．Lett．2000， 318，471-475．
[110]J．T．Jiu， H．Wang， K．Cai， et al， Liquid phase deposition of hydrogenated diamond-like carbon films on conductive glass substrates using a pulse-modulated source．Mater．Res．Bull 1999， 34， 1501-1506．
[111]D．Guo， K．Cai， L．T．Li， et al， Evaluation of diamond-like carbon films electrodeposited on an Al substrate from the liquid phase with pulse-modulated power．Carbon 2001， 39，1395-1398．
[112]T．M．Manhabosco， I．L．Muller， Electrodeposition of diamond-like carbon (DLC) films on Ti. Appl. Surf. Sci. 2009, 255, 4082-4086.
[113] R. K. Roy, B. Deb, B. Bhattacharjee, et al, Synthesis of diamond-like carbon film by novel electrodeposition route. Thin Solid Films 2002, 422, 92-97.
[114] M. C. Alex, P. Charoendee, D. G. Terea, J. Mater. Res. 2003, 18(7), 1561-1565.
[115] H. Wang, M. R. Shen, Z. Y. Ning, et al, Pulsed Elec-trodeposition of diamond-like carbon films. J. Mater. Res. 1997, 12( 11), 3102-3105.
[1]刘敏，雷威，张晓兵等，真空微电子学的研究和进展，电子器件2003， 26， 428-433．
[2]刘元震，王仲春，董亚强，电子发射与光电阴极，北京理工大学出版社，1995， 6．
[3]Meng Ding， Field Emission From Silicon， Massachusetts Institute of Technology， 2001， 31博士毕业论文．
[4]邓江，林祖伦，张仪德，场发射显示器研究现状．现代显示2005， 4， 8-11．
[5]基泰尔，固体物理导论，化学工业出版社，1979， 173．
[6]W．Schottky， Z．Phys．1923， 14， 63．
[7]L．W．Nordheim， Proc．Roy．Soc．A 1928， 121，626．
[8]N．A．de Bruyne， Proc．Roy．Soc．A 1928， 120， 423．
[9]W．W．Dolon， W．P．Dyke， Temperature-and-Field Emission of Electrons from Metals．Phys．Rev．1954， 95， 327-332
[10]C．A．Spindt， I， Brodie， L．Humphrey， et al， Physical properties of thin-film field emission cathodes with molybdenum cones．J．Appl．Phys．1976， 47， 5248-5263．
[11]L．Dvorson．M．Ding， A．I．Akinwande， Analytical electrostatic model of silicon conical field emitters．I．IEEE Trans．Electron Devices 2001，48， 134．
[12]R．Stratton， Field emission from semiconductors．Proc．Phys．Soc．London Vol．B68 pp 746-757 1955．
[13]R．Stratton， Theory of field emission from semiconductor．Phys．Rev．1962， 125， 67-82．[14]刘学壳著，阴极电子学，科学出版社，1980．
[15]C．A．Spindt， C．E．Holland， A．Rosengreen， et al， Field-emitter arrays for vacuum microelectronics．IEEE Trans．Electron Devices 1991，38， 2355-2363．
[16]K．Derbyshire， Beyond AMLCDs： field emission displays?．Solid State Technol．1994， 11， 55．
[17]茅东升，无氢非晶金刚石薄膜的制备及其电子场发射性能研究，中国科学院上海冶金研究所，博士学位研究生学位论文，2000．
[18]H．F．Gray．G．J．Campisi， R．F．Greene， A vacuum field effect transistor using silicon field emitter arrays．IEDM．Dig．Tech．Papers， 1986， 776-779．
[19]S．Kim， B．K．Ju， Y．H．Lee， et．al， Emission characteristic of diamond-tip field emitter arrays fabricated by transfer mold technique．J．Vac．Sci．Technol．B 1997， 15， 499．
[20]A．F．Myers， S．M．Camphausen， J．J．Cuomo， et al， Characterization of amorphous carbon coated silicon field emitters．J．Vac．Sci．Technol．B 1996， 14， 2024．
[21]V．V．Zhirnov， G．J．Wojak， W．B．Choi， et a]， Wide band gap materials for field emission devices．J．Vac．Sci．Technol．A 1997， 15， 1733-1738．
[22]F．J．Himpsel， J．A．Knapp， J．A．VanVechten， et al， Quantum photoyield of diamond(111)-A stable negative-affinity emitter．Phys．Rev．B 1979， 20， 624．
[23]J．Van der Weide， Z．Zhang， P．K．Baumann， et al， Negative-electron-affinity effects on the diamond (100) surface．Phys．Rev．B 1994， 50， 5803-5806．
[24]陈光华，邵乐喜，贺德衍等，宽带隙薄膜材料场电子发射研究的背景，现状和问题．物理2000， 29， 278-282．
[25]B．C．Djubua， N．N．Chubun， Emission properties of Spindt-type cold cathodes with different emission cone material．IEEE Trans．Electron．Devices 1991， 38， 2314．
[26]C．Wang， A．Garcia， D．C．Ingram， et al， Cold field emission from CVD diamond films observed in emission electron microscopy．Electron Lett．1991， 27， 1459．
[27]M．W．Geis， J．A．Gregory， B．B．Pate， Capacitance-voltage measurements on metal-SiO_2-diamond structures fabricated with (100)-and(111)-oriented substrates．IEEE Trans．Electron Devices 1991， 38， 619．
[28]K．Okano， K．Hoshina， S．Koizumi， et al， Fabrication of a miniature-size pyramidal-shape diamond field emitter array．IEEE Electron．Devices Lett．1995， 16， 239．
[29]K．Okano， K．Hoshina， S．Koizumi， et al， Fabrication of a diamond field emitter array．Appl．Phys．Lett．1994， 64， 2742．
[30]Walt A．de Heer， A．Chatelain， D．Ugarte， A Carbon Nanotube Field-Emission Electron Source．Science 1995， 17， 270， 1179．
[31]Q．L．Liao， Y．Zhang， J．J．Qi， et al， Field emission properties of a carbon nanotube cathode in different electric field modes．Mater．Lett．2008， 62， 1941-1944．
[32]T．Chen， Z．Sun， Y．W．Chen， et al， Enhancement of field emission property from hills-like carbon nanotubes film．Thin Solid Films 2008， 516， 1112-1115．
[33]S．M．C．Vieira， K．B．K．Teo， W．I．Milne， et al， Investigation of field emission properties of carbon nanotube arrays defined using nanoimprint lithography．Appl．Phys．Lett．2006， 89， 022111-022113.
[34] B. B. Pate, M. H. Hecht, C. Binns, et al, Photoemission and photon-stimulated ion desorption studies of diamond(111): Hydrogen. J. Vac. Sci. Technol. 1982,21,364.
[35] C. Bandis, B. B. Pate, Simultaneous field emission and photoemission from diamond. Appl.phys.Lett. 1996, 69, 366-368.
[36] O. Gr(o|¨)ning, O. M. Küttel, P. Gr(o|¨)ning, et al, Field emitted electron energy distribution from nitrogen-containing diamondlike carbon. Appl. Phys. Lett. 1997, 71,2253-2255.
[37] O. Ternyak, R. Akhvlediani, A. Hoffman, Field electron emission from undoped, continuous, submicron-thick diamond films. J. Appl. Phys. 2005, 98, 123522.
[38] J. Robertson, Recombination and photoluminescence mechanism in hydrogenated amorphous carbon. Phys. Rew. B 1996, 53, 16302-16305.
[39] J.Robertson, Mechanism of electron field emission from diamond, diamond-like and nanostructured carbon. J. Vac. Sci. Technol. B 1999, 17(2), 659-665.
[40] J. D. Carey, R. D. Forrest, R. U. A. Khan, et al, Influence of sp~2 clusters on the field emission properties of amorphous carbon thin films. Appl. Phys. Lett. 2000, 77, 2006-2008.
[41] J. P. Zhao, Z. Y. Chen, X. Wang, et al, Thickness-independent electron field emission from tetrahedral amorphous carbon films. Appl, Phys. Lett. 2000, 76, 191-193.
[42] J. D. Carey, R. D. Forrest, S. R. P. Silva, Origin of electric field enhancement in field emission from amorphous carbon thin films. Appl. Phys. Lett. 2001, 78, 2339-2341.
[43] M. W. Geis, J. C. Twichell, T. M. Lyszczarz, Diamond emitters fabrication and theory. J. Vac. Sci. Technol. 1996, 14,2060.
[44] R. D. Forrest, A. P. Burden, S. R. P. Silva, et al, A study of electron field emission as a function of film thickness from amorphous carbon films. Appl. Phys. Lett. 1998, 73,3784-3786.
[45] S. Gupta, B. L. Weiss, B. R. Weiner, et al, Study of the electron field emission and microstructure correlation in nanocrystalline carbon thin films. J Appl. Phys. 2001, 89, 5671-5675.
[46] Y. Umehara, S. Murai, Y. Koide, et al, Effects of sp~2/sp~3 bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition. Diam. Relat. Mat. 2002, 11, 1429-1435.
[47] W. Zhu, G. P. Kochanski, S. Jin, et al, Defect-enhanced electron field emission from chemical vapor deposited diamond. J. Appl. Phys. 1995, 78,2707.
[1] C. A. Spindt, I. Brodie, L. Humphrey, et al, Physical properties of thin-film field emission cathodes with molybdenum cones. J. Appl. Phys. 1976, 47, 5248-5263.
[2] F. J. Himpsel, J. A. Knapp, J. A. VanVechten, Quantum photoyield of diamond(111) -A stable negative-affinity emitter. Phys. Rev. B 1979, 20, 624-627.
[3] M. W. Geis, J. C. Twichell, J. Macaulay et al,Electron field emission from diamond and other carbon materials after H_2, O_2, and Cs treatment. Appl. Phys. Lett. 1995, 67,1328-1330.
[4] C. Bandis, B. B. Pate, Simultaneous field emission and photoemission from diamond. Appl. Phys. Lett. 1996, 69 (3), 366-368.
[5] M. W. Geis, J. C. Twichell, T. M. Lyszczarz, Diamond emitters fabrication and theory. J. Vac. Sci. Technol. B 1996, 14(3), 2060-2067.
[6] X. Lu, Q. Yang, C. Xiao, et al, Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration. Thin Solid Films 2008, 516,4217-4221.
[7] J. Robertson, Mechanisms of electron field emission from diamond, diamond-like carbon and nanostructured carbon. J. Vac. Sci. Technol. B 1999, 17.2, 659-665.
[8] P. W. May, S. Hohn, W. N. Wang, Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films. Appl. Phys. Lett. 1998, 72, 17, 2182-2184.
[9] P. W. May, S. Hohn, M. N. R. Ashfold, et al, Field emission from chemical vapor deposited diamond and diamond-like carbon films: Investigations of surface damage and conduction mechanisms. J. Appl. Phys. 1998, 84, 1618-1625.
[10] S. M. Metev, M. Ozegowski, K. Meteva, et al, Laser-assisted ECR-plasma-CVD of a-C:H films. Diam. Relat. Mat. 1996, 5, 420-424.
[11] A. Crunteanu, M. Charbonnier, M. Romand, et al,Structural and vibrational characterization of hydrogenated carbon nitride thin films obtained by laser-induced CVD. Appl. Surf. Sci.2000, 168, 44-47.
[12] C. Corbella, M. Vives, G. Oncins, et al, Characterization of DLC films obtained at room temperature by pulsed-dc PECVD．Diam．Relat．Mat．2004， 13， 1494-1499．
[13]A．Bubenzer， B．Dischler， G．Brandt， et al， RF-plasma deposited amorphous hydrogenated hard carbon thin films： preparation， properties，， and applications．J．Appl．Phys．1983， 54，4590-4595．
[14]L．Martinu， A．Raveh， D．Boutard， et al， Properties and stability of diamond-like carbon films related to bonded and unbonded hydrogen．Diam．Relat．Mat．1993， 2， 673-677．
[15]T．Y．You， O．Niwa， M．Tomita， et al， Characterization and electrochemical properties of highly dispersed copper oxide/hydroxide nanoparticles in graphite-like carbon films prepared by RF sputtering method．Eletrochem．Commun．2002， 4， 468-471．
[16]M．Sasaki， Y．Kozukue， K．Hashinoto， et al， Tribological properties in a high vacuum of carbon films containing titanium prepared by magnetron sputtering．Vacuum 2001， 74，455-459．
[17]Namba．， Attempt to grow diamond phase carbon-films from an organic solution．J．Vac．Sci．Technol．1992， A 10， 3368-3370．
[18]H．Kiyota， H．Araki， H．Kobayashi， et al， Electron field emission from diamond-like carbon films deposited by electrolysis of methanol liquid．Appl．Phys．Lett．1999， 75， 2331-2333．
[19]S．Gupta， M．Pal．Chowdhury， A．K．Pal， Field emission characteristics of diamond-like carbon films synthesized by electrodeposition technique．Appl．Surf．Sci．2004， 236，426-434．
[20]X．B．Yan， Tao．Xu， G．Chen， et al， Field-emission properties of diamond-like-carbon and nitrogen-doped diamond-like-carbon films prepared by electrochemical deposition．Appl．Phys．A 2005， 81， 41-46．
[21]H．Kiyota， M．Higashi， T．Kurosu， et al， Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid．J．Appl．Phys．2006， 99， 094903．
[22]叶凡，谢二庆，李瑞山等，类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究，物理学报，2005， 54卷，3935-3939．
[23]阎兴斌电化学沉积和聚合物先驱体热解法制备类金刚石碳及碳纳米复合薄膜的研究中国科学院兰州化学物理研究所博士论文2005．
[24][美]C．A．麦肯济著，大连工学院有机化学教研组，浙江大学有机化学教研组译，实验有机化学，人民教育出版社，1980．
[25] A. Grill, V. Patel, Characterization of diamondlike carbon by infrared spectroscopy. Appl. Phys. Lett. 1992, 60, 2089-2091.
[26] J. T. Jiu, K. Cai, Q. Fu, et al, Liquid deposition of hydrogenated carbon films in N,N-dimethyl formamide solution. Mater. Lett. 1999,41, 63-66.
[27] W. S. Simons, The Sadtler Handbook of Infrared Spectr, Sadtler Research Laboratories, 1978.
[28] A. Crunteanu, M. Charbonnier, M. Romand, et al, Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition. Surf. Coat. Technol. 2000,125,301-307.
[29] D. Briggs, J. C. Riviere, In Briggs D,Seah MP,editor. Practical Surface Analysis, Vol.1, Ch.3, Wiley,Great Britain, 1990, 160-162.
[30] E. Riedo, F. Comin, J. Chevrier, Structural properties and surface morphology of laser-deposited amorphous carbon and carbon nitride films. Surf. Coat. Technol. 2000, 125, 124-128.
[31] N. Paik, Raman and XPS studies of DLC films prepared by a magnetron sputter-type negative ion source. Surf. Coat. Techno. 2005, 200, 2170-2174.
[32] S. Lopez, H. M. Dunlop, M. Benmalek, XPS, XANES and ToF-SIMS Characterization of Reactively Magnetron-sputtered Carbon Nitride Films. Surf. Interface Anal. 1997, 25, 315-323.
[33] X. B. Yan, T. Xu, G. Chen, et al, Effect of deposition voltage on the microstructure of electrochemically deposited hydrogenated amorphous carbon films. Carbon 2004, 42,3103-3108.
[34] A. Hu, W. W. Duley, Surface enhanced Raman spectroscopic characterization of molecular structures in diamond-like carbon films. Chem. Phys. Lett. 2008, 450, 375-378.
[35] K. W. Sun, J. Y. Wang, T. Y. Ko, Raman spectroscopy of single nanodiamond: Phonon-confinement effects. Appl. Phys. Lett. 2008, 92, 153115.
[36] K. W. R. Gilkes, H. S. Sands, D. N. Batchelder, et al, Direct observation of sp~3 bonding in tetrahedral amorphous carbon using ultraviolet Raman spectroscopy. Appl. Phys. Lett. 1997, 70(15), 1980-1982.
[37] G. Inner, A. Dorner-Reisel, Micro-Raman studies on DLC coatings. Adv. Eng. Mater. 2005, 7(8), 694.
[38]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev．B 2001， 63，121405．
[39]酒金婷，付强等，液相电沉积类金刚石薄膜的相关物理化学问题，无机材料学报2002，17， 571-578．
[40]T．Suzuiki， Y．Manita， T．Yamazaki， et al， Deposition of carbon films by electrolysis of a water-ethylene glycol solution．J．Mater．Sci．1995， 30， 2067-2069．
[41]M．Tsuda， M．Nakajima， S．Oikawa， Epitaxial growth mechanism of diamond crystal in methane-hydrogen plasma．J．Am．Chem．Soc．1986， 108，5780-5783．
[42]阎兴斌，徐洮，王博等，电化学沉积DLC膜及其表征，材料科学与工程学报2003， 21，656-659．
[43]V．P．Novikov， V．P．Dymont， Synthesis of diamondlike films by an electrochemical method at atmospheric pressure and low temperature．Appl．Phys．Lett．1997， 70， 200-202．
[44]E．Shevchenko， E．Matiushenkov， D．Kochubey， et al， Chem．Commun．2001 317-318．
[45]茅东升，无氢非晶金刚石薄膜的制备及其电子场发射性能研究，中国科学院上海冶金研究所，博士学位研究生学位论文，2000．
[46]X．Lu， Q．Yang， C．Xiao， Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp2 phase concentration， Thin Solid Films 516 (2008) 4217-4221
[47]Y．Umehara， S．Murai， Yasuo Koide，et al， Effects of sp2ysp3bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition， Diamond and Related Materials 11 (2002) 1429-1435
[48]H．Kiyota， M．Higashi， T．Kurosu，et al， Field emission from amorphous carbon films grown by electrochemical deposition using methanol liquid．J．Appl．Phys．2006， 99， 094903．
[49]S．f．Shao， P．j．Jia， S．c．Liu， et al， Stable field emission from rose-like zinc oxide nanostructures synthesized through a hydrothermal route．Mater．Lett．2008， 62， 1200-1203．
[50]G．A．J．Amaratunga， S．R．P．Silva， Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes．Appl．Phys．Lett．1996， 68， 2529-2531．
[51]N．S．Xu， J．Chen， S．Z．Deng， et al， Physical origin of nonlinearity in the Fowler-Nordheim plot of field-induced emission from amorphous diamond films： Thermionic emission to field emission．Appl．Phys．Lett．2000， 76， 2463-2465．
[52] S. C. Lim, R. E. Stallcup Ⅱ, I.A. Akwani, et al, Effects of O_2, H_2, and N_2 gases on the field emission properties of diamond-coated microtips. Appl. Phys. Lett. 1999, 75, 1179.
[1] A. M. Liu, M. Cohen, Prediction of new low compressibility solids. Science 1989, 245, 841-842.
[2] J. Y. Hao, T. Xu, W. M. Liu, Preparation and characterization of hydrogenated carbon nitride films synthesized by dual DC-RF plasma system. Mater. Sci. Eng. A 2005, 408, 297-302.
[3] T. I. T. Okpalugo, H. Murphy, A. A. Ogwu, Human Microvascular Endothelial Cellular Interaction With Atomic N-Doped DLC Compared With Si-Doped DLC Thin Films. J. Biomed. Mater. Res. B 2006, 78B, 2, 222-229.
[4] B. Zheng, W. T. Zheng, K. Zhang, et al, First-principle study of nitrogen incorporation in amorphous carbon. Carbon 2006, 44, 962-968.
[5] S. Kobayashi, S. Nozaki, H. Morisaki, et al, Carbon nitride thin films deposited by the reactive ion beam sputtering technique. Thin Solid Films 1996, 281-282, 289-293.
[6] N. Hellgren, M. P. Johansson, E. Broitman, et al, Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering. Phys. Rev. B 1999, 59, 5162-5169.
[7] D. Marton, K. J. Boyd, A. H. Al-Bayati, et al, Carbon Nitride Deposited using energetic species: A Two-Phase system. Phys. Rev. Lett. 1994, 73, 128-131.
[8] H. Z. Ma, L. Zhang, N. Yao, et al, The effect of nitrogen addition on field emission of diamond-like carbon films. Diam. Relat. Mat. 2000, 9, 1608-1611.
[9] A. P. Caricato, G. Leggieri, A. Luches, et al, Characterization of C-N thin films deposited by reactive excimer laser ablation of graphite targets in nitrogen atmosphere. Thin Solid Films 1997, 307, 54-59.
[10] D. S. Mao, J. Zhao, W. Li, et al, Electron field emission from nitrogen-containing diamond-like carbon films deposited by filtered arc deposition. Mater. Lett. 1999, 41, 117-121.
[11] R. McCann, S. S. Roy, P. Papakonstantinou, et al, Chemical bonding modifications of tetrahedral amorphous carbon and nitrogenated tetrahedral amorphous carbon films induced by rapid thermal annealing. Thin Solid Films 2005, 482, 34-40.
[12] Gehan A. J. Amaratunga, S. R. P. Silva, Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes. Appl. Phys. Lett. 1996, 68,2529-2531.
[13] S. R. P. Silva, J. Robertson, G. A. J. Amaratunga, et al, Nitrogen modification of hydrogenated amorphous carbon films. J. Appl. Phys. 1997, 81,2626-2634.
[14] Namba., Attempt to grow diamond phase carbon-films from an organic solution. J. Vac. Sci. Technol.A1992. 10,3368-3370.
[15] Q. Fu, J. T. Jiu, H. Wang, et al, Simultaneous formation of diamond-like carbon and carbon nitride films in the electrodeposition of an organic liquid. Chem. Phys. Lett. 1999, 301, 87-90.
[16] J. W. Sun, Y. F. Zhang, X. X. He, et al, Amorphous CN films prepared by electrochemical deposition. Mater. Lett. 1999, 38, 98-102.
[17] X. B. Yan, T. Xu, G Chen, et al, Study of structure, tribological properties and growth mechanism of DLC and nitrogen-doped DLC films deposited by electrochemical technique. Appl. Surf. Sci. 2004, 236, 328-335.
[18] S. Kundoo, A. N. Banerjee, P. Saha, et al, Synthesis of crystalline carbon nitride thin films by electrolysis of methanol-urea solution. Mater. Lett. 2003, 57,2193-2197.
[19] Q. Fu, C. B. Cao, H. S. Zhu, Synthesis of Nitrogenated Carbon Films by Cathodic Electrodeposition at the Solid-liquid Interface. Mater. Lett. 2000,42, 166-170.
[20] Q. Fu, J. T. Jiu, K. Cai, Attempt to deposit carbon nitride films by electrodeposition from an organic liquid. Phys. Rev. B 1999, 59, 1693-1696.
[21] S. F. Shao, P. J. Jia, S. C. Liu, et al, Stable field emission from rose-like zinc oxide nanostructures synthesized through a hydrothermal route. Mater. Lett. 2008, 62, 1200-1203.
[22] R. Z. Wang, H. Yan, B. Wang, et al, Field emission enhancement by the quantum structure in an untrathin multilayer paanar cold cathode. Appl. Phys. Lett. 2008, 92, 142102.
[23] X. Lu, Q. Yang, C. Xiao, et al, Field electron emission characteristics of chemical vapour deposition diamond films with controlled sp~2 phase concentration. Thin Solid Films 2008, 516 4217-4221.
[24] S. Cui, Y. L. Li, Y. B. Guo, et al, Fabrication and Field-Emission Properties of Large-Area Nanostructures of the Organic Charge-Transfer Complex Cu-TCNAQ. Adv. Mater. 2008, 20,309-313.
[25] S. R. P. Silva, J. Robertson, G. A. J. Amaratunga, Nitrogen modification of hydrogenated amorphous carbon films．J．Appl．Phys．1997， 81(6)， 2626-2634．
[26]O．Amir， R．Kalish， properties of nitrogen-doped amorphous hydrogenated carbon films．J Appl．Phys．1991，70， 4958-4962．
[27]B．S．Satyanarayana， A．Hart， W．I．Milne， et al， Field emission from tetrahedral amorphous carbon．Appl．Phys．Lett．1997， 71，1430-1432．
[28]S．R．P．Silva， Gehan A．J．Amaratunga， J．R．Barnes， Self-texturing of nitrogenated amorphous carbon thin films for electron field emission．Appl．Phys．Lett．1997， 71(11)，1477-1479
[29]H．Z．Ma， L．Zhang， N．Yao， et al， The effect of nitrogen addition on field emission of diamond-like carbon films．Diam．Relat．Mat．2000， 9， 1608-1611．
[30]Gehan A．J．Amaratunga， S．R．P．Silva， Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes．Appl．Phys．Lett．1996， 68， 2529-2531．
[31]S．Kundoo， P．Saha， K．K．Chattopadhyay， Electron field emission from nitrogen and sulfur-doped diamond-like carbon films deposited by simple electrochemical route．Mater．Lett．2004， 58， 3920- 3924．
[32]叶凡，谢二庆，李瑞山等，类金刚石和碳氮薄膜的电化学沉积及其场发射性能研究．物理学报2005， 54卷，3935-3939．
[33]X．B．Yan， T．Xu， G．Chen， et al， Field-emission properties of diamond-like-carbon and nitrogen-doped diamond-like-carbon films prepared by electrochemical deposition．Appl．Phys．A 2005， 81， 41-46．
[34]X．M．Tian， S．Adhikari， S．Adhikary， et al， Nitrogen incorporated diamond-like carbon films by microwave surface wave plasma CVD．Diam．Relat．Mat．2005， 14， 1839-1842．
[35]E．Riedo， F．Comin， J．Chevrier， et al， Structural properties and surface morphology of laser-deposited amorphous carbon and carbon nitride films．Surf．Coat．Technol．2000， 125，124-128．
[36]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Techno．2000，125，301-307．
[37]D．Marton， K．J．Boyd， A．H．Al-Bayati， et al， Carbon Nitride Deposition Using Energetic Species： A Two-Phase System．Phys．Rev．Lett．1994， 73， 118-121．
[38]A．Grill， V．Patel， Characterization of diamondlike carbon by infrared spectroscopy．Appl．Phys．Lett．1992， 60， 2089-2091．
[39]J．T．Jiu， K．Cai， Q．Fu， et al， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41， 63-66．
[40]W．S．Simons， The Sadtler Handbook of Infrared Spectr， Sadtler Research Laboratories， 1978．
[41]G．Irmer， A．Dorner-Reisel， Micro-Raman studies on DLC coatings．Adv．Eng．Mater．2005，7(8)， 694．
[42]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev．B 2001， 63， 121405
[43]X．B．Yan， T．Xu， G．Chen， et al， Study of structure， tribological properties and growth mechanism of DLC and nitrogen-doped DLC films deposited by electrochemical technique．Appl．Surf．Sci．2004， 236， 328-335．
[44]J．W．Sun， Y．F．Zhang， X．X．He， et al， Amorphous CN films prepared by electrochemical deposition．Mater．Lett．1999， 38， 98-102．
[45]S．Kundoo， A．N．Banerjee， P．Saha， et al， Synthesis of crystalline carbon nitride thin films by electrolysis of methanol-urea solution．Mater．Left．2003， 57， 2193-2197．
[46]阎兴斌电化学沉积和聚合物先驱体热解法制备类金刚石碳及碳纳米复合薄膜的研究中科院兰州化学物理研究所博士毕业论文2005．
[47]V．S．Veerasamy， J．Yuan， G．Amaratunga， et al， Nitrogen doping of highly tetrahedral amorphous carbon．Phys．Rev．B 1993， 48， 17954．
[48]C．A．Davis， D．R．McKenzie， Y．Yin， et al， Substitutional nitrogen doping of tetrahedral amorphous carbon．Philos．Mag．B 1994， 69， 1133-1140．
[49]M．Weiler， S．Sattel， T．Giessen，et al， Preparation and properties of highly tetrahedral hydrogenated amorphous carbon．Phys．Rev．B 1996， 53， 1594．
[50]D．I．Jones， A．D．Stewart， Properties of hydrogenated amorphous carbon films and the effects of doping．Philos．Mag．B 1982， 46， 423-434．
[51]A．Helmbold， P．Hammer， J．U．Thiele，et al， Electrical conductivity of amorphous hydrogenated carbon．Philos．Mag．B 1995， 72， 335-350．
[52]W．Zhu， G．P．Kochanski， S．Jin，et al， Defect-enhanced electron field emission from chemical vapor deposited diamond．J．Appl．Phys．1995， 78， 2707．
[53] G. A. J. Amaratunga, S. R. P. Silva, Nitrogen containing hydrogenated amorphous carbon for thin-film field emission cathodes. Appl. Phys. Lett. 1996, 68, 2529.
[54]Y. Umehara, S. Murai, Y. Koide, M. Murakami, Effects of sp~2/sp~3 bonding ratios on field emission properties of diamond-like carbon films grown by microwave plasma chemical vapor deposition. Diam. Relat. Mater. 11 (2002), 1429-1435.
[55] J. J. Li, C. Z. Gu, H. Y. Peng, et al, Field emission properties of diamond-like carbon films annealed at different temperatures, Appl. Surf. Sci. 2005, 251, 236-241.
[1] J. Robertson, Diamond-like amorphous carbon, Mater. Sci. Eng. R. 2002, 37, 129-281.
[2] Peter R. Goglia, Jeffrey Berkowitz, Joel Hoehn, et al, Diamond-like carbon applications in high density hard disc recording heads. Diam. Relat. Mat. 2001, 10, 271-277.
[3] M. Vojs, E. Zdravecká, M. Marton, et al., Properties of amorphous carbon layers for bio-tribological applications. Microelectron. J. 2009, 40, 650-653.
[4] G.y Dearnaley, J. H. Arps, Biomedical applications of diamond-like carbon (DLC) coatings: A review. Surf. Coa. Technol. 2005, 200, 2518-2524.
[5] W. S. Choi, K. H. Kim, J. S. Yi, Diamond-like carbon protective anti-reflection coating for Si solar cell. Mater. Lett. 2008, 62, 577-580.
[6] S. Zhang, Y. Q. Fu, H. J. Du, Magnetron sputtering of nanocomposite (Ti,Cr)CN/DLC coatings. Surf. Coat. Technol. 2002, 162, 42-48.
[7] K. C. Park, J. H. Moon, J. Jang, et al, Deposition of hydrogen-free diamond-like carbon film by plasma enhanced chemical vapor deposition. Appl. Phys. Lett. 1996, 68(25), 3594-3696.
[8] H. Park, Y. K. Hong, J. S. Kim,et al, Surface morphology of laser deposited diamondlike films by atomic force microscopy imaging. Appl. Phys. Lett. 1996, 69(6), 779-781.
[9] Y. Ohgoe, K. K. Hirakuri, K. Tsuchimoto, et al, Uniform deposition of diamond-like carbon films on polymeric materials for biomedical applications. Surf. Coat. Technol. 2004, 184, 263-269.
[10] Y. Ohgoe, K. K. Hirakuri, Diamondlike carbon film deposition on a polycarbonate-tube inner wall using a cylindrical electrode with radio frequency glow discharge plasma. J. Appl. Phys. 2005, 97, 024906.
[11] Namba., Attempt to grow diamond phase carbon-films from an organic solution. J.Vac.Sci.Technol. A 1992, 10,3368-3370.
[12] H. Wang, M. R. Shen, Z. Y. Ning, Deposition of diamond-like carbon films by electrolysis of methanol solution. Appl. Phys. Lett. 1996, 69, 1074-1076.
[13] H. Wang, M. R. Shen, Z. Y. Ning, et al, Deposition of unhydrogenated diamond-like amorphous carbon films by electrolysis of organic solutions. Thin Solid Films 1997, 293, 87-90．
[14]K．Cai， D．Guo， Y．Huang， et al， Evaluation of diamond-like carbon films deposited on conductive glass from organic liquids using pulsed current．Surf．Coat．Technol．2000， 130，266-273．
[15]Z．Sun， Y．Sun， X．Wang， Investigation of phases in the carbon films deposited by electrolysis of ethanol liquid phase using Raman scattering．Chem．Phys．Lett．2000， 318， 471-475．
[16]J．T．Jiu， H．Wang， K．Cai， et al， Liquid phase deposition of hydrogenated diamond-like carbon films on conductive glass substrates using a pulse-modulated source．Mater．Res．Bull 1999， 34， 1501-1506．
[17]D．Guo， K．Cai， L．T．Li， et al， Evaluation of diamond-like carbon films electrodeposited on an Al substrate from the liquid phase with pulse-modulated power．Carbon 2001， 39，1395-1398．
[18]T．M．Manhabosco， I．L．Muller， Electrodeposition of diamond-like carbon (DLC) films on Ti．Appl．Surf．Sci．2009， 255， 4082-4086．
[19]R．K．Roy， B．Deb， B．Bhattacharjee， et al， Synthesis of diamond-like carbon film by novel electrodeposition route．Thin Solid Films 2002， 422， 92-97．
[20][美]C．A．麦肯济著，大连工学院有机化学教研组，浙江大学有机化学教研组译，实验有机化学，人民教育出版社，1980．
[21]A．Grill， V．Patel， Characterization of diamondlike carbon by infrared spectroscopy．Appl．Phys．Lett．1992， 60， 2089-2091．
[22]J．T．Jiu， K．Cai， Q．Fu， et al， Liquid deposition of hydrogenated carbon films in N，N-dimethyl formamide solution．Mater．Lett．1999， 41， 63-66．
[23]W．S．Simons， The Sadtler Handbook of Infrared Spectr， Sadtler Research Laboratories， 1978．
[24]A．Crunteanu， M．Charbonnier， M．Romand， et al， Synthesis and characterization of carbon nitride thin films obtained by laser induced chemical vapour deposition．Surf．Coat．Technol．2000，125，301-307．
[25]G．Irmer， A．Dorner-Reisel， Micro-Raman studies on DLC coatings， Adv．Eng．Mater．2005，7(8)， 694．
[26]A．C．Ferrari， J．Robertson， Origin of the 1150-cm(?)1 Raman mode in nanocrystalline diamond．Phys．Rev B 2001， 63， 121405．