混合型波分复用系统中薄膜滤光片的研究
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摘要
混合型波分复用技术通过对传统稀疏波分复用技术与宽光谱掺铒光纤放大技术的结合使用,具备了数据传输距离远、通信效率高、抗干扰和保密性能好、结构简单、可快速组建等特点,一经问世就引起了光纤通信领域的广泛关注。但该技术对所使用的复用／解复用滤光片和增益平坦滤光片技术要求特别严格,以目前的光学薄膜制备技术研制两种滤光片难度很大,这也成为了限制混合型波分复用技术发展的主要因素。为此,本文针对混合型波分复用系统中复用／解复用滤光片和增益平坦滤光片的使用要求,通过对合金靶溅射特性、复合薄膜沉积工艺、膜系设计、制备技术、测试技术进行了详尽的理论分析和实验研究,简化了实验步骤,并利用更少的膜层研制出了低损耗CWDM(Coarse Wavelength Division Multiplexing)滤光片和高增益平坦度GFF(Gain Flattering Filter)滤光片,具体研究内容如下。
首先采用Ta-Nb合金作为溅射靶材,02为反应气体,采用离子束反应溅射技术制备了一种新型复合薄膜。分别利用分光光度计、X射线衍射仪、X射线光电子能谱仪、扫描电镜和原子力显微镜对制备的复合薄膜的光学特性、结晶状态、成份配比、薄膜表面微结构和表面形貌进行了表征与分析,实验结果显示：相比于Ta2Oj和Nb2O5薄膜,复合薄膜更适用于研制薄膜层数多、薄膜吸收损耗低的滤光片,因此可替代Ta205或Nb2O5作为研制混合型波分复用系统中薄膜器件的薄膜材料。
其次对不同离子束工艺参量下制备的复合薄膜、Si0：薄膜的特性进行了深入研究,系统的分析了氧气充入方式对复合薄膜特性产生的影响,并对膜厚均匀性进行修正,为研制低损耗CWDM滤光片与GFF滤光片提供了必要的条件。通过正交矩阵法进行离子源工艺参量优化实验,与传统实验方法进行对比可知,正交矩阵法需要更少的实验次数即可获取较理想的工艺参量,这对简化实验步骤、缩短滤光片的研发周期有较大帮助。
另外,还建立了一套完善的膜系寻优设计方法,并对膜堆叠加、匹配层优化等技术进行了深入研究,选用复合薄膜与SiO2作为高低折射率薄膜材料,以WMS-13作为基底玻璃,利用较少的膜层数设计出了满足混合型波分复用系统使用要求的低损耗CWDM滤光片和高增益平坦度的GFF滤光片膜系。
根据膜系的结构,研究并制定了采用双离子束溅射法制备CWDM滤光片、GFF滤光片的膜厚监控方案。在低损耗CWDM滤光片研制过程中,采用光电极值法控制各腔内的规整膜层厚度,采用平均时间法控制耦合层厚度。在GFF滤光片研制过程中,采用时间监控法控制膜层厚度。并分别对两种薄膜进行多次沉积,将其结果进行最小二乘拟合得到复合薄膜、SiO2薄膜的沉积速率。实验结果显示：采用上述方法可一定程度上提高离子束溅射系统的膜厚控制精确度,保证低损耗CWDM滤光片和GFF滤光片制备工作可顺利完成,并为高精密薄膜器件的制备提供了更好的膜厚控制方案。
研制的低损耗CWDM滤光片和GFF滤光片经过光谱特性测试系统检测,具体数据为低损耗CWDM滤光片的通带中心波长为1551.1nm,通带峰值最大插入损耗-0.09dB,通带波纹在0.04dB范围内变化,在-0.5dB处通带宽17.1nm,在-35dB处带宽24.2nm,通带矩形度为0.707,截止区域的截止度均高于-40dB;GFF滤光片的波长独立损失WIL=0.063dB,误差函数EF的极大值与极小值之差为EFp-p=0.198dB；经过测试所研制的滤光片均可满足混合型波分复用系统的使用要求,本文的相关研究均取得了较满意的实验结果。
Hybrid wavelength division multiplexing technology, through the combined use of traditional coarse wavelength division multiplexing technology and wide spectrum of erbium doped fiber amplifier technology, had attracted broad attention of optical fiber communication since it appeared due to its long distance of data transmission, high efficiency of communication, anti-interference and secrecy performance, simple construction, and fast formation, etc. However, the technology was strict with the technology of multiplex/demultiplex optical filters and gain flattening filters it used. The two kinds of filters were difficult to develop with current technology of optical thin-film coating preparation, which became the main factor that restricted the development of hybrid wavelength division multiplexing technology. Therefore, based on the use requirements of multiplex/demultiplex optical filters and gain flattening filters in hybrid wavelength division multiplexing technology, through the detailed theoretical analysis and experimental research on alloy target sputtering characteristics, technique of hybrid thin-film deposition, design of film system, preparation technology and testing technology, it simplified the experimental procedure, and developed low-loss CWDM (Coarse Wavelength Division Multiplexing) filter and GFF (Gain Flattering Filter) by making use of less film in this paper.
Firstly, Ta-Nb alloy target was used as a sputtering material, O2was used as the reaction gas, and a new type of composite film was prepared by the technique of ion beam reactive sputtering deposition (IBRSD). Respectively, spectrophotometer, X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy were used to characterize and analyze the optical properties, crystalline state, composition ratio, the film surface microstructure and surface morphology of the composite film, the experimental results showed that:compared with Ta2O5and Nb2O5, the composite film was more suitable for developing the filters with more layers and lower absorption loss, the composite film could replace Ta2O5and Nb2O5to prepare the thin-film element for hybrid-WDM systems.
Secondly, the properties of composite film and SiO2film deposited by ion beam sputtering under different ion beam process parameters were studied, the properties of composite film under different reaction gas parameters were researched, and the uniformity of film layers'thickness was corrected, the necessary conditions for the development of low-loss CWDM filters and gain flattering filters were provided, orthogonal matrix method was used to optimize the process parameters of the ion beam, comparing with the traditional methods, the optimized methods showed that the orthogonal matrix method needed fewer experiments to obtain the desired process parameters, and the great help of simplify the experiment procedures and shorten the development cycles was given.
A perfect optimization method for designing filter film was established, the technologies of film stack plus and matching layers optimization were studied, the composite film and SiO2were chosen as the high and low refractive index film material, WMS-13glass was chosen as the substrate material, the film systems of the low-loss CWDM filters and GFF filters were designed by making use of less film and the requirements of hybrid WDM systems had been met.
According to the structures of thin film system, the film thickness monitoring strategy of CWDM filters and GFF filters prepared by dual ion beam sputtering methods were studied and developed. In the preparation of the low loss CWDM filters, the optical extreme value method and average time method were used to monitor layers'thickness. In the preparation of the GFF filters, time monitoring method was used to control layers'thickness. The deposition rates of composite and SiO2film were acquired by the least square fitting for results of different deposition experiments. The experimental results showed that the film thickness monitoring precision of ion beam sputtering system could be improved by using those methods, the preparation work of low-loss CWDM and GFF filters could be successfully completed and a better film thickness monitoring scheme was provided for the preparation of high precision thin film devices.
The transmission spectrum of the preparation of low-loss CWDM filter had been tested, which demonstration that the center wavelength of filter was1551.1nm, the width of the filter's pass band was17.1nm and24.2nm in the region of-0.5dB and-35dB respectively, the worst insertion loss within pass band region is-0.09dB, the ripple of the pass band is0.04dB, and the rectangle degree was0.707; the transmission spectrum of the preparation of GFF filter had been tested, which demonstration that the wavelength independent loss of GFF was0.063dB, the difference of maximum and minimum of error function was0.198dB. The results shown that the preparation of the filters met the using requirements of hybrid wavelength division multiplexing system well after testing, the related researches had achieved satisfactory results.
首先采用Ta-Nb合金作为溅射靶材,02为反应气体,采用离子束反应溅射技术制备了一种新型复合薄膜。分别利用分光光度计、X射线衍射仪、X射线光电子能谱仪、扫描电镜和原子力显微镜对制备的复合薄膜的光学特性、结晶状态、成份配比、薄膜表面微结构和表面形貌进行了表征与分析,实验结果显示：相比于Ta2Oj和Nb2O5薄膜,复合薄膜更适用于研制薄膜层数多、薄膜吸收损耗低的滤光片,因此可替代Ta205或Nb2O5作为研制混合型波分复用系统中薄膜器件的薄膜材料。
其次对不同离子束工艺参量下制备的复合薄膜、Si0：薄膜的特性进行了深入研究,系统的分析了氧气充入方式对复合薄膜特性产生的影响,并对膜厚均匀性进行修正,为研制低损耗CWDM滤光片与GFF滤光片提供了必要的条件。通过正交矩阵法进行离子源工艺参量优化实验,与传统实验方法进行对比可知,正交矩阵法需要更少的实验次数即可获取较理想的工艺参量,这对简化实验步骤、缩短滤光片的研发周期有较大帮助。
另外,还建立了一套完善的膜系寻优设计方法,并对膜堆叠加、匹配层优化等技术进行了深入研究,选用复合薄膜与SiO2作为高低折射率薄膜材料,以WMS-13作为基底玻璃,利用较少的膜层数设计出了满足混合型波分复用系统使用要求的低损耗CWDM滤光片和高增益平坦度的GFF滤光片膜系。
根据膜系的结构,研究并制定了采用双离子束溅射法制备CWDM滤光片、GFF滤光片的膜厚监控方案。在低损耗CWDM滤光片研制过程中,采用光电极值法控制各腔内的规整膜层厚度,采用平均时间法控制耦合层厚度。在GFF滤光片研制过程中,采用时间监控法控制膜层厚度。并分别对两种薄膜进行多次沉积,将其结果进行最小二乘拟合得到复合薄膜、SiO2薄膜的沉积速率。实验结果显示：采用上述方法可一定程度上提高离子束溅射系统的膜厚控制精确度,保证低损耗CWDM滤光片和GFF滤光片制备工作可顺利完成,并为高精密薄膜器件的制备提供了更好的膜厚控制方案。
研制的低损耗CWDM滤光片和GFF滤光片经过光谱特性测试系统检测,具体数据为低损耗CWDM滤光片的通带中心波长为1551.1nm,通带峰值最大插入损耗-0.09dB,通带波纹在0.04dB范围内变化,在-0.5dB处通带宽17.1nm,在-35dB处带宽24.2nm,通带矩形度为0.707,截止区域的截止度均高于-40dB;GFF滤光片的波长独立损失WIL=0.063dB,误差函数EF的极大值与极小值之差为EFp-p=0.198dB；经过测试所研制的滤光片均可满足混合型波分复用系统的使用要求,本文的相关研究均取得了较满意的实验结果。
Hybrid wavelength division multiplexing technology, through the combined use of traditional coarse wavelength division multiplexing technology and wide spectrum of erbium doped fiber amplifier technology, had attracted broad attention of optical fiber communication since it appeared due to its long distance of data transmission, high efficiency of communication, anti-interference and secrecy performance, simple construction, and fast formation, etc. However, the technology was strict with the technology of multiplex/demultiplex optical filters and gain flattening filters it used. The two kinds of filters were difficult to develop with current technology of optical thin-film coating preparation, which became the main factor that restricted the development of hybrid wavelength division multiplexing technology. Therefore, based on the use requirements of multiplex/demultiplex optical filters and gain flattening filters in hybrid wavelength division multiplexing technology, through the detailed theoretical analysis and experimental research on alloy target sputtering characteristics, technique of hybrid thin-film deposition, design of film system, preparation technology and testing technology, it simplified the experimental procedure, and developed low-loss CWDM (Coarse Wavelength Division Multiplexing) filter and GFF (Gain Flattering Filter) by making use of less film in this paper.
Firstly, Ta-Nb alloy target was used as a sputtering material, O2was used as the reaction gas, and a new type of composite film was prepared by the technique of ion beam reactive sputtering deposition (IBRSD). Respectively, spectrophotometer, X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy were used to characterize and analyze the optical properties, crystalline state, composition ratio, the film surface microstructure and surface morphology of the composite film, the experimental results showed that:compared with Ta2O5and Nb2O5, the composite film was more suitable for developing the filters with more layers and lower absorption loss, the composite film could replace Ta2O5and Nb2O5to prepare the thin-film element for hybrid-WDM systems.
Secondly, the properties of composite film and SiO2film deposited by ion beam sputtering under different ion beam process parameters were studied, the properties of composite film under different reaction gas parameters were researched, and the uniformity of film layers'thickness was corrected, the necessary conditions for the development of low-loss CWDM filters and gain flattering filters were provided, orthogonal matrix method was used to optimize the process parameters of the ion beam, comparing with the traditional methods, the optimized methods showed that the orthogonal matrix method needed fewer experiments to obtain the desired process parameters, and the great help of simplify the experiment procedures and shorten the development cycles was given.
A perfect optimization method for designing filter film was established, the technologies of film stack plus and matching layers optimization were studied, the composite film and SiO2were chosen as the high and low refractive index film material, WMS-13glass was chosen as the substrate material, the film systems of the low-loss CWDM filters and GFF filters were designed by making use of less film and the requirements of hybrid WDM systems had been met.
According to the structures of thin film system, the film thickness monitoring strategy of CWDM filters and GFF filters prepared by dual ion beam sputtering methods were studied and developed. In the preparation of the low loss CWDM filters, the optical extreme value method and average time method were used to monitor layers'thickness. In the preparation of the GFF filters, time monitoring method was used to control layers'thickness. The deposition rates of composite and SiO2film were acquired by the least square fitting for results of different deposition experiments. The experimental results showed that the film thickness monitoring precision of ion beam sputtering system could be improved by using those methods, the preparation work of low-loss CWDM and GFF filters could be successfully completed and a better film thickness monitoring scheme was provided for the preparation of high precision thin film devices.
The transmission spectrum of the preparation of low-loss CWDM filter had been tested, which demonstration that the center wavelength of filter was1551.1nm, the width of the filter's pass band was17.1nm and24.2nm in the region of-0.5dB and-35dB respectively, the worst insertion loss within pass band region is-0.09dB, the ripple of the pass band is0.04dB, and the rectangle degree was0.707; the transmission spectrum of the preparation of GFF filter had been tested, which demonstration that the wavelength independent loss of GFF was0.063dB, the difference of maximum and minimum of error function was0.198dB. The results shown that the preparation of the filters met the using requirements of hybrid wavelength division multiplexing system well after testing, the related researches had achieved satisfactory results.
引文
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