空间极紫外成像仪器多层膜反射镜研究
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摘要
安全都有巨大的影响。空间天气现象是太阳活动、地球磁场和地球在太阳系所处位置共同作用的结果,而太阳活动是空间天气的主要驱动源。现在对日观测和对地球等离子体层的观测已成为国际研究热点。空间极紫外成像仪器是实现对日和对地观测的重要仪器。极紫外多层膜反射镜是该波段成像仪器的关键性部件之一,反射镜的光学性能对空间极紫外成像仪器的主要性能指标至关重要。
文章选择了Mo/Si、B_4C/Si、B_4C/Mg、SiC/Mg等材料对,优化了膜层结构参数并计算其反射率曲线。为了提高30.4nm处反射率,采用B_4C/Mo/Si三种材料代替常规的两种材料组合,计算了结构优化后的反射率曲线。此外,文章还提出B_4C/Si+Mo/Si的多层膜结构,形成双通道(17.1nmh和30.4nm)高反膜。通过实验探索优化了镀膜工艺参数,并利用磁控溅射镀膜机制备了Mo/Si多层膜反射镜。测量了其在13.0nm、17.1nm、19.5nm和30.4nm的反射率。
文章研究了Mo/Si多层膜高温和强辐射环境下光学性能稳定性。实验结果表明:200℃以内Mo/Si多层膜稳定性很好。利用Monte-Carlo方法模拟计算了10keV和60keV质子辐照Mo/Si多层膜后质子在多层膜内的浓度分布以及缺陷浓度分布。对经质子辐照后的Mo/Si多层膜进行了检测,结果表明:辐照剂量越大对多层膜造成的损伤越大。文章对30.4nmMo/Si多层膜反射率随时间的变化做了检测,结果表明:反射率在最初的5个月里下降2.8%,之后基本趋于稳定。
Space weather has great impacts to the earth’s space environment, human survival, production, scientific research and national security. Space wheather is the result of interactions of the solar activities, the earth magnetic field, and the location of the earth in the solar system, while the solar activities are the main driving source. EUV space imager is one of the most important instruments to observe the solar activities and the earth’s plasmasphere. EUV multilayer mirror is the key component of the imager, and the mirror’s optical characteristics determine the main performance of the imager.
The material pairs, such as Mo/Si、B_4C/Si、B_4C/Mg、SiC/Mg, and so on, are studied in this paper. The parameters of the multilayer structure were optimized, and the reflectivities of the multilayers were calculated by computer. In order to improve the reflectivity of multilayer mirror at 30.4nm, B_4C/Mo/Si was chosen, and the structure was optimized, and the reflectivity was calculated. The B_4C/Si+Mo/Si multilayer was chosen in the paper to improve the reflectivity at 17.1nm and 30.4nm channel in one mirror. The parameters of coating process were optimized by experiments and the Mo/Si multilayers were fabricated by a magnetron sputtering coating machine. The reflctivities of the multilayer mirrors at 13.0nm, 17.1nm, 19.5nm and 30.4nm were measured by a laser-plasma reflectometer.
The stability of the optical characteristics of the Mo/Si multilayers in high tempertature and intense radiation environment were discussed here. Experimental results shows that the Mo/Si multilayer has excellent thermal stability below 200℃. The concentration distributions of the protons and defects in the multilayer after radiation of protons with energy of 10keV and 60keV were analogized by the Monte Carlo method. The optical characteristics of Mo/Si multilayers were investigated before and after radiation, and the experimental results showed that the more doses the more damage in the multilayer. The variation of the reflectivity of the Mo/Si multilayer at 30.4nm were measured in the paper, and the results showed that the reflectivity reduced 2.8% at the initial 5 months after fabrication, and then became basically stable later.
文章选择了Mo/Si、B_4C/Si、B_4C/Mg、SiC/Mg等材料对,优化了膜层结构参数并计算其反射率曲线。为了提高30.4nm处反射率,采用B_4C/Mo/Si三种材料代替常规的两种材料组合,计算了结构优化后的反射率曲线。此外,文章还提出B_4C/Si+Mo/Si的多层膜结构,形成双通道(17.1nmh和30.4nm)高反膜。通过实验探索优化了镀膜工艺参数,并利用磁控溅射镀膜机制备了Mo/Si多层膜反射镜。测量了其在13.0nm、17.1nm、19.5nm和30.4nm的反射率。
文章研究了Mo/Si多层膜高温和强辐射环境下光学性能稳定性。实验结果表明:200℃以内Mo/Si多层膜稳定性很好。利用Monte-Carlo方法模拟计算了10keV和60keV质子辐照Mo/Si多层膜后质子在多层膜内的浓度分布以及缺陷浓度分布。对经质子辐照后的Mo/Si多层膜进行了检测,结果表明:辐照剂量越大对多层膜造成的损伤越大。文章对30.4nmMo/Si多层膜反射率随时间的变化做了检测,结果表明:反射率在最初的5个月里下降2.8%,之后基本趋于稳定。
Space weather has great impacts to the earth’s space environment, human survival, production, scientific research and national security. Space wheather is the result of interactions of the solar activities, the earth magnetic field, and the location of the earth in the solar system, while the solar activities are the main driving source. EUV space imager is one of the most important instruments to observe the solar activities and the earth’s plasmasphere. EUV multilayer mirror is the key component of the imager, and the mirror’s optical characteristics determine the main performance of the imager.
The material pairs, such as Mo/Si、B_4C/Si、B_4C/Mg、SiC/Mg, and so on, are studied in this paper. The parameters of the multilayer structure were optimized, and the reflectivities of the multilayers were calculated by computer. In order to improve the reflectivity of multilayer mirror at 30.4nm, B_4C/Mo/Si was chosen, and the structure was optimized, and the reflectivity was calculated. The B_4C/Si+Mo/Si multilayer was chosen in the paper to improve the reflectivity at 17.1nm and 30.4nm channel in one mirror. The parameters of coating process were optimized by experiments and the Mo/Si multilayers were fabricated by a magnetron sputtering coating machine. The reflctivities of the multilayer mirrors at 13.0nm, 17.1nm, 19.5nm and 30.4nm were measured by a laser-plasma reflectometer.
The stability of the optical characteristics of the Mo/Si multilayers in high tempertature and intense radiation environment were discussed here. Experimental results shows that the Mo/Si multilayer has excellent thermal stability below 200℃. The concentration distributions of the protons and defects in the multilayer after radiation of protons with energy of 10keV and 60keV were analogized by the Monte Carlo method. The optical characteristics of Mo/Si multilayers were investigated before and after radiation, and the experimental results showed that the more doses the more damage in the multilayer. The variation of the reflectivity of the Mo/Si multilayer at 30.4nm were measured in the paper, and the results showed that the reflectivity reduced 2.8% at the initial 5 months after fabrication, and then became basically stable later.
引文
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