一种亚纳米级栅距变化量的变栅距光栅分度控制方法的研究
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摘要
变栅距光栅具有像差校正、自聚焦等优点，在天文物理学、同步辐射、光纤通信等领域有着重要的应用，因此，变栅距光栅的刻划技术一直是国际光栅制作领域的重大课题之一。变栅距光栅要求的栅距变化量为纳米、亚纳米数量级，这成为变栅距光栅制作的一个主要的技术难点。针对于此，美国、日本和俄罗斯等极少数国家为光栅刻划机设计了十分复杂的分度控制系统，虽然刻划出了具有实用性的变栅距光栅，但其复杂、昂贵的设备不适合我国光栅加工的具体情况。
由于变栅距光栅要求的最小栅距变化量为纳米至亚纳米级，仅靠提高刻划机的分度精度已很难实现，鉴于此，根据现有的光栅制作的具体情况，本文首次提出了一种相位扫描方法用于光栅刻划机的变栅距分度控制，即通过对光栅刻划机分度系统的干涉条纹采用微位移扫描方式进行相位控制，达到变栅距光栅分度的目的。实验结果表明，本文捉出的相位扫描方法原理正确，具有创新性，达到了变栅距光栅所要求的亚纳米级的栅距变化精度。由于该方法只需在现有的光电式光栅刻划机上附加相位扫描装置，因而系统的整体可靠性更高、更实用。
主要研究内容：
1、对平面变栅距光栅的聚焦特性和像差校正原理进行了较全面的综述。
2、完成了光电式刻划机控制系统的设计、制作、安装及调试，成功地对长春光机所的2#刻划机进行了光电控制改造，并对4#光电式光栅刻划机进行了重新改造。
3、提出了相位扫描的方法，设计并制作了相应的相位扫描装置。
4、采用相位扫描方法进行了变栅距光栅的刻划实验，并对刻划误差进行了初步的分析。
5、对变栅距光栅的实验样品进行了栅距的实际检测。
With the focal property and the aberration correcting ability, the varied line-space (VLS) grating has been successfully used in the areas of astronomical physics, synchrotron radiation, fiber communications and so on. Therefore, the ruling of the VLS grating is one of the greatest significant tasks of the grating fabrication. It is .a big problem to fabricate the VLS grating, considering its space increment varies within sub-nanometer. Hence, the grating ruling engines, in U. S. A, Japan or Russia, for VLS gratings have very complicated graduation control system. Although they have fabricated practical VLS grating, their costly devices don't adapt to the fabricating practice in our country.
Since the space increment within nanometer or sub-nanometer is required, it is difficult to make it only by improving the precision of the graduation system. A phase scanning method for fabricating the VLS grating is suggested initially in this dissertation. The VLS grating can be ruled by scanning the interference fringes of the graduation system with a photoelectric sensor. The experiments show that the phase scanning method is right and innovative and the ability of the sub-nanometer space increment is reached. Since it only require an extra phase scanning device, the whole system has higher reliability and practicability.
The main research work is shown as below:
1. Summarize the focal property and aberration correcting ability of VLS plane grating.
2. Accomplish the whole work of the photoelectric control system of the No. 2 ruling engine in CIOMP, including designing, making, fixing and debugging. Rebuild the control system of No. 4 ruling engine successfully.
3. Put forward the phase scanning method for VLS grating and design the scanning
device correspondingly.
4. Make the ruling experiments for VLS grating using the phase scanning method. Analyze the ruling error primarily.
5. Examine the factual space of the experimental VLS grating sample.
由于变栅距光栅要求的最小栅距变化量为纳米至亚纳米级，仅靠提高刻划机的分度精度已很难实现，鉴于此，根据现有的光栅制作的具体情况，本文首次提出了一种相位扫描方法用于光栅刻划机的变栅距分度控制，即通过对光栅刻划机分度系统的干涉条纹采用微位移扫描方式进行相位控制，达到变栅距光栅分度的目的。实验结果表明，本文捉出的相位扫描方法原理正确，具有创新性，达到了变栅距光栅所要求的亚纳米级的栅距变化精度。由于该方法只需在现有的光电式光栅刻划机上附加相位扫描装置，因而系统的整体可靠性更高、更实用。
主要研究内容：
1、对平面变栅距光栅的聚焦特性和像差校正原理进行了较全面的综述。
2、完成了光电式刻划机控制系统的设计、制作、安装及调试，成功地对长春光机所的2#刻划机进行了光电控制改造，并对4#光电式光栅刻划机进行了重新改造。
3、提出了相位扫描的方法，设计并制作了相应的相位扫描装置。
4、采用相位扫描方法进行了变栅距光栅的刻划实验，并对刻划误差进行了初步的分析。
5、对变栅距光栅的实验样品进行了栅距的实际检测。
With the focal property and the aberration correcting ability, the varied line-space (VLS) grating has been successfully used in the areas of astronomical physics, synchrotron radiation, fiber communications and so on. Therefore, the ruling of the VLS grating is one of the greatest significant tasks of the grating fabrication. It is .a big problem to fabricate the VLS grating, considering its space increment varies within sub-nanometer. Hence, the grating ruling engines, in U. S. A, Japan or Russia, for VLS gratings have very complicated graduation control system. Although they have fabricated practical VLS grating, their costly devices don't adapt to the fabricating practice in our country.
Since the space increment within nanometer or sub-nanometer is required, it is difficult to make it only by improving the precision of the graduation system. A phase scanning method for fabricating the VLS grating is suggested initially in this dissertation. The VLS grating can be ruled by scanning the interference fringes of the graduation system with a photoelectric sensor. The experiments show that the phase scanning method is right and innovative and the ability of the sub-nanometer space increment is reached. Since it only require an extra phase scanning device, the whole system has higher reliability and practicability.
The main research work is shown as below:
1. Summarize the focal property and aberration correcting ability of VLS plane grating.
2. Accomplish the whole work of the photoelectric control system of the No. 2 ruling engine in CIOMP, including designing, making, fixing and debugging. Rebuild the control system of No. 4 ruling engine successfully.
3. Put forward the phase scanning method for VLS grating and design the scanning
device correspondingly.
4. Make the ruling experiments for VLS grating using the phase scanning method. Analyze the ruling error primarily.
5. Examine the factual space of the experimental VLS grating sample.
引文
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3. Lerner J. M. Theory and Fabrication of a Periodic Structures. Diffraction Gratings, and Moire Phenomena Ⅱ. Proc. SPIE, 1984, 503.
4. Erwin G. Loewen and Robert S. Wiley. Large diffraction grating ruling engine with nanometer digital control system. Proc. SPIE, 1987, 815: 88-95.
5. Toshiaki Kita and Tatsuo Harada. Ruling engine using a piezoelectric device for large and high-groove density gratings. Appl. Opt, 1992, 31: 1399-1406.
6. Flamand J., Bonnemason F and Thevenon A. The blazing of holographic gratings using ion-etching. Proc. SPIE, 1989, 1055: 288-294.
7. L. Mashev and S. Tonchev. Formation of blazing holographic diffraction gratings. Appl. Phys, 1982, B28: 349-353.
8. T. Harada, Sakuma and Masaru Fuse. Fabrication of blazed gratings and grisms utilizing anisotropic etching of silicon. Proc. SPIE, 1998, 3450:11～16.
9. M. Koike and T. Harada. New blazed holographic gratings fabricated by an aspherical recording with an ion-etching method.. Proc. SPIE, 1987, 815: 96～101.
10. Benoit Deville, F. Bonnemason and B. Touzet. Holographically recorded, ion-etched variable line space gratings.. Proc. SPIE, 1998, 3450: 24～35.
11．尤政，梁晋文．纳米计量技术．计量技术．1995，11：2～4．
12. Valery Kiryanov. Laser nanointerferometry of displacement methods and means of measurement accuracy improvement. Proc. SPIE, 1999, 3736: 410-415.
13. Marek Dobosz. Analysis of tolerances in a grating interferometer for high-resolution displacement measurement. Proc. SPIE, 1999, 3744:
253～261.0
14. D. Croft and S. Devasia. High precision stages for micro/nano-lithography. Proc. SPIE, 1997, 3225: 68-75.
15. D. Xiaoli and S. Katuo. High-accuracy absolute distance measurement by means of wavelength scanning heterodyne interferometry. Meas. Sci. Techol, 1998, 9: 1031～1035.
16．袁哲俊，谢大纲．纳米技术的最新发展．制造技术与机床，2000，5：5～8．
17. Namioka T. J.Opt. Soc. Am, 1961,51: 4.
18. Namioka T. J.Opt. Soc. Am, 1961,51: 13.
19. F.M. Gerasimov, etc. Concave diffraction gratings with variable spacing. Opt. Spectrosc, 1970, 28: 423.
20. B. Gale. The theory of variable spacing gratings. Opt. Acta, 1966, 13: 41-54.
21. G E. Hirst. Some recent development in the fabrication of variably-spaced linear and circular diffraction gratings. Proc. SPIE, 1985, 560: 64-69.
22. Y. Sakayanagi. A Stigmatic Concave Grating with Varying Spacing. Sci. Light, 1967, 16: 129.
23. F.M. Gerasimov, etc. The use of moire interference fringes to control the rolling of diffraction ratings. Opt. Spectrosc, 1965, 19:152.
24. F.M. Gerasimov. Use of Diffraction Gratings for Controlling a Ruling Engine. Appl. Opt, 1967, 6: 1861～1865.
25. L. Rosen. Focusing Hologram Diffraction Grating. Rev. Sci. Instrum, 1967, 38: 438.
26. Lerner J. M, etc. Aberration corrected holographically recorded diffraction gratings. Proc. SPIE, 1980, 240: 72～81.
27. Toshiaki Kita and T. Harada. Ruling engine using a piezoelectric device for large and high-groove density gratings. Appl. Opt, 1992, 31: 1399-1406.
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