基于DMD的数字无掩模光刻成像系统设计
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摘要
随着微电子学、微光学、微机械技术的迅猛发展,微细加工技术也得到了不断的提高和改进。微光学元件也在现在通讯、军事应用、空间技术、超精加工、信息处理、生物医学以及娱乐消费等众多领域中得到广泛应用。这使得与微光学息息相关的设计、制作及应用技术也得到了越来越多的重视。
微光学在设计理论与制作方法上已有了很大的发展,为了进一步扩大微光学元件的应用领域,对其制作方法也提出了更多更高的要求。因此,研究便捷、有效、实时、灵活的微光学元件的制作方法仍然是目前国内外微光学领域的一个极为重要的研究方向。本论文设计了一个基于DMD的数字无掩模光刻成像系统,对实验中的影响因素及系统中引入的误差因素进行了详细的分析,并提出了相应的补偿方法及解决方法。其主要工作如下:
第一、在分析目前光刻工艺发展状况的基础上,论证了设计数字无掩模光刻系统的必要性及紧迫性。通过对DMD芯片的深入分析,获取设计中需应用的原理及关键参数。
第二、在学习衍射、折射光学原理的基础上,提出了三种设计基于DMD的数字无掩模光刻成像系统的方案,并通过实验验证了其可行性。对比三种方案的实验结果,得出最优方案并对其中的关键部件的主要参数进行了最优化的设计。
第三、详细分析了数字无掩模光刻系统中对曝光图形质量的主要影响因素,并提出了相应的补偿方法;详细分析了本论文提出的数字无掩模光刻成像系统中引入的误差因素,并分别提出了消除各个误差因素的解决方法。
With the rapid development of micro-electronic, micro-optics, and micro-mechanism, imperceptibly process technology is continually improved and ameliorated. Micro-optics devices are applied for most fields, likes communication, military affairs, space technology, exceed finish machining, information dispose, biology-physic and amusement consumption. It is result in that more and more people attach importance to design, execution and application technology relate to micro-optics.
Micro-optics is prodigious developed on design theory and execution. For extend the application fields of micro-optics devices, there is more and more demand for its execution means. So, at present, it is a very important research field about micro-optics inside and outside that researching execution of convenient, efficiency, real time, flexible micro-optics devices. In this paper, it presents a design measure of maskless lithography imaging system based on DMD. It analysis the influence factors and error factor in this system in detail, and presents relevant resolvent. The central works are as follows:
Firstly: Based on analyze the development status of lithography technologic at present, this paper demonstrate that design maskless lithography is necessary and urgently. Through analyze DMD, we obtain some require principle and key parameters.
Secondly: Based on study the principle diffraction optics, this paper presents three different schemes about design the maskless lithography imaging system based on DMD, and validate the feasibility through experimentation. Compared the results of three schemes, and educe the most optimization and the optimization parameters of its key parts.
Thirdly: Labouredly the mostly influence factors of maskless lithography, and give the equalize measures; labouredly the mostly error factors of this system, and give the resolvent idiographic.
微光学在设计理论与制作方法上已有了很大的发展,为了进一步扩大微光学元件的应用领域,对其制作方法也提出了更多更高的要求。因此,研究便捷、有效、实时、灵活的微光学元件的制作方法仍然是目前国内外微光学领域的一个极为重要的研究方向。本论文设计了一个基于DMD的数字无掩模光刻成像系统,对实验中的影响因素及系统中引入的误差因素进行了详细的分析,并提出了相应的补偿方法及解决方法。其主要工作如下:
第一、在分析目前光刻工艺发展状况的基础上,论证了设计数字无掩模光刻系统的必要性及紧迫性。通过对DMD芯片的深入分析,获取设计中需应用的原理及关键参数。
第二、在学习衍射、折射光学原理的基础上,提出了三种设计基于DMD的数字无掩模光刻成像系统的方案,并通过实验验证了其可行性。对比三种方案的实验结果,得出最优方案并对其中的关键部件的主要参数进行了最优化的设计。
第三、详细分析了数字无掩模光刻系统中对曝光图形质量的主要影响因素,并提出了相应的补偿方法;详细分析了本论文提出的数字无掩模光刻成像系统中引入的误差因素,并分别提出了消除各个误差因素的解决方法。
With the rapid development of micro-electronic, micro-optics, and micro-mechanism, imperceptibly process technology is continually improved and ameliorated. Micro-optics devices are applied for most fields, likes communication, military affairs, space technology, exceed finish machining, information dispose, biology-physic and amusement consumption. It is result in that more and more people attach importance to design, execution and application technology relate to micro-optics.
Micro-optics is prodigious developed on design theory and execution. For extend the application fields of micro-optics devices, there is more and more demand for its execution means. So, at present, it is a very important research field about micro-optics inside and outside that researching execution of convenient, efficiency, real time, flexible micro-optics devices. In this paper, it presents a design measure of maskless lithography imaging system based on DMD. It analysis the influence factors and error factor in this system in detail, and presents relevant resolvent. The central works are as follows:
Firstly: Based on analyze the development status of lithography technologic at present, this paper demonstrate that design maskless lithography is necessary and urgently. Through analyze DMD, we obtain some require principle and key parameters.
Secondly: Based on study the principle diffraction optics, this paper presents three different schemes about design the maskless lithography imaging system based on DMD, and validate the feasibility through experimentation. Compared the results of three schemes, and educe the most optimization and the optimization parameters of its key parts.
Thirdly: Labouredly the mostly influence factors of maskless lithography, and give the equalize measures; labouredly the mostly error factors of this system, and give the resolvent idiographic.
引文
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[3]Phillips N J.Micro-optics Studies Using Photopolymers.SPIE,1990,1544:10
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[12]翁寿松.下一代光刻技术的设备[J].电子工业专用设备,2004,33(10):35-38
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[23]彭钦军,郭永康,陈波等.液晶实时掩膜技术制作连续微光学元件[J].光学学报,2003,23(2):220-224。
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[31]侯德胜,杜春雷.邱传凯等.激光直写系统及其应用[J].光电工程.1997,24:26-30
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[34]W.Daschner,M.Larsson,S.H.Lee.Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step[J].1995,34:2534-2539
[35]Van Kessel,P.F,Hombeck,L.J,Meier,R.E,et al.A MEMS-based projection display[J].IEEE,1998,86:1687-1704
[36]田文超.贾建援,DMD及DLP显示技术[J].仪器仪表学报,2005,3:58
[37]Dana Dudley,Walter Duncan,John Slaughter.Emerging digital micromirror device(DMD)applications[R].Texas:DLPTM Products New Applications,2000:14
[38]Kevin J.Kearney,Zoran Ninkov.Characterization of a digital micromirror device for use as an optical in imaging and spectroscopy[J].SPIE,1998,32(92):81-92
[39]Levenson M D.Wavefront engineering from SOOnm CD to IOOnm CD[J].SPIE,I997,304(9):12-23
[40]Andres Merquez,Juan Campos,Maria J.Yzuel.Characterization of edge effects in twisted nematic liquid crystal displays[J].Opt.Eng.,2000,39(12):3301-3306
[41]L.J.Hornbeck,Digital Light ProcessingTM for High-Brightness[J],High-Resolution Applications (Invited paper)[R],Texas:Electronic Imaging EI '97 Projection Displays Ⅲ,IS&T and SPIE,1997:18
[42]Ryder S.Nesbitt,Steven L.Smith,Raymond A.Molnar,et al.Holographic recording using a digital micromirror device[J].SPIE,2005,689,45-51
[43]Larry J.Hornbeck.A History of Electronic Projection Display Technology[J],TI Technical Journals 1998,7:1
[44]Mike Douglass.Identifying and Eliminating Digital Light Processing~(TM)Failure Modes Through Accelerated Stress Testing[J],TI Technical Journals,1998,9:1
[45]Larry J.Hornbeck.Digital Light Processing and MEMS[R]:Texas,Texas Instruments Inc.Dalls,1999,1
[46]Michael A.Mignardi.Digital Micromirror Array for Projection TV[R],Texas,Texas Instruments,2000,1
[47]刘驰.DMD用于数字光刻成像研究[D],锦江:四川大学,2005:45
[48]R.J.Gove,V.Markandey,S.Marshall,D.Doherty,G.Sextro,and M.DuVal,High Definition Display System Based on Digital Micromirror Device[R],Italy,International Institute for Communications,1994:69
[49]J.Florence and L.Yoder,Display System Architectures for Digital Micromirror Device(DMD)Based Projectors[J],Proc.SPIE,1996,2650:93-208
[50]M.S.Brermesholtz,Light Collection Efficiency for Light Valve Projection Systems[J].Proc.SPIF,1996,2650:71-79
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[52]Amdrew B.Sontheimer,Digital Micromirror Device(DMD)Hinge Memory Lifetime Reliability Modeling[R],Piano:Texas Instruments,2001:86930
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[54]常虹,范志刚.基于DMD的红外双波段景象投影光学系统设计[J].哈尔滨工业大学学报,2007,39:839
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[58]谌廷政,吕海宝等.微光学器件灰度掩模制作及应用技术的研究[D]北京:国防科技大学,2004:69-72
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[61]董小春,杜春雷.精确控制大数值孔径微透镜列阵面形的显影阈值方法[J].光学学报,2004,870:28
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[63]KEVIN J.Kearney,ZORAN Ninkov,Characterization of a digital micromirror device for use as an optical mask in imaging and spectroscopy[C],SPIE,1998,3292:81-92
[64]李红军,赵晶丽,卢振武等.二元光学元件制作过程中的线宽误差[J].光电子·激光.2000,11(3):279-281
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[2]Motamedi M E.Micro-opto-electro-mechanical systems[J].Opt.Eng.,1994,33(11):3505-3517
[3]Phillips N J.Micro-optics Studies Using Photopolymers.SPIE,1990,1544:10
[4]Nogues J R.Fabrication of pure silica micro-optics by sol-gel.SPIE,1992,1751:214
[5]Wencai Jing.Yimo Zhang.Ge Zhou,Design of MOEMS adjustable optical delay line to reduce link set-up time in a tera-bids optical interconnection network[J].Optics Express,2002,10(14):591-596
[6]Jing Wencai,Zhang Yimo,Zhou Ge.Design of MOEMS adjustable optical delay line to reduce link set-up time in a tera-bits optical interconnection network[J].Optical Express,2002,10(14):591-596
[7]Yongqi Fu.Ngoi Kok Ann Bryan,A novel one step integration of edge-emitting laser diode with micro-elliptical lens using focused ion beam direct deposition[J].IEEE Transactions on Semiconductor Manufacturing,2002,15:2-8
[8]Dennis W.Prather,Sriram Venkataraman,Marion Lecompte[J],et al.VLSI-Scale Integration of DOES for Chip Level Optical Interconnects.Photon.Technol.Lett,2001,13:1112-1114
[9]Alexander Rohrbach,K.-H.Brenner.Surface-relief phase structures generated by light-initiated polymerization[J].Appl.Opt,1995,34(22):4747-4754
[10]刘加峰.胡存刚.宗仁鹤著,光刻技术在微电子设备的应用及发展[J],光电子技术和信息,2004,.37:24-27
[11]王相森.光学光刻技术的发展历程及趋势[J].微处理机,2002,11(4):1-2
[12]翁寿松.下一代光刻技术的设备[J].电子工业专用设备,2004,33(10):35-38
[13]甘学温等.纳米CMOS器件[M].北京,力学出版社,2004:59-74.
[14]陈大鹏,叶甜春.现代光刻技术[J].核技术2004,27(2):15-18
[15]翁寿松等.无掩模光刻技术的前景[J].电子工业专用设备,2005,127(8):1-3
[16]Walter Trybula.International SEMATECH Direction in Maskless Lithography[J].Future lab Intl,28,2005,19:1-2
[17]Onkels E D.SPIE 27th,Annual international symposium and education program on micro lithography[J],2002,4691:203-206
[18]陈大鹏,叶甜春.现代光刻技术[J].核技术,2004,27(2):81-86
[19]佟军民,胡松等.下一代光刻技术[J].电子工业专用设备,2005,11:27-34
[20]莫大康.无掩模光刻技术的最新进展[J].电子工业专用设备,2003,121(2):1-2
[21]陈劲松.用于衍射微光学元件制备的无掩模光刻技术[J].显微、测量、微细加工技术与设备,2005,25(2):75-78
[22]陈劲松,基于数字微镜的高质量精缩投影光刻系统的研制[J],激光与红外,2006,36(3):206-210
[23]彭钦军,郭永康,陈波等.液晶实时掩膜技术制作连续微光学元件[J].光学学报,2003,23(2):220-224。
[24]李圣怡,吕海宝,戴一帆等,电寻址空间光调制器“黑栅”效应的消除方法[J].光子学,2002,31(11):1421-1424.
[25]Kevin J Keamey Zoran Ninkov Characterization of a digital micromirror device for use as an optical mask in imaging and spectroscopy[A].SPIE,2003 3292:81-92
[26]J.B.Sampsell.An Overview of Texas Instruments Digital Micromirror Device(DMD)and Its Application to Projection Displays[J],Society for Information Display Internatl.Symposium Digest of Tech.Papers,1993,24:1012-1015
[27]G.Sextro,T.Ballew,J.Iwal.High-Definition Projection System Using DMD Display Technology[R].SID 95 Digest,Beijing:Beijing University,1995:70-73
[28]V.Markandey and R.Gove,Digital Display Systems Based on the Digital Micromirror Device [R].Beijing:SMPTE 136th Technical Conference and World Media Expo,1994:15-18
[29]J.B.Sampsell.The Digital Micromirror Device[R],Japan:7th ICSS&A,Yokohama,1993:79-85
[30]Linda Geppert.Technology 2000 Analysis&Forecast,Device&Circuits[J],IEEE,2000,37(1):69
[31]侯德胜,杜春雷.邱传凯等.激光直写系统及其应用[J].光电工程.1997,24:26-30
[32]张景和,廖江红,刘伟等.二元光学元件激光直接写入设备的研制[J].仪器仪表学报,2001,22(2):154-157
[33]沈亦兵,周光亚,侯西云等.用于二元光学掩模制作的激光直接写入系统研究[J].
[34]W.Daschner,M.Larsson,S.H.Lee.Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step[J].1995,34:2534-2539
[35]Van Kessel,P.F,Hombeck,L.J,Meier,R.E,et al.A MEMS-based projection display[J].IEEE,1998,86:1687-1704
[36]田文超.贾建援,DMD及DLP显示技术[J].仪器仪表学报,2005,3:58
[37]Dana Dudley,Walter Duncan,John Slaughter.Emerging digital micromirror device(DMD)applications[R].Texas:DLPTM Products New Applications,2000:14
[38]Kevin J.Kearney,Zoran Ninkov.Characterization of a digital micromirror device for use as an optical in imaging and spectroscopy[J].SPIE,1998,32(92):81-92
[39]Levenson M D.Wavefront engineering from SOOnm CD to IOOnm CD[J].SPIE,I997,304(9):12-23
[40]Andres Merquez,Juan Campos,Maria J.Yzuel.Characterization of edge effects in twisted nematic liquid crystal displays[J].Opt.Eng.,2000,39(12):3301-3306
[41]L.J.Hornbeck,Digital Light ProcessingTM for High-Brightness[J],High-Resolution Applications (Invited paper)[R],Texas:Electronic Imaging EI '97 Projection Displays Ⅲ,IS&T and SPIE,1997:18
[42]Ryder S.Nesbitt,Steven L.Smith,Raymond A.Molnar,et al.Holographic recording using a digital micromirror device[J].SPIE,2005,689,45-51
[43]Larry J.Hornbeck.A History of Electronic Projection Display Technology[J],TI Technical Journals 1998,7:1
[44]Mike Douglass.Identifying and Eliminating Digital Light Processing~(TM)Failure Modes Through Accelerated Stress Testing[J],TI Technical Journals,1998,9:1
[45]Larry J.Hornbeck.Digital Light Processing and MEMS[R]:Texas,Texas Instruments Inc.Dalls,1999,1
[46]Michael A.Mignardi.Digital Micromirror Array for Projection TV[R],Texas,Texas Instruments,2000,1
[47]刘驰.DMD用于数字光刻成像研究[D],锦江:四川大学,2005:45
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