低温等离子体放电过程的数值模拟
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摘要
近几年,低温等离子体放电在工业中的应用有了很大的发展。这种技术特别在微电子器件加工和各种功能膜的沉积方面得到了广泛的应用。在工业应用中,对等离子体加工过程的机理了解不够,大多数过程的机理图象还不够清晰、完整,且受加工工艺有关的因素多,参数范围大,过程复杂,因此缺乏有效的监测与调节手段,造成工艺过程重复性差,产品质量不稳定,产量低或效率不高。这主要是由于低温等离子体是由多种粒子组成的复杂体系,其内部及等离子体与固体表面存在多种物理化学过程。它易受外界电磁场的影响,又受内部感应场的作用,内部粒子间的碰撞或散射又不断影响内部集体的自洽场作用。所以等离子体比非电离气体复杂得多,至今仍有许多相关的内部机制未被完全了解,我们很有必要对等离子体中各种物理参数做详细的研究。
本论文对低温等离子体放电的研究中,主要做了以下几方面的工作:
1、查阅国内外资料文献,明确研究目的,对可采用的方案进行充分的调研和分析。
2、从实际需求出发,根据气体放电的基本原理,对采用流体模型数值模拟低温等离子体放电的过程进行了数值分析论证。流体模型分析低温等离子体放电过程既解决了自洽问题,也考虑到了带电粒子的非平衡问题,能够反应出等离子体的主要宏观性质,是一种简单快捷的分析方法。
3、分别用FORTRAN语言编程、气体放电软件OOPIC数值模拟了射频电感耦合、电容耦合等离子体放电过程,分析了放电中不同结构和放电气压对等离子体密度等重要参数的影响。这样就为等离子体工业应用的实验研究和生产提供了理论依据,从而在了解物理过程的基础上,找到合适的参数范围,可以有效的对其监测与调节,提高产品效率和质量。
Industrial applications of low temperature plasma technologies have developed rapidly during recent years. In particular, plasma etching and film are ever-increasing role in the manufacture of semiconductor playing devices. However, we still suffering from several problems, including difficulties in plasma processes, such as lack the effect control and adjustment method. Because the influence of several kinds of particals and electromagnetic field. For the understanding of the complex physical behaviour to find a research method in industrial applications, several achievements are listed as the followings:
1. Search data and literatures of domestic and abroad to find an acceptable method.
2. The expressions of the fluid model to imitate the process of low-pressure discharges are discussed with numerical calculations.
3.The imitations of the process of low-pressure discharges are presented, contain the analyse of parameters(such as plasma density、the space distribution of electron temperature and so on) of radio-frequency(rf) inductively coupled discharges and capacitively coupled discharge in difference structure and pressure. It provides a theory method in plasma empirical analysis and industrial applications. In this process, we can find suited parameters to control and increase efficiency and quantity.
本论文对低温等离子体放电的研究中,主要做了以下几方面的工作:
1、查阅国内外资料文献,明确研究目的,对可采用的方案进行充分的调研和分析。
2、从实际需求出发,根据气体放电的基本原理,对采用流体模型数值模拟低温等离子体放电的过程进行了数值分析论证。流体模型分析低温等离子体放电过程既解决了自洽问题,也考虑到了带电粒子的非平衡问题,能够反应出等离子体的主要宏观性质,是一种简单快捷的分析方法。
3、分别用FORTRAN语言编程、气体放电软件OOPIC数值模拟了射频电感耦合、电容耦合等离子体放电过程,分析了放电中不同结构和放电气压对等离子体密度等重要参数的影响。这样就为等离子体工业应用的实验研究和生产提供了理论依据,从而在了解物理过程的基础上,找到合适的参数范围,可以有效的对其监测与调节,提高产品效率和质量。
Industrial applications of low temperature plasma technologies have developed rapidly during recent years. In particular, plasma etching and film are ever-increasing role in the manufacture of semiconductor playing devices. However, we still suffering from several problems, including difficulties in plasma processes, such as lack the effect control and adjustment method. Because the influence of several kinds of particals and electromagnetic field. For the understanding of the complex physical behaviour to find a research method in industrial applications, several achievements are listed as the followings:
1. Search data and literatures of domestic and abroad to find an acceptable method.
2. The expressions of the fluid model to imitate the process of low-pressure discharges are discussed with numerical calculations.
3.The imitations of the process of low-pressure discharges are presented, contain the analyse of parameters(such as plasma density、the space distribution of electron temperature and so on) of radio-frequency(rf) inductively coupled discharges and capacitively coupled discharge in difference structure and pressure. It provides a theory method in plasma empirical analysis and industrial applications. In this process, we can find suited parameters to control and increase efficiency and quantity.
引文
[1] N.A.克拉尔,A.W.特里维尔皮斯.等离子体物理学原理.北京:原子能出版社,1983:3-5
[2] FFChen.等离子体物理学导论.北京:科学出版社,1980:5-15
[3] 菅井秀郎.等离子体电子工程学.北京:科学出版社,2005:1-10
[4] 金佑民.樊友三.低温等离子体物理基础.北京:清华大学出版社,1983:1-15
[5] 江南.我国低温等离子体研究进展(Ⅱ).物理,2006,35(3):231-237
[6] 唐德礼.低温等离子体应用中的理论和实验研究:[博士学位论文],四川乐山:核工业西南物理研究院,2003:5-15
[7] 杨津基.气体放电.北京:科学出版社,1983,145-292
[8] 彭国贤.等离子体物理的应用——气体放电.上海:知识出版社,1982,170-204
[9] 江剑平.阴极电子学与气体放电原理.北京:国防工业出版社,1980,334-359
[10] Annemie Bogaerts,Renaat Gijbels. Numerical modelling of gas discharge plasmas for various applications. Elsevier Science Ltd, 2003,69:37-52
[11] 黄俊卿.直流辉光放电正柱区及阴极鞘层区的模拟研究.大连理工大学学位论文,2001:5-38
[12] R.J.Carman,A.Maitland. A simulation of electron motion in the cathode sheath region of a glow discharge in helium. J.Phy.D:Appl.phy.,1987,20(8):1021-1030
[13] V.Guerra,P.A.Sá,and J.Loureiro.Kinetic. modeling of low-pressure nitrogen discharges and post-discharges. The European Physical Journal Applied Physics,2004
[14] B.F.Gordiets,C.M.Ferreira. model of a low- pressure Nz-Oz flowing glow discharge. IEEE Transactions on Plasma Science,1995,23(4):750-768
[15] J.P.Boeuf. A two-dimensional model of glow discharges. J.Appl.Phys.,1988,63(5):1342-1349
[16] Z.Wronski. Computer simulation of energy-angle distributions of ions generated in the cathode full of a glow discharge. Vacuum,1991,42(10):635-644.
[17] R.T.Farouki,S.Hamaguchi,M.Dalvie. Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths. Phys. Review A,1991,44(4):2664-2681.
[18] J.D.P.Passchier,W.J.Goedheer. Relaxation phenomena after laser-induced photodetachment in electronegative rf discharges. J.Appl.Phys.,1993,73(3):1073-1079.
[19] J.P.Boeuf,E.Marode. A Monte Carlo analysis of an electron swarm in a nonuniform field: the cathode region of a glow discharge in helium. J.Phys. D: Appl. Phys.,1982,15:2169-2187
[20] 周俐娜,王新兵.微空心阴极放电的流体模型模拟.物理学报,2004,53:3440-3444
[21] 赖建军,余建华.空心阴极直流放电的二维自洽模型描述和阴极溅射分析. 物理学报, 2001,50:1528-1533
[22] M.Surendra,D.B.Graves,G.M.Jellum. Self-consistent model of a direct-current glow discharge: treatment of fast electrons[J]. Phys Rev A, 1990, 41(2): 1112-1125
[23] K.H.Schoenbach,H.Chen,G.Schaefer.Phys. A. model of dc glow discharges. with abnormal cathode fall. J. Appl. Phys. 1990, 154-162
[24] Graeme G Lister. Low-pressure gas discharge modeling. J.Phys.D.Appl.Phy.1992,25:1649-1660
[25] G.I.Sukhinin,A.V.Fedoseev. Self-consistent hybrid model of stratification in a low-pressure glow discharge. XXVIIth ICPIG,Eindhoven,the Netherlands,2005:18-22
[26] Fred Y.Huang,Mark J.Kushner. A hybrid model for particle transport and electron energy distributions in positive column electrical discharges using equivalent species transport. J.Appl.Phys., 1995,78(10):15
[27] 王平,杨银堂等.应用于超大规模集成电路工艺的高密度等离子体源研究进展.真空科学与技术,2002,22(4):274-281
[28] 戴忠玲,毛明,王友年.等离子体刻蚀工艺的物理基础.物理学和高新技术,2006,35(8):693-698
[2] FFChen.等离子体物理学导论.北京:科学出版社,1980:5-15
[3] 菅井秀郎.等离子体电子工程学.北京:科学出版社,2005:1-10
[4] 金佑民.樊友三.低温等离子体物理基础.北京:清华大学出版社,1983:1-15
[5] 江南.我国低温等离子体研究进展(Ⅱ).物理,2006,35(3):231-237
[6] 唐德礼.低温等离子体应用中的理论和实验研究:[博士学位论文],四川乐山:核工业西南物理研究院,2003:5-15
[7] 杨津基.气体放电.北京:科学出版社,1983,145-292
[8] 彭国贤.等离子体物理的应用——气体放电.上海:知识出版社,1982,170-204
[9] 江剑平.阴极电子学与气体放电原理.北京:国防工业出版社,1980,334-359
[10] Annemie Bogaerts,Renaat Gijbels. Numerical modelling of gas discharge plasmas for various applications. Elsevier Science Ltd, 2003,69:37-52
[11] 黄俊卿.直流辉光放电正柱区及阴极鞘层区的模拟研究.大连理工大学学位论文,2001:5-38
[12] R.J.Carman,A.Maitland. A simulation of electron motion in the cathode sheath region of a glow discharge in helium. J.Phy.D:Appl.phy.,1987,20(8):1021-1030
[13] V.Guerra,P.A.Sá,and J.Loureiro.Kinetic. modeling of low-pressure nitrogen discharges and post-discharges. The European Physical Journal Applied Physics,2004
[14] B.F.Gordiets,C.M.Ferreira. model of a low- pressure Nz-Oz flowing glow discharge. IEEE Transactions on Plasma Science,1995,23(4):750-768
[15] J.P.Boeuf. A two-dimensional model of glow discharges. J.Appl.Phys.,1988,63(5):1342-1349
[16] Z.Wronski. Computer simulation of energy-angle distributions of ions generated in the cathode full of a glow discharge. Vacuum,1991,42(10):635-644.
[17] R.T.Farouki,S.Hamaguchi,M.Dalvie. Monte Carlo simulations of space-charge-limited ion transport through collisional plasma sheaths. Phys. Review A,1991,44(4):2664-2681.
[18] J.D.P.Passchier,W.J.Goedheer. Relaxation phenomena after laser-induced photodetachment in electronegative rf discharges. J.Appl.Phys.,1993,73(3):1073-1079.
[19] J.P.Boeuf,E.Marode. A Monte Carlo analysis of an electron swarm in a nonuniform field: the cathode region of a glow discharge in helium. J.Phys. D: Appl. Phys.,1982,15:2169-2187
[20] 周俐娜,王新兵.微空心阴极放电的流体模型模拟.物理学报,2004,53:3440-3444
[21] 赖建军,余建华.空心阴极直流放电的二维自洽模型描述和阴极溅射分析. 物理学报, 2001,50:1528-1533
[22] M.Surendra,D.B.Graves,G.M.Jellum. Self-consistent model of a direct-current glow discharge: treatment of fast electrons[J]. Phys Rev A, 1990, 41(2): 1112-1125
[23] K.H.Schoenbach,H.Chen,G.Schaefer.Phys. A. model of dc glow discharges. with abnormal cathode fall. J. Appl. Phys. 1990, 154-162
[24] Graeme G Lister. Low-pressure gas discharge modeling. J.Phys.D.Appl.Phy.1992,25:1649-1660
[25] G.I.Sukhinin,A.V.Fedoseev. Self-consistent hybrid model of stratification in a low-pressure glow discharge. XXVIIth ICPIG,Eindhoven,the Netherlands,2005:18-22
[26] Fred Y.Huang,Mark J.Kushner. A hybrid model for particle transport and electron energy distributions in positive column electrical discharges using equivalent species transport. J.Appl.Phys., 1995,78(10):15
[27] 王平,杨银堂等.应用于超大规模集成电路工艺的高密度等离子体源研究进展.真空科学与技术,2002,22(4):274-281
[28] 戴忠玲,毛明,王友年.等离子体刻蚀工艺的物理基础.物理学和高新技术,2006,35(8):693-698