光刻机结构动力学建模与仿真
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摘要
在集成电路制造业中,光刻机是精度最高,技术难度最大的一种机电一体化设备。光刻机整机系统是由整机框架、主基板、硅片台、掩模台、物镜、照明系统、预对准系统等分系统通过气力、磁力及联结件耦合的典型复杂多体系统。光刻机零部件众多,连接关系复杂,其动力学特性对提高其工作精度具有重要意义,因此建立其整机结构动力学模型是一项挑战性的基础任务。
本文对光刻机的复杂结构从动力学的角度进行适当的简化,用拉格朗日方法推导出硅片台系统和直线电机系统的多刚体动力学方程,从中可以看出动力学方程中存在大量耦合现象。在分析每个子系统动力学特型的基础上,利用虚拟样机技术ADAMS建立了光刻机整机的具有135个自由度的多刚体动力学仿真模型,并进行模型参数化。仿真模型中动力学参数的识别是建立准确动力学模型的关键,本文利用振动试验和动力学仿真相结合的方法,对关键子系统如气浮系统等的动力学参数进行了识别与计算,对整机动力学仿真模型进行参数修正,获得了比较精确的光刻机动力学仿真模型。基于精确的仿真模型然后进行整机系统的固有振动特性分析,获得了系统中的主要部件的固有振动频率的分布情况。为了验证建立的动力学仿真模型,本文利用锤击法对系统中的主要关键部件在整机环境下进行了振动测试,仿真结果与测试中分析的结果比较一致,验证了建立的动力学仿真模型的正确性。
本文在大量试验和分析的基础上,建立了光刻机整机系统的复杂多刚体动力学仿真模型,利用该动力学仿真模型可仿真分析光刻机系统的动力学特性,这对精密光刻机的机械结构设计、改进和控制策略等提供了理论依据,对提高光刻机的工作精度具有非常重要的指导意义。
The lithography is one of electromechanical integration equipment with the highest precision and the most advanced technology in the Integrated Circuit manufacture field. The mechanical system of the lithography is a typical and complicated multi-body system, which consists of the base frame, the mainplate, the reticle stage, the wafer stage, the lens, the illumination, the alignment system and so on, with the couple of gas-bearings, magnetic and the couplings. With many assemblies and complicated connections, the dynamic characteristic is very important for the improvement of the lithography precision. It is a challenge to set up the structural dynamic model for the complicated mechanical system of the lithography.
In this thesis, based on a rational simplification of the lithography’s complicated structure, the dynamic mathematic models of wafer stage system and linear motor system are set up with the Lagrange Method, in which exist many coupling phenomenon. On the basis of the analysis of the subsystem’s dynamic behaviors, the multi rigid-body and parametric dynamic simulation model with 135 DOFs is founded for the entire lithography structure with the virtual prototype software ADAMS. The identification of the dynamic parameters is the key to the dynamic model. The dynamic parameters of the key subsystems such as the air-bearings system are identified and calculated depending on the vibration test and the dynamic simulation. According to these parameters, the multi rigid-body dynamic model is modified to establish a more accurate simulation model. Based on the simulation model, the inherent vibration characteristic of the lithography is analyzed detailedly and the distribution of the natural frequencies of the lithography system is obtained. To check the dynamic simulation model, the vibration tests with the hammer impact on lithography key assemblies are carried out in the entire lithography system. The deviation between the natural frequencies gained from the test data and from the simulation results is reasonable and the simulation model is accepted.
In the thesis, based on the test and analysis, the multi rigid-body simulation model is set up for the lithography system. The simulation model can gain dynamic characteristic. These research results will provide theoretical guidelines for structural design & betterment and control strategy, as well as great references for improving the precision for the lithography.
本文对光刻机的复杂结构从动力学的角度进行适当的简化,用拉格朗日方法推导出硅片台系统和直线电机系统的多刚体动力学方程,从中可以看出动力学方程中存在大量耦合现象。在分析每个子系统动力学特型的基础上,利用虚拟样机技术ADAMS建立了光刻机整机的具有135个自由度的多刚体动力学仿真模型,并进行模型参数化。仿真模型中动力学参数的识别是建立准确动力学模型的关键,本文利用振动试验和动力学仿真相结合的方法,对关键子系统如气浮系统等的动力学参数进行了识别与计算,对整机动力学仿真模型进行参数修正,获得了比较精确的光刻机动力学仿真模型。基于精确的仿真模型然后进行整机系统的固有振动特性分析,获得了系统中的主要部件的固有振动频率的分布情况。为了验证建立的动力学仿真模型,本文利用锤击法对系统中的主要关键部件在整机环境下进行了振动测试,仿真结果与测试中分析的结果比较一致,验证了建立的动力学仿真模型的正确性。
本文在大量试验和分析的基础上,建立了光刻机整机系统的复杂多刚体动力学仿真模型,利用该动力学仿真模型可仿真分析光刻机系统的动力学特性,这对精密光刻机的机械结构设计、改进和控制策略等提供了理论依据,对提高光刻机的工作精度具有非常重要的指导意义。
The lithography is one of electromechanical integration equipment with the highest precision and the most advanced technology in the Integrated Circuit manufacture field. The mechanical system of the lithography is a typical and complicated multi-body system, which consists of the base frame, the mainplate, the reticle stage, the wafer stage, the lens, the illumination, the alignment system and so on, with the couple of gas-bearings, magnetic and the couplings. With many assemblies and complicated connections, the dynamic characteristic is very important for the improvement of the lithography precision. It is a challenge to set up the structural dynamic model for the complicated mechanical system of the lithography.
In this thesis, based on a rational simplification of the lithography’s complicated structure, the dynamic mathematic models of wafer stage system and linear motor system are set up with the Lagrange Method, in which exist many coupling phenomenon. On the basis of the analysis of the subsystem’s dynamic behaviors, the multi rigid-body and parametric dynamic simulation model with 135 DOFs is founded for the entire lithography structure with the virtual prototype software ADAMS. The identification of the dynamic parameters is the key to the dynamic model. The dynamic parameters of the key subsystems such as the air-bearings system are identified and calculated depending on the vibration test and the dynamic simulation. According to these parameters, the multi rigid-body dynamic model is modified to establish a more accurate simulation model. Based on the simulation model, the inherent vibration characteristic of the lithography is analyzed detailedly and the distribution of the natural frequencies of the lithography system is obtained. To check the dynamic simulation model, the vibration tests with the hammer impact on lithography key assemblies are carried out in the entire lithography system. The deviation between the natural frequencies gained from the test data and from the simulation results is reasonable and the simulation model is accepted.
In the thesis, based on the test and analysis, the multi rigid-body simulation model is set up for the lithography system. The simulation model can gain dynamic characteristic. These research results will provide theoretical guidelines for structural design & betterment and control strategy, as well as great references for improving the precision for the lithography.
引文
[1]苏雪莲.新世纪光刻技术及光刻设备的发展趋势.微电子技术,2004,29(2):8～17
[2]董吉洪,田兴志等.100nm步进扫描投影光刻机工件台、掩模台的发展.微纳米科学与技术,2004,5:20～24
[3] Toshiro I, Toshifumi S, Wataru W. Total solution in 157 nm lithography for below 65 nm node semiconductor devices.Elsevier, Microelectronic Engineering, 2004, 73-74: 11～15
[4] Dejule R. Next-generation Lithography: the Accomplishments and the challenges [J]. Solid State Technology, 1999, 6: 57～68
[5]王延风.磁悬浮精密定位工作台机电一体化CAD/CAE集成研究:[博士学位论文].长春:中国科学院长春光学精密机械与物理研究所,2004.1
[6]刘丹,程兆谷,高海军等.步进扫描投影光刻机工件台和掩模台的进展.激光与电子学进展,2003,40(5):14～20
[7] Jan V S, Frank B, Manfred S,et al. 0.7 NA DUV step & scan system for 150 nm imaging with improved overlay [J]. Proc SPIE, 1999, 3679:448～463
[8] Hirayanagi N, Fujiwara T, Hada K, et al. Nikon EB stepper:its system design and preliminary performance.Proceedings of SPIE, 2003, 37: 504～511
[9] Martin V D B, Hans J, Steve S, et al. Step-and-scan and step-and-repeat, a technology comparision [J]. Proc SPIE, 1996, 2726: 734～753
[10] Sasago M. Lithography Solutions for sub-0.1um Generations.IEEE, Symposium on VLSI Technology Digest, 1998: 6-9
[11] Itani T, Suganaga T, et al. Total solution in 157 nm lithography for below 65 nm node semiconductor devices.Microelectronic Engineering, 2004, 73-74:11～15
[12]董大为.光学光刻的过去、现在和未来.中国集成电路,2004,62:65～68
[13]刘晓莉,李霄燕,邵敏权.光刻技术及其新进展.光机电信息2005:12～15
[14] Jeanette R, Terence B, Robert L, et al. Exposing extreme ultraviolet lithography at Intel. Elsevier, Micoelectronic Engineering, 2006, 83: 672～675
[15] Sewell H, McCafferty D, Markoya L. Immersion Lithography Next Step on the Roadmap[R]. Brewer Science ARC Symposium, Albany, 2004, 10:10～28
[16]田陆屏.0.5μm步进光刻机关键技术设计.电子工业专用设备,1999,28(2): 5～9
[17]王国强,张进平等编著.虚拟样机技术及其在ADAMS上的实践.西安:西北工业大学出版社,2002:1～25
[18]刘延柱,洪嘉振等.多刚体系统动力学.北京:高等教育出版社,1989:1～20
[19]刘延柱.完全迪卡尔坐标描述的多体系统动力学.力学学报,1997,29(1): 84～94
[20] Chace M A, Simth D A. DAMN-A Digital Computer Program for the Dynamic Analysis of Generalized Mechanical Systems. SAE Paper 710244, Jan,1971
[21] Haung E J著,刘兴祥等(译).机械系统的计算机辅助运动学和动力学(第一卷).北京:高等教育出版社,1996:3～40
[22] Schwertassek R, Roberson R E. a State-space Dynamical Representation for Multibody Mechanical systems. Acta Mechanica,1983, 50:141～161
[23]周凡利.约束机械系统动力学分析实时积分算法研究与实现:[硕士学位论文].武汉:华中科技大学,2001
[24] Huston R L, Passerello C E. Multibody Structural Dynamics Including Translation Between the bodies. Computers and Structures, 1980, 12:713～720
[25] (美)毫格(Haug E J)著,刘兴祥,李吉容等译.机械系统的计算机辅助运动学和动力学(第二卷).北京:高等教育出版社,1996:1-15
[26]杨辉,洪嘉振等.柔性多体系统动力学实验研究综述.力学进展,2004,34(2): 171～180
[27]刘又午.多体动力学的休斯敦方法及其发展.中国机械工程,2000,11(6):601～607
[28]潘振宽.多体系统动力学及应用软件.青岛大学学报,1996,11(1):84-89
[29]洪嘉振,尤超蓝.刚柔耦合系统动力学研究进展.动力学与控制学报,2004,2(2):1～4
[30]刘贤喜.机械系统虚拟样机仿真软件的实用化研究:[博士学位论文].北京:中国农业大学,2001.10
[31]张越今,宋健.多体动力学仿真软件ADAMS理论及应用研讨.机械科学与技术,1997,16(5):753～758
[32]崔新涛.基于虚拟样机技术的变速器动力学仿真研究:[硕士学位论文].天津:天津大学,2004.1
[33]熊光愣,李伯虎,柴旭东.虚拟样机技术.系统仿真学报,2001,(3):114～117
[34]李若庆.气囊在光刻中应用.电子工业专用设备,2003,106:53～58
[35]李若庆.步进扫描工作台气浮结构分析.电子工业专业设备,2003,104:45～51
[36]张大钧,刘又午.有限段方法的刚度方程.机械工程学报(英文版),1992,1: 23～30
[37] Kim S S, Haug E J. A Recursive Formulation for Flexible Multibody dynamics, Part 2, Closed-loop Systems.Computer Methods in Applied Mechanics & Engineering,1989,74:251～269
[38] Roberson R E, Wittenburg J. A Dynamical Formalism for an Arbitray Number of Interconnected Rigid Bodies, with Reference to the Problem of Satellite Attitude Control. 3rd IFAC Congr, London(1967),Vol.1,Book 3: 46D.2～46D.9
[39] Cyril M H, Allan G. P. Harris’shock and vibration handbook-5th edition. New York: The McGraw-Hill Companies, 2002:72～79
[40] Thomson W T, Dahleh M D. Theory of Vibration with Applications: the 5th edition. beijing:Tsinghua University Publishing Company,2005:199～216
[41]师汉民.机械振动系统——分析·测试·建模·对策(上册)(第二版).武汉:华中科技大学出版社,2004:84～95
[42]郑建荣.ADAMS-虚拟样机技术入门与提高.北京:机械工业出版社,2001:1～33
[43]李军,邢俊文,覃文浩.ADAMS实例教程.北京:北京理工大学出版社,2002: 1～18
[44]陈立平,张云清,任卫群等.机械系统动力学分析及ADAMS应用教程[M] .北京:清华大学出版社,2005:1～42
[45]左鹤声,彭玉莺.振动试验模态分析.北京:中国铁道出版社,1995:3～26
[46]李享荣,吴益敏.试验模态分析及有限元相结合的方法识别结构的支承刚度.上海大学学报(自然科学版),1996,2(3):274～281
[47]田军,潘宏侠,黄晋英.组合结构动态特性的实验分析.测试技术学报,2002,16(2):112～116
[48]李德葆,张元润.振动测量与试验分析.北京:机械工业出版社,1992:95～97
[2]董吉洪,田兴志等.100nm步进扫描投影光刻机工件台、掩模台的发展.微纳米科学与技术,2004,5:20～24
[3] Toshiro I, Toshifumi S, Wataru W. Total solution in 157 nm lithography for below 65 nm node semiconductor devices.Elsevier, Microelectronic Engineering, 2004, 73-74: 11～15
[4] Dejule R. Next-generation Lithography: the Accomplishments and the challenges [J]. Solid State Technology, 1999, 6: 57～68
[5]王延风.磁悬浮精密定位工作台机电一体化CAD/CAE集成研究:[博士学位论文].长春:中国科学院长春光学精密机械与物理研究所,2004.1
[6]刘丹,程兆谷,高海军等.步进扫描投影光刻机工件台和掩模台的进展.激光与电子学进展,2003,40(5):14～20
[7] Jan V S, Frank B, Manfred S,et al. 0.7 NA DUV step & scan system for 150 nm imaging with improved overlay [J]. Proc SPIE, 1999, 3679:448～463
[8] Hirayanagi N, Fujiwara T, Hada K, et al. Nikon EB stepper:its system design and preliminary performance.Proceedings of SPIE, 2003, 37: 504～511
[9] Martin V D B, Hans J, Steve S, et al. Step-and-scan and step-and-repeat, a technology comparision [J]. Proc SPIE, 1996, 2726: 734～753
[10] Sasago M. Lithography Solutions for sub-0.1um Generations.IEEE, Symposium on VLSI Technology Digest, 1998: 6-9
[11] Itani T, Suganaga T, et al. Total solution in 157 nm lithography for below 65 nm node semiconductor devices.Microelectronic Engineering, 2004, 73-74:11～15
[12]董大为.光学光刻的过去、现在和未来.中国集成电路,2004,62:65～68
[13]刘晓莉,李霄燕,邵敏权.光刻技术及其新进展.光机电信息2005:12～15
[14] Jeanette R, Terence B, Robert L, et al. Exposing extreme ultraviolet lithography at Intel. Elsevier, Micoelectronic Engineering, 2006, 83: 672～675
[15] Sewell H, McCafferty D, Markoya L. Immersion Lithography Next Step on the Roadmap[R]. Brewer Science ARC Symposium, Albany, 2004, 10:10～28
[16]田陆屏.0.5μm步进光刻机关键技术设计.电子工业专用设备,1999,28(2): 5～9
[17]王国强,张进平等编著.虚拟样机技术及其在ADAMS上的实践.西安:西北工业大学出版社,2002:1～25
[18]刘延柱,洪嘉振等.多刚体系统动力学.北京:高等教育出版社,1989:1～20
[19]刘延柱.完全迪卡尔坐标描述的多体系统动力学.力学学报,1997,29(1): 84～94
[20] Chace M A, Simth D A. DAMN-A Digital Computer Program for the Dynamic Analysis of Generalized Mechanical Systems. SAE Paper 710244, Jan,1971
[21] Haung E J著,刘兴祥等(译).机械系统的计算机辅助运动学和动力学(第一卷).北京:高等教育出版社,1996:3～40
[22] Schwertassek R, Roberson R E. a State-space Dynamical Representation for Multibody Mechanical systems. Acta Mechanica,1983, 50:141～161
[23]周凡利.约束机械系统动力学分析实时积分算法研究与实现:[硕士学位论文].武汉:华中科技大学,2001
[24] Huston R L, Passerello C E. Multibody Structural Dynamics Including Translation Between the bodies. Computers and Structures, 1980, 12:713～720
[25] (美)毫格(Haug E J)著,刘兴祥,李吉容等译.机械系统的计算机辅助运动学和动力学(第二卷).北京:高等教育出版社,1996:1-15
[26]杨辉,洪嘉振等.柔性多体系统动力学实验研究综述.力学进展,2004,34(2): 171～180
[27]刘又午.多体动力学的休斯敦方法及其发展.中国机械工程,2000,11(6):601～607
[28]潘振宽.多体系统动力学及应用软件.青岛大学学报,1996,11(1):84-89
[29]洪嘉振,尤超蓝.刚柔耦合系统动力学研究进展.动力学与控制学报,2004,2(2):1～4
[30]刘贤喜.机械系统虚拟样机仿真软件的实用化研究:[博士学位论文].北京:中国农业大学,2001.10
[31]张越今,宋健.多体动力学仿真软件ADAMS理论及应用研讨.机械科学与技术,1997,16(5):753～758
[32]崔新涛.基于虚拟样机技术的变速器动力学仿真研究:[硕士学位论文].天津:天津大学,2004.1
[33]熊光愣,李伯虎,柴旭东.虚拟样机技术.系统仿真学报,2001,(3):114～117
[34]李若庆.气囊在光刻中应用.电子工业专用设备,2003,106:53～58
[35]李若庆.步进扫描工作台气浮结构分析.电子工业专业设备,2003,104:45～51
[36]张大钧,刘又午.有限段方法的刚度方程.机械工程学报(英文版),1992,1: 23～30
[37] Kim S S, Haug E J. A Recursive Formulation for Flexible Multibody dynamics, Part 2, Closed-loop Systems.Computer Methods in Applied Mechanics & Engineering,1989,74:251～269
[38] Roberson R E, Wittenburg J. A Dynamical Formalism for an Arbitray Number of Interconnected Rigid Bodies, with Reference to the Problem of Satellite Attitude Control. 3rd IFAC Congr, London(1967),Vol.1,Book 3: 46D.2～46D.9
[39] Cyril M H, Allan G. P. Harris’shock and vibration handbook-5th edition. New York: The McGraw-Hill Companies, 2002:72～79
[40] Thomson W T, Dahleh M D. Theory of Vibration with Applications: the 5th edition. beijing:Tsinghua University Publishing Company,2005:199～216
[41]师汉民.机械振动系统——分析·测试·建模·对策(上册)(第二版).武汉:华中科技大学出版社,2004:84～95
[42]郑建荣.ADAMS-虚拟样机技术入门与提高.北京:机械工业出版社,2001:1～33
[43]李军,邢俊文,覃文浩.ADAMS实例教程.北京:北京理工大学出版社,2002: 1～18
[44]陈立平,张云清,任卫群等.机械系统动力学分析及ADAMS应用教程[M] .北京:清华大学出版社,2005:1～42
[45]左鹤声,彭玉莺.振动试验模态分析.北京:中国铁道出版社,1995:3～26
[46]李享荣,吴益敏.试验模态分析及有限元相结合的方法识别结构的支承刚度.上海大学学报(自然科学版),1996,2(3):274～281
[47]田军,潘宏侠,黄晋英.组合结构动态特性的实验分析.测试技术学报,2002,16(2):112～116
[48]李德葆,张元润.振动测量与试验分析.北京:机械工业出版社,1992:95～97