激光直写系统的软硬件设计
摘要
激光直写技术是随着大规模集成电路的发展而于20世纪80年代中期提出的。激
光直写是一种制作光刻掩模、衍射元件等的新技术。激光直写技术是将激光刻蚀、声
光调制、光束准直以及计算机控制和数据处理等高新技术融为一体的技术。
所谓激光直写，就是利用聚焦的激光光束，由计算机控制声光调制器的通断以及
平台的移动，在光刻胶上进行曝光，经过显影后得到所需要的图形。激光直写系统要
求的器件的精度非常高，我们目前的工作目标是首先实现激光直写系统的基本功能，
在此基础上，再进行高性能系统的研制。本文的主要目的是建立了一种极坐标和直角
坐标相结合的激光直写系统的原理样机，探讨系统的各部分器件的基本性能要求，为
今后研制高精度激光直写系统做好工作基础，分析了激光直写系统中关键器件的性能
要求，基本控制方式，实现了极坐标方式下，任意旋转角度直线图形与共心圆环的光
刻。在文中探讨了在曲面条件下的激光直写焦深改进的措施。
自定义了一种支持*.DXF文件的矢量文件(*.LDW)，从而实现了与AutoCAD软件
的接口转换，使得系统支持矢量化运行，并且经过对*.DXF文件的转换后，实现了矢
量化运行的数据量较小。我们还进行了*.ARR文件的激光直写实验，比较了*.LDW与
*.ARR文件的不同之处。提出了线光栅干涉扫描实现条纹快速光刻的一种新方法。
今后的工作有，定量研究光斑的质量对光刻线条的线宽、陡度等的影响，研究利
用矢量化文件进行复杂图形的光刻控制的方式，改进系统的驱动方式和提高控制精
度，增加自动调焦系统。定量研究灰度狭缝扫描获得高精度槽型光栅的方法等等。总
之，因为系统中涉及的问题和工作非常多，不是论文中都能涉及到的，还有大量的工
作要做。
Photo masks are the backbone of micro-fabrication industries. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. The laser direct writing system is the kind of tool that exposes the precision patterns by the micro-spot on the photosensitive material. This is a single step process and comparatively cheaper and faster than lithography.
The laser direct writing system with polar coordinate and Cartesian coordinate is described in this paper. The properties of the key optical and electrical devices and the controlling mode in the system are put forwards. Using the polar coordinate lines with different directions and the circulars with the same axis can be written together.
By using He-Cd laser (442nm) as writing light source, the system can directly write line with width 05#m on a sample. The *.dxf format file is used widely in the industries which stores data in vectorial mode. In the paper a new *.ldw file format to get the data from *.dxf format file is defined for supporting the vectorial model scanning of laser direct writing system.
How to increase the depth of focus (DOF) of optical system is also discussed in this paper when writing pattern on the concave plates. Besides this, a new way to write lines with high resolution is proposed which is suitable to write the grating lines efficiently.
The experimental results are presented and discussed in Sec.5. The factors attributed to the results are also given. Finally further research directions are discussed.
光直写是一种制作光刻掩模、衍射元件等的新技术。激光直写技术是将激光刻蚀、声
光调制、光束准直以及计算机控制和数据处理等高新技术融为一体的技术。
所谓激光直写，就是利用聚焦的激光光束，由计算机控制声光调制器的通断以及
平台的移动，在光刻胶上进行曝光，经过显影后得到所需要的图形。激光直写系统要
求的器件的精度非常高，我们目前的工作目标是首先实现激光直写系统的基本功能，
在此基础上，再进行高性能系统的研制。本文的主要目的是建立了一种极坐标和直角
坐标相结合的激光直写系统的原理样机，探讨系统的各部分器件的基本性能要求，为
今后研制高精度激光直写系统做好工作基础，分析了激光直写系统中关键器件的性能
要求，基本控制方式，实现了极坐标方式下，任意旋转角度直线图形与共心圆环的光
刻。在文中探讨了在曲面条件下的激光直写焦深改进的措施。
自定义了一种支持*.DXF文件的矢量文件(*.LDW)，从而实现了与AutoCAD软件
的接口转换，使得系统支持矢量化运行，并且经过对*.DXF文件的转换后，实现了矢
量化运行的数据量较小。我们还进行了*.ARR文件的激光直写实验，比较了*.LDW与
*.ARR文件的不同之处。提出了线光栅干涉扫描实现条纹快速光刻的一种新方法。
今后的工作有，定量研究光斑的质量对光刻线条的线宽、陡度等的影响，研究利
用矢量化文件进行复杂图形的光刻控制的方式，改进系统的驱动方式和提高控制精
度，增加自动调焦系统。定量研究灰度狭缝扫描获得高精度槽型光栅的方法等等。总
之，因为系统中涉及的问题和工作非常多，不是论文中都能涉及到的，还有大量的工
作要做。
Photo masks are the backbone of micro-fabrication industries. Currently they are fabricated by lithographic process, which is very expensive and time consuming since it is a several step process. The laser direct writing system is the kind of tool that exposes the precision patterns by the micro-spot on the photosensitive material. This is a single step process and comparatively cheaper and faster than lithography.
The laser direct writing system with polar coordinate and Cartesian coordinate is described in this paper. The properties of the key optical and electrical devices and the controlling mode in the system are put forwards. Using the polar coordinate lines with different directions and the circulars with the same axis can be written together.
By using He-Cd laser (442nm) as writing light source, the system can directly write line with width 05#m on a sample. The *.dxf format file is used widely in the industries which stores data in vectorial mode. In the paper a new *.ldw file format to get the data from *.dxf format file is defined for supporting the vectorial model scanning of laser direct writing system.
How to increase the depth of focus (DOF) of optical system is also discussed in this paper when writing pattern on the concave plates. Besides this, a new way to write lines with high resolution is proposed which is suitable to write the grating lines efficiently.
The experimental results are presented and discussed in Sec.5. The factors attributed to the results are also given. Finally further research directions are discussed.
引文
1. Michael T. Gale, Markus Rossi. Jorn Pedersen, etal. Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists[J]. OPTICAL ENGINEERING, 1994, 33(11): 3556-3566.
2. walter Daschner, PinLong,etal。Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive[J].Appl. Opt, 1997(36):4675-4680.
3．侯得胜，冯伯儒等．激光直写系统制作掩模和器件的工艺[J]．微细加工技术．1999，1：55-59．
4. Michael R.wang and hang su. Multilevel diffractive microlens fabrication by one-step laser-assisted chemical etching upon high-energy-beam sensitive glass[J]. optics letters,1998(23):876-878.
5. Wang M R, Su Heng. Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication[J]. Appl opt, 1998, 37(32): 7568-7576.
6. J. H.Burge, D.S.Anderson, T. D. Milster, etal. Measurement of a convex secondary mirror using a holographic test plate[A]. SPIE[C]. 1994, 2199: 193-198.
7. J. H. Burge, D. S. Anderson. Full-aperture interferometric test of convex secondary mirrors using holographic test plates[A]. SPIE[C]. 1994, 2199: 181-192.
8. J.H. Burge, M. J. Fehniger, G. C. Cole. Demonstration of accuracy and flexibility of using CGH test plates for measuring aspheric surfaces[A]. SPIE[C]. 1997, 3134: 379-389.
9. Yao Cheng,Tai-Yuan Hang,Ching-Chang Chieng. thick-film lithography using laser write.
导体光电，2002，(23)：159-162．
11．陈林森等．数码三维与光变图象的制作方法及激光照排系统．中国专利，2001，01134159．9．
12．李红军，李凤友，等，灰度掩摸技术。微细加工技术。2000，1：10-15
13．张以谟主编，应用光学(下)[M]。机械工业出版社，1984
14．安毓英，刘继芳，李庄辉等。光电子技术[M]．北京：电子工业出版社，2002．
15．陈钰清，王静环．激光物理[M]．杭州：浙江大学出版社，1992．
16．梁铨廷．物理光学[M].6.北京：机械工业出版社，1987．
17．王季铁，曲家骐．执行电动机[M]．北京：机械工业出版社，1997．
18．金国藩，严瑛白，邬敏贤，等．二元光学[M]．北京：国防工业出版社，1998．
19. 21.Jose Ramon Salgueriro Juan Relix Roman etal.System for Laser writing to lithgraph masks for integrated optics[J].Opt. Eng. 1998(37): 1115-1123
20. S.Jeffrey Rosner Nader Shamma, Frederik Sporon-Fiedler著 谢中生译。亚微米光刻中最佳焦深的傅里叶函数分析[J]。电子工业专用设备, 2000，29(1)：27-31。
21．范育青，冯秀娟，周建华．CAD软件设计[M]．北京：北京航空航天出版社，1996．
22．于美文，光全息学及其应用。北京理工大学出版社，1994．
23．梁宜用，杨国光．衍射光学器件的激光辅助制造[J]．光学仪器,2002，4-5：86-90
2. walter Daschner, PinLong,etal。Cost-effective mass fabrication of multilevel diffractive optical elements by use of a single optical exposure with a gray-scale mask on high-energy beam-sensitive[J].Appl. Opt, 1997(36):4675-4680.
3．侯得胜，冯伯儒等．激光直写系统制作掩模和器件的工艺[J]．微细加工技术．1999，1：55-59．
4. Michael R.wang and hang su. Multilevel diffractive microlens fabrication by one-step laser-assisted chemical etching upon high-energy-beam sensitive glass[J]. optics letters,1998(23):876-878.
5. Wang M R, Su Heng. Laser direct-write gray-level mask and one-step etching for diffractive microlens fabrication[J]. Appl opt, 1998, 37(32): 7568-7576.
6. J. H.Burge, D.S.Anderson, T. D. Milster, etal. Measurement of a convex secondary mirror using a holographic test plate[A]. SPIE[C]. 1994, 2199: 193-198.
7. J. H. Burge, D. S. Anderson. Full-aperture interferometric test of convex secondary mirrors using holographic test plates[A]. SPIE[C]. 1994, 2199: 181-192.
8. J.H. Burge, M. J. Fehniger, G. C. Cole. Demonstration of accuracy and flexibility of using CGH test plates for measuring aspheric surfaces[A]. SPIE[C]. 1997, 3134: 379-389.
9. Yao Cheng,Tai-Yuan Hang,Ching-Chang Chieng. thick-film lithography using laser write.
导体光电，2002，(23)：159-162．
11．陈林森等．数码三维与光变图象的制作方法及激光照排系统．中国专利，2001，01134159．9．
12．李红军，李凤友，等，灰度掩摸技术。微细加工技术。2000，1：10-15
13．张以谟主编，应用光学(下)[M]。机械工业出版社，1984
14．安毓英，刘继芳，李庄辉等。光电子技术[M]．北京：电子工业出版社，2002．
15．陈钰清，王静环．激光物理[M]．杭州：浙江大学出版社，1992．
16．梁铨廷．物理光学[M].6.北京：机械工业出版社，1987．
17．王季铁，曲家骐．执行电动机[M]．北京：机械工业出版社，1997．
18．金国藩，严瑛白，邬敏贤，等．二元光学[M]．北京：国防工业出版社，1998．
19. 21.Jose Ramon Salgueriro Juan Relix Roman etal.System for Laser writing to lithgraph masks for integrated optics[J].Opt. Eng. 1998(37): 1115-1123
20. S.Jeffrey Rosner Nader Shamma, Frederik Sporon-Fiedler著 谢中生译。亚微米光刻中最佳焦深的傅里叶函数分析[J]。电子工业专用设备, 2000，29(1)：27-31。
21．范育青，冯秀娟，周建华．CAD软件设计[M]．北京：北京航空航天出版社，1996．
22．于美文，光全息学及其应用。北京理工大学出版社，1994．
23．梁宜用，杨国光．衍射光学器件的激光辅助制造[J]．光学仪器,2002，4-5：86-90