无掩模光刻系统研究
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摘要
本论文所提出的微尖端阵列无掩模光刻系统扩展了纳米加工的手段,是未来光刻技术发展的一种趋势。通过对本系统的研究,无需掩模,微尖端的发射电流就可直接曝光光刻胶,进行图形生成及加工,还通过阵列并行直写大大提高了工作效率。
取得的主要研究成果如下：1,设计并制做了无掩模光刻系统中的核心器件—微尖端阵列器件,开发了一整套用于制作微尖端阵列器件的MEMS制作工艺,并创新的提出了使用微尖端阵列来进行电子束直写。2,完整的制作了一套无掩模光刻平台,并完成了CIF版图文件到微动台可识别的二进制编码的转换。3,对微尖端阵列器件发射电子的能力进行了测试,取得了理想的测试结果。
In this paper, a maskless lithography system is proposed. It provides a new method to nanofabrication and it is the trend for next generation lithography technology. Based on this system, there is no need to use masks in lithography processes to generate and process patterns because the current emitted from micro tip can directly exposure the photoresist. The working efficiency is greatly enhanced through array parallel writing.
The main research achievements are listed as follows:1. The micro-tip array which is the key element of the maskless lithography system is designed and fabricated and the standard processings for the micro-fabrication are developed. The field electron emission through the micro-tip array is verified.2. The vacuum system for maskless lithography is set up completely. The transformation from CIF to binary coding which can be recognized by the micropositioner is accomplished.3. The efficiency of electron emission of microtip array is tested and good experimental results are received.
取得的主要研究成果如下：1,设计并制做了无掩模光刻系统中的核心器件—微尖端阵列器件,开发了一整套用于制作微尖端阵列器件的MEMS制作工艺,并创新的提出了使用微尖端阵列来进行电子束直写。2,完整的制作了一套无掩模光刻平台,并完成了CIF版图文件到微动台可识别的二进制编码的转换。3,对微尖端阵列器件发射电子的能力进行了测试,取得了理想的测试结果。
In this paper, a maskless lithography system is proposed. It provides a new method to nanofabrication and it is the trend for next generation lithography technology. Based on this system, there is no need to use masks in lithography processes to generate and process patterns because the current emitted from micro tip can directly exposure the photoresist. The working efficiency is greatly enhanced through array parallel writing.
The main research achievements are listed as follows:1. The micro-tip array which is the key element of the maskless lithography system is designed and fabricated and the standard processings for the micro-fabrication are developed. The field electron emission through the micro-tip array is verified.2. The vacuum system for maskless lithography is set up completely. The transformation from CIF to binary coding which can be recognized by the micropositioner is accomplished.3. The efficiency of electron emission of microtip array is tested and good experimental results are received.
引文
[1]Ritchit R H. Plasma losses by fast electrons in thin films[J]. Phys. Rev.,1956, (106):864-881
[2]郭小伟.SLM无掩膜光刻系统研究[D]：[博士学位论文].四川：四川大学光学专业,2007
[3]童志义.光学光刻技术现状及发展趋势[J].电子工业专用设备.2001,1：1-5
[4]F Mok, J diep, H K Liu, et al. Real time computer generated holograph by means of a liquid crystal television spatial light modulator[J]. Opt Lett.,1986,11:748
[5]邱国斌,蔡定平.金属表面电浆简介[J].物理双月刊(台湾).2006,28(2)：462-485
[6]Weeber I C. Observation of light confinement effects with a near fieldoptical microscope[J]. Phys. Rev. Lett.,1996,66:2-5
[7]Devanx E Local detection of the optical magnetic field in the near zone of dielectric samples[J]. Phys. Rev. B.,2000,62:1-14
[8]Anatoly V Zayatsa, Jill Elliott, Igor I Smolyaninov, et al. Imaging with short-wavelength surface plasmon polaritons[J]. Appl. Phys. Lett.,2005,86:1-3
[9]Lloyd R Harriott. Limits of Lithography[J]. IEEE.2001,3(89):366-368
[10]Cregan R F. Single-mode photonic band gap guidance of light in air[J]. Science, 1999,285:1-9
[11]Jean-Francois Masson, Kayla Hamersky, Stephen Beaudoin. In vitro biochemical monitoring with fiber optic based surface plasmon resonance sensors[J]. Proc of SPIE.,2004,261:123-134
[12]Qing Cao, Philippe Lalance. Negative role of surface plasmons in the transmission of metallic grating with very narrow slits[J]. Phys. Rev. Lett.,2002,88:1-4
[13]H A. Beth. Theory of diffraction by small holes[J]. The Physical Review. 2005,66:163-182
[14]A Degiron, H J Lezec, N Yamamoto, et al. Optical transmission properties of a single subwavelength aperture in a real metal[J]. Optics Communications.,2004,239:61-66
[15]T Lopez-Rios, D Mendoza, F J Garcia-Vidal, et al. Surface Shape Resonances in Lamellar Metallic Gratings[J]. Phys. Rev. Lett.,1998:665-8
[16]J A Porto, F J Garcia Vidal, J B Pendry. Transmission resonances on metallic gratings with very narrow slits[J]. Phys. Rev. Lett.,1999,83:1-8
[17]Y Takakura. Optical Resonance in a Narrow Slit in a Thick Metallic Screen[J]. Phys.Rev. Lett.,2001,86:1-3
[18]EE Times.电子工业设备.2008,163：62
[19]Micheal Quick, Julian Serda. 半导体制造技术.北京:电子工业出版社,2004:395-397
[20]T Ueno, J Sheats. X-Ray Lithography[J].1998:403
[21]T. Ueno, J.Sheats. X-Ray Lithography[J].1998:405
[22]R Dejule. Next-Generation Lithography Tools[J].2001:48
[23]Naoki Matsuzuka, Bungo Tanaka, Toshihiko Nagamura. et al. Development of Scanning probe Parallel nanowriting system with electronic beamresist[J]. IEEE., 2007:1649-1652.
[24]陈炯枢.电子束在微纳制造中的应用进展[J].真空与低温.2007,13(1)：7-9
[25]杨清华,刘明,陈大鹏,叶甜春.高斯电子束曝光系统[J].电子工业出版社.2005,121：42-45
[26]Tseng A. Transactions on Electronics Packaging Manufacturing[J]. IEEE., 2003,26:141-148
[27]Rai Choudhury P Handbook of Micro-lithography. Micromachining and Microfabrication[J].1997,1:187-189
[28]郝慧娟.电子束光刻的三维加工和邻近效应校正技术研究[D]：[博士学位论文].山东：山东大学控制理论与控制工程系,2007
[29]T. H. P. Chang. Proximity effect in electron-beam lithography[J], J. Vac. Sci. Technol. 1975,12(6):1271-1275
[30]Mihir Parikh. Correction to proximity effects in electronic beam lithography[J]. J. App. Phys.,1979,50(6):4383-4387
[31]S Y Lee, J Laddha. A Hierarchical Circuit Pattern Representation Format for Effcient E-beam Proximity Effect Correction[C]. Microelectronic Engineering, 2001,57-58:311-319
[32]崔铮.微纳米加工技术及其应用[J].北京：高教出版社.2005：31-38
[33]郝慧娟,张玉林,卢文娟.电子束抗蚀剂反差的计算[J].山东大学学报.2006,36(6)：121-124.
[34]孙霞,尤四方,肖沛,丁泽军.电子束光刻的邻近效应及其模拟[J].物理学报.2006,55：148-154
[35]Howard R E, Hu E L, Jackel L D, Grabbe P, Tennant DM. Appl. Phys. Lett.,1980,36:592-594
[36]Mamin. High-Density Data Storage Based on the Atomic Force Microscope [C]. Proceedings of the IEEE.1999:1014-1027
[37]Caroline Sunyong Lee. Micro Cantilevers with Integrated Heaters and Piezoelectric Detectors for Low Power SPM Data Storage Application[C]. The 16th IEEE International MEMS Conference.2003:28-32
[38]U Drechsler. Cantilevers with nano-heaters for thermomechanical storage application[J]. Microelectronic-Engineering(MEE).,2003,67-68:397-404
[39]E Eleftheriou. A Nanotechnology-based Approach to Data Storage[C]. Proc.29th VLDB Conf.2003:10-15
[40]Michel Despont. Wafer-scale micro-device transfer interconnect:its application in an AFM-based data storage system[J]. Journal of Microelectromechanical Systems.2004, 13(6):895-901
[41]D Bullen. Parallel dip pen nanolithography with arrays of individually addressable cantilevers[J]. Applied Physics Letters.,2004,84(5):789-79
[42]Wang X F Thermally actuated probe array for parallel dip-pen nanolithography[J]. Journal of Vacuum Science and Technology.,2004,22(6):2563-2567
[43]K H Kim. Massively parallel multi-tip nanoscale writer with fluidic capabilities-fountain pen nanolithography[C]. In Proceedings of the 4th international Symposium on MEMS and Nanotechnology.2003,52:235-238
[44]G Cross, M Despont, U Drechsler. et al. The "Millipede" —Nanotechnology Entering Data Storage[J]. IEEE.2002,1(1):5-7
[45]Hyo-Jin Nam. Integrated nitride cantilever array with Si heaters and piezoelectric detectors for nano-data-storage application [C].18th IEEE Int ernational Conference. MEMS.2005:247-250
[46]傅剑宇,陈大鹏,焦斌斌等.基于原子力显微镜的悬臂梁微尖端器件应用新进展[J].电子工业专用设备.2007,144：4-13
[47]罗恩泽,刘云鹏,刘卫东等.Fowler-Nordheim公式应用于实际场发射体的修正[J].电子器件.1994,17(3)：1-3
[2]郭小伟.SLM无掩膜光刻系统研究[D]：[博士学位论文].四川：四川大学光学专业,2007
[3]童志义.光学光刻技术现状及发展趋势[J].电子工业专用设备.2001,1：1-5
[4]F Mok, J diep, H K Liu, et al. Real time computer generated holograph by means of a liquid crystal television spatial light modulator[J]. Opt Lett.,1986,11:748
[5]邱国斌,蔡定平.金属表面电浆简介[J].物理双月刊(台湾).2006,28(2)：462-485
[6]Weeber I C. Observation of light confinement effects with a near fieldoptical microscope[J]. Phys. Rev. Lett.,1996,66:2-5
[7]Devanx E Local detection of the optical magnetic field in the near zone of dielectric samples[J]. Phys. Rev. B.,2000,62:1-14
[8]Anatoly V Zayatsa, Jill Elliott, Igor I Smolyaninov, et al. Imaging with short-wavelength surface plasmon polaritons[J]. Appl. Phys. Lett.,2005,86:1-3
[9]Lloyd R Harriott. Limits of Lithography[J]. IEEE.2001,3(89):366-368
[10]Cregan R F. Single-mode photonic band gap guidance of light in air[J]. Science, 1999,285:1-9
[11]Jean-Francois Masson, Kayla Hamersky, Stephen Beaudoin. In vitro biochemical monitoring with fiber optic based surface plasmon resonance sensors[J]. Proc of SPIE.,2004,261:123-134
[12]Qing Cao, Philippe Lalance. Negative role of surface plasmons in the transmission of metallic grating with very narrow slits[J]. Phys. Rev. Lett.,2002,88:1-4
[13]H A. Beth. Theory of diffraction by small holes[J]. The Physical Review. 2005,66:163-182
[14]A Degiron, H J Lezec, N Yamamoto, et al. Optical transmission properties of a single subwavelength aperture in a real metal[J]. Optics Communications.,2004,239:61-66
[15]T Lopez-Rios, D Mendoza, F J Garcia-Vidal, et al. Surface Shape Resonances in Lamellar Metallic Gratings[J]. Phys. Rev. Lett.,1998:665-8
[16]J A Porto, F J Garcia Vidal, J B Pendry. Transmission resonances on metallic gratings with very narrow slits[J]. Phys. Rev. Lett.,1999,83:1-8
[17]Y Takakura. Optical Resonance in a Narrow Slit in a Thick Metallic Screen[J]. Phys.Rev. Lett.,2001,86:1-3
[18]EE Times.电子工业设备.2008,163：62
[19]Micheal Quick, Julian Serda. 半导体制造技术.北京:电子工业出版社,2004:395-397
[20]T Ueno, J Sheats. X-Ray Lithography[J].1998:403
[21]T. Ueno, J.Sheats. X-Ray Lithography[J].1998:405
[22]R Dejule. Next-Generation Lithography Tools[J].2001:48
[23]Naoki Matsuzuka, Bungo Tanaka, Toshihiko Nagamura. et al. Development of Scanning probe Parallel nanowriting system with electronic beamresist[J]. IEEE., 2007:1649-1652.
[24]陈炯枢.电子束在微纳制造中的应用进展[J].真空与低温.2007,13(1)：7-9
[25]杨清华,刘明,陈大鹏,叶甜春.高斯电子束曝光系统[J].电子工业出版社.2005,121：42-45
[26]Tseng A. Transactions on Electronics Packaging Manufacturing[J]. IEEE., 2003,26:141-148
[27]Rai Choudhury P Handbook of Micro-lithography. Micromachining and Microfabrication[J].1997,1:187-189
[28]郝慧娟.电子束光刻的三维加工和邻近效应校正技术研究[D]：[博士学位论文].山东：山东大学控制理论与控制工程系,2007
[29]T. H. P. Chang. Proximity effect in electron-beam lithography[J], J. Vac. Sci. Technol. 1975,12(6):1271-1275
[30]Mihir Parikh. Correction to proximity effects in electronic beam lithography[J]. J. App. Phys.,1979,50(6):4383-4387
[31]S Y Lee, J Laddha. A Hierarchical Circuit Pattern Representation Format for Effcient E-beam Proximity Effect Correction[C]. Microelectronic Engineering, 2001,57-58:311-319
[32]崔铮.微纳米加工技术及其应用[J].北京：高教出版社.2005：31-38
[33]郝慧娟,张玉林,卢文娟.电子束抗蚀剂反差的计算[J].山东大学学报.2006,36(6)：121-124.
[34]孙霞,尤四方,肖沛,丁泽军.电子束光刻的邻近效应及其模拟[J].物理学报.2006,55：148-154
[35]Howard R E, Hu E L, Jackel L D, Grabbe P, Tennant DM. Appl. Phys. Lett.,1980,36:592-594
[36]Mamin. High-Density Data Storage Based on the Atomic Force Microscope [C]. Proceedings of the IEEE.1999:1014-1027
[37]Caroline Sunyong Lee. Micro Cantilevers with Integrated Heaters and Piezoelectric Detectors for Low Power SPM Data Storage Application[C]. The 16th IEEE International MEMS Conference.2003:28-32
[38]U Drechsler. Cantilevers with nano-heaters for thermomechanical storage application[J]. Microelectronic-Engineering(MEE).,2003,67-68:397-404
[39]E Eleftheriou. A Nanotechnology-based Approach to Data Storage[C]. Proc.29th VLDB Conf.2003:10-15
[40]Michel Despont. Wafer-scale micro-device transfer interconnect:its application in an AFM-based data storage system[J]. Journal of Microelectromechanical Systems.2004, 13(6):895-901
[41]D Bullen. Parallel dip pen nanolithography with arrays of individually addressable cantilevers[J]. Applied Physics Letters.,2004,84(5):789-79
[42]Wang X F Thermally actuated probe array for parallel dip-pen nanolithography[J]. Journal of Vacuum Science and Technology.,2004,22(6):2563-2567
[43]K H Kim. Massively parallel multi-tip nanoscale writer with fluidic capabilities-fountain pen nanolithography[C]. In Proceedings of the 4th international Symposium on MEMS and Nanotechnology.2003,52:235-238
[44]G Cross, M Despont, U Drechsler. et al. The "Millipede" —Nanotechnology Entering Data Storage[J]. IEEE.2002,1(1):5-7
[45]Hyo-Jin Nam. Integrated nitride cantilever array with Si heaters and piezoelectric detectors for nano-data-storage application [C].18th IEEE Int ernational Conference. MEMS.2005:247-250
[46]傅剑宇,陈大鹏,焦斌斌等.基于原子力显微镜的悬臂梁微尖端器件应用新进展[J].电子工业专用设备.2007,144：4-13
[47]罗恩泽,刘云鹏,刘卫东等.Fowler-Nordheim公式应用于实际场发射体的修正[J].电子器件.1994,17(3)：1-3