全自动涂胶设备及涂胶工艺的研究
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摘要
涂胶作为光刻工艺的重要环节,为了保证涂胶工艺质量,提高涂胶设备的自动化程度,减少中间污染环节,开发了一种全自动涂胶设备,通过对涂胶腔体和机械手等关键部件的改进,更好地满足了用户生产线要求;并通过对涂胶工艺中影响膜厚均匀性的重要因素进行研究、实验和分析,得出了适合用户生产线的工艺配方。
Spin-Coater is an important part of the photolithography process. In order to ensure the quality of coating process,improve the automation of coating equipment and reduce the contamination of the link,a kind of automatic coating equipment has been developed,and the key parts were improved to meet the requirements of user production line better,such as coating cavity and robotic arm,etc. By researching the coating process and the important factors affecting the uniformity of the thickness,a recipe is got to be suitable for user production line.
Spin-Coater is an important part of the photolithography process. In order to ensure the quality of coating process,improve the automation of coating equipment and reduce the contamination of the link,a kind of automatic coating equipment has been developed,and the key parts were improved to meet the requirements of user production line better,such as coating cavity and robotic arm,etc. By researching the coating process and the important factors affecting the uniformity of the thickness,a recipe is got to be suitable for user production line.
引文
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[2]陈焱,程金胜.全自动平板涂胶机的研制及应用[J].电子工业专用设备,2005,34(9):49-51.
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[4]林盛浩.半导体匀胶系统的研究与优化设计[D].成都:电子科技大学,2010.
[2]陈焱,程金胜.全自动平板涂胶机的研制及应用[J].电子工业专用设备,2005,34(9):49-51.
[3]陈世雄,陈杨枝.涂胶机的设计及涂胶工艺研究[J].广西机械,1996,(3):3-4.
[4]林盛浩.半导体匀胶系统的研究与优化设计[D].成都:电子科技大学,2010.