摘要
常规ZIF-8膜制备方式主要是原位合成法、晶种二次法等,但是在膜制备过程中都存在一定的缺陷,主要是由于水热合成存在溶剂热以及膜层与无机材料表面之间结合能力差等原因.以有机硅为膜基底,掺杂ZIF-8填充剂,采用两步法制备了稳定且具有较高气体分离性能的ZIF-8/有机硅杂化膜,通过扫描电镜(SEM)、粉末衍射(PXRD)等对不同ZIF-8掺杂比例制备的膜进行了分析表征,并考察了其对膜气体分离性能的影响.结果发现,经两步浸渍提拉后,膜表面均匀致密、无裂痕缺陷.当有机硅与ZIF-8质量比1∶1时,杂化膜的性能更为优异,H_2/CH_4在150℃时理想选择性系数为47.6,H_2∶CH_4(1∶1)混合气的分离因子为34.5.
Many efforts have been made for ZIF-8 membrane synthesis,which can be generally classied into two categories: in situ growth and secondary growth. ZIF-8 membranes still suffer from the difficult fabrication processes such as solvothermal synthesis at high temperature, interfacial defects between MOF particles and low interaction towards the substrate. The stable MOF(ZIF-8)/organosilica mixed matrix membranes(MMMs) with effective gas separation performance, which organosilica as matrix and ZIF-8 as fillers, has been successfully fabricated via two steps. A series of membranes with different ZIF-8 contents were prepared and characterized by scanning electron microscope(SEM) and powder X-ray diffraction(PXRD), and the effect of ZIF-8 contents on the performance of gas separation was also investigated. The results showed that the surfaces of membranes prepared through two-step dip-coating method were uniform and compact without any crack defects, and when the mass of ZIF-8 and organosilica is consistent, the as-prepared ZIF-8/organosilica membrane displays a remarkable molecular-sieving performance, the ideal separation factor of H_2/CH_4 is 47.6, and the mixed gas selectivity of H_2/CH_4(1∶1) is up to 34.5 at 150 ℃.
引文
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