畴腐蚀掺镁铌酸锂光分束器的泰伯效应研究
|
摘要
基于菲涅耳衍射理论分析了畴腐蚀二维周期结构掺镁铌酸锂晶体光分束器的泰伯效应,对光分束器不同占空比D及泰伯分数β条件下的近场光衍射自成像进行了数值模拟研究。设计并制备了不同占空比的畴腐蚀掺镁铌酸锂晶体光分束器,并对其进行了分数泰伯光衍射自成像的实验研究,得到了不同泰伯分数β条件下的近场光衍射强度分布。结果表明,当光分束器占空比D=52%、泰伯分数β=2时,近场衍射自成像效果最佳,实验结果与理论研究结果相符。
The Talbot effect of the two-dimensional optical beam splitter fabricated by selective etching of MgOdoped LiNbO3(MgLN)crystal is analysed based on the Fresnel diffraction theory.Numerical simulation is applied to study the intensity distribution of near-field optical diffraction under various duty cycle D and Talbot distance coefficientβ.Based on the theoretical result,the selective etching optical beam splitter is designed and fabricated with various duty cycles.Through optical experiments,the fractional Talbot diffraction imaging map is obtained at different Talbot distances.The results obtained show that good near-field diffraction images can be achieved at D=52%,β=2,which verifies the results of the numerical simulation research.
The Talbot effect of the two-dimensional optical beam splitter fabricated by selective etching of MgOdoped LiNbO3(MgLN)crystal is analysed based on the Fresnel diffraction theory.Numerical simulation is applied to study the intensity distribution of near-field optical diffraction under various duty cycle D and Talbot distance coefficientβ.Based on the theoretical result,the selective etching optical beam splitter is designed and fabricated with various duty cycles.Through optical experiments,the fractional Talbot diffraction imaging map is obtained at different Talbot distances.The results obtained show that good near-field diffraction images can be achieved at D=52%,β=2,which verifies the results of the numerical simulation research.
引文
1 HF Talbot.Facts relating to optical science[J].Phil Mag,1836,9(56):401-407.
2 M R Dennis,N I Zheludev,F Javier Garcia de Abajo.The plasmon Talbot effect[J].Opt Express,2007,15(15):9692-9700.
3 Han Yueping,Chen Zhiqiang,Zhang Li,et al..Developments of Xray grating imaging based on Talbot interferometry[J].Laser&Optoelectronics Progress,2012,49(7):070002.韩跃平,陈志强,张丽,等.基于Talbot干涉的X射线光栅成像技术研究进展[J].激光与光电子学进展,2012,49(7):070002.
4 Huang Jianheng,Lin Danying,Liu Zhenwei,et al..Analysis and simulation of mid-energy X-ray grating phase contrast microscopy imaging[J].Acta Optica Sinica,2011,31(10):1034001.黄建衡,林丹樱,刘振伟,等.中能X射线光栅相衬显微成像分析及模拟[J].光学学报,2011,31(10):1034001.
5 RIwanow,D A May-Arrioja,D N Christodoulides,et al..Discrete Talbot effect[J].Phys Rev Lett,2005,95(5):053902.
6 HJin,P Xu,J S Zhao,et al..Observation of quantum Talbot effect from a domain-engineered nonlinear photonic crystal[J].Appl Phys Lett,2012,101:211115.
7 D Duchesne,R Morandotti,J Aza珘na.Temporal Talbot phenomena in high-order dispersive media[J].J Opt Soc Am B,2007,24(1):113-125.
8 M Testorf,T J Suleski,Y C Chuang.Design of Talbot array illuminators for three-dimensional intensity distributions[J].Opt Express,2006,14(17):7623-7629.
9 H Hamam.Array illuminator with arbitrary fan-out[J].Appl Opt,2006,45(25):6525-6532.
10 Wu Bo,Yu Jinlong,Wang Zheng,et al..Optical pulse trains with multiplied repetition frequency based on fractional Talbot effect in fiber[J].Acta Optica Sinica,2010,30(5):1249-1253.吴波,于晋龙,王争,等.应用光纤分数塔尔博特效应产生重复频率倍频的光脉冲序列[J].光学学报,2010,30(5):1249-1253.
11 C Canalias,V Pasiskevicius.Mirrorless optical parametric oscillator[J].Nat Photonics,2007,1(8):459-462.
12 Li Yao,Bai Jian,Deng Yan,et al..Study on a wavefront detection system for long-focus lens by sub-wavefront scanning[J].Acta Optica Sinica,2010,30(9):2590-2595.李遥,白剑,邓燕,等.子波面扫描法长焦距透镜波面检测系统研究[J].光学学报,2010,30(9):2590-2595.
13 Y L Chen,J Guo,C B Lou,et al..Crystal growth and characteristics of 6.5mol%MgO-doped LiNbO3[J].J Crystal Growth,2004,263(1):427-430.
14 Yunlin Chen,Cibo Lou,Jingjun Xu.Domain switching characteristics of the near stoichiometric LiNbO3doped MgO[J].J Appl Phys,2003,94(6):956-958.
15 MPaturzo,P De Natale,S De Nicola,et al..Tunable twodimensional hexagonal phase array in domain-engineered Z-cut lithium niobate crystal[J].Opt Lett,2006,31(21):3164-3166.
16 Fan Tianwei,Chen Yunlin,Zhang Jinhong.A study of twodimensional hexagonal phase array grating in MgO:LN based on the Talbot effect[J].Acta Physica Sinica,2013,62(9):094216.范天伟,陈云琳,张进宏.基于Talbot效应的掺镁铌酸锂二维六角相位阵列光栅的研究[J].物理学报,2013,62(9):094216.
17 JCapmany,C R Fernández-Pousa,E Diéguez,et al..Surfacerelief diffraction gratings based on selective etching of periodically poled lithium niobate[J].Appl Phys Lett,2003,83(25):5145-5147.
18 SGrilli,P Ferraro,P De Natale,et al..Surface nanoscale periodic structures in congruent lithium niobate by domain reversal patterning and differential etching[J].Appl Phys Lett,2005,87(23):233106.
19 Song Haicheng,Zhu Linwei,Wang Shaoqing,et al..Study on the Talbot effect of a hexagonal periodic array object[J].Acta Optica Sinica,2013,33(s2):s205002.宋海程,朱林伟,王少卿,等.六角型周期阵列物体的塔尔博特效应研究[J].光学学报,2013,33(s2):s205002.
20 Yao Da,Liu Xin,Yue Shizhong.Trends of lithography technology and equipments for semiconductor fabrication[J].Semiconductor Technology,2008,33(3):193-196.
2 M R Dennis,N I Zheludev,F Javier Garcia de Abajo.The plasmon Talbot effect[J].Opt Express,2007,15(15):9692-9700.
3 Han Yueping,Chen Zhiqiang,Zhang Li,et al..Developments of Xray grating imaging based on Talbot interferometry[J].Laser&Optoelectronics Progress,2012,49(7):070002.韩跃平,陈志强,张丽,等.基于Talbot干涉的X射线光栅成像技术研究进展[J].激光与光电子学进展,2012,49(7):070002.
4 Huang Jianheng,Lin Danying,Liu Zhenwei,et al..Analysis and simulation of mid-energy X-ray grating phase contrast microscopy imaging[J].Acta Optica Sinica,2011,31(10):1034001.黄建衡,林丹樱,刘振伟,等.中能X射线光栅相衬显微成像分析及模拟[J].光学学报,2011,31(10):1034001.
5 RIwanow,D A May-Arrioja,D N Christodoulides,et al..Discrete Talbot effect[J].Phys Rev Lett,2005,95(5):053902.
6 HJin,P Xu,J S Zhao,et al..Observation of quantum Talbot effect from a domain-engineered nonlinear photonic crystal[J].Appl Phys Lett,2012,101:211115.
7 D Duchesne,R Morandotti,J Aza珘na.Temporal Talbot phenomena in high-order dispersive media[J].J Opt Soc Am B,2007,24(1):113-125.
8 M Testorf,T J Suleski,Y C Chuang.Design of Talbot array illuminators for three-dimensional intensity distributions[J].Opt Express,2006,14(17):7623-7629.
9 H Hamam.Array illuminator with arbitrary fan-out[J].Appl Opt,2006,45(25):6525-6532.
10 Wu Bo,Yu Jinlong,Wang Zheng,et al..Optical pulse trains with multiplied repetition frequency based on fractional Talbot effect in fiber[J].Acta Optica Sinica,2010,30(5):1249-1253.吴波,于晋龙,王争,等.应用光纤分数塔尔博特效应产生重复频率倍频的光脉冲序列[J].光学学报,2010,30(5):1249-1253.
11 C Canalias,V Pasiskevicius.Mirrorless optical parametric oscillator[J].Nat Photonics,2007,1(8):459-462.
12 Li Yao,Bai Jian,Deng Yan,et al..Study on a wavefront detection system for long-focus lens by sub-wavefront scanning[J].Acta Optica Sinica,2010,30(9):2590-2595.李遥,白剑,邓燕,等.子波面扫描法长焦距透镜波面检测系统研究[J].光学学报,2010,30(9):2590-2595.
13 Y L Chen,J Guo,C B Lou,et al..Crystal growth and characteristics of 6.5mol%MgO-doped LiNbO3[J].J Crystal Growth,2004,263(1):427-430.
14 Yunlin Chen,Cibo Lou,Jingjun Xu.Domain switching characteristics of the near stoichiometric LiNbO3doped MgO[J].J Appl Phys,2003,94(6):956-958.
15 MPaturzo,P De Natale,S De Nicola,et al..Tunable twodimensional hexagonal phase array in domain-engineered Z-cut lithium niobate crystal[J].Opt Lett,2006,31(21):3164-3166.
16 Fan Tianwei,Chen Yunlin,Zhang Jinhong.A study of twodimensional hexagonal phase array grating in MgO:LN based on the Talbot effect[J].Acta Physica Sinica,2013,62(9):094216.范天伟,陈云琳,张进宏.基于Talbot效应的掺镁铌酸锂二维六角相位阵列光栅的研究[J].物理学报,2013,62(9):094216.
17 JCapmany,C R Fernández-Pousa,E Diéguez,et al..Surfacerelief diffraction gratings based on selective etching of periodically poled lithium niobate[J].Appl Phys Lett,2003,83(25):5145-5147.
18 SGrilli,P Ferraro,P De Natale,et al..Surface nanoscale periodic structures in congruent lithium niobate by domain reversal patterning and differential etching[J].Appl Phys Lett,2005,87(23):233106.
19 Song Haicheng,Zhu Linwei,Wang Shaoqing,et al..Study on the Talbot effect of a hexagonal periodic array object[J].Acta Optica Sinica,2013,33(s2):s205002.宋海程,朱林伟,王少卿,等.六角型周期阵列物体的塔尔博特效应研究[J].光学学报,2013,33(s2):s205002.
20 Yao Da,Liu Xin,Yue Shizhong.Trends of lithography technology and equipments for semiconductor fabrication[J].Semiconductor Technology,2008,33(3):193-196.