摘要
用阴离子表面活性剂硬脂酸钠、十二烷基苯磺酸钠和十二烷基磺酸钠分别与非离子表面活性剂曲拉通100组合,制备阴-非离子型有机蒙脱石粉体。通过X射线粉晶衍射分析,研究阴-非离子型有机蒙脱石粉体的制备、阴离子表面活性剂种类和蒙脱石类型对蒙脱石改性效果的影响。结果表明,3种阴离子表面活性剂均能进入蒙脱石层间,得到层间距分别为5.65、4.29、3.73 nm的阴-非离子型有机蒙脱石。用阴-非离子表面活性剂改性不同类型蒙脱石的研究结果表明,蒙脱石的膨胀容明显影响阴-非离子型改性剂改性蒙脱石的效果,并呈规律性变化,蒙脱石的膨胀容值越大,改性效果越好。
Montmorillonite was modified with non-ionic surfactant Trion X-100 and anionic surfactants sodium stearate,sodium dodecyl benzene sulfonate and sodium dodecyl sulfonate respectively.The preparation of anion-non-ionic surfactants modified montmorillonites,the effects of anionic surfactant types and montmorillonite types on modification effect of montmorillonite were investigated.XRD results show that the basal spacing of modified montmorillonites reach 5.65,4.29,3.73 nm respectively.The dfferent types of montmorillonites modified with anionic-non-ionic surfactant show that montmorillonite expansion capacity is the main influencing factor of the modification effect.
引文
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