锆合金表面TiAlN和TiAlSiN涂层微观形貌和性能的研究
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摘要
对Zr-4合金表面分别进行多弧离子镀TiAlSiN涂层和TiAlN涂层。利用扫描电镜对涂层进行表面微观形貌观察;利用ImageJ对涂层大颗粒分布进行统计和分析;利用X射线衍射仪对涂层进行物相分析;利用自动划痕仪对涂层的力学性能进行检测;利用高温热处理炉对涂层试样进行800℃高温抗氧化实验。结果表明:TiAlSiN涂层表面的大颗粒数较TiAlN涂层的少。TiAlSiN涂层中除了与TiAlN涂层共同拥有的Ti_2N、Ti_3AlN物相外,还生成了AlN物相和非晶相Si_3N_4。由于Si元素的加入引起残余应力,TiAlSiN涂层的膜基结合力低于TiAlN涂层。TiAlSiN涂层试样的氧化增重远低于TiAlN涂层的氧化增重。
TiAlSiN coating and TiAlN coating were deposited on Zr-4 alloy surface by multi-arc ion plating,respectively.Surface micromorphology of the coatings were observed by scanning electron microscope.Statistics and analysis of the large particle distribution of the coatings were carried out by ImageJ.The phase composition of the coatings was analyzed by X-ray diffractometer.The mechanical properties of the coatings were tested by an automatic scratch tester.And the samples were subjected to 800℃ high temperature oxidation resistance test in a high temperature heat treatment furnace.The results show that the amount of large particles on the surface of TiAlSiN coating is less than that of TiAlN coating.Both TiAlSiN coating and TiAlN coating have Ti_2N phase and Ti_3AlN phase.In addition,TiAlSiN coating also has AlN phase and Si_3N_4 amorphous phase.Because the addition of Si elements leads to residual stress,TiAlSiN coating has lower coating/substrate adhesion strength than TiAlN coating.Oxidation weight gain of TiAlSiN coating sample is far lower than that of TiAlN coating sample.
TiAlSiN coating and TiAlN coating were deposited on Zr-4 alloy surface by multi-arc ion plating,respectively.Surface micromorphology of the coatings were observed by scanning electron microscope.Statistics and analysis of the large particle distribution of the coatings were carried out by ImageJ.The phase composition of the coatings was analyzed by X-ray diffractometer.The mechanical properties of the coatings were tested by an automatic scratch tester.And the samples were subjected to 800℃ high temperature oxidation resistance test in a high temperature heat treatment furnace.The results show that the amount of large particles on the surface of TiAlSiN coating is less than that of TiAlN coating.Both TiAlSiN coating and TiAlN coating have Ti_2N phase and Ti_3AlN phase.In addition,TiAlSiN coating also has AlN phase and Si_3N_4 amorphous phase.Because the addition of Si elements leads to residual stress,TiAlSiN coating has lower coating/substrate adhesion strength than TiAlN coating.Oxidation weight gain of TiAlSiN coating sample is far lower than that of TiAlN coating sample.
引文
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[3]吴华,范洪远,应诗浩,等.表面处理对锆合金性能的影响[J].金属热处理,2006,31(1):17-19.
[4]罗扬,林庆选.锆合金R60705的表面渗氮处理[J].金属热处理,2014,39(12):64-66.
[5]王欣.激光表面改性核电Zr-1Nb合金的组织与性能研究[D].北京:北京工业大学,2014.
[6]文强.激光熔凝复合处理对核燃料包壳Zr-1Nb合金微观组织与耐蚀性能的影响[D].北京:北京工业大学,2015.
[7]张立杰,范洪远,应诗浩,等.锆合金氧化膜研究进展[J].材料导报,2006,20(S2):422-424.
[8]王浩然,邱长军.锆合金表面技术的研究进展[J].世界有色金属,2016(18):46-47.
[9]胡汝骞,樊湘芳,丰振东,等.Zr4合金离子氮化和软氮化表面处理的研究[J].热加工工艺,2016,45(14):130-132.
[10]TANG G Y,CHOI B H,KIM W,et al.Characteristics of surface oxidation and corrosion resistance of nitrogen implanted Zircaloy-4[J].Surface and Coatings Technology,1997,89(3):252-257.
[11]陈昌浩,金永中,陈建,等.弧电流对多弧离子镀TiN涂层形貌及力学性能的影响[J].热加工工艺,2016,45(14):117-119.
[12]朱鹏志,朱颖,李刘合.TiAlSiN涂层刀具的发展与应用[J].新技术新工艺,2014(5):105-110.
[13]王桂阳.磁控溅射制备TiA1N和TiAISiN薄膜及其性能研究[D].沈阳:东北大学,2014.
[14]杨昌虎,马忠权,袁剑辉.基底温度对直流磁控溅射制备掺铝氧化锌薄膜性能的影响[J].光学学报,2011,31(5):254-260.
[15]SHIMADA Y,YONEZAWA Y,SUNADA H.Measurement and evaluation of the adhesive force between particles by the direct separation method[J].Journal of Pharmaceutical Sciences,2003,92(3):560-568.
[16]ZHU L H,SONG C,NI W Y,et al.Effect of 10%Si addition on cathodic arc evaporated TiAlSiN coatings[J].Transactions of Nonferrous Metals Society of China,2016,26(6):1 638-1 646.
[17]CARVALHO S,REBOUTA L,RIBEIRO E,et al.Structural evolution of T-Al-Si-N nanocomposite coatings[J].Vacuum,2009,83(10):1 206-1 212.
[18]喻利花,薛安俊,董松涛,等.Si含量对TiAlSiN薄膜微结构与力学性能的影响[J].材料热处理学报,2010,31(7):140-145.
[19]汤成建,孔德军.阴极离子镀TiAlSiN涂层高温摩擦与磨损性能[J].材料热处理学报[J].2016,37(2):172-178.
[20]VEPREK S,REIPRICH S.A concept for the design of novel superhard coatings[J].Thin Solid Films,1995,268(2):64-71.