Ice lithography for 3D nanofabrication
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摘要
Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography, which makes 2 D patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication.Recently, significant progress in 3 D electron-beam-based nanofabrication has been made, such as the emerging ice lithography technology, in which ice thin-films are patterned by a focused electronbeam. Here, we review the history and progress of ice lithography, and focus on its applications in efficient 3 D nanofabrication and additive manufacturing or nanoscale 3 D printing. The finest linewidth made using frozen octane is below 5 nm, and nanostructures can be fabricated in selected areas on non-planar surfaces such as freely suspended nanotubes or nanowires. As developing custom instruments is required to advance this emerging technology, we discuss the evolution of ice lithography instruments and highlight major instrumentation advances. Finally, we present the perspectives of 3 D printing of functional materials using organic ices. We believe that we barely scratched the surface of this new and exciting research area, and we hope that this review will stimulate cutting-edge and interdisciplinary research that exploits the undiscovered potentials of ice lithography for 3 D photonics, electronics and 3 D nanodevices for biology and medicine.
Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography, which makes 2 D patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication.Recently, significant progress in 3 D electron-beam-based nanofabrication has been made, such as the emerging ice lithography technology, in which ice thin-films are patterned by a focused electronbeam. Here, we review the history and progress of ice lithography, and focus on its applications in efficient 3 D nanofabrication and additive manufacturing or nanoscale 3 D printing. The finest linewidth made using frozen octane is below 5 nm, and nanostructures can be fabricated in selected areas on non-planar surfaces such as freely suspended nanotubes or nanowires. As developing custom instruments is required to advance this emerging technology, we discuss the evolution of ice lithography instruments and highlight major instrumentation advances. Finally, we present the perspectives of 3 D printing of functional materials using organic ices. We believe that we barely scratched the surface of this new and exciting research area, and we hope that this review will stimulate cutting-edge and interdisciplinary research that exploits the undiscovered potentials of ice lithography for 3 D photonics, electronics and 3 D nanodevices for biology and medicine.
Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography, which makes 2 D patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication.Recently, significant progress in 3 D electron-beam-based nanofabrication has been made, such as the emerging ice lithography technology, in which ice thin-films are patterned by a focused electronbeam. Here, we review the history and progress of ice lithography, and focus on its applications in efficient 3 D nanofabrication and additive manufacturing or nanoscale 3 D printing. The finest linewidth made using frozen octane is below 5 nm, and nanostructures can be fabricated in selected areas on non-planar surfaces such as freely suspended nanotubes or nanowires. As developing custom instruments is required to advance this emerging technology, we discuss the evolution of ice lithography instruments and highlight major instrumentation advances. Finally, we present the perspectives of 3 D printing of functional materials using organic ices. We believe that we barely scratched the surface of this new and exciting research area, and we hope that this review will stimulate cutting-edge and interdisciplinary research that exploits the undiscovered potentials of ice lithography for 3 D photonics, electronics and 3 D nanodevices for biology and medicine.
引文
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[18] Tiddi W, Elsukova A, Le HT, et al. Organic ice resists. Nano Lett2017;17:7886–91.
[19] Elsukova A, Han A, Zhao D, et al. Effect of molecular weight on the feature size in organic ice resists. Nano Lett 2018;18:7576–82.
[20] Hong Y, Zhao D, Liu D, et al. Three-dimensional in situ electron-beam lithography using water ice. Nano Lett 2018;18:5036–41.
[21] Tiddi W, Elsukova A, Beleggia M, et al. Organic ice resists for 3D electron-beam processing:instrumentation and operation. Microelectron Eng2018;192:38–43.
[22] Tiddi W. Organic ice resists for electron-beam lithography:instrumentation and processes. Ph.D. Thesis, Technical University of Denmark, 2018.
[23] Yasin S, Hasko DG, Ahmed H. Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography. Microelectron Eng 2002;61–62:745–53.
[24] Namatsu H, Yamaguchi T, Nagase M, et al. Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth?uctuations. Microelectron Eng1998;41–42:331–4.
[25] Hari S, Hagen CW, Verduin T, et al. Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing. J Micro/Nanolithogr, MEMS, MOEMS 2014;13.
[26] Aieta F, Genevet P, Kats M, et al. Aberrations of?at lenses and aplanatic metasurfaces. Opt Express 2013;21:31530.
[27] Kostovski G, Stoddart PR, Mitchell A. The optical?ber tip:An inherently lightcoupled microscopic platform for micro-and nanotechnologies. Adv Mater2014;26:3798–820.
[28] Sirringhaus H, Kawase T, Friend RH, et al. High-resolution inkjet printing of allpolymer transistor circuits. Science 2000;290:2123–6.
[29] Melchels FPW, Feijen J, Grijpma DW. A review on stereolithography and its applications in biomedical engineering. Biomaterials 2010;31:6121–30.
[30] Kawata S, Sun H-B, Tanaka T, et al. Finer features for functional microdevices.Nature 2001;412:697–8.
[31] Han A, Chervinsky J, Branton D, et al. An ice lithography instrument. Rev Sci Instrum 2011;82.
[32] Shawrav MM, Taus P, Wanzenboeck HD, et al. Highly conductive and pure gold nanostructures grown by electron beam induced deposition. Sci Rep2016;6:34003.
[33] Sengupta S, Li C, Baumier C, et al. Superconducting nanowires by electronbeam-induced deposition. Appl Phys Lett 2015;106:042601.
[34] Bresin M, Botman A, Randolph SJ, et al. Liquid phase electron-beam-induced deposition on bulk substrates using environmental scanning electron microscopy. Microsc Microanal 2014;20:376–84.
[35] Bahlke ME, Mendoza HA, Ashall DT, et al. Dry lithography of large-area, thin-?lm organic semiconductors using frozen CO2resists. Adv Mater2012;24:6136–40.
[36] Wieland MJ, Derks H, Gupta H, et al. Throughput enhancement technique for MAPPER maskless lithography. Proc SPIE 2010;7637:76371Z.
[2] Orji NG, Badaroglu M, Barnes BM, et al. Metrology for the next generation of semiconductor devices. Nat Electron 2018;1:532–47.
[3] Yuan J, Liu X, Akbulut O, et al. Superwetting nanowire membranes for selective absorption. Nat Nanotechnol 2008;3:332–6.
[4] Shi J, Votruba AR, Farokhzad OC, et al. Nanotechnology in drug delivery and tissue engineering:from discovery to applications. Nano Lett 2010;10:3223–30.
[5] Ladd TD, Jelezko F, La?amme R, et al. Quantum computers. Nature2010;464:45–53.
[6] Chen Y. Nanofabrication by electron beam lithography and its applications:a review. Microelectron Eng 2015;135:57–72.
[7] Manfrinato VR, Zhang L, Su D, et al. Resolution limits of electron-beam lithography toward the atomic scale. Nano Lett 2013;13:1555–8.
[8] Manfrinato VR, Stein A, Zhang L, et al. Aberration-corrected electron beam lithography at the one nanometer length scale. Nano Lett 2017;17:4562–7.
[9] Zhang J, Con C, Cui B. Electron beam lithography on irregular surfaces using an evaporated resist. ACS Nano 2014;8:3483–9.
[10] Hagen CW. The future of focused electron beam-induced processing. Appl Phys A 2014;117:1599–605.
[11] Huth M, Porrati F, Dobrovolskiy OV. Focused electron beam induced deposition meets materials science. Microelectron Eng 2018;185–186:9–28.
[12] Fowlkes JD, Winkler R, Lewis BB, et al. Simulation-guided 3D nanomanufacturing via focused electron beam induced deposition. ACS Nano2016;10:6163–72.
[13] King GM, Schürmann G, Branton D, et al. Nanometer patterning with ice. Nano Lett 2005;5:1157–60.
[14] Petrik NG, Kimmel GA. Electron-stimulated reactions at the interfaces of amorphous solid water?lms driven by long-range energy transfer from the bulk. Phys Rev Lett 2003;90.
[15] Petrik NG, Kavetsky AG, Kimmel GA. Electron-stimulated production of molecular oxygen in amorphous solid water. J Phys Chem B2006;110:2723–31.
[16] Han A, Vlassarev D, Wang J, et al. Ice lithography for nanodevices. Nano Lett2010;10:5056–9.
[17] Han A, Kuan A, Golovchenko J, et al. Nanopatterning on nonplanar and fragile substrates with ice resists. Nano Lett 2012;12:1018–21.
[18] Tiddi W, Elsukova A, Le HT, et al. Organic ice resists. Nano Lett2017;17:7886–91.
[19] Elsukova A, Han A, Zhao D, et al. Effect of molecular weight on the feature size in organic ice resists. Nano Lett 2018;18:7576–82.
[20] Hong Y, Zhao D, Liu D, et al. Three-dimensional in situ electron-beam lithography using water ice. Nano Lett 2018;18:5036–41.
[21] Tiddi W, Elsukova A, Beleggia M, et al. Organic ice resists for 3D electron-beam processing:instrumentation and operation. Microelectron Eng2018;192:38–43.
[22] Tiddi W. Organic ice resists for electron-beam lithography:instrumentation and processes. Ph.D. Thesis, Technical University of Denmark, 2018.
[23] Yasin S, Hasko DG, Ahmed H. Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography. Microelectron Eng 2002;61–62:745–53.
[24] Namatsu H, Yamaguchi T, Nagase M, et al. Nano-patterning of a hydrogen silsesquioxane resist with reduced linewidth?uctuations. Microelectron Eng1998;41–42:331–4.
[25] Hari S, Hagen CW, Verduin T, et al. Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing. J Micro/Nanolithogr, MEMS, MOEMS 2014;13.
[26] Aieta F, Genevet P, Kats M, et al. Aberrations of?at lenses and aplanatic metasurfaces. Opt Express 2013;21:31530.
[27] Kostovski G, Stoddart PR, Mitchell A. The optical?ber tip:An inherently lightcoupled microscopic platform for micro-and nanotechnologies. Adv Mater2014;26:3798–820.
[28] Sirringhaus H, Kawase T, Friend RH, et al. High-resolution inkjet printing of allpolymer transistor circuits. Science 2000;290:2123–6.
[29] Melchels FPW, Feijen J, Grijpma DW. A review on stereolithography and its applications in biomedical engineering. Biomaterials 2010;31:6121–30.
[30] Kawata S, Sun H-B, Tanaka T, et al. Finer features for functional microdevices.Nature 2001;412:697–8.
[31] Han A, Chervinsky J, Branton D, et al. An ice lithography instrument. Rev Sci Instrum 2011;82.
[32] Shawrav MM, Taus P, Wanzenboeck HD, et al. Highly conductive and pure gold nanostructures grown by electron beam induced deposition. Sci Rep2016;6:34003.
[33] Sengupta S, Li C, Baumier C, et al. Superconducting nanowires by electronbeam-induced deposition. Appl Phys Lett 2015;106:042601.
[34] Bresin M, Botman A, Randolph SJ, et al. Liquid phase electron-beam-induced deposition on bulk substrates using environmental scanning electron microscopy. Microsc Microanal 2014;20:376–84.
[35] Bahlke ME, Mendoza HA, Ashall DT, et al. Dry lithography of large-area, thin-?lm organic semiconductors using frozen CO2resists. Adv Mater2012;24:6136–40.
[36] Wieland MJ, Derks H, Gupta H, et al. Throughput enhancement technique for MAPPER maskless lithography. Proc SPIE 2010;7637:76371Z.