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在“Elsevier电子期刊”中，命中：1,170条，耗时：0.053975 秒

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1.Analysis of the polishing ability of electrogenerated chemical polishing

作者：Kun Shan ; Ping Zhou ; ^{pzhou@dlut.edu.cn" class="auth_mail" title="E-mail the corresponding author} ; Yunsheng Zuo ; Renke Kang ; Dongming Guo

关键词：Electrochemistry ; Chemical polishing ; Roughness ; Polishing ability ; Numerical simulation

刊名：Precision Engineering

出版年：2017

2.Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms

作者：Yan Zhou^a ; ^b ; ^c ; ^{zhouyanbebe@126.com} ; Guoshun Pan^a ; ^b ; ^c ; ^{pangs@tsinghua.edu.cn} ; Hua Gong^a ; ^b ; ^c ; ^{gh1986313@163.com} ; Xiaolei Shi^a ; ^b ; ^c ; ^{xlshi@tsinghua-sz.org} ; Chunli Zou^a ; ^b ; ^c

关键词：Sapphire ; Chemical mechanical polishing ; Silica ; Atomic step structure ; AFM

刊名：Colloids and Surfaces A: Physicochemical and Engineering Aspects

出版年：2017

3.Quasi-monodisperse β-SiC nanospheres: Synthesis and application in chemical-mechanical polishing

作者：Meng Zhang ^{meng_zhang@haut.edu.cn}

关键词：Silicon carbide ; Nanospheres ; Chemical-mechanical polishing ; Mix-solvothermal ; Method

刊名：Journal of Physics and Chemistry of Solids

出版年：2017

4.Comparative study of the lubricating behavior between 12-in. copper disk and wafer during chemical mechanical polishing

作者：Dewen Zhao ; Yongyong He ; Tongqing Wang ; Xinchun Lu ; ^{xclu@tsinghua.edu.cn" class="auth_mail" title="E-mail the corresponding author}

关键词：Chemical mechanical polishing ; Hydrodynamic lubrication ; Carrier structure ; Fluid pressure

刊名：Tribology International

出版年：2017

5.Surface characterization of polymers used in fabrication of interim prostheses after treatment with photopolymerized glaze

作者：Daniela Micheline dos Santos^a ; ^{danielamicheline@foa.unesp.br}Author Vitae ; Betina Chiarelo Commar^aAuthor Vitae ; Liliane da Rocha Bonatto^aAuthor Vitae ; Emily Vivianne Freitas da Silva^aAuthor Vitae ; Mariana Vilela Sô ; nego^aAuthor Vitae ; Elidiane Cipriano Rangel^bAuthor Vitae ; Aldieris Alves Pesqueira^aAuthor Vitae ; Marcelo Coelho Goiato^aAuthor Vitae

关键词：Composite resins ; Acrylic resins ; Color ; Hardness ; Chemical polishing

刊名：Materials Science and Engineering: C

出版年：2017

6.Experimental considerations for using electrochemical impedance spectroscopy to study chemical mechanical planarization systems

作者：M.C. Turk^a ; M.J. Walters^b ; D. Roy^a ; ^{samoy@clarkson.edu}

关键词：CMP ; EIS ; open circuit potential ; tribo-corrosion ; voltammetry

刊名：Electrochimica Acta

出版年：2017

7.Nanoscratching of copper surface by CeO₂

作者：Ning Xu^a ; Weizhong Han^a ; Yuchun Wang^b ; Ju Li^a ; ^c ; Zhiwei Shan^a ; ^{zwshan@mail.xjtu.edu.cn}

关键词：Chemical mechanical planarization ; CeO2 tip ; Nanoscratch ; Coefficient of friction ; Wear

刊名：Acta Materialia

出版年：2017

8.Filtration of aqueous colloidal ceria slurries using fibrous filters - An experimental and simulation study

作者：Vahid Rastegar^a ; ^b ; Goodarz Ahmadi^b ; ^c ; S.V. Babu^b ; ^d ; ^{babu@clarkson.edu}

关键词：ANSYS-FLUENT ; Fibrous filters ; Fiber efficiency ; Chemical mechanical polishing ; Colloidal ceria dispersion

刊名：Separation and Purification Technology

出版年：2017

9.Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency

作者：Pavel Jano&scaron ; ^a ; ^{pavel.janos@ujep.cz" class="auth_mail" title="E-mail the corresponding author} ; Jakub Ederer^a ; Věra Pilařová ; ^a ; Jiří ; Henych^a ; ^b ; Jakub Tolasz^b ; David Milde^c ; Tomá ; &scaron ; Opletal^c

关键词：Chemical mechanical polishing ; Ceria-based polishing powders ; Polishing efficiency ; Crystallinity ; Cerium (III) content

刊名：Wear

出版年：2016

10.Laser-induced damage characteristics in fused silica surface due to mechanical and chemical defects during manufacturing processes

作者：Yaguo Li^a ; ^{yargolee@163.com} ; Zhigang Yuan^a ; Jian Wang^a ; Qiao Xu^b

关键词：Laser induced damage ; Optical manufacturing ; Fused silica ; Cracks and scratches ; Metallic contamination

刊名：Optics & Laser Technology

出版年：2017

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