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在“Elsevier电子期刊”中，命中：23,779条，耗时：0.0220155 秒

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1.The influence of landing points on the sputtering of mono-crystal solids due to cluster impacting

作者：Guo-jian Niu ; Xiao-chun Li ; Qian Xu ; Zhong-shi Yang ; ^{zsyang@ipp.ac.cn} ; Guang-nan Luo ; ^{gnluo@ipp.ac.cn}

关键词：Sputtering ; Cluster ; Mechanism ; Molecular dynamics

刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

出版年：2017

2.Deposition and characterization of AZO thin films on flexible glass substrates using DC magnetron sputtering technique

作者：Yanping Xia^a ; Peihong Wang^a ; ^{wangpeihong2002@ahu.edu.cn} ; Shiwei Shi^a ; Miao Zhang^a ; Gang He^a ; Jianguo Lv^b ; Zhaoqi Sun^a

关键词：AZO thin film ; Flexible glass substrates ; Sputtering power ; Working pressure ; Substrate temperature

刊名：Ceramics International

出版年：2017

3.Effects of sputtering period on the performance of Cu₂ZnSnS₄ solar cells

作者：Yilei Lu ; Shurong Wang ; ^{shrw88@aliyun.com} ; Zhishan Li ; Zhi Jiang ; Min Yang ; Qi Li

关键词：CZTS ; Thin film ; Sputtering periods ; Solar cell

刊名：Physica B: Condensed Matter

出版年：2017

4.Physicochemical model for reactive sputtering of hot target

作者：Viktor I. Shapovalov ; ^{vishapovalov@mail.ru} ; Vitaliy V. Karzin ; Anastasia S. Bondarenko

关键词：Model ; Reactive sputtering ; Hot target ; Oxide ; Evaporation

刊名：Physics Letters A

出版年：2017

5.Structural and magnetic properties of Co-N thin films deposited using magnetron sputtering at 523 K

作者：Nidhi Pandey^a ; Mukul Gupta^a ; ^{mgupta@csr.res.in} ; ^{dr.mukul.gupta@gmail.com} ; Rachana Gupta^b ; Sujay Chakravarty^c ; Neeraj Shukla^c ; Anton Devishvili^d ; ^e ; ^f

关键词：Cobalt nitride thin films ; Tetra cobalt nitride ; Reactive nitrogen sputtering

刊名：Journal of Alloys and Compounds

出版年：2017

6.The erosion groove effects on RF planar magnetron sputtering

作者：Rabah Tadjine^a ; ^b ; ^{rtadjine@cdta.dz} ; Mounes M. Alim^a ; ^{malim@cdta.dz} ; Mohamed Kechouane^b ; ^{kechouanem@yahoo.fr}

关键词：RF plasma discharge ; Magnetron sputtering ; Target erosion ; Plasma impedance ; Plasma diagnostic

刊名：Surface and Coatings Technology

出版年：2017

7.Relative sputtering rates of oxides and fluorides of aluminum and yttrium

作者：Dae-Min Kim^a ; Mi-Ran Jang^a ; Yoon-Suk Oh^a ; Seongwon Kim^a ; Sung-Min Lee^a ; ^{smlee@kicet.re.kr} ; Sang-Ho Lee^b

关键词：Sputtering yield ; Oxide ; Fluoride ; Plasma etching

刊名：Surface and Coatings Technology

出版年：2017

8.Charge-state related effects in sputtering of LiF by swift heavy ions

作者：W. Assmann^a ; B. Ban-d'Etat^b ; M. Bender^c ; P. Boduch^b ; P.L. Grande^d ; H. Lebius^b ; D. Leliè ; vre^b ; G.G. Marmitt^d ; H. Rothard^b ; T. Seidl^c ; D. Severin^c ; K.-O. Voss^c ; M. Toulemonde^b ; ^{toulemonde@ganil.fr} ; C. Trautmann^c ; ^e

关键词：Electronic energy loss ; Sputtering ; LiF ; Jet component

刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

出版年：2017

9.The effect of sputtering atmosphere parameters on dielectric properties of the ferromagnetic alloy - ferroelectric ceramics nanocomposite (FeCoZr)_x(PbZrTiO₃)_(100−x)

作者：Oleksandr Boiko^a ; Tomasz N. Koltunowicz^a ; ^{t.koltunowicz@pollub.pl} ; Pawel Zukowski^a ; Alexander K. Fedotov^b ; Andrey V. Larkin^b

关键词：Nanocomposites ; Ferroelectric ; Ceramics ; Ion beam sputtering ; AC conductivity ; Relaxation time ; Activation energy

刊名：Ceramics International

出版年：2017

10.Sputtering of octatetraene by 15 keV C₆₀ projectiles: Comparison of reactive interatomic potentials

作者：Michal Kanski ; Dawid Maciazek ; Mikolaj Golunski ; Zbigniew Postawa ; ^{zbigniew.postawa@uj.edu.pl}

关键词：Computer simulations ; Sputtering ; Cluster projectile ; Octatetraene ; Interatomic potentials

刊名：Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

出版年：2017

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