74-3: Multicolor 1250 ppi OLED Arrays Patterened by Photolithography
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文摘
In this paper, we demonstrate multicolor OLEDs patterned sideby-side by photolithography. 1250 ppi arrays with 10 μm subpixel pitch are shown. The chemically amplified, i-line photoresist enables submicron pitch and aperture ratio above 60%. OLED photolithography paves the road to cost-effective, full-color displays with 4K and 8K resolution.
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