Synthesis and characterization of Ti2AlC coatings by magnetron sputtering from three elemental targets and ex-situ annealing
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文摘
Ti2AlC MAX phase formation induced by post annealing of elemental multilayers Ti-Al-C multilayers with nanoscale architecture deposited by magnetron sputtering Two substrate types were used: Si and thermally oxidized Si. No MAX phase formation observed for films on Si Phase-pure MAX phase formation observed for films on thermally oxidized Si at 800 °C
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