Thin films deposition with ECR planar plasma source

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• 作者：Vladimir Tereshin ; Aleksandr Bovda ; Vera Bovda ; Oleg Byrka ; Vladimir Chebotarev ; Vladimir Fedorchenko and Igor` ; Garkusha
• 关键词：ECR discharge ; Planar ECR plasma source ; Coating deposition ; Tungsten films ; Amorphous films
• 刊名：Vacuum
• 出版年：2006
• 出版时间：7 September 2006
• 年：2006
• 卷：80
• 期：11-12
• 页码：1272-1277
• 全文大小：222 K

文摘

The results of film deposition of pure tungsten as well as intermetallic compound of NdFeB type on various substrates using planar ECR plasma source (with multipole magnetic field) developed in our laboratory are presented. The frequency of 2.45 GHz was generated within the magnetic system by two-slot antenna. The ions of ECR argon plasma are used for target sputtering. The main plasma parameters are density 10¹⁰ cm⁻³, T_e15 eV, ions energy 20 eV, ion current density 3.5 mA/cm² at the ultimate magnetron power. Under sputtering of Nd₈Fe₈₆B₆ target the amorphous films with high adherence and thickness of 5 μm were formed on the substrate. The deposition rate of tungsten films (target biasing 900 V) was 0.59 nm/s. The fine-grained films with high adhesion were obtained. They were tested against heat loads up to 100 J/cm² produced under irradiation of coatings with plasma streams.