The electrical properties of bulk GaN crystals grown by HVPE
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文摘

The samples investigated in this work are sliced from the same bulk crystal.

The dislocation density of samples ranges from 2.4×106 cm−2 to 2.3×105 cm−2.

The evolution of dislocation and impurity with thickness is presented.

The mechanism determining the electrical properties of bulk GaN is discussed.

HVPE is identified as an effective approach in growing thick bulk GaN.

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