The influence of neon in the deposition of titanium nitride by plasma-assisted physical vapour deposition

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• 作者：Fancey ; Kevin S. ; Leyland ; Adrian ; Moh’ ; d Badow ; Fadhel ; Matthews ; Allan
• 关键词：PVD ; Titanium nitride ; Neon ; Penning ionisation
• 刊名：Materials Science and Engineering: A
• 出版年：1999
• 出版时间：April 1, 1999
• 年：1999
• 卷：262
• 期：1-2
• 页码：227-231
• 全文大小：242 K

文摘

Titanium nitride coatings were produced by reactive (plasma-assisted) deposition in argon and neon-based nitrogenous discharges. Coating analysis has indicated that during deposition, nitrogen reactivity can be enhanced when neon is used, and this may be attributed to Penning ionisation. The effect could assist deposition onto heat-sensitive materials by permitting lower processing temperatures.