Substrate topography guides pore morphology evolution in nanoporous gold thin films

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• 作者：Christopher A.R. Chapman^a ; Pallavi Daggumati^b ; Shannon C. Gott^c ; Masaru P. Rao^c ; ^d ; ^e ; Erkin Seker^b ; ^{eseker@ucdavis.edu" class="auth_mail" title="E-mail the corresponding author}
• 关键词：Nanoporous material ; Annealing ; Dealloying ; Fracture ; Microfabrication
• 刊名：Scripta Materialia
• 出版年：2016
• 出版时间：1 January 2016
• 年：2016
• 卷：110
• 期：Complete
• 页码：33-36
• 全文大小：940 K

文摘

This paper illustrates the effect of substrate topography on morphology evolution in nanoporous gold (np-Au) thin films. One micron-high silicon ridges with widths varying between 150 nm and 50 渭m were fabricated and coated with 500 nm-thick np-Au films obtained by dealloying sputtered gold–silver alloy films. Analysis of scanning electron micrographs of the np-Au films following dealloying and thermal annealing revealed two distinct regimes where the ratio of film thickness to ridge width determines the morphological evolution of np-Au films.