Atomic layer deposition of Al₂O₃ catalysts for narrow diameter distributed single-walled carbon nanotube arrays growth

详细信息    查看全文

• 作者：Lei Tang^a ; ^b ; Qichong Zhang^a ; Chaowei Li^a ; ^b ; Xiaona Wang^a ; Kai Zhang^a ; Yancui Xu^a ; Taotao Li^a ; Jianhui Fang^b ; Yagang Yao^a ; ^{ygyao2013@sinano.ac.cn}
• 关键词：Atomic layer deposition ; Al2O3 catalysts ; Narrow diameter distributed ; Single-walled carbon nanotube arrays
• 刊名：Carbon
• 出版年：2017
• 出版时间：April 2017
• 年：2017
• 卷：114
• 期：Complete
• 页码：224-229
• 全文大小：2002 K
• 卷排序：114

文摘

Taking the importance of uniform size catalysts and the unfavorable effects of residual metal catalysts into consideration, herein, we develop a facile way which utilizes the typical and facile semiconducting technique namely atomic layer deposition (ALD) to prepare non-metallic Al2O3 catalysts for narrow diameter single-walled carbon nanotube (SWNT) arrays growth. As a result, we obtained SWNT arrays with narrow-diameter distribution of 1.26 ± 0.033 nm on the a-plane sapphire substrates. Moreover, the relationship between catalysts and SWNTs were explored. These optimized conditions pave an avenue for narrow diameter even chirality distribution in SWNTs growth, which promotes the development of structure-controlled and relative applications of SWNTs.