H₂O₂ and/or TiO₂ photocatalysis under UV irradiation for the removal of antibiotic resistant bacteria and their antibiotic resistance genes

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• 作者：Changsheng Guo^a ; Kai Wang^a ; ^b ; Song Hou^a ; Li Wan^a ; Jiapei Lv^a ; Yuan Zhang^a ; Xiaodong Qu^c ; Shuyi Chen^b ; Jian Xu^a ; ^{xujian@craes.org.cn}
• 关键词：Antibiotic resistant bacteria (ARB) ; Antibiotic resistance genes (ARGs) ; Photocatalysis ; TiO2 ; Removal
• 刊名：Journal of Hazardous Materials
• 出版年：2017
• 出版时间：5 February 2017
• 年：2017
• 卷：323
• 期：part_PB
• 页码：710-718
• 全文大小：2486 K
• 卷排序：323

文摘

TiO2 thin film was successfully synthesized for treating ARB and ARGs from water. More than 5.5 log units of ARB reduction was achieved by TiO2 under UV irradiation. With TiO2, ARGs were reduced by more than 5 log units under UV irradiation. TiO2 could remove both intracellular and extracellular forms of ARGs.