Depth profile investigation of the incorporated iron atoms during Kr⁺ ion beam sputtering on Si (001)

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• 作者：B. Khanbabaee^a ; ^{khanbabaee@physik.uni-siegen.de} ; B. Arezki^a ; A. Biermanns^a ; M. Cornejo^b ; D. Hirsch^b ; D. Lü ; tzenkirchen-Hecht^c ; F. Frost^b ; U. Pietsch^a
• 关键词：Silicon ; Depth profile ; Sputtering ; Nano-patterning ; X-ray reflectivity ; X-ray absorption near edge spectroscopy
• 刊名：Thin Solid Films
• 出版年：2013
• 出版时间：1 January, 2013
• 年：2013
• 卷：527
• 期：Complete
• 页码：349-353
• 全文大小：862 K

文摘

We investigate the incorporation of iron atoms during nano-patterning of Si surfaces induced by 2 keV Kr⁺ ion beam erosion under an off-normal incidence angle of 15¡ã. Considering the low penetration depth of the ions, we have used X-ray reflectivity (XRR) and X-ray absorption near edge spectroscopy (XANES) under grazing-incidence angles in order to determine the depth profile and phase composition of the incorporated iron atoms in the near surface region, complemented by secondary ion mass spectrometry and atomic force microscopy. XRR analysis shows the accumulation of metallic atoms within a near surface layer of a few nanometer thickness. We verify that surface pattern formation takes place only when the co-sputtered Fe concentration exceeds a certain limit. For high Fe concentration, the ripple formation is accompanied by the enhancement of Fe close to the surface, whereas no Fe enhancement is found for low Fe concentration at samples with smooth surfaces. Modeling of the measured XANES spectra reveals the appearance of different silicide phases with decreasing Fe content from the top towards the volume.