Fabrication of size-tunable antireflective nanopillar array using hybrid nano-patterning lithography

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• 作者：Hung-Chun Wu ; XueBo Xu ; MeiYing He ; MingQuan Zhang ; Kung-Jeng Ma ; MingDong Bao
• 关键词：Antireflection nanostructure ; Nanosphere lithography ; Nanoimprint lithography ; Surface free energy
• 刊名：Surface and Coatings Technology
• 出版年：15 February, 2014
• 年：2014
• 卷：240
• 期：Complete
• 页码：413-418
• 全文大小：1024 K

文摘

This study developed a novel and inexpensive method for fabricating size-tunable tapered antireflective nanopillars on a polycarbonate (PC) film using hybrid nano-patterning lithography consisting of nanosphere lithography (NSL) and nanoimprint lithography (NIL). The optical properties of the antireflective surfaces can be controlled by the CrN nanomold morphologies resulting from the different reactive ion etching conditions. The nanomold surface of CrN nanohole arrays has a low surface energy at the interface and has an anti-sticking property that can be applied in the problem of the sticking during demolding. A high-performance antireflective tapered nanopillar layer was successfully imprinted on a PC film surface using a contactless gas assisted pressing process along with a CrN nanomold prepared by NSL. The optical properties of antireflective characteristic of the PC tapered nanostructures were analyzed. Such antireflective surfaces are promising for fabrication of high light transmittance and antireflective optical materials to be used in many important fields.