Restoration of graphene from graphene oxide by defect repair

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• 作者：Meng Cheng ; Rong Yang ; Lianchang Zhang ; Zhiwen Shi ; Wei Yang ; Duoming Wang ; Guibai Xie ; Dongxia Shi ; Guangyu Zhang ; ^{gyzhang@iphy.ac.cn}
• 刊名：Carbon
• 出版年：2012
• 出版时间：June, 2012
• 年：2012
• 卷：50
• 期：7
• 页码：2581-2587
• 全文大小：1247 K

文摘

A simple and efficient method to repair defects in graphene oxide (GO) is reported, accompanied by a simultaneous reduction process by a methane plasma. The graphene after repair is of high quality. For a typical monolayer after repair and reduction, the minimum sheet resistance at the Dirac point and the Raman D/G peak intensity ratio are about 9.0 k¦¸/?and ?.53, respectively.