Toward optimizing dental implant performance: Surface characterization of Ti and TiZr implant materials

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• 作者：M. Murphy^a ; M.S. Walczak^a ; A.G. Thomas^b ; N. Silikas^c ; S. Berner^d ; R. Lindsay^a ; ^{robert.lindsay@manchester.ac.uk}
• 关键词：Dental implants ; Osseointegration ; Surface characterization ; X-ray diffraction ; Raman μ-spectroscopy ; X-ray photoelectron spectroscopy
• 刊名：Dental Materials
• 出版年：2017
• 出版时间：January 2017
• 年：2017
• 卷：33
• 期：1
• 页码：43-53
• 全文大小：2967 K
• 卷排序：33

文摘

Ti and TiZr implant surfaces are studied to further insight into osseointegration. Data are acquired from substrates subjected to SLA and SLActive surface treatments. All substrates exhibit surface films with near TiO2 stoichiometry. No evidence is found for discrete ZrOx phases on TiZr implant surfaces.