Preparation of polyhedral oligomeric silsesquioxane based imprinted monolith
文摘
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POSS was used to prepare imprinted monolithic column for the first time.

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The influence of synthesis parameters on the imprinting effect was studied.

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The greatest imprinting factor on POSS-based MIP was about 10 times higher than POSS-free MIP.

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Thermodynamic and Van Deemter analysis were used to evaluate the POSS-based MIP.

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