Sub-25 nm direct write (maskless) X-ray nanolithography

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• 作者：Adam F.G. Leontowich^a ; ^{adam.leontowich@cfel.de} ; Adam P. Hitchcock^a ; Ben Watts^b ; Jö ; rg Raabe^b
• 关键词：Maskless lithography ; STXM ; Fresnel zone plate ; X-ray lithography ; Cold development
• 刊名：Microelectronic Engineering
• 出版年：2013
• 出版时间：August, 2013
• 年：2013
• 卷：108
• 期：Complete
• 页码：5-7
• 全文大小：735 K

文摘

Sub-25 nm continuous, reproducible features of arbitrary geometry were created by X-ray lithography in direct write (maskless) geometry, analogous to conventional electron beam lithography. This was achieved through the use of a laser interferometer-controlled scanning transmission X-ray microscope (STXM) equipped with a zone doubled Fresnel zone plate lens, and a cold development procedure. These features are among the smallest created with photons in direct write geometry.