Correlation-free ellipsometric characterization of uniaxially anisotropic nanolayers
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文摘
The possibilities of simultaneous determining the thickness and optical constants of uniaxially anisotropic nanoscale dielectric films on absorbing isotropic substrates by ellipsometry, which is based only on the phase change measurements, are investigated. By using analytical formulas for differential ellipsometric angles, obtained in the framework of a long-wavelength approximation, it is shown that in certain cases the correlation-free measurements of the material parameters and thickness of such films are entirely possible solely from phase information. The accuracy of the obtained formulas for determining the parameters of ultrathin films is estimated by computer simulation of the reflection problem on the basis of the exact electromagnetic theory for anisotropic layered systems.
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